KR100858077B1 - 가스 공급 장치, 이온 주입 장치, 가스 시약 공급 방법, 흡탈착 방법 및 반도체 제조 설비 - Google Patents
가스 공급 장치, 이온 주입 장치, 가스 시약 공급 방법, 흡탈착 방법 및 반도체 제조 설비 Download PDFInfo
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- KR100858077B1 KR100858077B1 KR1020027014732A KR20027014732A KR100858077B1 KR 100858077 B1 KR100858077 B1 KR 100858077B1 KR 1020027014732 A KR1020027014732 A KR 1020027014732A KR 20027014732 A KR20027014732 A KR 20027014732A KR 100858077 B1 KR100858077 B1 KR 100858077B1
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- gas
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- physical adsorption
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- 238000005406 washing Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Images
Classifications
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C7/00—Methods or apparatus for discharging liquefied, solidified, or compressed gases from pressure vessels, not covered by another subclass
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B01—PHYSICAL OR CHEMICAL PROCESSES OR APPARATUS IN GENERAL
- B01D—SEPARATION
- B01D53/00—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols
- B01D53/02—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography
- B01D53/04—Separation of gases or vapours; Recovering vapours of volatile solvents from gases; Chemical or biological purification of waste gases, e.g. engine exhaust gases, smoke, fumes, flue gases, aerosols by adsorption, e.g. preparative gas chromatography with stationary adsorbents
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C11/00—Use of gas-solvents or gas-sorbents in vessels
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/04—Arrangement or mounting of valves
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C13/00—Details of vessels or of the filling or discharging of vessels
- F17C13/04—Arrangement or mounting of valves
- F17C13/045—Automatic change-over switching assembly for bottled gas systems with two (or more) gas containers
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0302—Fittings, valves, filters, or components in connection with the gas storage device
- F17C2205/0338—Pressure regulators
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2205/00—Vessel construction, in particular mounting arrangements, attachments or identifications means
- F17C2205/03—Fluid connections, filters, valves, closure means or other attachments
- F17C2205/0388—Arrangement of valves, regulators, filters
- F17C2205/0391—Arrangement of valves, regulators, filters inside the pressure vessel
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/01—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the phase
- F17C2223/0107—Single phase
- F17C2223/0123—Single phase gaseous, e.g. CNG, GNC
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2223/00—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel
- F17C2223/03—Handled fluid before transfer, i.e. state of fluid when stored in the vessel or before transfer from the vessel characterised by the pressure level
- F17C2223/038—Subatmospheric pressure
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F17—STORING OR DISTRIBUTING GASES OR LIQUIDS
- F17C—VESSELS FOR CONTAINING OR STORING COMPRESSED, LIQUEFIED OR SOLIDIFIED GASES; FIXED-CAPACITY GAS-HOLDERS; FILLING VESSELS WITH, OR DISCHARGING FROM VESSELS, COMPRESSED, LIQUEFIED, OR SOLIDIFIED GASES
- F17C2270/00—Applications
- F17C2270/05—Applications for industrial use
- F17C2270/0518—Semiconductors
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Oil, Petroleum & Natural Gas (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Filling Or Discharging Of Gas Storage Vessels (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
- Feeding, Discharge, Calcimining, Fusing, And Gas-Generation Devices (AREA)
- Chemical Vapour Deposition (AREA)
- Drying Of Semiconductors (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/564,323 | 2000-05-03 | ||
| US09/564,323 US6406519B1 (en) | 1998-03-27 | 2000-05-03 | Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
| PCT/US2001/013922 WO2001083084A1 (en) | 2000-05-03 | 2001-04-27 | Gas cabinet assembly comprising sorbent-based gas storage and delivery system |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| KR20030034065A KR20030034065A (ko) | 2003-05-01 |
| KR100858077B1 true KR100858077B1 (ko) | 2008-09-11 |
Family
ID=24254011
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| KR1020027014732A Expired - Lifetime KR100858077B1 (ko) | 2000-05-03 | 2001-04-27 | 가스 공급 장치, 이온 주입 장치, 가스 시약 공급 방법, 흡탈착 방법 및 반도체 제조 설비 |
Country Status (6)
| Country | Link |
|---|---|
| EP (1) | EP1284806A4 (enExample) |
| JP (1) | JP2003532034A (enExample) |
| KR (1) | KR100858077B1 (enExample) |
| CN (1) | CN1204954C (enExample) |
| AU (1) | AU2001257439A1 (enExample) |
| WO (1) | WO2001083084A1 (enExample) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170063871A (ko) * | 2014-10-03 | 2017-06-08 | 엔테그리스, 아이엔씨. | 압력-조절 가스 공급 용기 |
| KR102132173B1 (ko) * | 2019-01-22 | 2020-07-10 | 주식회사 원익홀딩스 | 가스실린더의 가스공급장치용 캐비닛 |
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| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6921062B2 (en) | 2002-07-23 | 2005-07-26 | Advanced Technology Materials, Inc. | Vaporizer delivery ampoule |
| US7300038B2 (en) * | 2002-07-23 | 2007-11-27 | Advanced Technology Materials, Inc. | Method and apparatus to help promote contact of gas with vaporized material |
| US6991671B2 (en) * | 2002-12-09 | 2006-01-31 | Advanced Technology Materials, Inc. | Rectangular parallelepiped fluid storage and dispensing vessel |
| JP4652785B2 (ja) * | 2004-11-29 | 2011-03-16 | 株式会社日立国際電気 | 基板処理装置 |
| KR100675063B1 (ko) * | 2005-06-27 | 2007-01-29 | 울산화학주식회사 | 저온액화가스의 충전방법 |
| KR100820377B1 (ko) * | 2006-07-07 | 2008-04-10 | 김재윤 | 질소가스충진기 |
| GB2441056A (en) * | 2006-08-18 | 2008-02-20 | Nomenca Ltd | Gas canister security retention cabinet |
| US20080241805A1 (en) | 2006-08-31 | 2008-10-02 | Q-Track Corporation | System and method for simulated dosimetry using a real time locating system |
| US8499789B2 (en) | 2008-05-29 | 2013-08-06 | Tescom Corporation | Mobile gas supply system |
| SG182510A1 (en) * | 2010-01-14 | 2012-08-30 | Advanced Tech Materials | Ventilation gas management systems and processes |
| US8858819B2 (en) | 2010-02-15 | 2014-10-14 | Air Products And Chemicals, Inc. | Method for chemical mechanical planarization of a tungsten-containing substrate |
| TWI525042B (zh) * | 2010-09-16 | 2016-03-11 | 首威公司 | 氟化氫供應單元 |
| US9032990B2 (en) * | 2011-04-25 | 2015-05-19 | Applied Materials, Inc. | Chemical delivery system |
| KR20200124780A (ko) | 2012-05-31 | 2020-11-03 | 엔테그리스, 아이엔씨. | 배취식 침착을 위한 고 물질 플럭스를 갖는 유체의 소스 시약-기반 수송 |
| JP2014207200A (ja) * | 2013-04-16 | 2014-10-30 | 東京電力株式会社 | ナトリウム−硫黄電池における火災の消火方法 |
| CN103638890B (zh) * | 2013-11-19 | 2016-01-06 | 全椒南大光电材料有限公司 | 高纯安全气体源的制备方法 |
| SG11201706560PA (en) | 2015-02-12 | 2017-09-28 | Entegris Inc | Smart package |
| US10052623B2 (en) | 2015-06-29 | 2018-08-21 | Industrial Technology Research Institute | Inorganic material for removing harmful substance from wastewater and method of preparing the same, and method for wastewater treatment |
| FR3039622B1 (fr) * | 2015-07-31 | 2018-03-02 | Air Liquide Electronics Systems | Installation de distribution de gaz de travail. |
| CN107364659B (zh) * | 2017-07-31 | 2023-06-27 | 浙江巨化装备制造有限公司 | 一种无水氟化氢的安全储存设备及其制造方法 |
| CN107883184B (zh) * | 2017-10-27 | 2020-02-11 | 北京空间技术研制试验中心 | 用于航天器的高压气瓶承载装置 |
| CN108421365A (zh) * | 2018-03-19 | 2018-08-21 | 杭州正大重工机械有限公司 | 一种有机废气收集和处理系统 |
| KR102040716B1 (ko) * | 2018-07-10 | 2019-11-06 | 에이엠티 주식회사 | 가스통 자동 교체방법 |
| US12233377B2 (en) * | 2019-03-27 | 2025-02-25 | Eneos Corporation | Hydrogen gas supply apparatus and hydrogen gas supply method |
| US11577217B2 (en) * | 2019-12-12 | 2023-02-14 | Praxair Technology, Inc. | Dopant fluid storage and dispensing systems utilizing high performance, structurally modified particulate carbon adsorbents |
| US11527380B2 (en) * | 2020-04-01 | 2022-12-13 | Taiwan Semiconductor Manufacturing Co., Ltd. | Ion implanter toxic gas delivery system |
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| US12018800B2 (en) | 2022-03-29 | 2024-06-25 | Praxair Technology, Inc. | Method and system for optimized gas delivery with automated redundant pressure regulation safety feature |
| CN116510474A (zh) * | 2022-09-20 | 2023-08-01 | 北京京仪自动化装备技术股份有限公司 | 用于半导体废气处理设备的反应腔和反应腔的监测方法 |
| CN116371142B (zh) * | 2023-06-01 | 2023-10-03 | 中国华能集团清洁能源技术研究院有限公司 | 烟气低温吸附再生系统和吸附剂加热输送装置 |
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| CN120981683A (zh) * | 2023-07-13 | 2025-11-18 | 株式会社力森诺科 | 高压气体容器的清洗方法 |
| CN121079538A (zh) * | 2023-07-13 | 2025-12-05 | 株式会社力森诺科 | 高压气体容器的清洗方法 |
| KR102716664B1 (ko) * | 2024-07-08 | 2024-10-11 | 김형호 | 반도체 제조공정용 케미컬 저장용기 |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4378982A (en) * | 1981-08-28 | 1983-04-05 | Greene & Kellogg, Inc. | Compact oxygen concentrator |
| US5112367A (en) * | 1989-11-20 | 1992-05-12 | Hill Charles C | Fluid fractionator |
| US5213769A (en) * | 1991-10-30 | 1993-05-25 | Whitlock Walter H | Mixture forming method and apparatus |
| US5704967A (en) * | 1995-10-13 | 1998-01-06 | Advanced Technology Materials, Inc. | Fluid storage and delivery system comprising high work capacity physical sorbent |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56158126A (en) * | 1980-05-12 | 1981-12-05 | Taikisha Ltd | Adsorber-desorber |
| DE3440260C1 (de) * | 1984-11-03 | 1986-04-03 | Deutsche Gesellschaft für Wiederaufarbeitung von Kernbrennstoffen mbH, 3000 Hannover | Verfahren zur Vorbereitung einer Saugkokille fuer die Aufnahme von verglasten radioaktiven Abfallstoffen nach der Absaugmethode und Vorrichtung zur Durchfuehrung des Verfahrens |
| JPS6346164A (ja) * | 1986-08-13 | 1988-02-27 | 株式会社明電舎 | インプラント材料の製造方法 |
| US5512087A (en) * | 1992-05-12 | 1996-04-30 | Newport Petroleum | Petroleum vapor control apparatus |
| FR2695568B1 (fr) * | 1992-09-14 | 1994-10-21 | Air Liquide | Procédé et installation de séparation de gaz par perméation. |
| JP2813856B2 (ja) * | 1993-11-29 | 1998-10-22 | 日本エア・リキード株式会社 | シリンダ付ガス供給装置 |
| US5518528A (en) * | 1994-10-13 | 1996-05-21 | Advanced Technology Materials, Inc. | Storage and delivery system for gaseous hydride, halide, and organometallic group V compounds |
| JP3117610B2 (ja) * | 1994-12-08 | 2000-12-18 | 川崎製鉄株式会社 | ジボランガス収納・供給方法およびその設備 |
| US5953682A (en) * | 1997-02-14 | 1999-09-14 | Millipore Corporation | Automated gas cylinder tracking system |
| US6199384B1 (en) * | 1999-07-09 | 2001-03-13 | American Air Liquide Inc. | System and method for controlled delivery of liquefied gases including control aspects |
-
2001
- 2001-04-27 CN CNB018089798A patent/CN1204954C/zh not_active Expired - Lifetime
- 2001-04-27 JP JP2001579949A patent/JP2003532034A/ja active Pending
- 2001-04-27 EP EP01930952A patent/EP1284806A4/en not_active Withdrawn
- 2001-04-27 AU AU2001257439A patent/AU2001257439A1/en not_active Abandoned
- 2001-04-27 WO PCT/US2001/013922 patent/WO2001083084A1/en not_active Ceased
- 2001-04-27 KR KR1020027014732A patent/KR100858077B1/ko not_active Expired - Lifetime
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4378982A (en) * | 1981-08-28 | 1983-04-05 | Greene & Kellogg, Inc. | Compact oxygen concentrator |
| US5112367A (en) * | 1989-11-20 | 1992-05-12 | Hill Charles C | Fluid fractionator |
| US5213769A (en) * | 1991-10-30 | 1993-05-25 | Whitlock Walter H | Mixture forming method and apparatus |
| US5704967A (en) * | 1995-10-13 | 1998-01-06 | Advanced Technology Materials, Inc. | Fluid storage and delivery system comprising high work capacity physical sorbent |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| KR20170063871A (ko) * | 2014-10-03 | 2017-06-08 | 엔테그리스, 아이엔씨. | 압력-조절 가스 공급 용기 |
| KR102277235B1 (ko) * | 2014-10-03 | 2021-07-13 | 엔테그리스, 아이엔씨. | 압력-조절 가스 공급 용기 |
| KR102132173B1 (ko) * | 2019-01-22 | 2020-07-10 | 주식회사 원익홀딩스 | 가스실린더의 가스공급장치용 캐비닛 |
Also Published As
| Publication number | Publication date |
|---|---|
| WO2001083084A1 (en) | 2001-11-08 |
| AU2001257439A1 (en) | 2001-11-12 |
| CN1204954C (zh) | 2005-06-08 |
| JP2003532034A (ja) | 2003-10-28 |
| EP1284806A1 (en) | 2003-02-26 |
| KR20030034065A (ko) | 2003-05-01 |
| CN1452507A (zh) | 2003-10-29 |
| EP1284806A4 (en) | 2006-03-15 |
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