JP2004522302A5 - - Google Patents
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- Publication number
- JP2004522302A5 JP2004522302A5 JP2002584378A JP2002584378A JP2004522302A5 JP 2004522302 A5 JP2004522302 A5 JP 2004522302A5 JP 2002584378 A JP2002584378 A JP 2002584378A JP 2002584378 A JP2002584378 A JP 2002584378A JP 2004522302 A5 JP2004522302 A5 JP 2004522302A5
- Authority
- JP
- Japan
- Prior art keywords
- oxygen
- hydrogen
- process gas
- combustion chamber
- enriched
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 claims 49
- 238000002485 combustion reaction Methods 0.000 claims 34
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 claims 30
- 239000001301 oxygen Substances 0.000 claims 30
- 229910052760 oxygen Inorganic materials 0.000 claims 30
- 239000001257 hydrogen Substances 0.000 claims 26
- 229910052739 hydrogen Inorganic materials 0.000 claims 26
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 claims 25
- 239000007789 gas Substances 0.000 claims 25
- 239000000758 substrate Substances 0.000 claims 10
- 238000004519 manufacturing process Methods 0.000 claims 7
- 239000004065 semiconductor Substances 0.000 claims 5
- 238000010438 heat treatment Methods 0.000 claims 4
- 239000011261 inert gas Substances 0.000 claims 3
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Chemical compound O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 2
- 239000012530 fluid Substances 0.000 claims 1
- 150000002431 hydrogen Chemical class 0.000 claims 1
- 239000000203 mixture Substances 0.000 claims 1
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE10119741A DE10119741B4 (de) | 2001-04-23 | 2001-04-23 | Verfahren und Vorrichtung zum Behandeln von Halbleitersubstraten |
| PCT/EP2002/004345 WO2002086958A1 (de) | 2001-04-23 | 2002-04-19 | Verfahren und vorrichtung zum erzeugen von prozessgasen |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2004522302A JP2004522302A (ja) | 2004-07-22 |
| JP2004522302A5 true JP2004522302A5 (https=) | 2006-01-05 |
| JP4276845B2 JP4276845B2 (ja) | 2009-06-10 |
Family
ID=7682338
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002584378A Expired - Fee Related JP4276845B2 (ja) | 2001-04-23 | 2002-04-19 | 基板を処理するための方法及び装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US7144826B2 (https=) |
| EP (1) | EP1382063A1 (https=) |
| JP (1) | JP4276845B2 (https=) |
| KR (1) | KR100700240B1 (https=) |
| DE (1) | DE10119741B4 (https=) |
| TW (1) | TW588419B (https=) |
| WO (1) | WO2002086958A1 (https=) |
Families Citing this family (15)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4609098B2 (ja) * | 2004-03-24 | 2011-01-12 | 東京エレクトロン株式会社 | 被処理体の酸化方法、酸化装置及び記憶媒体 |
| KR100966086B1 (ko) * | 2005-03-08 | 2010-06-28 | 가부시키가이샤 히다치 고쿠사이 덴키 | 반도체장치의 제조 방법 및 기판처리장치 |
| JP4453021B2 (ja) * | 2005-04-01 | 2010-04-21 | セイコーエプソン株式会社 | 半導体装置の製造方法及び半導体製造装置 |
| GB0613044D0 (en) * | 2006-06-30 | 2006-08-09 | Boc Group Plc | Gas combustion apparatus |
| US20080257719A1 (en) * | 2007-04-21 | 2008-10-23 | Ted Suratt | Apparatus And Method For Making Flammable Gas |
| US9698439B2 (en) | 2008-02-19 | 2017-07-04 | Proton Power, Inc. | Cellulosic biomass processing for hydrogen extraction |
| US8303676B1 (en) | 2008-02-19 | 2012-11-06 | Proton Power, Inc. | Conversion of C-O-H compounds into hydrogen for power or heat generation |
| US9023243B2 (en) | 2012-08-27 | 2015-05-05 | Proton Power, Inc. | Methods, systems, and devices for synthesis gas recapture |
| US10005961B2 (en) | 2012-08-28 | 2018-06-26 | Proton Power, Inc. | Methods, systems, and devices for continuous liquid fuel production from biomass |
| CA2884860C (en) | 2012-09-18 | 2021-04-20 | Proton Power, Inc. | C-o-h compound processing for hydrogen or liquid fuel production |
| US10563128B2 (en) | 2014-01-10 | 2020-02-18 | Proton Power, Inc. | Methods for aerosol capture |
| US20150307784A1 (en) | 2014-03-05 | 2015-10-29 | Proton Power, Inc. | Continuous liquid fuel production methods, systems, and devices |
| US9890332B2 (en) | 2015-03-08 | 2018-02-13 | Proton Power, Inc. | Biochar products and production |
| CN107154354B (zh) | 2016-03-03 | 2020-12-11 | 上海新昇半导体科技有限公司 | 晶圆热处理的方法 |
| CN112413589B (zh) * | 2020-11-04 | 2023-04-14 | 北京北方华创微电子装备有限公司 | 半导体工艺设备的点火装置及半导体工艺设备 |
Family Cites Families (21)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3630956A (en) * | 1969-04-01 | 1971-12-28 | Air Prod & Chem | Method of producing gases with controlled concentrations of water vapor |
| US3907981A (en) * | 1973-03-12 | 1975-09-23 | Rockwell International Corp | Method for recombining hydrogen and oxygen |
| JPS57194522A (en) | 1981-05-27 | 1982-11-30 | Oki Electric Ind Co Ltd | Thermal treatment of semiconductor wafer |
| DE3143050A1 (de) * | 1981-10-30 | 1983-05-05 | Varta Batterie Ag, 3000 Hannover | Verfahren zur druckgesteuerten h(pfeil abwaerts)2(pfeil abwaerts)/o(pfeil abwaerts)2(pfeil abwaerts)-rekombination |
| DE3729113A1 (de) * | 1987-09-01 | 1989-03-09 | Fraunhofer Ges Forschung | Verfahren zur druckgesteuerten katalytischen verbrennung von brennbaren gasen in einem oxidationsreaktor |
| DE3809367A1 (de) * | 1988-03-19 | 1989-09-28 | Kernforschungsz Karlsruhe | Verfahren und vorrichtung zur verbrennung von wasserstoff mit sauerstoff |
| FR2643364B1 (fr) * | 1989-02-22 | 1993-08-13 | Air Liquide | Procede d'elaboration de composants multicouches ceramique-metal et appareil pour sa mise en oeuvre |
| JPH088255B2 (ja) * | 1990-02-20 | 1996-01-29 | 株式会社東芝 | 半導体基板表面処理方法および半導体基板表面処理装置 |
| US5316796A (en) * | 1990-03-09 | 1994-05-31 | Nippon Telegraph And Telephone Corporation | Process for growing a thin metallic film |
| US5527926A (en) * | 1990-11-26 | 1996-06-18 | Bracco International B.V. | Methods and compositions for using non-ionic contrast agents to reduce the risk of clot formation in diagnostic procedures |
| US5257926A (en) * | 1991-12-17 | 1993-11-02 | Gideon Drimer | Fast, safe, pyrogenic external torch assembly |
| JP3310386B2 (ja) * | 1993-05-25 | 2002-08-05 | 忠弘 大見 | 絶縁酸化膜の形成方法及び半導体装置 |
| JPH0710935U (ja) * | 1993-07-24 | 1995-02-14 | ヤマハ株式会社 | 縦型熱処理炉 |
| JPH0920501A (ja) * | 1995-07-06 | 1997-01-21 | Nippon Seisan Gijutsu Kenkyusho:Kk | 超高純度水の製造方法およびその装置 |
| JP3155487B2 (ja) * | 1997-02-12 | 2001-04-09 | 株式会社日立国際電気 | ウェット酸化装置およびウェット酸化方法 |
| JP3808975B2 (ja) * | 1997-06-17 | 2006-08-16 | 忠弘 大見 | 半導体製造用水分の発生方法 |
| JP3644810B2 (ja) * | 1997-12-10 | 2005-05-11 | 株式会社フジキン | 少流量の水分供給方法 |
| JPH11204511A (ja) * | 1998-01-08 | 1999-07-30 | Kokusai Electric Co Ltd | シリコン熱酸化膜の形成装置 |
| US6114258A (en) * | 1998-10-19 | 2000-09-05 | Applied Materials, Inc. | Method of oxidizing a substrate in the presence of nitride and oxynitride films |
| US6372663B1 (en) * | 2000-01-13 | 2002-04-16 | Taiwan Semiconductor Manufacturing Company, Ltd | Dual-stage wet oxidation process utilizing varying H2/O2 ratios |
| TW200416772A (en) * | 2002-06-06 | 2004-09-01 | Asml Us Inc | System and method for hydrogen-rich selective oxidation |
-
2001
- 2001-04-23 DE DE10119741A patent/DE10119741B4/de not_active Expired - Fee Related
-
2002
- 2002-04-04 TW TW091106866A patent/TW588419B/zh not_active IP Right Cessation
- 2002-04-19 US US10/476,136 patent/US7144826B2/en not_active Expired - Lifetime
- 2002-04-19 JP JP2002584378A patent/JP4276845B2/ja not_active Expired - Fee Related
- 2002-04-19 WO PCT/EP2002/004345 patent/WO2002086958A1/de not_active Ceased
- 2002-04-19 EP EP02764065A patent/EP1382063A1/de not_active Withdrawn
- 2002-04-19 KR KR1020037013762A patent/KR100700240B1/ko not_active Expired - Fee Related
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