JP2009010266A - Printed circuit board and method of manufacturing same - Google Patents

Printed circuit board and method of manufacturing same Download PDF

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JP2009010266A
JP2009010266A JP2007171967A JP2007171967A JP2009010266A JP 2009010266 A JP2009010266 A JP 2009010266A JP 2007171967 A JP2007171967 A JP 2007171967A JP 2007171967 A JP2007171967 A JP 2007171967A JP 2009010266 A JP2009010266 A JP 2009010266A
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wiring board
printed wiring
hole
layer
electroless plating
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Daisuke Shibata
大輔 柴田
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Meiko Co Ltd
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Meiko Co Ltd
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  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Printing Elements For Providing Electric Connections Between Printed Circuits (AREA)

Abstract

<P>PROBLEM TO BE SOLVED: To provide a printed circuit board in particular having through holes or IVHs (Interstitial Via Holes) and a method of manufacturing the printed circuit board, which can form a fine wiring pattern. <P>SOLUTION: A through hole 10 passing through a substrate 1 is formed in the substrate 1 having first and second conductive layers 7 and 8 formed on its both surfaces, an electrolessly-plated film 11 for electrically connecting the first and second conductive layers is formed so as to cover the inner surface of the through hole and the surfaces of the first and second conductive layers, the through hole having the electrolessly-plated film covered on its inner surface is buried with a conductive member 13, the conductive member projected from the surfaces of the substrate are removed together with the electrolessly-plated film formed on the respective surfaces. <P>COPYRIGHT: (C)2009,JPO&INPIT

Description

本発明は、プリント配線板の製造方法及びプリント配線板に係り、特に、スルーホールやIVH(Interstitial Via Hole)を有するプリント配線板の製造方法及びプリント配線板に関する。   The present invention relates to a printed wiring board manufacturing method and a printed wiring board, and more particularly to a printed wiring board manufacturing method and printed wiring board having through holes and IVH (Interstitial Via Hole).

複数の配線層がそれぞれ絶縁層を介して積層されたプリント配線板において、配線層間を電気的に接続する手段として、スルーホールやIVH(Interstitial Via Hole)がある。
また、スルーホールやIVHを蓋めっき層で覆う場合がある。
スルーホールを蓋めっき層で覆うことにより、スルーホール上に電子部品等を実装することが可能になり、プリント配線板の電子部品実装密度を向上されることが可能になる。
また、IVHを蓋めっき層で覆うことにより、IVHの直上にビア(スタックドビアと称す)を形成することが可能になり、プリント配線板の配線密度を向上させることができる。
特許文献1には、スルーホールを有するプリント配線板の一例が開示されている。
特開平10−135629号公報
In a printed wiring board in which a plurality of wiring layers are laminated via insulating layers, there are through holes and IVH (Interstitial Via Hole) as means for electrically connecting the wiring layers.
Further, the through hole or IVH may be covered with a lid plating layer.
By covering the through hole with the lid plating layer, it is possible to mount an electronic component or the like on the through hole, and the electronic component mounting density of the printed wiring board can be improved.
Further, by covering IVH with a lid plating layer, a via (referred to as a stacked via) can be formed immediately above IVH, and the wiring density of the printed wiring board can be improved.
Patent Document 1 discloses an example of a printed wiring board having a through hole.
Japanese Patent Laid-Open No. 10-135629

ところで、配線層は、一般的に、フォトリソグラフィ法により、導電層を部分的にエッチングして形成される。
しかしながら、特許文献1に開示されているようなプリント配線板では、この導電層が銅箔と銅めっき膜との積層構造を有し、また銅めっき膜は、一般的に、無電解銅めっきを行って薄膜の無電解銅めっき膜を形成した後、この無電解銅めっき膜をめっき導通膜として電気銅めっきを行って、無電解銅めっき膜上に厚膜の電気銅めっき膜をさらに形成することによって得られるので、この導電層の厚さが厚くなるため、微細な配線パターンを形成することが困難となりその改善が望まれる。
Incidentally, the wiring layer is generally formed by partially etching the conductive layer by photolithography.
However, in a printed wiring board as disclosed in Patent Document 1, this conductive layer has a laminated structure of a copper foil and a copper plating film, and the copper plating film is generally made of electroless copper plating. After forming a thin electroless copper plating film, electrolytic copper plating is performed using the electroless copper plating film as a plating conductive film to further form a thick electrolytic copper plating film on the electroless copper plating film Therefore, it is difficult to form a fine wiring pattern and the improvement is desired.

また、蓋めっき層を形成した場合は、上記導電層と蓋めっき層とのさらなる積層構造を有するため、微細な配線パターンの形成がより困難となりその改善が望まれる。   Moreover, when the lid plating layer is formed, since it has a further laminated structure of the conductive layer and the lid plating layer, it is more difficult to form a fine wiring pattern, and an improvement thereof is desired.

また、スルーホールやIVHの内面を銅めっき膜で覆わずに、スルーホールやIVHに、直接、導電性ペーストを充填する方法もあるが、導電性ペースト中に分散している導電性粒子と上記内面に露出した内層の配線層との接触面積のばらつきにより、この接触面積が小さい場合には、接触抵抗が大きくなったり、断線したりすることがある。   In addition, there is a method of directly filling the through hole or IVH with the conductive paste without covering the inner surface of the through hole or IVH with the copper plating film, but the conductive particles dispersed in the conductive paste and the above Due to variations in the contact area between the inner wiring layer exposed on the inner surface and the contact area is small, the contact resistance may increase or the wire may be disconnected.

そこで、本発明が解決しようとする課題は、特に、スルーホールやIVHを有するプリント配線板の製造方法及びプリント配線板において、微細な配線パターンを形成可能とするプリント配線板の製造方法及びプリント配線板を提供することにある。   Therefore, the problems to be solved by the present invention are, in particular, a printed wiring board manufacturing method and printed wiring board capable of forming a fine wiring pattern in a printed wiring board manufacturing method and printed wiring board having through holes and IVH. To provide a board.

上記の課題を解決するために、本願各発明は次の手段を有する。
1)両面側に第1の導電層(7)及び第2の導電層(8)が設けられた基板(1)に、該基板を貫通する貫通孔(10)を穿設する貫通孔穿設工程と、前記貫通孔穿設工程後に、前記貫通孔の内面、並びに、前記第1の導電層及び前記第2の導電層の各表面を覆って前記第1の導電層と前記第2の導電層とを電気的に接続する無電解めっき膜(11)を形成する無電解めっき工程と、前記無電解めっき工程後に、前記無電解めっき膜で内面が覆われた前記貫通孔を導電性部材(13)で埋める導電性部材充填工程と、前記導電性部材充填工程後に、前記基板の各表面よりも突出した前記導電性部材を、前記各表面上に形成された前記無電解めっき膜と共に除去する除去工程と、を有するプリント配線板(20,50,60,70)の製造方法である。
2)前記除去工程後に、前記導電性部材及び前記各表面を覆う第3の導電層(61,62,71,72)を形成する導電層形成工程を有する1)項記載のプリント配線板の製造方法である。
3)配線層(3,4,15,16)と絶縁層(2,5,6)とが交互に複数層積層された積層構造を有するプリント配線板において、前記複数の配線層が露出された内面を有する孔部(10)と、前記内面を覆って、前記複数の配線層を互いに電気的に接続する無電解めっき膜(11)と、前記無電解めっき膜で内面が覆われた前記孔部を埋める導電性部材(13)と、を有するプリント配線板(20,50,60,70)である。
4)前記導電性部材は、導電層(61,62)で覆われてなることを特徴とする3)項記載のプリント配線板である。
In order to solve the above problems, each invention of the present application has the following means.
1) Drilling a through hole for drilling a through hole (10) penetrating the substrate (1) having the first conductive layer (7) and the second conductive layer (8) on both sides. After the step and the through hole drilling step, the first conductive layer and the second conductive layer cover the inner surface of the through hole and the surfaces of the first conductive layer and the second conductive layer. An electroless plating step for forming an electroless plating film (11) for electrically connecting the layers; and after the electroless plating step, the through hole whose inner surface is covered with the electroless plating film is connected to a conductive member ( The conductive member filling step 13) and the conductive member protruding from each surface of the substrate are removed together with the electroless plating film formed on each surface after the conductive member filling step. A printed wiring board (20, 50, 60, 70) having a removal step A.
2) Production of a printed wiring board according to 1), comprising a conductive layer forming step of forming a third conductive layer (61, 62, 71, 72) covering the conductive member and the respective surfaces after the removing step. Is the method.
3) In a printed wiring board having a laminated structure in which a plurality of wiring layers (3, 4, 15, 16) and insulating layers (2, 5, 6) are alternately stacked, the plurality of wiring layers are exposed. A hole (10) having an inner surface, an electroless plating film (11) covering the inner surface and electrically connecting the plurality of wiring layers to each other, and the hole whose inner surface is covered with the electroless plating film A printed wiring board (20, 50, 60, 70) having a conductive member (13) filling the portion.
4) The printed wiring board according to item 3), wherein the conductive member is covered with a conductive layer (61, 62).

本発明によれば、特にスルーホールやIVHを有するプリント配線板の製造方法及びプリント配線板において、微細な配線パターンが形成可能になるという効果を奏する。   According to the present invention, there is an effect that a fine wiring pattern can be formed particularly in a printed wiring board manufacturing method and a printed wiring board having through holes and IVH.

本発明の実施の形態を、好ましい実施例である第1実施例及び第2実施例により図1〜図8を用いて説明する。   DESCRIPTION OF THE PREFERRED EMBODIMENTS Embodiments of the present invention will be described with reference to FIGS. 1 to 8 according to a first embodiment and a second embodiment which are preferred embodiments.

<第1実施例>
第1実施例は、本発明に係る、特にスルーホールを有するプリント配線板の製造方法及びプリント配線板の実施例であり、その製造過程をA1工程〜A4工程として図1〜図4を用いて説明する。
図1〜図4は、本発明に係る、特にスルーホールを有するプリント配線板の製造方法及びプリント配線板の第1実施例におけるA1工程〜A4工程をそれぞれ説明するための模式的断面図である。
<First embodiment>
1st Example is the Example of the manufacturing method of a printed wiring board which has a through-hole especially based on this invention, and a printed wiring board, The manufacturing process is made into A1 process-A4 process using FIGS. 1-4. explain.
1 to 4 are schematic cross-sectional views for explaining each of A1 process to A4 process in the first embodiment of the printed wiring board manufacturing method and the printed wiring board according to the present invention, in particular, according to the present invention. .

[A1工程](図1参照)
周知の方法により、シールド板1を作製する。
シールド板1は、コア材2と、このコア材2の両面に形成された第1の配線層3及び第2の配線層4と、この第1の配線層3及び第2の配線層4を覆うように形成された第1の絶縁層5及び第2の絶縁層6と、この第1の絶縁層5及び第2の絶縁層6を覆うように形成された銅箔7及び銅箔8と、により構成されている。
コア材2,第1の絶縁層5,及び第2の絶縁層6は、ガラスクロス等のシート状補強材にエポキシ樹脂等の絶縁樹脂を含浸させて硬化したものである。
[Step A1] (see FIG. 1)
The shield plate 1 is produced by a known method.
The shield plate 1 includes a core material 2, a first wiring layer 3 and a second wiring layer 4 formed on both surfaces of the core material 2, and the first wiring layer 3 and the second wiring layer 4. A first insulating layer 5 and a second insulating layer 6 formed so as to cover; a copper foil 7 and a copper foil 8 which are formed so as to cover the first insulating layer 5 and the second insulating layer 6; , Is configured.
The core material 2, the first insulating layer 5, and the second insulating layer 6 are obtained by impregnating an insulating resin such as an epoxy resin into a sheet-like reinforcing material such as a glass cloth.

第1実施例では、コア材2の厚さを100μm、第1の配線層3及び第2の配線層4の厚さをそれぞれ18μm、第1の絶縁層5及び第2の絶縁層6の厚さ(第1の配線層3及び第2の配線層4上の厚さ)をそれぞれ60μm、銅箔7及び銅箔8の厚さをそれぞれ18μmとした。
従って、シールド板1の厚さは292μmである。
In the first embodiment, the thickness of the core material 2 is 100 μm, the thickness of the first wiring layer 3 and the second wiring layer 4 is 18 μm, respectively, and the thickness of the first insulating layer 5 and the second insulating layer 6 The thicknesses (thickness on the first wiring layer 3 and the second wiring layer 4) were 60 μm, and the thicknesses of the copper foil 7 and the copper foil 8 were 18 μm, respectively.
Therefore, the thickness of the shield plate 1 is 292 μm.

[A2工程](図2参照)
まず、シールド板1の所定位置に、このシールド板1を貫通する貫通孔10を、例えばドリル加工により穿設する。
次に、シールド板1の表面及び貫通孔10の内面をそれぞれ覆うように、無電解めっき膜11を形成する。
この無電解めっき膜11により、内層の配線層である第2の配線層4と、銅箔7,銅箔8とは、互いに確実に電気的に接続される。
[Step A2] (see FIG. 2)
First, a through hole 10 penetrating the shield plate 1 is drilled at a predetermined position of the shield plate 1 by, for example, drilling.
Next, the electroless plating film 11 is formed so as to cover the surface of the shield plate 1 and the inner surface of the through hole 10.
By this electroless plating film 11, the second wiring layer 4, which is the inner wiring layer, and the copper foil 7 and the copper foil 8 are reliably electrically connected to each other.

第1実施例では、貫通孔10の孔径(直径)を250μmとし、無電解めっき膜11の材質を銅とし、その厚さを0.2〜0.5μmとした。   In the first example, the hole diameter (diameter) of the through hole 10 was 250 μm, the material of the electroless plating film 11 was copper, and the thickness was 0.2 to 0.5 μm.

[A3工程](図3参照)
まず、図3(a)に示すように、内面が無電解めっき膜11で覆われた貫通孔10に、例えばスクリーン印刷法を用いて、導電性ペースト13を充填し、さらに、この充填された導電性ペースト13を硬化させる。
次に、図3(b)に示すように、シールド板1の各表面よりも突出して硬化した余分な導電性ペースト13を、上記各表面上の無電解めっき膜11と共に、例えばバフ研磨により除去する。
この除去工程により、無電解めっき膜11が除去された後のシールド板1(銅箔6,7)の各表面と、導電性ペースト13の露出面とは、互いに連続する略平坦な面となる。
[Step A3] (See FIG. 3)
First, as shown in FIG. 3A, the through-hole 10 whose inner surface is covered with the electroless plating film 11 is filled with a conductive paste 13 using, for example, a screen printing method, and this filling is further performed. The conductive paste 13 is cured.
Next, as shown in FIG. 3B, the excess conductive paste 13 that protrudes and hardens from each surface of the shield plate 1 is removed together with the electroless plating film 11 on each surface by, for example, buffing. To do.
By this removal step, each surface of the shield plate 1 (copper foils 6 and 7) after the electroless plating film 11 is removed and the exposed surface of the conductive paste 13 are substantially flat surfaces that are continuous with each other. .

導電性ペースト13は、市販の銅ペーストや銀ペースト等を用いることができる。実施例では、導電性ペースト13として、熱硬化型の銅ペーストを用い、環境温度120℃〜150℃で1時間の熱処理を行って硬化させた。
また、導電性ペースト13を充填する他の充填方法としてロールコート法等を用いることができる。
As the conductive paste 13, a commercially available copper paste, silver paste, or the like can be used. In the example, a thermosetting copper paste was used as the conductive paste 13 and cured by performing a heat treatment at an environmental temperature of 120 ° C. to 150 ° C. for 1 hour.
In addition, a roll coating method or the like can be used as another filling method for filling the conductive paste 13.

[A4工程](図4参照)
銅箔7及び銅箔8を、フォトリソグラフィ法を用いてそれぞれ部分的に除去することによって、それぞれ複数の配線パターンからなる第3の配線層15及び第4の配線層16を形成する。
内面が無電解めっき膜11で覆われると共に導電性ペースト13で充填された貫通孔10は、第2の配線層4,第3の配線層15,及び第4の配線層16を互いに電気的に接続するスルーホール18となる。
[Step A4] (see FIG. 4)
The copper foil 7 and the copper foil 8 are partially removed by using a photolithography method to form a third wiring layer 15 and a fourth wiring layer 16 each having a plurality of wiring patterns.
The through hole 10 whose inner surface is covered with the electroless plating film 11 and filled with the conductive paste 13 electrically connects the second wiring layer 4, the third wiring layer 15, and the fourth wiring layer 16 to each other. It becomes the through hole 18 to be connected.

上述したA1工程〜A4工程により、スルーホール18を有するプリント配線板20を得る。   The printed wiring board 20 having the through hole 18 is obtained by the above-described steps A1 to A4.

上述したプリント配線板の製造方法及びプリント配線板によれば、スルーホールによって電気的に接続される配線層を銅箔からなる単層構造とすることができるので、この配線層を形成するための導電層の厚さを薄くすることができるため、微細な配線パターンを形成することが可能になる。   According to the printed wiring board manufacturing method and the printed wiring board described above, the wiring layer that is electrically connected by the through hole can have a single-layer structure made of copper foil. Since the thickness of the conductive layer can be reduced, a fine wiring pattern can be formed.

また、上述したプリント配線板の製造方法及びプリント配線板によれば、スルーホールの内面を無電解めっき膜で覆うことにより、無電解めっき膜で覆わずにスルーホールを導電性ペーストで直接充填した場合に比べて、低い接触抵抗で、かつ、各配線層同士を確実に電気的に接続することができる。   Also, according to the above-described printed wiring board manufacturing method and printed wiring board, by covering the inner surface of the through hole with the electroless plating film, the through hole is directly filled with the conductive paste without being covered with the electroless plating film. Compared with the case, each wiring layer can be reliably electrically connected with low contact resistance.

<第2実施例>
第2実施例は、本発明に係る、特にIVH(Interstitial Via Hole)を有するプリント配線板の製造方法及びプリント配線板の実施例であり、その製造過程をB1工程〜B4工程として図5〜図8を用いて説明する。
図5〜図8は、本発明に係る、特にIVHを有するプリント配線板の製造方法及びプリント配線板の第2実施例におけるB1工程〜B4工程をそれぞれ説明するための模式的断面図である。
<Second embodiment>
The second embodiment is an embodiment of a method of manufacturing a printed wiring board and particularly a printed wiring board having IVH (Interstitial Via Hole) according to the present invention. The manufacturing process is shown as B1 to B4 in FIGS. 8 will be used for explanation.
FIGS. 5-8 is typical sectional drawing for demonstrating each B1 process-B4 process in the manufacturing method of the printed wiring board which has IVH especially based on this invention, and 2nd Example of a printed wiring board.

[B1工程](図5参照)
まず、上述した第1実施例のA1工程〜A4工程と同様の工程を行って、上述のプリント配線板20を作製する。
なお、第1実施例と同じ構成部については、第1実施例と同じ符号を付す。
[Step B1] (see FIG. 5)
First, the above-described printed wiring board 20 is manufactured by performing the same steps as the steps A1 to A4 of the first embodiment described above.
The same components as those of the first embodiment are denoted by the same reference numerals as those of the first embodiment.

次に、第3の配線層15及び第4の配線層16をそれぞれ覆うように、プリント配線板20の両面に、第3の絶縁層30及び第4の絶縁層31を形成する。
第3の絶縁層30及び第4の絶縁層31は、インク状の絶縁性樹脂を、ロールコート法、スクリーン印刷法、及びカーテンコート法等の塗布方法を用いて塗布して硬化することによって、また、ガラスクロス等のシート状補強材に絶縁性樹脂が含浸されたプリプレグを、ラミネート法や積層プレス法を用いて熱圧着することによって、形成することができる。
Next, the third insulating layer 30 and the fourth insulating layer 31 are formed on both surfaces of the printed wiring board 20 so as to cover the third wiring layer 15 and the fourth wiring layer 16, respectively.
The third insulating layer 30 and the fourth insulating layer 31 are formed by applying and curing an ink-like insulating resin using a coating method such as a roll coating method, a screen printing method, and a curtain coating method, Moreover, it can form by carrying out the thermocompression bonding of the prepreg by which insulating resin was impregnated in sheet-like reinforcement materials, such as a glass cloth, using the lamination method or the lamination press method.

第2実施例では、インク状の絶縁性樹脂であるエポキシ樹脂をロールコート法を用いて塗布し、この塗布されたエポキシ樹脂を硬化することによって、上述の第3の絶縁層30及び第4の絶縁層31を形成した。
また、第2実施例では、第3の絶縁層30及び第4の絶縁層31の厚さ(第3の配線層15及び第4の配線層16上の各厚さ)を、それぞれ50μmとした。
In the second embodiment, an epoxy resin, which is an ink-like insulating resin, is applied using a roll coating method, and the applied epoxy resin is cured, whereby the above-described third insulating layer 30 and the fourth insulating resin are cured. An insulating layer 31 was formed.
In the second embodiment, the thicknesses of the third insulating layer 30 and the fourth insulating layer 31 (the thicknesses on the third wiring layer 15 and the fourth wiring layer 16) are 50 μm, respectively. .

[B2工程](図6参照)
第3の絶縁層30及び第4の絶縁層31の各所定の箇所に、第3の配線層15を露出させる第1の有底穴33、及び、第4の配線層16を露出させる第2の有底穴34を、例えばレーザ加工によりそれぞれ形成する。
[Step B2] (see FIG. 6)
A first bottomed hole 33 that exposes the third wiring layer 15 and a second hole that exposes the fourth wiring layer 16 at predetermined locations of the third insulating layer 30 and the fourth insulating layer 31. The bottomed holes 34 are respectively formed by, for example, laser processing.

[B3工程](図7参照)
第1の有底穴33及び第2の有底穴34に生じたレーザ加工による残渣を周知のデスミア処理によって除去した後、これら第1の有底穴33及び第2の有底穴34の各内面、並びに、第3の絶縁層30及び第4の絶縁層31の各表面を覆うように、第1の導電層36及び第2の導電層37を形成する。
第1の導電層36及び第2の導電層37は、無電解めっきを行って薄膜の無電解めっき膜を形成した後、この無電解めっき膜をめっき導通膜として電気めっきを行い、無電解めっき膜上にさらに厚膜の電気めっき膜を形成することによって得られる。
第2実施例では、第1の導電層36及び第2の導電層37の材質を銅とし、その厚さをそれぞれ30μmとした。
[Step B3] (see FIG. 7)
After the residue due to laser processing generated in the first bottomed hole 33 and the second bottomed hole 34 is removed by a known desmear process, each of the first bottomed hole 33 and the second bottomed hole 34 is A first conductive layer 36 and a second conductive layer 37 are formed so as to cover the inner surface and the surfaces of the third insulating layer 30 and the fourth insulating layer 31.
The first conductive layer 36 and the second conductive layer 37 are formed by electroless plating to form a thin electroless plating film, and then electroplating using the electroless plating film as a plating conductive film. It is obtained by forming a thick electroplated film on the film.
In the second embodiment, the material of the first conductive layer 36 and the second conductive layer 37 is copper, and the thickness thereof is 30 μm.

[B4工程](図8参照)
第1の導電層36及び第2の導電層37を、フォトリソグラフィ法を用いてそれぞれ部分的にエッチングすることによって、それぞれ複数の配線パターンからなる第5の配線層39及び第6の配線層40を形成する。
内面が第1の導電層36で覆われた第1の有底穴33は、第3の配線層15と第5の配線層39とを電気的に接続する第1のビア42となり、内面が第2の導電層37で覆われた第2の有底穴34は、第4の配線層16と第6の配線層40とを電気的に接続する第2のビア43となる。
また、内面が無電解めっき膜11で覆われると共に導電性ペースト13で充填された貫通孔10は、第2の配線層4,第3の配線層15,及び第4の配線層16を互いに電気的に接続するIVH(Interstitial Via Hole)45となる。
[Step B4] (see FIG. 8)
The first conductive layer 36 and the second conductive layer 37 are partially etched using a photolithography method, so that a fifth wiring layer 39 and a sixth wiring layer 40 each having a plurality of wiring patterns are obtained. Form.
The first bottomed hole 33 whose inner surface is covered with the first conductive layer 36 becomes the first via 42 that electrically connects the third wiring layer 15 and the fifth wiring layer 39, and the inner surface is The second bottomed hole 34 covered with the second conductive layer 37 serves as a second via 43 that electrically connects the fourth wiring layer 16 and the sixth wiring layer 40.
Further, the through hole 10 whose inner surface is covered with the electroless plating film 11 and filled with the conductive paste 13 electrically connects the second wiring layer 4, the third wiring layer 15, and the fourth wiring layer 16 to each other. It becomes IVH (Interstitial Via Hole) 45 to be connected.

上述したB1工程〜B4工程により、IVH45を有するプリント配線板50を得る。   The printed wiring board 50 having IVH45 is obtained by the above-described B1 to B4 processes.

上述したプリント配線板の製造方法及びプリント配線板によれば、IVHによって電気的に接続される配線層を銅箔からなる単層構造とすることができるので、この配線層を形成するための導電層の厚さを薄くすることができるため、微細な配線パターンを形成することが可能になる。   According to the printed wiring board manufacturing method and the printed wiring board described above, the wiring layer electrically connected by IVH can have a single-layer structure made of copper foil. Since the thickness of the layer can be reduced, a fine wiring pattern can be formed.

また、上述したプリント配線板の製造方法及びプリント配線板によれば、IVHの内面を無電解めっき膜で覆うことにより、無電解めっき膜で覆わずにIVHを導電性ペーストで直接充填した場合に比べて、低い接触抵抗で、かつ、各配線層同士を確実に電気的に接続することができる。   Further, according to the above-described printed wiring board manufacturing method and printed wiring board, when the inner surface of IVH is covered with an electroless plating film, IVH is directly filled with a conductive paste without being covered with the electroless plating film. In comparison, each wiring layer can be reliably electrically connected with a low contact resistance.

本発明の実施例は、上述した構成及び手順に限定されるものではなく、本発明の要旨を逸脱しない範囲において変形例としてもよいのは言うまでもない。   The embodiment of the present invention is not limited to the configuration and procedure described above, and it goes without saying that modifications may be made without departing from the scope of the present invention.

ここで、上述した第1実施例の変形例を図9を用いて、第2実施例の変形例を図10を用いてそれぞれ説明する。
図9及び図10は、第1実施例及び第2実施例の変形例をそれぞれ説明するための模式的断面図である。
Here, a modification of the first embodiment will be described with reference to FIG. 9 and a modification of the second embodiment will be described with reference to FIG.
9 and 10 are schematic cross-sectional views for explaining modifications of the first embodiment and the second embodiment, respectively.

まず、上述した第1実施例の変形例について、図9を用いて説明する。   First, a modification of the first embodiment described above will be described with reference to FIG.

まず、上述した第1実施例のA1工程〜A3工程と同様の工程を行う。
次に、導電性ペースト13,銅箔7,及び銅箔8を覆うように蓋めっき層61,62を形成する。
蓋めっき層61,62は、無電解めっきを行って薄膜の無電解めっき膜を形成した後、この無電解めっき膜をめっき導通膜として電気めっきを行い、無電解めっき膜上にさらに厚膜の電気めっき膜を形成することによって得られる。
変形例では、蓋めっき層61,62の材質を銅とし、その厚さをそれぞれ10μmとした。
First, the same steps as the steps A1 to A3 of the first embodiment described above are performed.
Next, lid plating layers 61 and 62 are formed so as to cover the conductive paste 13, the copper foil 7, and the copper foil 8.
The lid plating layers 61 and 62 are electrolessly plated to form a thin electroless plating film, and then electroplating is performed using the electroless plating film as a plating conductive film, and a thick film is further formed on the electroless plating film. It is obtained by forming an electroplated film.
In the modification, the material of the lid plating layers 61 and 62 is copper, and the thickness thereof is 10 μm.

その後、蓋めっき層61,62及び銅箔7,8を、フォトリソグラフィ法を用いてそれぞれ部分的に除去することによって、それぞれ複数の配線パターンからなる第3の配線層63及び第4の配線層64を形成する。   Thereafter, the lid plating layers 61 and 62 and the copper foils 7 and 8 are partially removed by using a photolithography method, whereby a third wiring layer 63 and a fourth wiring layer each formed of a plurality of wiring patterns. 64 is formed.

上述した手順により、第1実施例の変形例であるプリント配線板60を得る。   The printed wiring board 60 which is a modification of the first embodiment is obtained by the procedure described above.

このプリント配線板60によれば、銅箔7,8と導電性ペースト13とが蓋めっき層61,62でさらに接続されるため、接続抵抗を低減できると共に接続強度を向上させることができる。   According to the printed wiring board 60, since the copper foils 7 and 8 and the conductive paste 13 are further connected by the lid plating layers 61 and 62, the connection resistance can be reduced and the connection strength can be improved.

また、このプリント配線板60によれば、蓋めっき層61,62上に、半田等の導電性部材を介して電子部品を実装できるので、プリント配線板の電子部品実装密度を向上させることができる。   Moreover, according to this printed wiring board 60, since electronic components can be mounted on the lid plating layers 61 and 62 via a conductive member such as solder, the electronic component mounting density of the printed wiring board can be improved. .

次に、上述した第2実施例の変形例について、図10を用いて説明する。   Next, a modification of the above-described second embodiment will be described with reference to FIG.

まず、上述したプリント配線板60の両面に、第2実施例のB1工程と同様にして、第3の配線層63及び第4の配線層64をそれぞれ覆うように、第3の絶縁層30及び第4の絶縁層31を形成する。
次に、第2実施例のB2工程〜B4工程と同様の工程を行うことにより、第2実施例の変形例であるプリント配線板70を得る。
First, on both surfaces of the printed wiring board 60 described above, the third insulating layer 30 and the fourth wiring layer 64 are respectively covered so as to cover the third wiring layer 63 and the fourth wiring layer 64 in the same manner as in the B1 step of the second embodiment. A fourth insulating layer 31 is formed.
Next, a printed wiring board 70 which is a modification of the second embodiment is obtained by performing the same processes as the B2 process to the B4 process of the second embodiment.

このプリント配線板70によれば、上述したプリント配線板60と同様に、銅箔7,8と導電性ペースト13とが蓋めっき層61,62でさらに接続されるため、接続抵抗を低減できると共に接続強度を向上させることができる。   According to this printed wiring board 70, since the copper foils 7 and 8 and the conductive paste 13 are further connected by the lid plating layers 61 and 62 as in the above-described printed wiring board 60, the connection resistance can be reduced. Connection strength can be improved.

また、このプリント配線板70によれば、蓋めっき層61,62上に、ビア42,43を形成することができるので、プリント配線板の配線密度を向上させることができる。   Moreover, according to this printed wiring board 70, since the vias 42 and 43 can be formed on the lid plating layers 61 and 62, the wiring density of the printed wiring board can be improved.

ところで、第1実施例,第2実施例,及び変形例では、4層のシールド板1を用いたが、これに限定されるものではなく、このシールド板1に替えて、5層以上のシールド板1を用いてもよいし、コア材の両面に銅箔がそれぞれ貼り合わされた、所謂、両面銅張り板を用いてもよい。   By the way, in the first embodiment, the second embodiment, and the modified example, the four-layer shield plate 1 is used. However, the present invention is not limited to this, and the shield plate 1 is replaced with five or more layers of shields. The plate 1 may be used, or a so-called double-sided copper-clad plate in which copper foils are bonded to both sides of the core material may be used.

また、第1実施例のA3工程,第2実施例のB1工程,及び変形例では、シールド板1(銅箔7,8)の各表面上の無電解めっき膜11を除去するようにしたが、これに限定されるものではない。
例えば、上記除去工程において、銅箔7,8の各表面上の無電解めっき膜11を除去すると共に、これら銅箔7,8を所定の厚さまで薄くなるように除去してもよい。このように導電層の厚さを所定の厚さに調整する方法を銅厚調整と称す。
In the A3 process of the first embodiment, the B1 process of the second embodiment, and the modification, the electroless plating film 11 on each surface of the shield plate 1 (copper foils 7 and 8) is removed. However, the present invention is not limited to this.
For example, in the above removal step, the electroless plating film 11 on each surface of the copper foils 7 and 8 may be removed, and the copper foils 7 and 8 may be removed to a predetermined thickness. A method for adjusting the thickness of the conductive layer to a predetermined thickness is referred to as copper thickness adjustment.

本発明のプリント配線板の製造方法及びプリント配線板の第1実施例におけるA1工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the A1 process in the manufacturing method of the printed wiring board of this invention, and 1st Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第1実施例におけるA2工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the A2 process in the manufacturing method of the printed wiring board of this invention, and 1st Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第1実施例におけるA3工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the A3 process in the manufacturing method of the printed wiring board of this invention, and 1st Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第1実施例におけるA4工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the A4 process in the manufacturing method of the printed wiring board of this invention, and 1st Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第2実施例におけるB1工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the B1 process in the manufacturing method of the printed wiring board of this invention, and 2nd Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第2実施例におけるB2工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the B2 process in the manufacturing method of the printed wiring board of this invention, and 2nd Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第2実施例におけるB3工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the B3 process in the manufacturing method of the printed wiring board of this invention, and 2nd Example of a printed wiring board. 本発明のプリント配線板の製造方法及びプリント配線板の第2実施例におけるB4工程を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the B4 process in the manufacturing method of the printed wiring board of this invention, and 2nd Example of a printed wiring board. 第1実施例の変形例を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the modification of 1st Example. 第2実施例の変形例を説明するための模式的断面図である。It is typical sectional drawing for demonstrating the modification of 2nd Example.

符号の説明Explanation of symbols

1 シールド板、 2 コア材、 3,4,15,16,39,40 配線層、 5,6,30,31 絶縁層、 7,8 銅箔、 10 貫通孔、 11 無電解めっき膜、 13 導電性ペースト、 18 スルーホール、 20,50 プリント配線板、 33,34 有底穴、 36,37 導電層、 42,43 ビア、 45 IVH DESCRIPTION OF SYMBOLS 1 Shield plate, 2 Core materials, 3, 4, 15, 16, 39, 40 Wiring layer, 5, 6, 30, 31 Insulating layer, 7, 8 Copper foil, 10 Through hole, 11 Electroless plating film, 13 Conductivity Paste, 18 through hole, 20, 50 printed wiring board, 33, 34 bottomed hole, 36, 37 conductive layer, 42, 43 via, 45 IVH

Claims (4)

両面側に第1の導電層及び第2の導電層が設けられた基板に、該基板を貫通する貫通孔を穿設する貫通孔穿設工程と、
前記貫通孔穿設工程後に、前記貫通孔の内面、並びに、前記第1の導電層及び前記第2の導電層の各表面を覆って前記第1の導電層と前記第2の導電層とを電気的に接続する無電解めっき膜を形成する無電解めっき工程と、
前記無電解めっき工程後に、前記無電解めっき膜で内面が覆われた前記貫通孔を導電性部材で埋める導電性部材充填工程と、
前記導電性部材充填工程後に、前記基板の各表面よりも突出した前記導電性部材を、前記各表面上に形成された前記無電解めっき膜と共に除去する除去工程と、
を有するプリント配線板の製造方法。
A through-hole drilling step of drilling a through-hole penetrating the substrate on the substrate provided with the first conductive layer and the second conductive layer on both sides;
After the through-hole drilling step, covering the inner surface of the through-hole and the surfaces of the first conductive layer and the second conductive layer, the first conductive layer and the second conductive layer An electroless plating process for forming an electroless plating film to be electrically connected;
After the electroless plating step, a conductive member filling step of filling the through hole whose inner surface is covered with the electroless plating film with a conductive member;
After the conductive member filling step, the removal step of removing the conductive member protruding from each surface of the substrate together with the electroless plating film formed on each surface;
The manufacturing method of the printed wiring board which has this.
前記除去工程後に、前記導電性部材及び前記各表面を覆う第3の導電層を形成する導電層形成工程を有する請求項1記載のプリント配線板の製造方法。   The method for manufacturing a printed wiring board according to claim 1, further comprising a conductive layer forming step of forming a third conductive layer covering the conductive member and the surfaces after the removing step. 配線層と絶縁層とが交互に複数層積層された積層構造を有するプリント配線板において、
前記複数の配線層が露出された内面を有する孔部と、
前記内面を覆って、前記複数の配線層を互いに電気的に接続する無電解めっき膜と、
前記無電解めっき膜で内面が覆われた前記孔部を埋める導電性部材と、
を有するプリント配線板。
In a printed wiring board having a laminated structure in which a plurality of wiring layers and insulating layers are alternately laminated,
A hole having an inner surface from which the plurality of wiring layers are exposed;
An electroless plating film covering the inner surface and electrically connecting the plurality of wiring layers to each other;
A conductive member filling the hole whose inner surface is covered with the electroless plating film;
A printed wiring board having:
前記導電性部材は、導電層で覆われてなることを特徴とする請求項3記載のプリント配線板。   The printed wiring board according to claim 3, wherein the conductive member is covered with a conductive layer.
JP2007171967A 2007-06-29 2007-06-29 Printed circuit board and method of manufacturing same Pending JP2009010266A (en)

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WO2014087470A1 (en) * 2012-12-03 2014-06-12 株式会社メイコー Circuit board and method for manufacturing circuit board
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JP2003309356A (en) * 2002-04-15 2003-10-31 Daiwa Kogyo:Kk Method of forming plated through-hole and method of manufacturing multilayer wiring board

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010232596A (en) * 2009-03-30 2010-10-14 Murata Mfg Co Ltd Method of manufacturing multilayer wiring board, and multilayer wiring board
WO2013046441A1 (en) 2011-09-30 2013-04-04 株式会社メイコー Substrate manufacturing method
KR20140086980A (en) 2011-09-30 2014-07-08 메이코 일렉트로닉스 컴파니 리미티드 Substrate manufacturing method
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WO2014073563A1 (en) * 2012-11-09 2014-05-15 古河電気工業株式会社 Production method for build-up multilayer substrate, and build-up multilayer substrate
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JPWO2014073563A1 (en) * 2012-11-09 2016-09-08 古河電気工業株式会社 Build-up multilayer substrate manufacturing method and build-up multilayer substrate
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WO2014087470A1 (en) * 2012-12-03 2014-06-12 株式会社メイコー Circuit board and method for manufacturing circuit board
JPWO2014087470A1 (en) * 2012-12-03 2017-01-05 株式会社メイコー Circuit board and method for manufacturing the circuit board
CN114040565A (en) * 2021-11-15 2022-02-11 广东世运电路科技股份有限公司 PCB processing method, PCB processing equipment and computer readable storage medium

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