JP2004079605A - Multilayer wiring substrate with built-in component, and its manufacturing method - Google Patents

Multilayer wiring substrate with built-in component, and its manufacturing method Download PDF

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Publication number
JP2004079605A
JP2004079605A JP2002234485A JP2002234485A JP2004079605A JP 2004079605 A JP2004079605 A JP 2004079605A JP 2002234485 A JP2002234485 A JP 2002234485A JP 2002234485 A JP2002234485 A JP 2002234485A JP 2004079605 A JP2004079605 A JP 2004079605A
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JP
Japan
Prior art keywords
component
conductive paste
paste film
built
insulating layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002234485A
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Japanese (ja)
Inventor
Daisuke Mizutani
水谷 大輔
Yasuhiro Yoneda
米田 泰博
Katsusada Motoyoshi
本吉 勝貞
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujitsu Ltd
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Fujitsu Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fujitsu Ltd filed Critical Fujitsu Ltd
Priority to JP2002234485A priority Critical patent/JP2004079605A/en
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Abstract

<P>PROBLEM TO BE SOLVED: To receive no damage on components even when a through hole exposing a part of the component is formed by laser drilling in an insulating film covering the component when a multilayer wiring substrate with the built-in component is manufactured in the multi-layer wiring substrate with the built-in component and its manufacturing method. <P>SOLUTION: The multilayer wiring substrate with the built-in component is provided with an insulating layer 5 covering on the substrate 1 including passive components 3 such as a resistor, a coil and a capacitor mounted on the substrate 1 and forming a conductive paste film 4A at a via hole opposite position on the upper face, and the passive component 3 forming the conductive paste film 4A; and one or more leader via holes 5A formed on the insulating layer 5 existing just above the conductive paste film 4A. <P>COPYRIGHT: (C)2004,JPO

Description

【0001】
【発明の属する技術分野】
本発明は、抵抗、コイル、コンデンサなどの受動部品を高密度で内蔵することを可能にした部品内蔵多層配線回路基板及びその製造方法に関する。
【0002】
【従来の技術】
一般に、多層配線回路基板に抵抗、コイル、コンデンサなどの受動部品を内蔵する場合、それ等の受動部品と他の部分との接続は、基板の同一面に形成された回路上に於いてのみ実施される。
【0003】
回路基板の高密度化を図る為には、部品からの配線引き出しを成るべく短くすることが必要であり、その為には、部品と他の部分との接続を基板の厚さ方向で実施することが必要である。
【0004】
現在、部品を覆う絶縁膜に配線引き出し用のビア・ホールを形成するにはレーザ・ドリリングに依ることが普通であるが、その場合、部品の上面にレーザに依るダメージを与えてしまうことが多く、部品内蔵多層配線回路基板の製造歩留りを低下させる大きな要因になっている。
【0005】
【発明が解決しようとする課題】
本発明では、部品内蔵多層配線回路基板を作製する際、部品を覆う絶縁膜にレーザ・ドリリングに依って部品の一部を表出させる通孔を形成しても、部品がダメージを受けないようにしようとする。
【0006】
【課題を解決するための手段】
本発明に依る部品内蔵多層配線回路基板及びその製造方法では、基板(例えば回路基板1)上に実装され上面に於けるビア・ホール対向位置に導電性ペースト膜(例えば導電性ペースト膜4A)が形成された抵抗、コイル、コンデンサなどの受動部品(例えば受動部品3)と、該導電性ペースト膜が形成された受動部品も含めて該基板上を覆う絶縁層(例えば絶縁層5)と、該導電性ペースト膜の直上に在る該絶縁層に形成された一つ以上の配線引き出し用のビア・ホール(例えばビア・ホール5A)とを形成することが基本になっている。
【0007】
前記手段を採ることに依り、抵抗、コイル、コンデンサなどの受動部品を内蔵した多層配線回路基板の部品から配線を引き出す場合、最短距離にする為、部品の直上に在る絶縁膜にレーザ・ドリリングに依ってビア・ホールを穿孔しても、部品の表面が損傷されることは皆無であって、通常、レーザに依ってダメージを受けてしまう厚さ1〔μm〕以下の金属薄膜からなる電極が部品の表面に形成されていても、その電極とビア導体を接続することは容易になり、従って、部品内蔵多層配線回路基板の高密度化及び製造歩留りは飛躍的に向上し、内蔵部品の製造コストは低減される。
【0008】
【発明の実施の形態】
図1は本発明の原理的な実施の形態を説明する為の部品内蔵多層配線回路基板を表す要部切断側面図であり、図に於いて、1は回路基板、2は配線、3は内蔵された受動部品、4は導電性ペースト、4Aは導電性ペースト膜、5は絶縁層、5Aはビア・ホールをそれぞれ示している。
【0009】
図示された部品内蔵多層配線回路基板を作製する場合のプロセス概略を説明する。
(1)配線2をもつ回路基板1に受動部品3を実装し、受動部品3の上面に導電性ペースト4を厚さ10〔μm〕〜20〔μm〕程度に塗布して導電性
ペースト膜4Aを形成する。
【0010】
(2)全面に絶縁層5を形成してから、CO2 レーザを用いたドリリングを行
ってビア・ホール5Aを形成する。
【0011】
この場合、ビア・ホール5Aの底には導電性ペースト膜4Aが表出されてレーザ・ビームの照射を受けるが、受動部品3の表面が直接照射される
ことはないので、致命的ダメージを受けることはない。
【0012】
前記のようなプロセスを採ることで、部品内蔵多層配線回路基板に搭載された部品の直上にビア・ホールを形成し、最短距離で配線を引き出すことが可能となり、その為に部品がダメージを受けることはなく、また、導電性ペースト膜4Aはレーザ照射を受けても、その機能が劣化するおそれは皆無である。
【0013】
図2乃至図5は本発明の具体的な実施例を説明する為の工程要所に於ける部品内蔵多層配線回路基板の要部切断側面図であり、以下、これ等の図を参照しつつ説明する。
【0014】
図2(A)参照
(1)部品の実装対象である回路基板11と部品12とを準備する。部品12は抵抗値50〔Ω〕の薄膜抵抗体であって、厚さ5〔μm〕のポリイミド・フィルム支持体12Aに厚さ2〔μm〕のNi合金抵抗体12Bが形成され、その表面に厚さ0.5〔μm〕で1〔mm〕□のCu電極12Cが形成された構造に
なっている。
【0015】
一般に、薄膜抵抗体の抵抗値製造は電極間の距離に依存する為、電極の厚さをできる限り薄くすることに依ってパターニング精度を高く維持することが必
要である。
【0016】
図2(B)参照
(2)部品12を例えばエポキシ樹脂剤である熱硬化型接着剤13を用いて回路基
板12に固着する。
【0017】
図3(A)参照
(3)スクリーン印刷法を適用することに依り、電極12Cの表面に厚さ30〔μm〕、直径400〔μm〕の導電ペースト膜14を形成する。
【0018】
この場合の導電ペーストとしては、熱硬化エポキシ樹脂中にCu粉末を75
〔重量%〕分散させたものを用いている。
(4)前記したように導電ペースト膜14を印刷形成した後、温度100〔℃〕、時間10〔分〕の仮熱硬化を行い、導電ペースト膜14が後の工程で流動しな
いように固定する。
【0019】
図3(B)参照
(5)真空熱プレス法を適用することに依り、全面に絶縁層15及びCu箔16を
形成する。
【0020】
真空熱プレスする際、温度170〔℃〕以上の温度を30〔分〕以上に亙って維持することで、絶縁層15及び導電ペースト膜14の熱硬化を同時に行っ
た。
【0021】
この場合の絶縁層15の構成材料は、未硬化の熱硬化型エポキシ樹脂をガラス布に含浸したものであって、厚さは100〔μm〕であり、そして、Cu箔
16は厚さが18〔μm〕のものを用いた。
【0022】
図4(A)参照
(6)リソグラフィ技術に於けるレジスト・プロセス、及び、ウエット・エッチング法を適用することに依り、Cu箔16のエッチングを行って直径300〔μ
m〕の開口16Aを形成する。
【0023】
図4(B)参照
(7)Cu箔16に形成した開口16Aを介し、炭酸ガス・レーザ・ドリリングに依って、絶縁層15に表面側に於ける直径が100〔μm〕且つ底部の直径が
70〔μm〕であるビア・ホール15Aを形成する。
【0024】
この場合、導電ペースト膜14が存在しないとすると、ビア・ホール15Aの底面に表出されたCu電極12Cが炭酸ガス・レーザのエネルギで損傷されるのであるが、ここでは、ビア・ホール15Aの底部に硬化した導電ペースト
膜14の存在するのみである。
【0025】
図5参照
(8)ビア・ホール15Aの形成後、無電界めっき、電界めっき、エッチングの標準的工程を採って、導電ペースト膜14を介してCu電極12Cに導電接続す
る配線パターン17を形成する。
【0026】
(9)配線パターン17の形成後、それを利用して部品12の抵抗値を測定したと
ころ、実装前と同じく50〔Ω〕であることが確認された。
【0027】
本発明に於いては、前記説明した実施の形態を含め、多くの形態で実施することができ、以下、それを付記として例示する。
【0028】
(付記1)
基板上に実装され上面に於けるビア・ホール対向位置に導電性ペースト膜が形成された抵抗、コイル、コンデンサなどの受動部品と、
該導電性ペースト膜が形成された受動部品も含めて該基板上を覆う絶縁層と、該導電性ペースト膜の直上に在る該絶縁層に形成された一つ以上の配線引き出し用のビア・ホールと
を備えてなることを特徴とする部品内蔵多層配線回路基板。
【0029】
(付記2)
受動部品に於ける導電性ペースト膜の直上に形成されたビア・ホールから該導電性ペースト膜を介して該受動部品の配線が引き出されてなること
を特徴とする(付記1)記載の部品内蔵多層配線回路基板。
【0030】
(付記3)
受動部品が絶縁フィルムの両面に厚さが1〔μm〕以下である金属電極が形成されたコンデンサであること
を特徴とする(付記1)記載の部品内蔵多層配線回路基板。
【0031】
(付記4)
基板上に抵抗、コイル、コンデンサなどの受動部品を実装する工程と、
該受動部品の上面に於けるビア・ホール対向予定領域に導電性ペーストを塗布して導電性ペースト膜を形成する工程と、
該導電性ペースト膜が形成された受動部品を含む全面を覆う絶縁層を形成する工程と、
該受動部品に於ける該導電性ペースト膜直上の絶縁層をレーザ・ドリル加工してビア・ホールを形成する工程と
が含まれてなることを特徴とする部品内蔵多層配線回路基板の製造方法。
【0032】
(付記5)
レーザ・ドリル加工でビア・ホールを形成する際にレーザ・ドリルのエネルギで導電性ペースト膜を硬化させること
を特徴とする(付記4)記載の部品内蔵多層配線回路基板の製造方法。
【0033】
【発明の効果】
本発明に依る部品内蔵多層配線回路基板及びその製造方法に於いては、基板上に実装された抵抗、コイル、コンデンサなどの受動部品の上面に於けるビア・ホール対向位置には導電性ペースト膜が形成され、導電性ペースト膜が形成された受動部品も含めて基板上は絶縁層で覆われ、導電性ペースト膜の直上に在る絶縁層には一つ以上の配線引き出し用のビア・ホールが形成される。
【0034】
前記構成を採ることに依り、抵抗、コイル、コンデンサなどの受動部品を内蔵した多層配線回路基板の部品から配線を引き出す場合、最短距離にする為、部品の直上に在る絶縁膜にレーザ・ドリリングに依ってビア・ホールを穿孔しても、部品の表面が損傷されることは皆無であって、通常、レーザに依ってダメージを受けてしまう厚さ1〔μm〕以下の金属薄膜からなる電極が部品の表面に形成されていても、その電極とビア導体を接続することは容易になり、従って、部品内蔵多層配線回路基板の高密度化及び製造歩留りは飛躍的に向上し、内蔵部品の製造コストは低減される。
【図面の簡単な説明】
【図1】本発明の実施の形態1を説明する為の部品内蔵多層配線回路基板を表す要部切断側面図である。
【図2】本発明の具体的な実施例を説明する為の工程要所に於ける部品内蔵多層配線回路基板の要部切断側面図である。
【図3】本発明の具体的な実施例を説明する為の工程要所に於ける部品内蔵多層配線回路基板の要部切断側面図である。
【図4】本発明の具体的な実施例を説明する為の工程要所に於ける部品内蔵多層配線回路基板の要部切断側面図である。
【図5】本発明の具体的な実施例を説明する為の工程要所に於ける部品内蔵多層配線回路基板の要部切断側面図である。
【符号の説明】
1 回路基板
2 配線
3 内蔵された部品
4 導電性ペースト
4A 導電性ペースト膜
5 絶縁層
5A ビア・ホール
[0001]
TECHNICAL FIELD OF THE INVENTION
The present invention relates to a component-embedded multilayer wiring circuit board capable of incorporating passive components such as resistors, coils, and capacitors at a high density, and a method of manufacturing the same.
[0002]
[Prior art]
In general, when passive components such as resistors, coils, and capacitors are built in a multilayer wiring circuit board, the connection between those passive components and other parts is performed only on the circuit formed on the same surface of the board. Is done.
[0003]
In order to increase the density of a circuit board, it is necessary to shorten the length of wiring lead-out from the component as much as possible. For that purpose, the connection between the component and other parts is performed in the thickness direction of the substrate. It is necessary.
[0004]
At present, it is common to use laser drilling to form via holes for drawing wiring in the insulating film covering the component, but in this case, the upper surface of the component is often damaged by the laser. This is a major factor in lowering the production yield of the component built-in multilayer wiring circuit board.
[0005]
[Problems to be solved by the invention]
In the present invention, when manufacturing a multilayer wiring circuit board with a built-in component, even if a through hole for exposing a part of the component by laser drilling is formed in an insulating film covering the component, the component is not damaged. To try.
[0006]
[Means for Solving the Problems]
In the component-embedded multilayer wiring circuit board and the method of manufacturing the same according to the present invention, a conductive paste film (for example, conductive paste film 4A) is mounted on a substrate (for example, circuit board 1) at a position facing a via hole on the upper surface. A passive component (for example, passive component 3) such as a formed resistor, a coil, and a capacitor; an insulating layer (for example, insulating layer 5) covering the substrate including the passive component on which the conductive paste film is formed; Basically, one or more via holes (for example, via holes 5A) are formed in the insulating layer immediately above the conductive paste film for drawing out wiring.
[0007]
By taking the above means, when pulling out wiring from the components of the multilayer wiring circuit board incorporating passive components such as resistors, coils, capacitors, etc., in order to minimize the distance, laser drilling on the insulating film just above the components The surface of the component is not damaged even if a via hole is formed by the method described above, and an electrode made of a metal thin film having a thickness of 1 [μm] or less, which is usually damaged by a laser. Even if the component is formed on the surface of the component, it is easy to connect the electrode and the via conductor, and therefore the density and manufacturing yield of the multilayer wiring circuit board with a built-in component are dramatically improved, and the Manufacturing costs are reduced.
[0008]
BEST MODE FOR CARRYING OUT THE INVENTION
FIG. 1 is a cutaway side view showing an essential part of a multilayer wiring circuit board with a built-in component for explaining a principle embodiment of the present invention. In the drawing, 1 is a circuit board, 2 is a wiring, and 3 is a built-in. 4 denotes a conductive paste, 4A denotes a conductive paste film, 5 denotes an insulating layer, and 5A denotes via holes.
[0009]
An outline of a process for manufacturing the illustrated multilayer wiring circuit board with a built-in component will be described.
(1) The passive component 3 is mounted on the circuit board 1 having the wiring 2, and the conductive paste 4 is applied on the upper surface of the passive component 3 to a thickness of about 10 μm to 20 μm to form the conductive paste film 4 </ b> A. To form
[0010]
(2) After forming the insulating layer 5 on the entire surface, drilling is performed using a CO 2 laser to form a via hole 5A.
[0011]
In this case, the conductive paste film 4A is exposed at the bottom of the via hole 5A and is irradiated with the laser beam. However, since the surface of the passive component 3 is not directly irradiated, it is fatally damaged. Never.
[0012]
By employing the above-described process, a via hole can be formed immediately above the component mounted on the component-embedded multilayer wiring circuit board, and the wiring can be drawn out at the shortest distance, thereby causing damage to the component. In addition, even if the conductive paste film 4A receives laser irradiation, there is no possibility that its function is deteriorated.
[0013]
FIG. 2 to FIG. 5 are cutaway side views of a main part of a multilayer wiring circuit board with a built-in component at a key step for explaining a specific embodiment of the present invention. explain.
[0014]
2A. (1) Prepare a circuit board 11 and a component 12 on which components are to be mounted. The component 12 is a thin film resistor having a resistance value of 50 [Ω]. A Ni alloy resistor 12B having a thickness of 2 [μm] is formed on a polyimide film support 12A having a thickness of 5 [μm]. It has a structure in which a Cu electrode 12C of 0.5 [μm] and 1 [mm] □ is formed.
[0015]
In general, the production of the resistance value of a thin film resistor depends on the distance between the electrodes. Therefore, it is necessary to maintain a high patterning accuracy by reducing the thickness of the electrodes as much as possible.
[0016]
2B, the component 12 is fixed to the circuit board 12 using, for example, a thermosetting adhesive 13 which is an epoxy resin.
[0017]
3 (A) (3) A conductive paste film 14 having a thickness of 30 [μm] and a diameter of 400 [μm] is formed on the surface of the electrode 12C by applying the screen printing method.
[0018]
As the conductive paste in this case, a Cu powder in a thermosetting epoxy resin is used.
[% By weight] A dispersed one is used.
(4) After the conductive paste film 14 is formed by printing as described above, temporary heat curing is performed at a temperature of 100 ° C. for a time of 10 minutes to fix the conductive paste film 14 so as not to flow in a later step. .
[0019]
3 (B) (5) The insulating layer 15 and the Cu foil 16 are formed on the entire surface by applying the vacuum hot pressing method.
[0020]
During the vacuum hot pressing, the insulating layer 15 and the conductive paste film 14 were simultaneously cured by maintaining the temperature of 170 ° C. or more for 30 minutes or more.
[0021]
In this case, the constituent material of the insulating layer 15 is a material obtained by impregnating an uncured thermosetting epoxy resin into a glass cloth, the thickness is 100 [μm], and the Cu foil 16 has a thickness of 18 μm. [Μm] was used.
[0022]
Referring to FIG. 4A, (6) the Cu foil 16 is etched to a diameter of 300 [μ] by applying a resist process in the lithography technique and a wet etching method.
m] is formed.
[0023]
4 (B) (7) Through the opening 16A formed in the Cu foil 16, the diameter of the insulating layer 15 on the surface side is 100 [μm] and the diameter of the bottom is formed by carbon dioxide laser drilling. A via hole 15A of 70 [μm] is formed.
[0024]
In this case, if the conductive paste film 14 does not exist, the Cu electrode 12C exposed on the bottom surface of the via hole 15A is damaged by the energy of the carbon dioxide gas laser. Only the cured conductive paste film 14 is present at the bottom.
[0025]
Referring to FIG. 5 (8), after forming the via hole 15A, a wiring pattern 17 that is conductively connected to the Cu electrode 12C via the conductive paste film 14 is formed by using standard steps of electroless plating, electrolytic plating, and etching. .
[0026]
(9) After the wiring pattern 17 was formed, the resistance value of the component 12 was measured using the wiring pattern 17, and it was confirmed that the resistance value was 50 [Ω] as before mounting.
[0027]
The present invention can be embodied in many forms including the above-described embodiment, and will be exemplified below as additional notes.
[0028]
(Appendix 1)
Passive components such as resistors, coils, capacitors, etc., with a conductive paste film formed on the upper surface facing the via hole on the substrate,
An insulating layer covering the substrate including the passive component on which the conductive paste film is formed, and one or more wiring vias formed on the insulating layer immediately above the conductive paste film; A multilayer wiring circuit board with a built-in component, comprising: a hole;
[0029]
(Appendix 2)
The built-in component according to (Supplementary Note 1), wherein the wiring of the passive component is drawn out from the via hole formed immediately above the conductive paste film in the passive component via the conductive paste film. Multilayer wiring circuit board.
[0030]
(Appendix 3)
2. The multilayer wiring circuit board with a built-in component according to claim 1, wherein the passive component is a capacitor having a metal electrode having a thickness of 1 [μm] or less formed on both surfaces of an insulating film.
[0031]
(Appendix 4)
Mounting passive components such as resistors, coils, and capacitors on the board;
Forming a conductive paste film by applying a conductive paste to a via-hole facing region on the upper surface of the passive component;
Forming an insulating layer covering the entire surface including the passive component on which the conductive paste film is formed;
Forming a via hole by laser drilling an insulating layer immediately above the conductive paste film in the passive component.
[0032]
(Appendix 5)
The method for manufacturing a multilayer wiring circuit board with a built-in component according to (Appendix 4), wherein the conductive paste film is cured by the energy of the laser drill when the via hole is formed by laser drilling.
[0033]
【The invention's effect】
In the component-embedded multilayer wiring circuit board and the method of manufacturing the same according to the present invention, a conductive paste film is provided at a position facing a via hole on the upper surface of a passive component such as a resistor, a coil or a capacitor mounted on the board. Is formed on the substrate, including the passive component on which the conductive paste film is formed, and the insulating layer immediately above the conductive paste film is covered with an insulating layer. Is formed.
[0034]
By taking the above configuration, when drawing out wiring from the components of a multilayer wiring circuit board incorporating passive components such as resistors, coils, capacitors, etc., in order to minimize the distance, laser drilling is performed on the insulating film located directly above the components. The surface of the component is not damaged even if a via hole is formed by the method described above, and an electrode made of a metal thin film having a thickness of 1 [μm] or less, which is usually damaged by a laser. Even if the component is formed on the surface of the component, it is easy to connect the electrode and the via conductor, and therefore the density and manufacturing yield of the multilayer wiring circuit board with a built-in component are dramatically improved, and the Manufacturing costs are reduced.
[Brief description of the drawings]
FIG. 1 is a cutaway side view showing a main part of a multilayer wiring circuit board with a built-in component for explaining Embodiment 1 of the present invention.
FIG. 2 is a cutaway side view of a main part of the multilayer wiring circuit board with a built-in component at a key point in a process for explaining a specific embodiment of the present invention.
FIG. 3 is a cutaway side view of a main part of a multilayer wiring circuit board with a built-in component at a key step for explaining a specific embodiment of the present invention.
FIG. 4 is a cutaway side view of an essential part of a multilayer wiring circuit board with a built-in component in a process essential point for explaining a specific embodiment of the present invention.
FIG. 5 is a cutaway side view of a main part of the multilayer wiring circuit board with a built-in component at a key step in the process for explaining a specific embodiment of the present invention.
[Explanation of symbols]
DESCRIPTION OF SYMBOLS 1 Circuit board 2 Wiring 3 Built-in component 4 Conductive paste 4A Conductive paste film 5 Insulating layer 5A Via hole

Claims (3)

基板上に実装され上面に於けるビア・ホール対向位置に導電性ペースト膜が形成された抵抗、コイル、コンデンサなどの受動部品と、
該導電性ペースト膜が形成された受動部品も含めて該基板上を覆う絶縁層と、該導電性ペースト膜の直上に在る該絶縁層に形成された一つ以上の配線引き出し用のビア・ホールと
を備えてなることを特徴とする部品内蔵多層配線回路基板。
Passive components such as resistors, coils, capacitors, etc., with a conductive paste film formed on the upper surface facing the via hole on the substrate,
An insulating layer covering the substrate including the passive component on which the conductive paste film is formed, and one or more wiring vias formed on the insulating layer immediately above the conductive paste film; A multilayer wiring circuit board with a built-in component, comprising: a hole;
受動部品に於ける導電性ペースト膜の直上に形成されたビア・ホールから該導電性ペースト膜を介して該受動部品の配線が引き出されてなること
を特徴とする請求項1記載の部品内蔵多層配線回路基板。
2. The component built-in multilayer according to claim 1, wherein a wiring of said passive component is drawn out from a via hole formed immediately above said conductive paste film in said passive component via said conductive paste film. Printed circuit board.
基板上に抵抗、コイル、コンデンサなどの受動部品を実装する工程と、
該受動部品の上面に於けるビア・ホール対向予定領域に導電性ペーストを塗布して導電性ペースト膜を形成する工程と、
該導電性ペースト膜が形成された受動部品を含む全面を覆う絶縁層を形成する工程と、
該受動部品に於ける該導電性ペースト膜直上の絶縁層をレーザ・ドリル加工してビア・ホールを形成する工程と
が含まれてなることを特徴とする部品内蔵多層配線回路基板の製造方法。
Mounting passive components such as resistors, coils, and capacitors on the board;
Forming a conductive paste film by applying a conductive paste to a via-hole facing region on the upper surface of the passive component;
Forming an insulating layer covering the entire surface including the passive component on which the conductive paste film is formed;
Forming a via hole by laser drilling an insulating layer immediately above the conductive paste film in the passive component.
JP2002234485A 2002-08-12 2002-08-12 Multilayer wiring substrate with built-in component, and its manufacturing method Pending JP2004079605A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002234485A JP2004079605A (en) 2002-08-12 2002-08-12 Multilayer wiring substrate with built-in component, and its manufacturing method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002234485A JP2004079605A (en) 2002-08-12 2002-08-12 Multilayer wiring substrate with built-in component, and its manufacturing method

Publications (1)

Publication Number Publication Date
JP2004079605A true JP2004079605A (en) 2004-03-11

Family

ID=32019285

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002234485A Pending JP2004079605A (en) 2002-08-12 2002-08-12 Multilayer wiring substrate with built-in component, and its manufacturing method

Country Status (1)

Country Link
JP (1) JP2004079605A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007019268A (en) * 2005-07-07 2007-01-25 Toshiba Corp Wiring board and manufacturing method thereof, and electronic equipment incorporating wiring board
KR100867954B1 (en) 2007-10-31 2008-11-11 삼성전기주식회사 Printed circuit board having embedded electronic components and method for manufacturing the same

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2007019268A (en) * 2005-07-07 2007-01-25 Toshiba Corp Wiring board and manufacturing method thereof, and electronic equipment incorporating wiring board
KR100867954B1 (en) 2007-10-31 2008-11-11 삼성전기주식회사 Printed circuit board having embedded electronic components and method for manufacturing the same

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