JP2004059990A - 成膜装置 - Google Patents

成膜装置 Download PDF

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Publication number
JP2004059990A
JP2004059990A JP2002219328A JP2002219328A JP2004059990A JP 2004059990 A JP2004059990 A JP 2004059990A JP 2002219328 A JP2002219328 A JP 2002219328A JP 2002219328 A JP2002219328 A JP 2002219328A JP 2004059990 A JP2004059990 A JP 2004059990A
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JP
Japan
Prior art keywords
tray
substrate
film forming
processed
forming apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2002219328A
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English (en)
Japanese (ja)
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JP2004059990A5 (enExample
Inventor
Mitsuhiro Yoshinaga
光宏 吉永
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP2002219328A priority Critical patent/JP2004059990A/ja
Publication of JP2004059990A publication Critical patent/JP2004059990A/ja
Publication of JP2004059990A5 publication Critical patent/JP2004059990A5/ja
Pending legal-status Critical Current

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  • Physical Vapour Deposition (AREA)
  • Chemical Vapour Deposition (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
JP2002219328A 2002-07-29 2002-07-29 成膜装置 Pending JP2004059990A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2002219328A JP2004059990A (ja) 2002-07-29 2002-07-29 成膜装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002219328A JP2004059990A (ja) 2002-07-29 2002-07-29 成膜装置

Publications (2)

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JP2004059990A true JP2004059990A (ja) 2004-02-26
JP2004059990A5 JP2004059990A5 (enExample) 2005-10-27

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JP2002219328A Pending JP2004059990A (ja) 2002-07-29 2002-07-29 成膜装置

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JP (1) JP2004059990A (enExample)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006287152A (ja) * 2005-04-05 2006-10-19 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2007088408A (ja) * 2005-09-24 2007-04-05 Applied Materials Gmbh & Co Kg 基板キャリヤ
JP2010521765A (ja) * 2006-04-28 2010-06-24 アプライド マテリアルズ インコーポレイテッド イオン源用前板
JP2014107439A (ja) * 2012-11-28 2014-06-09 Kyocera Corp ワーク載置用トレーおよびこれを用いたウエハ熱処理用トレーならびにワーク載置用トレーの製造方法
JP2016035080A (ja) * 2014-08-01 2016-03-17 大陽日酸株式会社 サセプタカバーおよび該サセプタカバーを備えた気相成長装置

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2006287152A (ja) * 2005-04-05 2006-10-19 Matsushita Electric Ind Co Ltd プラズマ処理装置
JP2007088408A (ja) * 2005-09-24 2007-04-05 Applied Materials Gmbh & Co Kg 基板キャリヤ
US8083912B2 (en) 2005-09-24 2011-12-27 Applied Materials Gmbh & Co. Kg. Substrate carrier
JP2010521765A (ja) * 2006-04-28 2010-06-24 アプライド マテリアルズ インコーポレイテッド イオン源用前板
JP2014107439A (ja) * 2012-11-28 2014-06-09 Kyocera Corp ワーク載置用トレーおよびこれを用いたウエハ熱処理用トレーならびにワーク載置用トレーの製造方法
JP2016035080A (ja) * 2014-08-01 2016-03-17 大陽日酸株式会社 サセプタカバーおよび該サセプタカバーを備えた気相成長装置

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