JP2004047452A5 - - Google Patents

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Publication number
JP2004047452A5
JP2004047452A5 JP2003140481A JP2003140481A JP2004047452A5 JP 2004047452 A5 JP2004047452 A5 JP 2004047452A5 JP 2003140481 A JP2003140481 A JP 2003140481A JP 2003140481 A JP2003140481 A JP 2003140481A JP 2004047452 A5 JP2004047452 A5 JP 2004047452A5
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JP
Japan
Prior art keywords
chamber
chambers
manufacturing apparatus
deposition
film formation
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Application number
JP2003140481A
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English (en)
Japanese (ja)
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JP2004047452A (ja
JP4954434B2 (ja
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Priority to JP2003140481A priority Critical patent/JP4954434B2/ja
Priority claimed from JP2003140481A external-priority patent/JP4954434B2/ja
Publication of JP2004047452A publication Critical patent/JP2004047452A/ja
Publication of JP2004047452A5 publication Critical patent/JP2004047452A5/ja
Application granted granted Critical
Publication of JP4954434B2 publication Critical patent/JP4954434B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2003140481A 2002-05-17 2003-05-19 製造装置 Expired - Fee Related JP4954434B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2003140481A JP4954434B2 (ja) 2002-05-17 2003-05-19 製造装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2002143803 2002-05-17
JP2002143803 2002-05-17
JP2003140481A JP4954434B2 (ja) 2002-05-17 2003-05-19 製造装置

Publications (3)

Publication Number Publication Date
JP2004047452A JP2004047452A (ja) 2004-02-12
JP2004047452A5 true JP2004047452A5 (de) 2006-07-06
JP4954434B2 JP4954434B2 (ja) 2012-06-13

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ID=31719507

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003140481A Expired - Fee Related JP4954434B2 (ja) 2002-05-17 2003-05-19 製造装置

Country Status (1)

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JP (1) JP4954434B2 (de)

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2005117498A1 (ja) * 2004-05-31 2005-12-08 Ulvac, Inc 有機ｅｌ素子の製造方法および有機ｅｌ素子製造装置の洗浄方法
US7753751B2 (en) 2004-09-29 2010-07-13 Semiconductor Energy Laboratory Co., Ltd. Method of fabricating the display device
JP2006278067A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 有機電界発光素子の製造方法、及び有機電界発光素子
JP2006278068A (ja) * 2005-03-28 2006-10-12 Fuji Photo Film Co Ltd 有機電界発光素子の製造方法、及び有機電界発光素子
KR101189774B1 (ko) 2005-12-05 2012-10-10 주식회사 탑 엔지니어링 보호 캡 합착 공정 라인
US8608855B2 (en) 2006-04-28 2013-12-17 Semiconductor Energy Laboratory Co., Ltd. Electrode cover and evaporation device
EP1983072A1 (de) * 2007-04-20 2008-10-22 Applied Materials, Inc. Bearbeitungsvorrichtung und Verfahren zur Bearbeitung eines Substrats
US10434804B2 (en) 2008-06-13 2019-10-08 Kateeva, Inc. Low particle gas enclosure systems and methods
US12064979B2 (en) 2008-06-13 2024-08-20 Kateeva, Inc. Low-particle gas enclosure systems and methods
US12018857B2 (en) 2008-06-13 2024-06-25 Kateeva, Inc. Gas enclosure assembly and system
US11975546B2 (en) 2008-06-13 2024-05-07 Kateeva, Inc. Gas enclosure assembly and system
US20100279021A1 (en) 2009-05-04 2010-11-04 Samsung Mobile Display Co., Ltd. Apparatus for depositing organic material and depositing method thereof
JP2010140917A (ja) * 2010-03-25 2010-06-24 Fujifilm Corp 有機電界発光素子
JP5846780B2 (ja) * 2011-06-30 2016-01-20 株式会社アルバック 真空処理装置及び真空処理方法、リチウムイオン二次電池の製造方法
JP5879594B2 (ja) * 2012-03-02 2016-03-08 株式会社昭和真空 成膜装置
KR102064391B1 (ko) 2012-08-31 2020-01-10 삼성디스플레이 주식회사 기판 처리 장치
EP3087623B1 (de) 2013-12-26 2021-09-22 Kateeva, Inc. Wärmebehandlung von elektronischen vorrichtungen
CN107611287A (zh) 2014-01-21 2018-01-19 科迪华公司 用于电子装置封装的设备和技术
KR20240119185A (ko) 2014-04-30 2024-08-06 카티바, 인크. 가스 쿠션 장비 및 기판 코팅 기술
KR102454027B1 (ko) * 2016-11-06 2022-10-14 케이엘에이 코포레이션 유기 발광 다이오드의 캡슐화를 위한 방법 및 장치

Family Cites Families (17)

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Publication number Priority date Publication date Assignee Title
JPS5536924A (en) * 1978-09-04 1980-03-14 Toko Inc Manufacturing of mn-bi thin film
JPS5941510B2 (ja) * 1979-07-24 1984-10-08 双葉電子工業株式会社 酸化ベリリウム膜とその形成方法
JPS57134555A (en) * 1981-02-10 1982-08-19 Fuji Photo Film Co Ltd Method and device for forming thin film
JPS63149371A (ja) * 1986-12-10 1988-06-22 Fuji Seiki Kk 複数の蒸着源を有する蒸着源保持装置
JPH03197668A (ja) * 1989-12-25 1991-08-29 Shinku Kikai Kogyo Kk 蒸発源およびそれを用いた蒸発装置
JPH05230627A (ja) * 1992-02-21 1993-09-07 Yamaha Corp 真空蒸着装置
JPH07126838A (ja) * 1993-10-28 1995-05-16 Matsushita Electric Ind Co Ltd 蒸着ボート
JP3371177B2 (ja) * 1995-02-13 2003-01-27 ソニー株式会社 蒸着装置とフリップチップｉｃの製造方法
JPH1025563A (ja) * 1996-07-08 1998-01-27 Shinko Seiki Co Ltd 真空蒸着装置及び真空蒸着方法
JPH10324966A (ja) * 1997-05-27 1998-12-08 Sony Corp 真空蒸着装置及び真空蒸着法
JPH11126686A (ja) * 1997-10-23 1999-05-11 Matsushita Electric Ind Co Ltd 有機エレクトロルミネセンス素子の製造装置
JP3782245B2 (ja) * 1998-10-28 2006-06-07 Ｔｄｋ株式会社 有機ｅｌ表示装置の製造装置及び製造方法
US6202591B1 (en) * 1998-11-12 2001-03-20 Flex Products, Inc. Linear aperture deposition apparatus and coating process
JP2000315576A (ja) * 1999-03-01 2000-11-14 Toray Ind Inc 有機電界発光素子およびその製造方法
JP2001059161A (ja) * 1999-08-20 2001-03-06 Tdk Corp 有機薄膜の製造装置および製造方法
TW490714B (en) * 1999-12-27 2002-06-11 Semiconductor Energy Lab Film formation apparatus and method for forming a film
JP2001234335A (ja) * 2000-02-17 2001-08-31 Matsushita Electric Works Ltd 蒸着装置

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