JP2004045267A5 - - Google Patents

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Publication number
JP2004045267A5
JP2004045267A5 JP2002204233A JP2002204233A JP2004045267A5 JP 2004045267 A5 JP2004045267 A5 JP 2004045267A5 JP 2002204233 A JP2002204233 A JP 2002204233A JP 2002204233 A JP2002204233 A JP 2002204233A JP 2004045267 A5 JP2004045267 A5 JP 2004045267A5
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JP
Japan
Prior art keywords
light
photodetector
diffraction grating
measuring
mirror
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Application number
JP2002204233A
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English (en)
Japanese (ja)
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JP2004045267A (ja
JP3958134B2 (ja
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Priority to JP2002204233A priority Critical patent/JP3958134B2/ja
Priority claimed from JP2002204233A external-priority patent/JP3958134B2/ja
Priority to US10/618,112 priority patent/US7003075B2/en
Publication of JP2004045267A publication Critical patent/JP2004045267A/ja
Publication of JP2004045267A5 publication Critical patent/JP2004045267A5/ja
Application granted granted Critical
Publication of JP3958134B2 publication Critical patent/JP3958134B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2002204233A 2002-07-12 2002-07-12 測定装置 Expired - Fee Related JP3958134B2 (ja)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2002204233A JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置
US10/618,112 US7003075B2 (en) 2002-07-12 2003-07-11 Optical measuring device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2002204233A JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置

Publications (3)

Publication Number Publication Date
JP2004045267A JP2004045267A (ja) 2004-02-12
JP2004045267A5 true JP2004045267A5 (enExample) 2005-10-27
JP3958134B2 JP3958134B2 (ja) 2007-08-15

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Family Applications (1)

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JP2002204233A Expired - Fee Related JP3958134B2 (ja) 2002-07-12 2002-07-12 測定装置

Country Status (2)

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US (1) US7003075B2 (enExample)
JP (1) JP3958134B2 (enExample)

Families Citing this family (61)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2005233828A (ja) * 2004-02-20 2005-09-02 Canon Inc Ｅｕｖ光スペクトル測定装置およびｅｕｖ光のパワー算出方法
JP4508708B2 (ja) * 2004-04-12 2010-07-21 キヤノン株式会社 Ｅｕｖ光を用いた露光装置および露光方法
JP2006128342A (ja) * 2004-10-28 2006-05-18 Canon Inc 露光装置、光源装置及びデバイス製造方法
US7113566B1 (en) * 2005-07-15 2006-09-26 Jordan Valley Applied Radiation Ltd. Enhancing resolution of X-ray measurements by sample motion
JP4728116B2 (ja) * 2005-12-15 2011-07-20 日本電信電話株式会社 Ｘ線吸収分光装置および方法
US7920676B2 (en) * 2007-05-04 2011-04-05 Xradia, Inc. CD-GISAXS system and method
US11726332B2 (en) 2009-04-27 2023-08-15 Digilens Inc. Diffractive projection apparatus
US9335604B2 (en) 2013-12-11 2016-05-10 Milan Momcilo Popovich Holographic waveguide display
DE102009029234A1 (de) * 2009-09-07 2011-03-10 Robert Bosch Gmbh Laserprojektor zur Fahrwerksvermessung
US11300795B1 (en) 2009-09-30 2022-04-12 Digilens Inc. Systems for and methods of using fold gratings coordinated with output couplers for dual axis expansion
US11320571B2 (en) * 2012-11-16 2022-05-03 Rockwell Collins, Inc. Transparent waveguide display providing upper and lower fields of view with uniform light extraction
US10795160B1 (en) 2014-09-25 2020-10-06 Rockwell Collins, Inc. Systems for and methods of using fold gratings for dual axis expansion
US8243878B2 (en) 2010-01-07 2012-08-14 Jordan Valley Semiconductors Ltd. High-resolution X-ray diffraction measurement with enhanced sensitivity
US8189179B2 (en) * 2010-07-09 2012-05-29 Raytheon Company System and method for hyperspectral and polarimetric imaging
US8687766B2 (en) 2010-07-13 2014-04-01 Jordan Valley Semiconductors Ltd. Enhancing accuracy of fast high-resolution X-ray diffractometry
US8437450B2 (en) 2010-12-02 2013-05-07 Jordan Valley Semiconductors Ltd. Fast measurement of X-ray diffraction from tilted layers
WO2012136970A1 (en) 2011-04-07 2012-10-11 Milan Momcilo Popovich Laser despeckler based on angular diversity
US8781070B2 (en) 2011-08-11 2014-07-15 Jordan Valley Semiconductors Ltd. Detection of wafer-edge defects
WO2016020630A2 (en) 2014-08-08 2016-02-11 Milan Momcilo Popovich Waveguide laser illuminator incorporating a despeckler
EP2995986B1 (en) 2011-08-24 2017-04-12 Rockwell Collins, Inc. Data display
US8634139B1 (en) 2011-09-30 2014-01-21 Rockwell Collins, Inc. System for and method of catadioptric collimation in a compact head up display (HUD)
US9400246B2 (en) * 2011-10-11 2016-07-26 Kla-Tencor Corporation Optical metrology tool equipped with modulated illumination sources
JP5948558B2 (ja) * 2012-04-06 2016-07-06 国立研究開発法人日本原子力研究開発機構 分光装置
EP2842003B1 (en) 2012-04-25 2019-02-27 Rockwell Collins, Inc. Holographic wide angle display
US9933684B2 (en) 2012-11-16 2018-04-03 Rockwell Collins, Inc. Transparent waveguide display providing upper and lower fields of view having a specific light output aperture configuration
US9726624B2 (en) 2014-06-18 2017-08-08 Bruker Jv Israel Ltd. Using multiple sources/detectors for high-throughput X-ray topography measurement
US10241330B2 (en) 2014-09-19 2019-03-26 Digilens, Inc. Method and apparatus for generating input images for holographic waveguide displays
US10088675B1 (en) 2015-05-18 2018-10-02 Rockwell Collins, Inc. Turning light pipe for a pupil expansion system and method
WO2016113534A1 (en) 2015-01-12 2016-07-21 Milan Momcilo Popovich Environmentally isolated waveguide display
US9632226B2 (en) 2015-02-12 2017-04-25 Digilens Inc. Waveguide grating device
CN107430352B (zh) 2015-03-25 2020-01-21 Asml荷兰有限公司 量测方法、量测设备和器件制造方法
US11366316B2 (en) 2015-05-18 2022-06-21 Rockwell Collins, Inc. Head up display (HUD) using a light pipe
US10126552B2 (en) 2015-05-18 2018-11-13 Rockwell Collins, Inc. Micro collimator system and method for a head up display (HUD)
CN105158179A (zh) * 2015-06-08 2015-12-16 苏州谱道光电科技有限公司 一种分析仪光源模块
EP3359999A1 (en) 2015-10-05 2018-08-15 Popovich, Milan Momcilo Waveguide display
CN106644070A (zh) * 2015-11-02 2017-05-10 北京振兴计量测试研究所 真空紫外成像光谱仪校准装置
EP3433659B1 (en) 2016-03-24 2024-10-23 DigiLens, Inc. Method and apparatus for providing a polarization selective holographic waveguide device
US10890707B2 (en) 2016-04-11 2021-01-12 Digilens Inc. Holographic waveguide apparatus for structured light projection
US11513350B2 (en) 2016-12-02 2022-11-29 Digilens Inc. Waveguide device with uniform output illumination
WO2018129398A1 (en) 2017-01-05 2018-07-12 Digilens, Inc. Wearable heads up displays
US10295824B2 (en) 2017-01-26 2019-05-21 Rockwell Collins, Inc. Head up display with an angled light pipe
WO2019136473A1 (en) 2018-01-08 2019-07-11 Digilens, Inc. Methods for fabricating optical waveguides
KR102768598B1 (ko) 2018-01-08 2025-02-13 디지렌즈 인코포레이티드. 도파관 셀 내의 홀로그래픽 격자의 높은 처리능력의 레코딩을 위한 시스템 및 방법
KR102819207B1 (ko) 2018-01-08 2025-06-11 디지렌즈 인코포레이티드. 도파관 셀을 제조하기 위한 시스템 및 방법
WO2020149956A1 (en) 2019-01-14 2020-07-23 Digilens Inc. Holographic waveguide display with light control layer
WO2020163524A1 (en) 2019-02-05 2020-08-13 Digilens Inc. Methods for compensating for optical surface nonuniformity
US20220283377A1 (en) 2019-02-15 2022-09-08 Digilens Inc. Wide Angle Waveguide Display
EP3924759B1 (en) 2019-02-15 2025-07-30 Digilens Inc. Methods and apparatuses for providing a holographic waveguide display using integrated gratings
US20200292745A1 (en) 2019-03-12 2020-09-17 Digilens Inc. Holographic Waveguide Backlight and Related Methods of Manufacturing
EP3719545A1 (en) * 2019-04-03 2020-10-07 ASML Netherlands B.V. Manufacturing a reflective diffraction grating
CN114207492A (zh) 2019-06-07 2022-03-18 迪吉伦斯公司 带透射光栅和反射光栅的波导及其生产方法
US11287317B2 (en) * 2019-08-27 2022-03-29 Viavi Solutions Inc. Optical measurement device including internal spectral reference
KR102775783B1 (ko) 2019-08-29 2025-02-28 디지렌즈 인코포레이티드. 진공 격자 및 이의 제조 방법
CN112097900B (zh) * 2020-11-10 2021-04-20 中国工程物理研究院激光聚变研究中心 一种高能激光光束质量测试方法及测试系统
DE102020216337A1 (de) 2020-12-18 2022-01-05 Carl Zeiss Smt Gmbh Messvorrichtung zur Messung von Reflexionseigenschaften einer Probe im extremen ultravioletten Spektralbereich
WO2022150841A1 (en) 2021-01-07 2022-07-14 Digilens Inc. Grating structures for color waveguides
JP2024508926A (ja) 2021-03-05 2024-02-28 ディジレンズ インコーポレイテッド 真空周期的構造体および製造の方法
DE102021204170B4 (de) 2021-04-27 2024-09-26 Carl Zeiss Smt Gmbh Messvorrichtung sowie Verfahren zur Messung einer Wirkung einer wellenlängenabhängigen Messlicht-Reflektivität sowie einer Wirkung einer Polarisation von Messlicht auf eine Messlicht-Beaufschlagung einer Lithografiemaske
CN113640327B (zh) * 2021-06-03 2023-07-25 中国工程物理研究院材料研究所 一种大曲率微小件表面多层金属薄膜的无损检测方法
DE102022207661A1 (de) 2022-07-26 2024-02-01 Carl Zeiss Smt Gmbh EUV-Reflektometer und Messverfahren
DE102023101151B4 (de) * 2023-01-18 2024-07-25 Helmholtz-Zentrum Berlin für Materialien und Energie Gesellschaft mit beschränkter Haftung Monochromatorkammer und Monochromator

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0833344B2 (ja) * 1986-08-28 1996-03-29 株式会社島津製作所 デンシトメ−タ
SU1562716A1 (ru) * 1988-03-21 1990-05-07 Институт Прикладной Физики Ан Мсср Монохроматор
DE68929270T2 (de) * 1988-09-09 2001-05-23 Canon K.K., Tokio/Tokyo Vorrichtung und Gerät zur Positionsdetektion
JP3008633B2 (ja) * 1991-01-11 2000-02-14 キヤノン株式会社 位置検出装置
JPH0595035A (ja) * 1991-10-01 1993-04-16 Tadahiro Omi 分析装置
JPH08145916A (ja) * 1994-11-18 1996-06-07 Hitachi Ltd 小角散乱ｘ線装置
JP3862347B2 (ja) * 1996-04-11 2006-12-27 キヤノン株式会社 Ｘ線縮小露光装置およびこれを利用したデバイス製造方法
JPH11264762A (ja) * 1998-03-17 1999-09-28 Shimadzu Corp エシェル型分光器
US6312373B1 (en) * 1998-09-22 2001-11-06 Nikon Corporation Method of manufacturing an optical system
US6891626B2 (en) * 2000-01-26 2005-05-10 Timbre Technologies, Inc. Caching of intra-layer calculations for rapid rigorous coupled-wave analyses
DE10040813A1 (de) * 2000-08-21 2002-03-21 Zeiss Carl Spektrometeranordnung

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