JP2005268744A5 - - Google Patents

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Publication number
JP2005268744A5
JP2005268744A5 JP2004284218A JP2004284218A JP2005268744A5 JP 2005268744 A5 JP2005268744 A5 JP 2005268744A5 JP 2004284218 A JP2004284218 A JP 2004284218A JP 2004284218 A JP2004284218 A JP 2004284218A JP 2005268744 A5 JP2005268744 A5 JP 2005268744A5
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JP
Japan
Prior art keywords
light
exposure
optical system
projection optical
liquid
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Application number
JP2004284218A
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English (en)
Japanese (ja)
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JP2005268744A (ja
JP4466300B2 (ja
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Priority to JP2004284218A priority Critical patent/JP4466300B2/ja
Priority claimed from JP2004284218A external-priority patent/JP4466300B2/ja
Publication of JP2005268744A publication Critical patent/JP2005268744A/ja
Publication of JP2005268744A5 publication Critical patent/JP2005268744A5/ja
Application granted granted Critical
Publication of JP4466300B2 publication Critical patent/JP4466300B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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JP2004284218A 2003-09-29 2004-09-29 露光装置及び露光方法並びにデバイス製造方法、計測装置 Expired - Fee Related JP4466300B2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2004284218A JP4466300B2 (ja) 2003-09-29 2004-09-29 露光装置及び露光方法並びにデバイス製造方法、計測装置

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003338420 2003-09-29
JP2004042931 2004-02-19
JP2004284218A JP4466300B2 (ja) 2003-09-29 2004-09-29 露光装置及び露光方法並びにデバイス製造方法、計測装置

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2010000173A Division JP5136566B2 (ja) 2003-09-29 2010-01-04 露光装置及び露光方法並びにデバイス製造方法

Publications (3)

Publication Number Publication Date
JP2005268744A JP2005268744A (ja) 2005-09-29
JP2005268744A5 true JP2005268744A5 (enExample) 2009-07-09
JP4466300B2 JP4466300B2 (ja) 2010-05-26

Family

ID=35092919

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2004284218A Expired - Fee Related JP4466300B2 (ja) 2003-09-29 2004-09-29 露光装置及び露光方法並びにデバイス製造方法、計測装置

Country Status (1)

Country Link
JP (1) JP4466300B2 (enExample)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1670043B1 (en) 2003-09-29 2013-02-27 Nikon Corporation Exposure apparatus, exposure method, and device manufacturing method
JP5136566B2 (ja) * 2003-09-29 2013-02-06 株式会社ニコン 露光装置及び露光方法並びにデバイス製造方法
JP2005175034A (ja) * 2003-12-09 2005-06-30 Canon Inc 露光装置
JP4018647B2 (ja) 2004-02-09 2007-12-05 キヤノン株式会社 投影露光装置およびデバイス製造方法
JP4720747B2 (ja) * 2004-12-02 2011-07-13 株式会社ニコン 露光装置、露光方法、及びデバイス製造方法
JP4612833B2 (ja) * 2004-12-15 2011-01-12 キヤノン株式会社 露光装置及びデバイス製造方法
JP4908948B2 (ja) 2006-06-30 2012-04-04 キヤノン株式会社 露光装置およびデバイス製造方法
US8013977B2 (en) * 2006-07-17 2011-09-06 Asml Netherlands B.V. Lithographic apparatus, radiation sensor and method of manufacturing a radiation sensor
JP2008159695A (ja) 2006-12-21 2008-07-10 Canon Inc 露光装置
US8975599B2 (en) 2007-05-03 2015-03-10 Asml Netherlands B.V. Image sensor, lithographic apparatus comprising an image sensor and use of an image sensor in a lithographic apparatus
JP5004658B2 (ja) 2007-05-21 2012-08-22 キヤノン株式会社 露光装置、露光方法、デバイス製造方法及び測定装置
US8194231B2 (en) * 2007-10-02 2012-06-05 Asml Netherlands B.V. Lithographic apparatus and method
EP2264528A1 (en) * 2009-06-19 2010-12-22 ASML Netherlands B.V. Sensor and lithographic apparatus
JP5234091B2 (ja) * 2010-11-30 2013-07-10 ウシオ電機株式会社 光照射装置
JP5541198B2 (ja) * 2011-03-01 2014-07-09 ウシオ電機株式会社 光照射装置
US10082424B2 (en) * 2014-05-07 2018-09-25 Asml Netherlands B.V. Diamond-based monitoring apparatus for lithographic apparatus, and a lithographic apparatus comprising diamond-based monitoring apparatus
CN110892330B (zh) 2017-07-10 2024-05-03 Asml荷兰有限公司 光刻方法和设备

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