DE68929270T2 - Vorrichtung und Gerät zur Positionsdetektion - Google Patents

Vorrichtung und Gerät zur Positionsdetektion

Info

Publication number
DE68929270T2
DE68929270T2 DE68929270T DE68929270T DE68929270T2 DE 68929270 T2 DE68929270 T2 DE 68929270T2 DE 68929270 T DE68929270 T DE 68929270T DE 68929270 T DE68929270 T DE 68929270T DE 68929270 T2 DE68929270 T2 DE 68929270T2
Authority
DE
Germany
Prior art keywords
position detection
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68929270T
Other languages
English (en)
Other versions
DE68929270D1 (de
Inventor
Kenji Saitoh
Masakazu Matsugu
Naoto Abe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP63225801A external-priority patent/JP2513281B2/ja
Priority claimed from JP63225808A external-priority patent/JP2513282B2/ja
Priority claimed from JP63225806A external-priority patent/JPH0274805A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68929270D1 publication Critical patent/DE68929270D1/de
Application granted granted Critical
Publication of DE68929270T2 publication Critical patent/DE68929270T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
DE68929270T 1988-09-09 1989-09-07 Vorrichtung und Gerät zur Positionsdetektion Expired - Fee Related DE68929270T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP63225801A JP2513281B2 (ja) 1988-09-09 1988-09-09 位置合わせ装置
JP63225808A JP2513282B2 (ja) 1988-09-09 1988-09-09 位置合わせ装置
JP63225806A JPH0274805A (ja) 1988-09-09 1988-09-09 位置合わせ装置

Publications (2)

Publication Number Publication Date
DE68929270D1 DE68929270D1 (de) 2001-01-18
DE68929270T2 true DE68929270T2 (de) 2001-05-23

Family

ID=27331096

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68929270T Expired - Fee Related DE68929270T2 (de) 1988-09-09 1989-09-07 Vorrichtung und Gerät zur Positionsdetektion

Country Status (3)

Country Link
US (1) US5160848A (de)
EP (1) EP0358514B1 (de)
DE (1) DE68929270T2 (de)

Families Citing this family (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325176A (en) * 1988-02-16 1994-06-28 Canon Kabushiki Kaisha Position detecting method and apparatus including Fraunhofer diffraction detector
DE69128164T2 (de) * 1990-05-01 1998-04-02 Canon Kk Verfahren und Apparat zur Detektion von Lageabweichungen
US5495336A (en) * 1992-02-04 1996-02-27 Canon Kabushiki Kaisha Position detecting method for detecting a positional relationship between a first object and a second object
US6329104B1 (en) 1992-03-16 2001-12-11 Holtronic Technologies, Ltd. Position alignment system for holographic lithography process
US5444538A (en) * 1994-03-10 1995-08-22 New Vision Systems, Inc. System and method for optimizing the grid and intrafield registration of wafer patterns
JP3958134B2 (ja) * 2002-07-12 2007-08-15 キヤノン株式会社 測定装置
US6912435B2 (en) 2002-08-28 2005-06-28 Inficon Lt Inc. Methods and systems for controlling reticle-induced errors
US7379840B2 (en) * 2004-07-12 2008-05-27 Raytheon Company Arranging mobile sensors into a predetermined pattern
US7433018B2 (en) * 2005-12-27 2008-10-07 Asml Netherlands B.V. Pattern alignment method and lithographic apparatus
WO2008089729A1 (de) * 2007-01-25 2008-07-31 Ralf Violonchi Mikrooptische strahlformungsanordnung zur bildprojektion einer divergenten isotropen lichtpunktewolke, vornehmlich für den entertainmentbereich
JP5812599B2 (ja) * 2010-02-25 2015-11-17 キヤノン株式会社 情報処理方法及びその装置
CN101968611B (zh) * 2010-09-08 2012-04-18 中国科学院光电技术研究所 一种基于相位分布的单点掩模硅片调平方法
EP2476995A1 (de) * 2011-01-12 2012-07-18 Canon Kabushiki Kaisha Vorrichtung und Verfahren zum Messen der Verschiebung, Verfahren zur Herstellung eines Farbstoffs für ein optisches Formelement und optisches Element
KR20220061327A (ko) * 2020-11-05 2022-05-13 삼성디스플레이 주식회사 표시 장치용 패널 정렬 장치 및 패널 정렬 방법

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
US4360273A (en) * 1980-02-14 1982-11-23 Sperry Corporation Optical alignment of masks for X-ray lithography
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4539482A (en) * 1980-10-09 1985-09-03 Canon Kabushiki Kaisha Reading apparatus
US4514858A (en) * 1983-03-15 1985-04-30 Micronix Partners Lithography system
JPS61111402A (ja) * 1984-11-06 1986-05-29 Nippon Kogaku Kk <Nikon> 位置検出装置
EP0243520B1 (de) * 1986-04-29 1991-11-27 Ibm Deutschland Gmbh Interferometrische Maskensubstratausrichtung
US4815854A (en) * 1987-01-19 1989-03-28 Nec Corporation Method of alignment between mask and semiconductor wafer
US4870289A (en) * 1987-09-25 1989-09-26 Matsushita Electric Industrial Co., Ltd. Apparatus for controlling relation in position between a photomask and a wafer

Also Published As

Publication number Publication date
EP0358514A2 (de) 1990-03-14
EP0358514A3 (de) 1990-12-27
EP0358514B1 (de) 2000-12-13
DE68929270D1 (de) 2001-01-18
US5160848A (en) 1992-11-03

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee