JP2004045267A5 - - Google Patents

Download PDF

Info

Publication number
JP2004045267A5
JP2004045267A5 JP2002204233A JP2002204233A JP2004045267A5 JP 2004045267 A5 JP2004045267 A5 JP 2004045267A5 JP 2002204233 A JP2002204233 A JP 2002204233A JP 2002204233 A JP2002204233 A JP 2002204233A JP 2004045267 A5 JP2004045267 A5 JP 2004045267A5
Authority
JP
Japan
Prior art keywords
light
photodetector
diffraction grating
measuring
mirror
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002204233A
Other languages
English (en)
Japanese (ja)
Other versions
JP3958134B2 (ja
JP2004045267A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP2002204233A priority Critical patent/JP3958134B2/ja
Priority claimed from JP2002204233A external-priority patent/JP3958134B2/ja
Priority to US10/618,112 priority patent/US7003075B2/en
Publication of JP2004045267A publication Critical patent/JP2004045267A/ja
Publication of JP2004045267A5 publication Critical patent/JP2004045267A5/ja
Application granted granted Critical
Publication of JP3958134B2 publication Critical patent/JP3958134B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2002204233A 2002-07-12 2002-07-12 測定装置 Expired - Fee Related JP3958134B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002204233A JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置
US10/618,112 US7003075B2 (en) 2002-07-12 2003-07-11 Optical measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002204233A JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置

Publications (3)

Publication Number Publication Date
JP2004045267A JP2004045267A (ja) 2004-02-12
JP2004045267A5 true JP2004045267A5 (enExample) 2005-10-27
JP3958134B2 JP3958134B2 (ja) 2007-08-15

Family

ID=31709891

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002204233A Expired - Fee Related JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置

Country Status (2)

Country Link
US (1) US7003075B2 (enExample)
JP (1) JP3958134B2 (enExample)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005233828A (ja) * 2004-02-20 2005-09-02 Canon Inc Ｅｕｖ光スペクトル測定装置およびｅｕｖ光のパワー算出方法
JP4508708B2 (ja) * 2004-04-12 2010-07-21 キヤノン株式会社 Ｅｕｖ光を用いた露光装置および露光方法
JP2006128342A (ja) * 2004-10-28 2006-05-18 Canon Inc 露光装置、光源装置及びデバイス製造方法
US7113566B1 (en) * 2005-07-15 2006-09-26 Jordan Valley Applied Radiation Ltd. Enhancing resolution of X-ray measurements by sample motion
JP4728116B2 (ja) * 2005-12-15 2011-07-20 日本電信電話株式会社 Ｘ線吸収分光装置および方法
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US11726332B2 (en) 2009-04-27 2023-08-15 Digilens Inc. Diffractive projection apparatus
US9335604B2 (en) 2013-12-11 2016-05-10 Milan Momcilo Popovich Holographic waveguide display
DE102009029234A1 (de) * 2009-09-07 2011-03-10 Robert Bosch Gmbh Laserprojektor zur Fahrwerksvermessung
US10795160B1 (en) 2014-09-25 2020-10-06 Rockwell Collins, Inc. Systems for and methods of using fold gratings for dual axis expansion
US11300795B1 (en) 2009-09-30 2022-04-12 Digilens Inc. Systems for and methods of using fold gratings coordinated with output couplers for dual axis expansion
US11320571B2 (en) * 2012-11-16 2022-05-03 Rockwell Collins, Inc. Transparent waveguide display providing upper and lower fields of view with uniform light extraction
US8243878B2 (en) * 2010-01-07 2012-08-14 Jordan Valley Semiconductors Ltd. High-resolution X-ray diffraction measurement with enhanced sensitivity
US8189179B2 (en) * 2010-07-09 2012-05-29 Raytheon Company System and method for hyperspectral and polarimetric imaging
US8687766B2 (en) 2010-07-13 2014-04-01 Jordan Valley Semiconductors Ltd. Enhancing accuracy of fast high-resolution X-ray diffractometry
US8437450B2 (en) 2010-12-02 2013-05-07 Jordan Valley Semiconductors Ltd. Fast measurement of X-ray diffraction from tilted layers
US9274349B2 (en) 2011-04-07 2016-03-01 Digilens Inc. Laser despeckler based on angular diversity
US8781070B2 (en) 2011-08-11 2014-07-15 Jordan Valley Semiconductors Ltd. Detection of wafer-edge defects
WO2013027004A1 (en) 2011-08-24 2013-02-28 Milan Momcilo Popovich Wearable data display
WO2016020630A2 (en) 2014-08-08 2016-02-11 Milan Momcilo Popovich Waveguide laser illuminator incorporating a despeckler
US8634139B1 (en) 2011-09-30 2014-01-21 Rockwell Collins, Inc. System for and method of catadioptric collimation in a compact head up display (HUD)
US9400246B2 (en) * 2011-10-11 2016-07-26 Kla-Tencor Corporation Optical metrology tool equipped with modulated illumination sources
JP5948558B2 (ja) * 2012-04-06 2016-07-06 国立研究開発法人日本原子力研究開発機構 分光装置
CN106125308B (zh) 2012-04-25 2019-10-25 罗克韦尔柯林斯公司 用于显示图像的装置和方法
US9933684B2 (en) 2012-11-16 2018-04-03 Rockwell Collins, Inc. Transparent waveguide display providing upper and lower fields of view having a specific light output aperture configuration
US9726624B2 (en) 2014-06-18 2017-08-08 Bruker Jv Israel Ltd. Using multiple sources/detectors for high-throughput X-ray topography measurement
US10241330B2 (en) 2014-09-19 2019-03-26 Digilens, Inc. Method and apparatus for generating input images for holographic waveguide displays
US10088675B1 (en) 2015-05-18 2018-10-02 Rockwell Collins, Inc. Turning light pipe for a pupil expansion system and method
EP3245444B1 (en) 2015-01-12 2021-09-08 DigiLens Inc. Environmentally isolated waveguide display
US9632226B2 (en) 2015-02-12 2017-04-25 Digilens Inc. Waveguide grating device
CN107430352B (zh) 2015-03-25 2020-01-21 Asml荷兰有限公司 量测方法、量测设备和器件制造方法
US10126552B2 (en) 2015-05-18 2018-11-13 Rockwell Collins, Inc. Micro collimator system and method for a head up display (HUD)
US11366316B2 (en) 2015-05-18 2022-06-21 Rockwell Collins, Inc. Head up display (HUD) using a light pipe
CN105158179A (zh) * 2015-06-08 2015-12-16 苏州谱道光电科技有限公司 一种分析仪光源模块
US10690916B2 (en) 2015-10-05 2020-06-23 Digilens Inc. Apparatus for providing waveguide displays with two-dimensional pupil expansion
CN106644070A (zh) * 2015-11-02 2017-05-10 北京振兴计量测试研究所 真空紫外成像光谱仪校准装置
CN108780224B (zh) 2016-03-24 2021-08-03 迪吉伦斯公司 用于提供偏振选择性全息波导装置的方法和设备
WO2017178781A1 (en) 2016-04-11 2017-10-19 GRANT, Alastair, John Holographic waveguide apparatus for structured light projection
EP3548939A4 (en) 2016-12-02 2020-11-25 DigiLens Inc. UNIFORM OUTPUT LIGHTING WAVEGUIDE DEVICE
WO2018129398A1 (en) 2017-01-05 2018-07-12 Digilens, Inc. Wearable heads up displays
US10295824B2 (en) 2017-01-26 2019-05-21 Rockwell Collins, Inc. Head up display with an angled light pipe
US10732569B2 (en) 2018-01-08 2020-08-04 Digilens Inc. Systems and methods for high-throughput recording of holographic gratings in waveguide cells
KR102745805B1 (ko) 2018-01-08 2024-12-20 디지렌즈 인코포레이티드. 광 도파관의 제조 방법
EP3710876A4 (en) 2018-01-08 2022-02-09 DigiLens Inc. SYSTEMS AND PROCESSES FOR THE MANUFACTURE OF WAVEGUIDE CELLS
US20200225471A1 (en) 2019-01-14 2020-07-16 Digilens Inc. Holographic Waveguide Display with Light Control Layer
US20200247017A1 (en) 2019-02-05 2020-08-06 Digilens Inc. Methods for Compensating for Optical Surface Nonuniformity
US20220283377A1 (en) 2019-02-15 2022-09-08 Digilens Inc. Wide Angle Waveguide Display
CN120405821A (zh) 2019-02-15 2025-08-01 迪吉伦斯公司 使用集成光栅提供全息波导显示的方法和装置
US20200292745A1 (en) 2019-03-12 2020-09-17 Digilens Inc. Holographic Waveguide Backlight and Related Methods of Manufacturing
EP3719545A1 (en) * 2019-04-03 2020-10-07 ASML Netherlands B.V. Manufacturing a reflective diffraction grating
US20200386947A1 (en) 2019-06-07 2020-12-10 Digilens Inc. Waveguides Incorporating Transmissive and Reflective Gratings and Related Methods of Manufacturing
US11287317B2 (en) * 2019-08-27 2022-03-29 Viavi Solutions Inc. Optical measurement device including internal spectral reference
KR102775783B1 (ko) 2019-08-29 2025-02-28 디지렌즈 인코포레이티드. 진공 격자 및 이의 제조 방법
CN112097900B (zh) * 2020-11-10 2021-04-20 中国工程物理研究院激光聚变研究中心 一种高能激光光束质量测试方法及测试系统
DE102020216337A1 (de) 2020-12-18 2022-01-05 Carl Zeiss Smt Gmbh Messvorrichtung zur Messung von Reflexionseigenschaften einer Probe im extremen ultravioletten Spektralbereich
US12399326B2 (en) 2021-01-07 2025-08-26 Digilens Inc. Grating structures for color waveguides
US12158612B2 (en) 2021-03-05 2024-12-03 Digilens Inc. Evacuated periodic structures and methods of manufacturing
DE102021204170B4 (de) 2021-04-27 2024-09-26 Carl Zeiss Smt Gmbh Messvorrichtung sowie Verfahren zur Messung einer Wirkung einer wellenlängenabhängigen Messlicht-Reflektivität sowie einer Wirkung einer Polarisation von Messlicht auf eine Messlicht-Beaufschlagung einer Lithografiemaske
CN113640327B (zh) * 2021-06-03 2023-07-25 中国工程物理研究院材料研究所 一种大曲率微小件表面多层金属薄膜的无损检测方法
CN118661138A (zh) 2021-12-29 2024-09-17 迪吉伦斯公司 利用倒置母版进行全息记录的方法和系统
DE102022207661A1 (de) 2022-07-26 2024-02-01 Carl Zeiss Smt Gmbh EUV-Reflektometer und Messverfahren
DE102023101151B4 (de) * 2023-01-18 2024-07-25 Helmholtz-Zentrum Berlin für Materialien und Energie Gesellschaft mit beschränkter Haftung Monochromatorkammer und Monochromator

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0833344B2 (ja) * 1986-08-28 1996-03-29 株式会社島津製作所 デンシトメ−タ
SU1562716A1 (ru) * 1988-03-21 1990-05-07 Институт Прикладной Физики Ан Мсср Монохроматор
EP0358514B1 (en) * 1988-09-09 2000-12-13 Canon Kabushiki Kaisha Position detecting method and apparatus
JP3008633B2 (ja) * 1991-01-11 2000-02-14 キヤノン株式会社 位置検出装置
JPH0595035A (ja) * 1991-10-01 1993-04-16 Tadahiro Omi 分析装置
JPH08145916A (ja) * 1994-11-18 1996-06-07 Hitachi Ltd 小角散乱ｘ線装置
JP3862347B2 (ja) * 1996-04-11 2006-12-27 キヤノン株式会社 Ｘ線縮小露光装置およびこれを利用したデバイス製造方法
JPH11264762A (ja) * 1998-03-17 1999-09-28 Shimadzu Corp エシェル型分光器
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
CN1303397C (zh) * 2000-01-26 2007-03-07 音质技术公司 为集成电路周期性光栅产生仿真衍射信号库的方法及系统
DE10040813A1 (de) * 2000-08-21 2002-03-21 Zeiss Carl Spektrometeranordnung

Similar Documents

Publication Publication Date Title
JP3958134B2 (ja) 測定装置
JP7451687B2 (ja) オーバレイ計測用格子ターゲット構造の暗視野イメージング
JP3624783B2 (ja) ダブルパスエタロンスペクトロメータ
JP2781987B2 (ja) 波長検出装置
KR20020077433A (ko) 파면 검출장치
JP2006138874A (ja) 複光路２重エタロン分光器
JP3674504B2 (ja) 分光反射率測定装置および分光反射率測定方法
KR102736650B1 (ko) Euv 마스크 및 euv 팰리클의 반사도와 투과도 측정장치
US6317203B1 (en) Narrowband module inspection device
US20250060677A1 (en) Method for measuring an effect of a wavelength-dependent measuring light reflectivity and an effect of a polarization of measuring light on a measuring light impingement on a lithography mask
CN113552090A (zh) 一种基于微型扫描光栅微镜的近红外荧光光谱仪
US20030030799A1 (en) Coaxial illumination system
JP2004333131A (ja) 全反射蛍光ｘａｆｓ測定装置
NL1032952C2 (nl) Polarisatie-evaluatiemasker, polarisatie-evaluatiewerkwijze en polarisatiebepalingsinrichting.
JP2005268744A5 (enExample)
CN108458787A (zh) 中阶梯光栅型空间外差拉曼光谱仪光路结构
JP7486178B2 (ja) 分光分析装置
US7248364B2 (en) Apparatus and method for optical characterization of a sample over a broadband of wavelengths with a small spot size
JP2001108523A (ja) 分光測定装置
JPH05281041A (ja) 分光器
JP2016125826A (ja) 分析装置
JP2005504318A (ja) 測定装置
US6456361B1 (en) Method and instrument for measuring vacuum ultraviolet light beam, method of producing device and optical exposure apparatus
JP7283190B2 (ja) 分光測定装置及び分光測定方法
JPH11101739A (ja) エリプソメトリ装置