JP5948558B2 - 分光装置 - Google Patents
分光装置 Download PDFInfo
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- JP5948558B2 JP5948558B2 JP2012087536A JP2012087536A JP5948558B2 JP 5948558 B2 JP5948558 B2 JP 5948558B2 JP 2012087536 A JP2012087536 A JP 2012087536A JP 2012087536 A JP2012087536 A JP 2012087536A JP 5948558 B2 JP5948558 B2 JP 5948558B2
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- 238000003384 imaging method Methods 0.000 description 9
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- 230000007246 mechanism Effects 0.000 description 5
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- 239000000463 material Substances 0.000 description 4
- 230000008859 change Effects 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 229920002120 photoresistant polymer Polymers 0.000 description 3
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000013461 design Methods 0.000 description 2
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
- 229910052737 gold Inorganic materials 0.000 description 2
- 239000010931 gold Substances 0.000 description 2
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 2
- 238000002310 reflectometry Methods 0.000 description 2
- 206010010071 Coma Diseases 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 239000006185 dispersion Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 238000011156 evaluation Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000009434 installation Methods 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 239000002356 single layer Substances 0.000 description 1
- 230000003595 spectral effect Effects 0.000 description 1
- 238000004611 spectroscopical analysis Methods 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/20—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by using diffraction of the radiation by the materials, e.g. for investigating crystal structure; by using scattering of the radiation by the materials, e.g. for investigating non-crystalline materials; by using reflection of the radiation by the materials
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/067—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators using surface reflection, e.g. grazing incidence mirrors, gratings
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- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
- G21K1/062—Devices having a multilayer structure
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- Diffracting Gratings Or Hologram Optical Elements (AREA)
Description
本発明の分光装置は、対応波長範囲が異なる複数の不等間隔溝回折格子を具備し、所望出力光の波長に対応して前記複数の不等間隔溝回折格子のうちから一つの不等間隔溝回折格子が選択され、当該一つの不等間隔溝回折格子に光源から発した入射光が入射し、回折された回折光が出力光として全ての前記不等間隔溝回折格子に共通とされた結像面に照射される設定とされ、前記一つの不等間隔溝回折格子を選択し前記入射光を入射させる位置に設置させる切換手段を具備する分光装置であって、前記切換手段は、前記複数の不等間隔溝回折格子の中から前記一つの不等間隔溝回折格子を選択するに際して、各不等間隔溝回折格子の格子面の中心を通る法線を共通とし、前記光源が前記格子面の上側にある場合に、対応波長範囲の短い順に前記格子面が高い位置に設定されるように、前記一つの不等間隔溝回折格子を選択し設置させることを特徴とする。
本発明の分光装置において、前記光源は、0.5〜25nmの波長の光を発することを特徴とする。
本発明の分光装置において、前記不等間隔溝回折格子における格子面は凹面形状とされたことを特徴とする。
本発明の分光装置は、前記不等間隔溝回折格子における格子面に多層膜が形成されたことを特徴とする。
本発明の分光装置において、前記切換手段は、前記不等間隔溝回折格子の格子面の中心を通る法線が共通となる位置に前記複数の不等間隔溝回折格子を並進移動又は回転移動させることによって前記一つの不等間隔溝回折格子を選択することを特徴とする。
11 格子面
20 光源
30 像面
100 入射光
200 回折光
500、600、700 分光装置
510、610 移動台(切換手段)
710 回転台(切換手段)
Claims (5)
- 対応波長範囲が異なる複数の不等間隔溝回折格子を具備し、所望出力光の波長に対応して前記複数の不等間隔溝回折格子のうちから一つの不等間隔溝回折格子が選択され、当該一つの不等間隔溝回折格子に光源から発した入射光が入射し、回折された回折光が出力光として全ての前記不等間隔溝回折格子に共通とされた結像面に照射される設定とされ、前記一つの不等間隔溝回折格子を選択し前記入射光を入射させる位置に設置させる切換手段を具備する分光装置であって、
前記切換手段は、前記複数の不等間隔溝回折格子の中から前記一つの不等間隔溝回折格子を選択するに際して、各不等間隔溝回折格子の格子面の中心を通る法線を共通とし、前記光源が前記格子面の上側にある場合に、対応波長範囲の短い順に前記格子面が高い位置に設定されるように、前記一つの不等間隔溝回折格子を選択し設置させることを特徴とする分光装置。 - 前記光源は、0.5〜25nmの波長の光を発することを特徴とする請求項1に記載の分光装置。
- 前記不等間隔溝回折格子における格子面は凹面形状とされたことを特徴とする請求項1又は2に記載の分光装置。
- 前記不等間隔溝回折格子における格子面に多層膜が形成されたことを特徴とする請求項1から請求項3までのいずれか1項に記載の分光装置。
- 前記切換手段は、
前記不等間隔溝回折格子の格子面の中心を通る法線が共通となる位置に前記複数の不等間隔溝回折格子を並進移動又は回転移動させることによって前記一つの不等間隔溝回折格子を選択することを特徴とする請求項1から請求項4までのいずれか1項に記載の分光装置。
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2012087536A JP5948558B2 (ja) | 2012-04-06 | 2012-04-06 | 分光装置 |
EP13001723.9A EP2647983B1 (en) | 2012-04-06 | 2013-04-04 | Spectroscopic apparatus |
US13/856,834 US8983032B2 (en) | 2012-04-06 | 2013-04-04 | Spectroscopic apparatus |
Applications Claiming Priority (1)
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---|---|---|---|
JP2012087536A JP5948558B2 (ja) | 2012-04-06 | 2012-04-06 | 分光装置 |
Publications (2)
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JP2013217730A JP2013217730A (ja) | 2013-10-24 |
JP5948558B2 true JP5948558B2 (ja) | 2016-07-06 |
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JP2012087536A Active JP5948558B2 (ja) | 2012-04-06 | 2012-04-06 | 分光装置 |
Country Status (3)
Country | Link |
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US (1) | US8983032B2 (ja) |
EP (1) | EP2647983B1 (ja) |
JP (1) | JP5948558B2 (ja) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2016031271A (ja) * | 2014-07-29 | 2016-03-07 | 日本電子株式会社 | X線分光器の調整方法、x線分光器、および試料分析装置 |
US10677744B1 (en) * | 2016-06-03 | 2020-06-09 | U.S. Department Of Energy | Multi-cone x-ray imaging Bragg crystal spectrometer |
DE102017206066A1 (de) * | 2017-04-10 | 2018-10-11 | Anvajo GmbH | Spektrometer |
US10571334B2 (en) | 2017-12-15 | 2020-02-25 | Horiba Instruments Incorporated | System and method for selective resolution for concave grating spectrometer |
WO2019125308A1 (en) * | 2017-12-21 | 2019-06-27 | Agency For Science, Technology And Research | 2 dimensional variable line spacing grating based optical spectrometer |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0664207B2 (ja) | 1985-04-11 | 1994-08-22 | 株式会社島津製作所 | 回折格子分光器 |
US5016265A (en) * | 1985-08-15 | 1991-05-14 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Variable magnification variable dispersion glancing incidence imaging x-ray spectroscopic telescope |
US5274435A (en) * | 1992-02-26 | 1993-12-28 | Hettrick Michael C | Grating monochromators and spectrometers based on surface normal rotation |
US5280338A (en) * | 1992-10-30 | 1994-01-18 | Oriel Corporation | Multi-grating spectrograph and method of changing gratings |
JPH1151883A (ja) * | 1997-08-04 | 1999-02-26 | Rigaku Ind Co | 蛍光x線分析装置および方法 |
JP3624207B2 (ja) * | 1997-08-06 | 2005-03-02 | 理学電機工業株式会社 | 点集束型x線分光装置 |
JP2007273477A (ja) * | 2001-02-27 | 2007-10-18 | Jeol Ltd | X線分光器を備えた電子顕微鏡 |
JP2002329473A (ja) * | 2001-02-27 | 2002-11-15 | Jeol Ltd | X線分光器を備えた透過型電子顕微鏡 |
JP3958134B2 (ja) * | 2002-07-12 | 2007-08-15 | キヤノン株式会社 | 測定装置 |
JP2006133280A (ja) | 2004-11-02 | 2006-05-25 | Japan Atomic Energy Agency | 多層膜不等間隔溝ラミナー型回折格子及び同分光装置 |
JP2009300303A (ja) | 2008-06-16 | 2009-12-24 | Japan Atomic Energy Agency | 多層膜不等間隔溝ラミナー型回折格子及び同回折格子を用いた分光装置 |
JP5502644B2 (ja) * | 2010-07-30 | 2014-05-28 | 国立大学法人東北大学 | X線検出システム |
-
2012
- 2012-04-06 JP JP2012087536A patent/JP5948558B2/ja active Active
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2013
- 2013-04-04 EP EP13001723.9A patent/EP2647983B1/en active Active
- 2013-04-04 US US13/856,834 patent/US8983032B2/en active Active
Also Published As
Publication number | Publication date |
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EP2647983A3 (en) | 2017-01-04 |
US20130266120A1 (en) | 2013-10-10 |
EP2647983A2 (en) | 2013-10-09 |
EP2647983B1 (en) | 2021-05-26 |
US8983032B2 (en) | 2015-03-17 |
JP2013217730A (ja) | 2013-10-24 |
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