JP2004525994A - 二重硬化樹脂におけるフッ素化光開始剤 - Google Patents

二重硬化樹脂におけるフッ素化光開始剤 Download PDF

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Publication number
JP2004525994A
JP2004525994A JP2002543602A JP2002543602A JP2004525994A JP 2004525994 A JP2004525994 A JP 2004525994A JP 2002543602 A JP2002543602 A JP 2002543602A JP 2002543602 A JP2002543602 A JP 2002543602A JP 2004525994 A JP2004525994 A JP 2004525994A
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JP
Japan
Prior art keywords
group
hydroxy
alkyl
composition
alkoxy
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2002543602A
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English (en)
Japanese (ja)
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JP2004525994A5 (https=
Inventor
ボーダン，ジゼル
ユング，トゥニヤ
ヒュースラー，リナルド
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
BASF Schweiz AG
Original Assignee
Ciba Spezialitaetenchemie Holding AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ciba Spezialitaetenchemie Holding AG filed Critical Ciba Spezialitaetenchemie Holding AG
Publication of JP2004525994A publication Critical patent/JP2004525994A/ja
Publication of JP2004525994A5 publication Critical patent/JP2004525994A5/ja
Withdrawn legal-status Critical Current

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    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
    • C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
    • C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
    • C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
    • C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C323/00—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups
    • C07C323/23—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton
    • C07C323/31—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton
    • C07C323/32—Thiols, sulfides, hydropolysulfides or polysulfides substituted by halogen, oxygen or nitrogen atoms, or by sulfur atoms not being part of thio groups containing thio groups and nitrogen atoms, not being part of nitro or nitroso groups, bound to the same carbon skeleton having the sulfur atom of at least one of the thio groups bound to a carbon atom of a six-membered aromatic ring of the carbon skeleton having at least one of the nitrogen atoms bound to an acyclic carbon atom of the carbon skeleton
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C69/00—Esters of carboxylic acids; Esters of carbonic or haloformic acids
    • C07C69/62—Halogen-containing esters
    • C07C69/63—Halogen-containing esters of saturated acids
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07F—ACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F7/00—Compounds containing elements of Groups 4 or 14 of the Periodic Table
    • C07F7/02—Silicon compounds
    • C07F7/08—Compounds having one or more C—Si linkages
    • C07F7/18—Compounds having one or more C—Si linkages as well as one or more C—O—Si linkages
    • C07F7/1804—Compounds having Si-O-C linkages
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D4/00—Coating compositions, e.g. paints, varnishes or lacquers, based on organic non-macromolecular compounds having at least one polymerisable carbon-to-carbon unsaturated bond ; Coating compositions, based on monomers of macromolecular compounds of groups C09D183/00 - C09D183/16

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  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Optical Fibers, Optical Fiber Cores, And Optical Fiber Bundles (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2002543602A 2000-11-20 2001-11-13 二重硬化樹脂におけるフッ素化光開始剤 Withdrawn JP2004525994A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP00811098 2000-11-20
PCT/EP2001/013130 WO2002040602A1 (en) 2000-11-20 2001-11-13 Fluorinated-photoinitiators in dual cure resins

Publications (2)

Publication Number Publication Date
JP2004525994A true JP2004525994A (ja) 2004-08-26
JP2004525994A5 JP2004525994A5 (https=) 2005-12-22

Family

ID=8175040

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002543602A Withdrawn JP2004525994A (ja) 2000-11-20 2001-11-13 二重硬化樹脂におけるフッ素化光開始剤

Country Status (12)

Country Link
US (1) US20040067311A1 (https=)
EP (1) EP1392779B1 (https=)
JP (1) JP2004525994A (https=)
KR (1) KR100853363B1 (https=)
CN (1) CN1235984C (https=)
AT (1) ATE429468T1 (https=)
AU (1) AU2002218297A1 (https=)
BR (1) BR0115471A (https=)
CA (1) CA2424477A1 (https=)
DE (1) DE60138488D1 (https=)
MX (1) MXPA03004456A (https=)
WO (1) WO2002040602A1 (https=)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009053663A (ja) * 2007-08-02 2009-03-12 Fujifilm Corp 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置
JP2009138150A (ja) * 2007-12-10 2009-06-25 Konica Minolta Holdings Inc 光開始剤、光重合性組成物及び光硬化方法
JP2014009173A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2003066693A1 (en) * 2002-02-04 2003-08-14 Ciba Specialty Chemicals Holding Inc. Fluorinated photoinitiators in highly fluorinated monomers
JP4501462B2 (ja) * 2003-03-12 2010-07-14 Ｔｄｋ株式会社 複合ハードコート層付き物体及び複合ハードコート層の形成方法
JP4767840B2 (ja) * 2003-06-06 2011-09-07 チバ ホールディング インコーポレーテッド 新規な界面活性ポリシロキサン光開始剤
US20080241567A1 (en) * 2005-05-25 2008-10-02 Sarfraz Ahmed Siddiqui Frosting methods, frosted articles, & frosting liquids
US7244508B2 (en) * 2005-05-25 2007-07-17 Int'l Cellulose Corp. Frosting coating materials, articles, and methods
JP2009509016A (ja) * 2005-09-22 2009-03-05 チバ ホールディング インコーポレーテッド 耐引掻性ポリマー及びコーティング組成物
US8343570B2 (en) * 2005-11-17 2013-01-01 Dcc Ip Stabilizers for thermosetting powder coating compositions
JP4874689B2 (ja) * 2006-03-31 2012-02-15 富士フイルム株式会社 ホログラフィック記録用組成物及びこれを用いた光記録媒体
JP5507256B2 (ja) * 2006-12-13 2014-05-28 スリーエム イノベイティブ プロパティズ カンパニー 酸性成分及び光退色性染料を有する歯科用組成物の使用方法
CN101812143B (zh) * 2010-04-09 2012-08-29 北京化工大学 一种含氟光引发剂及其应用
CN102912472B (zh) * 2012-11-07 2014-07-02 北京化工大学 一种制备具有表面感光活性电纺丝纳米纤维的制备方法
CN104059402B (zh) * 2014-03-04 2017-01-04 深圳市西卡德科技有限公司 一种光聚合型感光高分子材料、制备方法及其应用
CN110908234B (zh) * 2018-08-28 2022-08-02 深圳光峰科技股份有限公司 固化胶及其投影屏幕
CN115485263A (zh) 2020-05-14 2022-12-16 3M创新有限公司 包含全氟化基团、光引发剂基团和酰胺连接基团的化合物
KR102765439B1 (ko) * 2021-12-06 2025-02-11 주식회사 테크늄 아세토페논계 화합물, 이를 포함하는 광경화성 조성물, 및 이로부터 형성된 광경화막 및 화상 표시 장치
CN114957302A (zh) * 2022-05-10 2022-08-30 常州大学 一种碳硼烷含氟光引发剂及其制备方法和应用
CN118085652A (zh) * 2024-02-03 2024-05-28 广东鑫皇冠新材料有限公司 一种水性眼镜器材涂料及其制备方法

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2590895B1 (fr) * 1985-12-03 1988-01-15 Atochem Monomeres acryliques fluores, polymeres en derivant et leur application comme agents hydrophobes et oleophobes
DE69217559T2 (de) * 1991-12-11 1997-06-05 Allied Signal Inc Uv-härtung von fluorinierten monomeren
DE69737861T8 (de) * 1996-07-02 2008-06-26 Ciba Specialty Chemicals Holding Inc. Verfahren zur vernetzung einen polymerisierbaren zusammensetzung
US6620857B2 (en) * 1996-07-02 2003-09-16 Ciba Specialty Chemicals Corporation Process for curing a polymerizable composition
DE19860041A1 (de) * 1998-12-23 2000-06-29 Basf Ag Durch Addition an Isocyanatgruppen als auch durch strahlungsinduzierte Addition an aktivierte C-C-Doppelbindungen härtbare Beschichtungsmittel
US6448302B1 (en) * 2000-01-19 2002-09-10 The Sherwin-Williams Company Radiation curable coatings having low gloss and coated articles made therefrom

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2009053663A (ja) * 2007-08-02 2009-03-12 Fujifilm Corp 硬化性組成物、硬化膜、フォトスペーサーの製造方法、液晶表示装置用基板及び液晶表示装置
JP2009138150A (ja) * 2007-12-10 2009-06-25 Konica Minolta Holdings Inc 光開始剤、光重合性組成物及び光硬化方法
JP2014009173A (ja) * 2012-06-28 2014-01-20 Toray Fine Chemicals Co Ltd スルフィド化合物およびその製造方法

Also Published As

Publication number Publication date
US20040067311A1 (en) 2004-04-08
AU2002218297A1 (en) 2002-05-27
KR20030055313A (ko) 2003-07-02
KR100853363B1 (ko) 2008-08-22
CA2424477A1 (en) 2002-05-23
ATE429468T1 (de) 2009-05-15
EP1392779A1 (en) 2004-03-03
CN1474862A (zh) 2004-02-11
EP1392779B1 (en) 2009-04-22
WO2002040602A1 (en) 2002-05-23
CN1235984C (zh) 2006-01-11
BR0115471A (pt) 2003-08-19
MXPA03004456A (es) 2003-08-19
DE60138488D1 (de) 2009-06-04

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