JP2004526984A5 - - Google Patents
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- Publication number
- JP2004526984A5 JP2004526984A5 JP2002548218A JP2002548218A JP2004526984A5 JP 2004526984 A5 JP2004526984 A5 JP 2004526984A5 JP 2002548218 A JP2002548218 A JP 2002548218A JP 2002548218 A JP2002548218 A JP 2002548218A JP 2004526984 A5 JP2004526984 A5 JP 2004526984A5
- Authority
- JP
- Japan
- Prior art keywords
- cycloalkyl
- substituted
- alkyl
- interrupted
- oso
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 51
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 35
- 229910052736 halogen Inorganic materials 0.000 claims description 32
- 125000002947 alkylene group Chemical group 0.000 claims description 31
- 125000000217 alkyl group Chemical group 0.000 claims description 16
- 229910052739 hydrogen Inorganic materials 0.000 claims description 7
- 239000001257 hydrogen Substances 0.000 claims description 7
- -1 anthracyl Chemical group 0.000 claims 51
- 150000002367 halogens Chemical class 0.000 claims 30
- 239000002253 acid Substances 0.000 claims 24
- 125000001072 heteroaryl group Chemical group 0.000 claims 18
- 125000001624 naphthyl group Chemical group 0.000 claims 18
- 125000005561 phenanthryl group Chemical group 0.000 claims 17
- 150000001875 compounds Chemical class 0.000 claims 14
- 239000000203 mixture Substances 0.000 claims 11
- 125000001424 substituent group Chemical group 0.000 claims 10
- 125000002993 cycloalkylene group Chemical group 0.000 claims 8
- 125000003170 phenylsulfonyl group Chemical group C1(=CC=CC=C1)S(=O)(=O)* 0.000 claims 8
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 8
- 125000002088 tosyl group Chemical group [H]C1=C([H])C(=C([H])C([H])=C1C([H])([H])[H])S(*)(=O)=O 0.000 claims 8
- 125000002861 (C1-C4) alkanoyl group Chemical group 0.000 claims 6
- 229910052799 carbon Inorganic materials 0.000 claims 6
- 125000004432 carbon atom Chemical group C* 0.000 claims 6
- 125000006331 halo benzoyl group Chemical group 0.000 claims 6
- 125000004390 alkyl sulfonyl group Chemical group 0.000 claims 4
- 125000003236 benzoyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C(*)=O 0.000 claims 4
- IFVTZJHWGZSXFD-UHFFFAOYSA-N biphenylene Chemical group C1=CC=C2C3=CC=CC=C3C2=C1 IFVTZJHWGZSXFD-UHFFFAOYSA-N 0.000 claims 4
- 125000001589 carboacyl group Chemical group 0.000 claims 4
- 150000002431 hydrogen Chemical class 0.000 claims 4
- 125000004957 naphthylene group Chemical group 0.000 claims 4
- 125000000843 phenylene group Chemical group C1(=C(C=CC=C1)*)* 0.000 claims 4
- 238000004519 manufacturing process Methods 0.000 claims 3
- 229920002120 photoresistant polymer Polymers 0.000 claims 3
- 125000004769 (C1-C4) alkylsulfonyl group Chemical group 0.000 claims 2
- 125000006710 (C2-C12) alkenyl group Chemical group 0.000 claims 2
- XTFIVUDBNACUBN-UHFFFAOYSA-N 1,3,5-trinitro-1,3,5-triazinane Chemical compound [O-][N+](=O)N1CN([N+]([O-])=O)CN([N+]([O-])=O)C1 XTFIVUDBNACUBN-UHFFFAOYSA-N 0.000 claims 2
- 241001481833 Coryphaena hippurus Species 0.000 claims 2
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 2
- 125000001797 benzyl group Chemical group [H]C1=C([H])C([H])=C(C([H])=C1[H])C([H])([H])* 0.000 claims 2
- 239000011230 binding agent Substances 0.000 claims 2
- 125000000392 cycloalkenyl group Chemical group 0.000 claims 2
- 239000000463 material Substances 0.000 claims 2
- 125000005146 naphthylsulfonyl group Chemical group C1(=CC=CC2=CC=CC=C12)S(=O)(=O)* 0.000 claims 2
- 229910052757 nitrogen Inorganic materials 0.000 claims 2
- 125000004433 nitrogen atom Chemical group N* 0.000 claims 2
- 229920000642 polymer Polymers 0.000 claims 2
- 239000000654 additive Substances 0.000 claims 1
- 238000000576 coating method Methods 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 238000004090 dissolution Methods 0.000 claims 1
- 239000003623 enhancer Substances 0.000 claims 1
- 125000001188 haloalkyl group Chemical group 0.000 claims 1
- 239000000976 ink Substances 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
- 239000000758 substrate Substances 0.000 claims 1
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000006552 (C3-C8) cycloalkyl group Chemical group 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| EP00811147 | 2000-12-04 | ||
| EP01810551 | 2001-06-08 | ||
| PCT/EP2001/013725 WO2002046507A2 (en) | 2000-12-04 | 2001-11-26 | Onium salts and the use therof as latent acids |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004526984A JP2004526984A (ja) | 2004-09-02 |
| JP2004526984A5 true JP2004526984A5 (cg-RX-API-DMAC10.html) | 2008-05-15 |
| JP4294317B2 JP4294317B2 (ja) | 2009-07-08 |
Family
ID=26074087
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002548218A Expired - Fee Related JP4294317B2 (ja) | 2000-12-04 | 2001-11-26 | オニウム塩及びその潜在的酸としての使用 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6929896B2 (cg-RX-API-DMAC10.html) |
| EP (1) | EP1344109B1 (cg-RX-API-DMAC10.html) |
| JP (1) | JP4294317B2 (cg-RX-API-DMAC10.html) |
| KR (1) | KR100862281B1 (cg-RX-API-DMAC10.html) |
| CN (1) | CN100383665C (cg-RX-API-DMAC10.html) |
| AT (1) | ATE394707T1 (cg-RX-API-DMAC10.html) |
| AU (1) | AU2002227945A1 (cg-RX-API-DMAC10.html) |
| BR (1) | BR0115944A (cg-RX-API-DMAC10.html) |
| CA (1) | CA2428255C (cg-RX-API-DMAC10.html) |
| DE (1) | DE60133929D1 (cg-RX-API-DMAC10.html) |
| MX (1) | MXPA03004958A (cg-RX-API-DMAC10.html) |
| WO (1) | WO2002046507A2 (cg-RX-API-DMAC10.html) |
Families Citing this family (39)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6787281B2 (en) | 2002-05-24 | 2004-09-07 | Kodak Polychrome Graphics Llc | Selected acid generating agents and their use in processes for imaging radiation-sensitive elements |
| AT500298A1 (de) * | 2002-06-14 | 2005-11-15 | Agrolinz Melamin Gmbh | Verfahren zur härtung von aminoplasten |
| US6790590B2 (en) | 2003-01-27 | 2004-09-14 | Kodak Polychrome Graphics, Llp | Infrared absorbing compounds and their use in imageable elements |
| JP2005035162A (ja) * | 2003-07-14 | 2005-02-10 | Fuji Photo Film Co Ltd | 平版印刷版の製版方法、平版印刷方法および機上現像用平版印刷原版 |
| JP4644457B2 (ja) * | 2003-09-10 | 2011-03-02 | 富士フイルム株式会社 | 感光性組成物及びそれを用いたパターン形成方法 |
| ATE450813T1 (de) * | 2004-05-17 | 2009-12-15 | Fujifilm Corp | Verfahren zur erzeugung eines musters |
| CN1988956B (zh) * | 2004-07-21 | 2012-10-03 | 西巴特殊化学品控股有限公司 | 通过倒置的两阶段工序光活化催化剂的方法及其应用 |
| JP4152928B2 (ja) * | 2004-08-02 | 2008-09-17 | 株式会社シンク・ラボラトリー | ポジ型感光性組成物 |
| JP4770244B2 (ja) * | 2005-04-11 | 2011-09-14 | Ｊｓｒ株式会社 | オニウム塩、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物 |
| JP4810862B2 (ja) * | 2005-04-11 | 2011-11-09 | Ｊｓｒ株式会社 | オニウム塩、それを用いた感放射線性酸発生剤及びポジ型感放射線性樹脂組成物 |
| KR20080008354A (ko) * | 2005-05-11 | 2008-01-23 | 도오꾜오까고오교 가부시끼가이샤 | 네거티브형 레지스트 조성물 및 레지스트 패턴 형성 방법 |
| JP2007041200A (ja) * | 2005-08-02 | 2007-02-15 | Fujifilm Corp | ポジ型感光性組成物及びそれを用いたパターン形成方法 |
| US8049333B2 (en) | 2005-08-12 | 2011-11-01 | Cambrios Technologies Corporation | Transparent conductors comprising metal nanowires |
| US20070077452A1 (en) * | 2005-10-04 | 2007-04-05 | Jie Liu | Organic light emitting devices having latent activated layers and methods of fabricating the same |
| US20070176167A1 (en) * | 2006-01-27 | 2007-08-02 | General Electric Company | Method of making organic light emitting devices |
| GB0607668D0 (en) | 2006-04-18 | 2006-05-31 | Riso Nat Lab | Use of decomposable vehicles or solvents in printing or coating compositions |
| WO2007124092A2 (en) | 2006-04-21 | 2007-11-01 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
| US20080014117A1 (en) * | 2006-07-14 | 2008-01-17 | Questel Adhesives | Food sterilization dosage indicator |
| US8018568B2 (en) | 2006-10-12 | 2011-09-13 | Cambrios Technologies Corporation | Nanowire-based transparent conductors and applications thereof |
| CN101589473B (zh) | 2006-10-12 | 2011-10-05 | 凯博瑞奥斯技术公司 | 基于纳米线的透明导体及其应用 |
| GB0623936D0 (en) * | 2006-11-29 | 2007-01-10 | Univ Strathclyde | Polymers with transmission into the ultraviolet |
| KR101456838B1 (ko) | 2007-04-20 | 2014-11-04 | 캄브리오스 테크놀로지즈 코포레이션 | 복합 투명 도전체 및 그 제조 방법 |
| KR100908601B1 (ko) * | 2007-06-05 | 2009-07-21 | 제일모직주식회사 | 반사방지 하드마스크 조성물 및 이를 이용한 기판상 재료의패턴화 방법 |
| US9034556B2 (en) | 2007-12-21 | 2015-05-19 | Tokyo Ohka Kogyo Co., Ltd. | Compound and method of producing the same, acid generator, resist composition and method of forming resist pattern |
| JP4703674B2 (ja) * | 2008-03-14 | 2011-06-15 | 富士フイルム株式会社 | レジスト組成物及びそれを用いたパターン形成方法 |
| US8163461B2 (en) * | 2008-04-09 | 2012-04-24 | Cornell Research Foundation, Inc. | Photoacid generator compounds and compositions |
| JP5746829B2 (ja) * | 2009-04-06 | 2015-07-08 | 富士フイルム株式会社 | 感活性光線性または感放射線性樹脂組成物及びそれを用いたパターン形成方法 |
| JP5607044B2 (ja) * | 2009-06-02 | 2014-10-15 | 山本化成株式会社 | ヨードニウム系光重合開始剤、その製造方法およびこれを含有してなる光硬化性組成物 |
| WO2011106438A1 (en) | 2010-02-24 | 2011-09-01 | Cambrios Technologies Corporation | Nanowire-based transparent conductors and methods of patterning same |
| JP5521996B2 (ja) * | 2010-11-19 | 2014-06-18 | 信越化学工業株式会社 | スルホニウム塩を含む高分子化合物、レジスト材料及びパターン形成方法、並びにスルホニウム塩単量体及びその製造方法 |
| US20140005301A1 (en) * | 2011-02-23 | 2014-01-02 | Basf Se | Sulfonium sulfates, their preparation and use |
| JP2013129649A (ja) * | 2011-11-22 | 2013-07-04 | Central Glass Co Ltd | 珪素化合物、縮合物およびそれを用いたレジスト組成物、ならびにそれを用いるパターン形成方法 |
| JP2013148878A (ja) * | 2011-12-19 | 2013-08-01 | Sumitomo Chemical Co Ltd | レジスト組成物 |
| WO2013156509A2 (en) * | 2012-04-19 | 2013-10-24 | Basf Se | Sulfonium compounds, their preparation and use |
| JP6671381B2 (ja) | 2015-02-02 | 2020-03-25 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 潜在酸およびそれらの使用 |
| JP6888669B2 (ja) * | 2017-03-31 | 2021-06-16 | ダイキン工業株式会社 | アルキル硫酸エステル又はその塩 |
| US11279814B2 (en) | 2017-03-31 | 2022-03-22 | Daikin Industries, Ltd. | Production method for fluoropolymer, surfactant for polymerization, and use of surfactant |
| JP7356282B2 (ja) * | 2018-08-01 | 2023-10-04 | 住友化学株式会社 | レジスト組成物及びレジストパターンの製造方法 |
| WO2025132334A1 (en) | 2023-12-19 | 2025-06-26 | Merck Patent Gmbh | Resists using pfas free pags |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE728755R (fr) | 1968-02-28 | 1969-08-01 | Du Pont | Procédé de préparation de composés organiques non-saturés |
| DE3369988D1 (en) | 1982-07-26 | 1987-04-09 | Asahi Chemical Ind | Fluoroepoxides and a process for production thereof |
| US4491628A (en) | 1982-08-23 | 1985-01-01 | International Business Machines Corporation | Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone |
| DE3750275T3 (de) | 1986-06-13 | 1998-10-01 | Microsi Inc | Lackzusammensetzung und -anwendung. |
| JPH01226868A (ja) | 1988-03-08 | 1989-09-11 | Sanshin Kagaku Kogyo Kk | スルホニウム化合物及びアシル化剤 |
| US5345392A (en) * | 1991-01-25 | 1994-09-06 | International Business Machines Corporation | Battery charge monitor for a personal computer |
| US5153466A (en) * | 1991-03-26 | 1992-10-06 | Medtronic, Inc. | All monolithic transceiver operative from a low voltage vcc dc supply |
| JP2964107B2 (ja) | 1991-11-11 | 1999-10-18 | 日本電信電話株式会社 | ポジ型レジスト材料 |
| US5550004A (en) * | 1992-05-06 | 1996-08-27 | Ocg Microelectronic Materials, Inc. | Chemically amplified radiation-sensitive composition |
| JPH06199770A (ja) * | 1992-12-28 | 1994-07-19 | Japan Synthetic Rubber Co Ltd | 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物 |
| US5314747A (en) * | 1993-03-19 | 1994-05-24 | Xerox Corporation | Recording sheets containing cationic sulfur compounds |
| JP3588822B2 (ja) * | 1994-07-07 | 2004-11-17 | Ｊｓｒ株式会社 | 新規オニウム塩およびそれを含有する感放射線性樹脂 組成物 |
| CA2187046A1 (fr) * | 1996-10-03 | 1998-04-03 | Alain Vallee | Sulfonylimidures et sulfonylmethylures, leur utilisation comme photoinitiateur |
| JP3950241B2 (ja) * | 1997-10-17 | 2007-07-25 | 三菱重工業株式会社 | 樹脂組成物、樹脂硬化物、及び構造物の補修方法、補強方法、補修用材料、補強用材料 |
| US6159656A (en) * | 1998-06-26 | 2000-12-12 | Fuji Photo Film Co., Ltd. | Positive photosensitive resin |
| HK1042473A1 (en) * | 1999-12-03 | 2002-08-16 | Toyo Gosei Kogyo Co., Ltd. | Process for producing onium salt derivative and novel onium salt derivative |
| JP4262406B2 (ja) * | 1999-12-03 | 2009-05-13 | 東洋合成工業株式会社 | オニウム塩誘導体の製造方法 |
| JP4161497B2 (ja) * | 1999-12-24 | 2008-10-08 | Ｊｓｒ株式会社 | ネガ型感放射線性樹脂組成物 |
-
2001
- 2001-11-26 EP EP01989514A patent/EP1344109B1/en not_active Expired - Lifetime
- 2001-11-26 US US10/432,263 patent/US6929896B2/en not_active Expired - Fee Related
- 2001-11-26 DE DE60133929T patent/DE60133929D1/de not_active Expired - Lifetime
- 2001-11-26 JP JP2002548218A patent/JP4294317B2/ja not_active Expired - Fee Related
- 2001-11-26 BR BR0115944-5A patent/BR0115944A/pt not_active Application Discontinuation
- 2001-11-26 MX MXPA03004958A patent/MXPA03004958A/es not_active Application Discontinuation
- 2001-11-26 AT AT01989514T patent/ATE394707T1/de not_active IP Right Cessation
- 2001-11-26 CN CNB018200575A patent/CN100383665C/zh not_active Expired - Fee Related
- 2001-11-26 KR KR1020037007500A patent/KR100862281B1/ko not_active Expired - Fee Related
- 2001-11-26 CA CA002428255A patent/CA2428255C/en not_active Expired - Fee Related
- 2001-11-26 WO PCT/EP2001/013725 patent/WO2002046507A2/en not_active Ceased
- 2001-11-26 AU AU2002227945A patent/AU2002227945A1/en not_active Abandoned
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