DE68929205D1 - Vorrichtung und Verfahren zur Positionsdetektion - Google Patents

Vorrichtung und Verfahren zur Positionsdetektion

Info

Publication number
DE68929205D1
DE68929205D1 DE68929205T DE68929205T DE68929205D1 DE 68929205 D1 DE68929205 D1 DE 68929205D1 DE 68929205 T DE68929205 T DE 68929205T DE 68929205 T DE68929205 T DE 68929205T DE 68929205 D1 DE68929205 D1 DE 68929205D1
Authority
DE
Germany
Prior art keywords
position detection
detection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE68929205T
Other languages
English (en)
Other versions
DE68929205T2 (de
Inventor
Jun Hattori
Shigeyuki Suda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE68929205D1 publication Critical patent/DE68929205D1/de
Application granted granted Critical
Publication of DE68929205T2 publication Critical patent/DE68929205T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7049—Technique, e.g. interferometric
DE68929205T 1988-09-09 1989-09-07 Vorrichtung und Verfahren zur Positionsdetektion Expired - Fee Related DE68929205T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP22580388 1988-09-09
JP1209924A JP2626076B2 (ja) 1988-09-09 1989-08-14 位置検出装置

Publications (2)

Publication Number Publication Date
DE68929205D1 true DE68929205D1 (de) 2000-06-15
DE68929205T2 DE68929205T2 (de) 2000-09-28

Family

ID=26517751

Family Applications (1)

Application Number Title Priority Date Filing Date
DE68929205T Expired - Fee Related DE68929205T2 (de) 1988-09-09 1989-09-07 Vorrichtung und Verfahren zur Positionsdetektion

Country Status (4)

Country Link
US (1) US5148035A (de)
EP (1) EP0358513B1 (de)
JP (1) JP2626076B2 (de)
DE (1) DE68929205T2 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3008633B2 (ja) * 1991-01-11 2000-02-14 キヤノン株式会社 位置検出装置
US5455679A (en) * 1993-02-22 1995-10-03 Canon Kabushiki Kaisha Position detecting system
US20040237637A1 (en) * 2003-01-17 2004-12-02 Andre Veinotte Flow sensor for purge valve diagnostic
JP5032156B2 (ja) * 2007-03-05 2012-09-26 ジーイー・メディカル・システムズ・グローバル・テクノロジー・カンパニー・エルエルシー 磁気共鳴イメージング装置および磁気共鳴イメージング方法

Family Cites Families (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4037969A (en) * 1976-04-02 1977-07-26 Bell Telephone Laboratories, Incorporated Zone plate alignment marks
US4360273A (en) * 1980-02-14 1982-11-23 Sperry Corporation Optical alignment of masks for X-ray lithography
US4326805A (en) * 1980-04-11 1982-04-27 Bell Telephone Laboratories, Incorporated Method and apparatus for aligning mask and wafer members
US4539482A (en) * 1980-10-09 1985-09-03 Canon Kabushiki Kaisha Reading apparatus
US4398824A (en) * 1981-04-15 1983-08-16 Bell Telephone Laboratories, Incorporated Wafer tilt compensation in zone plate alignment system
US4636626A (en) * 1983-01-14 1987-01-13 Nippon Kogaku K.K. Apparatus for aligning mask and wafer used in semiconductor circuit element fabrication
US4545683A (en) * 1983-02-28 1985-10-08 The Perkin-Elmer Corporation Wafer alignment device
US4514858A (en) * 1983-03-15 1985-04-30 Micronix Partners Lithography system
US4656347A (en) * 1984-01-30 1987-04-07 Nippon Telegraph & Telephone Public Corporation Diffraction grating position adjuster using a grating and a reflector
JPS60163110A (ja) * 1984-02-06 1985-08-26 Canon Inc 位置合わせ装置
US4701050A (en) * 1984-08-10 1987-10-20 Hitachi, Ltd. Semiconductor exposure apparatus and alignment method therefor
JPS61111402A (ja) * 1984-11-06 1986-05-29 Nippon Kogaku Kk <Nikon> 位置検出装置
US4812661A (en) * 1986-08-20 1989-03-14 Hewlett-Packard Company Method and apparatus for hybrid I.C. lithography
JPS63131008A (ja) * 1986-11-20 1988-06-03 Fujitsu Ltd 光学的アライメント方法
EP0309281B1 (de) * 1987-09-25 1995-03-08 Matsushita Electric Industrial Co., Ltd. Vorrichtung zur Kontrolle des Lageverhältnisses zwischen einer Photomaske und einem Plättchen

Also Published As

Publication number Publication date
JP2626076B2 (ja) 1997-07-02
EP0358513B1 (de) 2000-05-10
EP0358513A2 (de) 1990-03-14
US5148035A (en) 1992-09-15
DE68929205T2 (de) 2000-09-28
EP0358513A3 (de) 1991-01-02
JPH02167405A (ja) 1990-06-27

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee