JP2004045267A5 - - Google Patents

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Publication number
JP2004045267A5
JP2004045267A5 JP2002204233A JP2002204233A JP2004045267A5 JP 2004045267 A5 JP2004045267 A5 JP 2004045267A5 JP 2002204233 A JP2002204233 A JP 2002204233A JP 2002204233 A JP2002204233 A JP 2002204233A JP 2004045267 A5 JP2004045267 A5 JP 2004045267A5
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JP
Japan
Prior art keywords
light
photodetector
diffraction grating
measuring
mirror
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JP2002204233A
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English (en)
Japanese (ja)
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JP3958134B2 (ja
JP2004045267A (ja
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Priority to JP2002204233A priority Critical patent/JP3958134B2/ja
Priority claimed from JP2002204233A external-priority patent/JP3958134B2/ja
Priority to US10/618,112 priority patent/US7003075B2/en
Publication of JP2004045267A publication Critical patent/JP2004045267A/ja
Publication of JP2004045267A5 publication Critical patent/JP2004045267A5/ja
Application granted granted Critical
Publication of JP3958134B2 publication Critical patent/JP3958134B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002204233A 2002-07-12 2002-07-12 測定装置 Expired - Fee Related JP3958134B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002204233A JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置
US10/618,112 US7003075B2 (en) 2002-07-12 2003-07-11 Optical measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002204233A JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置

Publications (3)

Publication Number Publication Date
JP2004045267A JP2004045267A (ja) 2004-02-12
JP2004045267A5 true JP2004045267A5 (https=) 2005-10-27
JP3958134B2 JP3958134B2 (ja) 2007-08-15

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Family Applications (1)

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JP2002204233A Expired - Fee Related JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置

Country Status (2)

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US (1) US7003075B2 (https=)
JP (1) JP3958134B2 (https=)

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JP6895451B2 (ja) 2016-03-24 2021-06-30 ディジレンズ インコーポレイテッド 偏光選択ホログラフィー導波管デバイスを提供するための方法および装置
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CN114721242B (zh) 2018-01-08 2025-08-15 迪吉伦斯公司 用于制造光学波导的方法
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KR20230153459A (ko) 2021-03-05 2023-11-06 디지렌즈 인코포레이티드. 진공 주기적 구조체 및 제조 방법
DE102021204170B4 (de) 2021-04-27 2024-09-26 Carl Zeiss Smt Gmbh Messvorrichtung sowie Verfahren zur Messung einer Wirkung einer wellenlängenabhängigen Messlicht-Reflektivität sowie einer Wirkung einer Polarisation von Messlicht auf eine Messlicht-Beaufschlagung einer Lithografiemaske
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