JP2003532034A5 - - Google Patents
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- Publication number
- JP2003532034A5 JP2003532034A5 JP2001579949A JP2001579949A JP2003532034A5 JP 2003532034 A5 JP2003532034 A5 JP 2003532034A5 JP 2001579949 A JP2001579949 A JP 2001579949A JP 2001579949 A JP2001579949 A JP 2001579949A JP 2003532034 A5 JP2003532034 A5 JP 2003532034A5
- Authority
- JP
- Japan
- Prior art keywords
- gas
- storage
- distribution
- solid phase
- supply system
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000007789 gas Substances 0.000 description 199
- 238000009826 distribution Methods 0.000 description 68
- 238000003860 storage Methods 0.000 description 64
- 239000002594 sorbent Substances 0.000 description 62
- 239000007790 solid phase Substances 0.000 description 35
- WTEOIRVLGSZEPR-UHFFFAOYSA-N boron trifluoride Chemical compound FB(F)F WTEOIRVLGSZEPR-UHFFFAOYSA-N 0.000 description 30
- 238000000034 method Methods 0.000 description 22
- 238000001179 sorption measurement Methods 0.000 description 22
- 238000004891 communication Methods 0.000 description 18
- 229910015900 BF3 Inorganic materials 0.000 description 15
- 239000003463 adsorbent Substances 0.000 description 12
- 238000003795 desorption Methods 0.000 description 11
- 239000003153 chemical reaction reagent Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- -1 diborane Chemical compound 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 239000004065 semiconductor Substances 0.000 description 7
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 6
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical compound Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 description 6
- XYFCBTPGUUZFHI-UHFFFAOYSA-N Phosphine Chemical compound P XYFCBTPGUUZFHI-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 229910052723 transition metal Inorganic materials 0.000 description 6
- 150000003624 transition metals Chemical class 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 230000001590 oxidative effect Effects 0.000 description 5
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 3
- RWSOTUBLDIXVET-UHFFFAOYSA-N Dihydrogen sulfide Chemical compound S RWSOTUBLDIXVET-UHFFFAOYSA-N 0.000 description 3
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 3
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 3
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 3
- 229910021529 ammonia Inorganic materials 0.000 description 3
- 229910000074 antimony hydride Inorganic materials 0.000 description 3
- RBFQJDQYXXHULB-UHFFFAOYSA-N arsane Chemical compound [AsH3] RBFQJDQYXXHULB-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000000460 chlorine Substances 0.000 description 3
- 229910052801 chlorine Inorganic materials 0.000 description 3
- 229910000078 germane Inorganic materials 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 150000004678 hydrides Chemical class 0.000 description 3
- 229910000042 hydrogen bromide Inorganic materials 0.000 description 3
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 3
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 3
- 229910000040 hydrogen fluoride Inorganic materials 0.000 description 3
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 3
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 3
- 229910000037 hydrogen sulfide Inorganic materials 0.000 description 3
- 239000012535 impurity Substances 0.000 description 3
- 238000005468 ion implantation Methods 0.000 description 3
- 150000002500 ions Chemical class 0.000 description 3
- 229910000073 phosphorus hydride Inorganic materials 0.000 description 3
- SPVXKVOXSXTJOY-UHFFFAOYSA-N selane Chemical compound [SeH2] SPVXKVOXSXTJOY-UHFFFAOYSA-N 0.000 description 3
- 229910000058 selane Inorganic materials 0.000 description 3
- 229910000077 silane Inorganic materials 0.000 description 3
- OUULRIDHGPHMNQ-UHFFFAOYSA-N stibane Chemical compound [SbH3] OUULRIDHGPHMNQ-UHFFFAOYSA-N 0.000 description 3
- 229910000059 tellane Inorganic materials 0.000 description 3
- PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 3
- NXHILIPIEUBEPD-UHFFFAOYSA-H tungsten hexafluoride Chemical compound F[W](F)(F)(F)(F)F NXHILIPIEUBEPD-UHFFFAOYSA-H 0.000 description 3
- 239000005909 Kieselgur Substances 0.000 description 2
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 2
- 229910000323 aluminium silicate Inorganic materials 0.000 description 2
- 239000000356 contaminant Substances 0.000 description 2
- 238000000354 decomposition reaction Methods 0.000 description 2
- KWLSQQRRSAWBOQ-UHFFFAOYSA-N dipotassioarsanylpotassium Chemical compound [K][As]([K])[K] KWLSQQRRSAWBOQ-UHFFFAOYSA-N 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- 238000012544 monitoring process Methods 0.000 description 2
- 229920000642 polymer Polymers 0.000 description 2
- 238000010926 purge Methods 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 230000002950 deficient Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- HNPSIPDUKPIQMN-UHFFFAOYSA-N dioxosilane;oxo(oxoalumanyloxy)alumane Chemical compound O=[Si]=O.O=[Al]O[Al]=O HNPSIPDUKPIQMN-UHFFFAOYSA-N 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 229910052744 lithium Inorganic materials 0.000 description 1
- 238000012423 maintenance Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 239000002516 radical scavenger Substances 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 238000002336 sorption--desorption measurement Methods 0.000 description 1
- LSNNMFCWUKXFEE-UHFFFAOYSA-L sulfite Chemical class [O-]S([O-])=O LSNNMFCWUKXFEE-UHFFFAOYSA-L 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- 239000002918 waste heat Substances 0.000 description 1
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/564,323 | 2000-05-03 | ||
| US09/564,323 US6406519B1 (en) | 1998-03-27 | 2000-05-03 | Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
| PCT/US2001/013922 WO2001083084A1 (en) | 2000-05-03 | 2001-04-27 | Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003532034A JP2003532034A (ja) | 2003-10-28 |
| JP2003532034A5 true JP2003532034A5 (enExample) | 2008-07-03 |
Family
ID=24254011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001579949A Pending JP2003532034A (ja) | 2000-05-03 | 2001-04-27 | 収着剤ベースのガス貯蔵及び供給システムを備えるガスキャビネットアセンブリ |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1284806A4 (enExample) |
| JP (1) | JP2003532034A (enExample) |
| KR (1) | KR100858077B1 (enExample) |
| CN (1) | CN1204954C (enExample) |
| AU (1) | AU2001257439A1 (enExample) |
| WO (1) | WO2001083084A1 (enExample) |
Families Citing this family (38)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US7300038B2 (en) * | 2002-07-23 | 2007-11-27 | Advanced Technology Materials, Inc. | Method and apparatus to help promote contact of gas with vaporized material |
| US6991671B2 (en) * | 2002-12-09 | 2006-01-31 | Advanced Technology Materials, Inc. | Rectangular parallelepiped fluid storage and dispensing vessel |
| JP4652785B2 (ja) * | 2004-11-29 | 2011-03-16 | 株式会社日立国際電気 | 基板処理装置 |
| KR100675063B1 (ko) * | 2005-06-27 | 2007-01-29 | 울산화학주식회사 | 저온액화가스의 충전방법 |
| KR100820377B1 (ko) * | 2006-07-07 | 2008-04-10 | 김재윤 | 질소가스충진기 |
| GB2441056A (en) * | 2006-08-18 | 2008-02-20 | Nomenca Ltd | Gas canister security retention cabinet |
| US20080241805A1 (en) | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
| US8499789B2 (en) | 2008-05-29 | 2013-08-06 | Tescom Corporation | Mobile gas supply system |
| SG182510A1 (en) * | 2010-01-14 | 2012-08-30 | Advanced Tech Materials | Ventilation gas management systems and processes |
| US8858819B2 (en) | 2010-02-15 | 2014-10-14 | Air Products And Chemicals, Inc. | Method for chemical mechanical planarization of a tungsten-containing substrate |
| TWI525042B (zh) * | 2010-09-16 | 2016-03-11 | 首威公司 | 氟化氫供應單元 |
| US9032990B2 (en) * | 2011-04-25 | 2015-05-19 | Applied Materials, Inc. | Chemical delivery system |
| KR20200124780A (ko) | 2012-05-31 | 2020-11-03 | 엔테그리스, 아이엔씨. | 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송 |
| JP2014207200A (ja) * | 2013-04-16 | 2014-10-30 | 東京電力株式会社 | ナトリウム−硫黄電池における火災の消火方法 |
| CN103638890B (zh) * | 2013-11-19 | 2016-01-06 | 全椒南大光电材料有限公司 | 高纯安全气体源的制备方法 |
| KR102408666B1 (ko) * | 2014-10-03 | 2022-06-13 | 엔테그리스, 아이엔씨. | 압력-조절 가스 공급 용기 |
| SG11201706560PA (en) | 2015-02-12 | 2017-09-28 | Entegris Inc | Smart package |
| US10052623B2 (en) | 2015-06-29 | 2018-08-21 | Industrial Technology Research Institute | Inorganic material for removing harmful substance from wastewater and method of preparing the same, and method for wastewater treatment |
| FR3039622B1 (fr) * | 2015-07-31 | 2018-03-02 | Air Liquide Electronics Systems | Installation de distribution de gaz de travail. |
| CN107364659B (zh) * | 2017-07-31 | 2023-06-27 | 浙江巨化装备制造有限公司 | 一种无水氟化氢的安全储存设备及其制造方法 |
| CN107883184B (zh) * | 2017-10-27 | 2020-02-11 | 北京空间技术研制试验中心 | 用于航天器的高压气瓶承载装置 |
| CN108421365A (zh) * | 2018-03-19 | 2018-08-21 | 杭州正大重工机械有限公司 | 一种有机废气收集和处理系统 |
| KR102040716B1 (ko) * | 2018-07-10 | 2019-11-06 | 에이엠티 주식회사 | 가스통 자동 교체방법 |
| KR102132173B1 (ko) * | 2019-01-22 | 2020-07-10 | 주식회사 원익홀딩스 | 가스실린더의 가스공급장치용 캐비닛 |
| US12233377B2 (en) * | 2019-03-27 | 2025-02-25 | Eneos Corporation | Hydrogen gas supply apparatus and hydrogen gas supply method |
| US11577217B2 (en) * | 2019-12-12 | 2023-02-14 | Praxair Technology, Inc. | Dopant fluid storage and dispensing systems utilizing high performance, structurally modified particulate carbon adsorbents |
| US11527380B2 (en) * | 2020-04-01 | 2022-12-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Ion implanter toxic gas delivery system |
| KR102229474B1 (ko) * | 2020-08-31 | 2021-03-17 | 서갑수 | 가스 공급 조절 박스 |
| US11493909B1 (en) * | 2021-04-16 | 2022-11-08 | Taiwan Semiconductor Manufacturing Company Ltd. | Method for detecting environmental parameter in semiconductor fabrication facility |
| US11629821B1 (en) | 2022-01-19 | 2023-04-18 | Praxair Technology, Inc. | Gas dosing apparatus with directional control valve |
| US12018800B2 (en) | 2022-03-29 | 2024-06-25 | Praxair Technology, Inc. | Method and system for optimized gas delivery with automated redundant pressure regulation safety feature |
| CN116510474A (zh) * | 2022-09-20 | 2023-08-01 | 北京京仪自动化装备技术股份有限公司 | 用于半导体废气处理设备的反应腔和反应腔的监测方法 |
| CN116371142B (zh) * | 2023-06-01 | 2023-10-03 | 中国华能集团清洁能源技术研究院有限公司 | 烟气低温吸附再生系统和吸附剂加热输送装置 |
| CN116624753B (zh) * | 2023-06-16 | 2023-11-07 | 福建德尔科技股份有限公司 | 一种三氟化氯充装方法及系统 |
| CN120981683A (zh) * | 2023-07-13 | 2025-11-18 | 株式会社力森诺科 | 高压气体容器的清洗方法 |
| CN121079538A (zh) * | 2023-07-13 | 2025-12-05 | 株式会社力森诺科 | 高压气体容器的清洗方法 |
| KR102716664B1 (ko) * | 2024-07-08 | 2024-10-11 | 김형호 | 반도체 제조공정용 케미컬 저장용기 |
Family Cites Families (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56158126A (en) * | 1980-05-12 | 1981-12-05 | Taikisha Ltd | Adsorber-desorber |
| US4378982A (en) * | 1981-08-28 | 1983-04-05 | Greene & Kellogg, Inc. | Compact oxygen concentrator |
| DE3440260C1 (de) * | 1984-11-03 | 1986-04-03 | Deutsche Gesellschaft für Wiederaufarbeitung von Kernbrennstoffen mbH, 3000 Hannover | Verfahren zur Vorbereitung einer Saugkokille fuer die Aufnahme von verglasten radioaktiven Abfallstoffen nach der Absaugmethode und Vorrichtung zur Durchfuehrung des Verfahrens |
| JPS6346164A (ja) * | 1986-08-13 | 1988-02-27 | 株式会社明電舎 | インプラント材料の製造方法 |
| US5112367A (en) * | 1989-11-20 | 1992-05-12 | Hill Charles C | Fluid fractionator |
| US5213769A (en) * | 1991-10-30 | 1993-05-25 | Whitlock Walter H | Mixture forming method and apparatus |
| US5512087A (en) * | 1992-05-12 | 1996-04-30 | Newport Petroleum | Petroleum vapor control apparatus |
| FR2695568B1 (fr) * | 1992-09-14 | 1994-10-21 | Air Liquide | Procédé et installation de séparation de gaz par perméation. |
| JP2813856B2 (ja) * | 1993-11-29 | 1998-10-22 | 日本エア・リキード株式会社 | シリンダ付ガス供給装置 |
| US5518528A (en) * | 1994-10-13 | 1996-05-21 | Advanced Technology Materials, Inc. | Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds |
| US5704967A (en) * | 1995-10-13 | 1998-01-06 | Advanced Technology Materials, Inc. | Fluid storage and delivery system comprising high work capacity physical sorbent |
| JP3117610B2 (ja) * | 1994-12-08 | 2000-12-18 | 川崎製鉄株式会社 | ジボランガス収納・供給方法およびその設備 |
| US5953682A (en) * | 1997-02-14 | 1999-09-14 | Millipore Corporation | Automated gas cylinder tracking system |
| US6199384B1 (en) * | 1999-07-09 | 2001-03-13 | American Air Liquide Inc. | System and method for controlled delivery of liquefied gases including control aspects |
-
2001
- 2001-04-27 CN CNB018089798A patent/CN1204954C/zh not_active Expired - Lifetime
- 2001-04-27 JP JP2001579949A patent/JP2003532034A/ja active Pending
- 2001-04-27 EP EP01930952A patent/EP1284806A4/en not_active Withdrawn
- 2001-04-27 AU AU2001257439A patent/AU2001257439A1/en not_active Abandoned
- 2001-04-27 WO PCT/US2001/013922 patent/WO2001083084A1/en not_active Ceased
- 2001-04-27 KR KR1020027014732A patent/KR100858077B1/ko not_active Expired - Lifetime
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