JP2003505876A5 - - Google Patents
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- Publication number
- JP2003505876A5 JP2003505876A5 JP2001512586A JP2001512586A JP2003505876A5 JP 2003505876 A5 JP2003505876 A5 JP 2003505876A5 JP 2001512586 A JP2001512586 A JP 2001512586A JP 2001512586 A JP2001512586 A JP 2001512586A JP 2003505876 A5 JP2003505876 A5 JP 2003505876A5
- Authority
- JP
- Japan
- Prior art keywords
- glass
- doped
- reflective
- ultraviolet soft
- sio
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011521 glass Substances 0.000 description 93
- 238000001459 lithography Methods 0.000 description 40
- 229910004298 SiO 2 Inorganic materials 0.000 description 32
- 238000000034 method Methods 0.000 description 32
- 238000000576 coating method Methods 0.000 description 27
- 239000011248 coating agent Substances 0.000 description 26
- 230000005855 radiation Effects 0.000 description 23
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 20
- 239000000758 substrate Substances 0.000 description 17
- 238000005286 illumination Methods 0.000 description 13
- 238000004519 manufacturing process Methods 0.000 description 11
- 229910052681 coesite Inorganic materials 0.000 description 10
- 229910052906 cristobalite Inorganic materials 0.000 description 10
- 239000000377 silicon dioxide Substances 0.000 description 10
- 229910052682 stishovite Inorganic materials 0.000 description 10
- 229910052905 tridymite Inorganic materials 0.000 description 10
- 230000007547 defect Effects 0.000 description 7
- 239000000356 contaminant Substances 0.000 description 6
- 239000002994 raw material Substances 0.000 description 5
- 238000001816 cooling Methods 0.000 description 4
- 239000002019 doping agent Substances 0.000 description 4
- 230000001678 irradiating effect Effects 0.000 description 4
- 238000005498 polishing Methods 0.000 description 4
- 230000008901 benefit Effects 0.000 description 3
- 238000002310 reflectometry Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 230000003746 surface roughness Effects 0.000 description 3
- 229910010413 TiO 2 Inorganic materials 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000007730 finishing process Methods 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000009467 reduction Effects 0.000 description 2
- 239000004071 soot Substances 0.000 description 2
- 239000000126 substance Substances 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 1
- 229910052779 Neodymium Inorganic materials 0.000 description 1
- 238000000560 X-ray reflectometry Methods 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 229910052783 alkali metal Inorganic materials 0.000 description 1
- 150000001340 alkali metals Chemical class 0.000 description 1
- 229910052784 alkaline earth metal Inorganic materials 0.000 description 1
- 150000001342 alkaline earth metals Chemical class 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 239000002419 bulk glass Substances 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 239000002826 coolant Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 230000003111 delayed effect Effects 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- QEFYFXOXNSNQGX-UHFFFAOYSA-N neodymium atom Chemical compound [Nd] QEFYFXOXNSNQGX-UHFFFAOYSA-N 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 230000003647 oxidation Effects 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- 238000000206 photolithography Methods 0.000 description 1
- 230000008569 process Effects 0.000 description 1
- 238000012797 qualification Methods 0.000 description 1
- 238000007493 shaping process Methods 0.000 description 1
- 229910052724 xenon Inorganic materials 0.000 description 1
- FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 1
Applications Claiming Priority (7)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US14505799P | 1999-07-22 | 1999-07-22 | |
| US60/145,057 | 1999-07-22 | ||
| US14984099P | 1999-08-19 | 1999-08-19 | |
| US60/149,840 | 1999-08-19 | ||
| US15881399P | 1999-10-12 | 1999-10-12 | |
| US60/158,813 | 1999-10-12 | ||
| PCT/US2000/018798 WO2001008163A1 (en) | 1999-07-22 | 2000-07-10 | Extreme ultraviolet soft x-ray projection lithographic method system and lithography elements |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003505876A JP2003505876A (ja) | 2003-02-12 |
| JP2003505876A5 true JP2003505876A5 (enExample) | 2006-01-05 |
| JP3766802B2 JP3766802B2 (ja) | 2006-04-19 |
Family
ID=27386208
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001512586A Expired - Lifetime JP3766802B2 (ja) | 1999-07-22 | 2000-07-10 | 遠紫外軟ｘ線投影リソグラフィー法システムおよびリソグラフィーエレメント |
Country Status (6)
| Country | Link |
|---|---|
| US (2) | US6931097B1 (enExample) |
| EP (1) | EP1214718A4 (enExample) |
| JP (1) | JP3766802B2 (enExample) |
| KR (1) | KR100648355B1 (enExample) |
| AU (1) | AU6208300A (enExample) |
| WO (1) | WO2001008163A1 (enExample) |
Families Citing this family (41)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6931097B1 (en) | 1999-07-22 | 2005-08-16 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| FR2801113B1 (fr) * | 1999-11-15 | 2003-05-09 | Commissariat Energie Atomique | Procede d'obtention et source de rayonnement extreme ultra violet, application en lithographie |
| US6776006B2 (en) | 2000-10-13 | 2004-08-17 | Corning Incorporated | Method to avoid striae in EUV lithography mirrors |
| US8047023B2 (en) * | 2001-04-27 | 2011-11-01 | Corning Incorporated | Method for producing titania-doped fused silica glass |
| US6606883B2 (en) * | 2001-04-27 | 2003-08-19 | Corning Incorporated | Method for producing fused silica and doped fused silica glass |
| DE10139188A1 (de) * | 2001-08-16 | 2003-03-06 | Schott Glas | Glaskeramik für röntgenoptische Komponenten |
| US6997015B2 (en) | 2001-11-27 | 2006-02-14 | Corning Incorporated | EUV lithography glass structures formed by extrusion consolidation process |
| US6988377B2 (en) | 2001-11-27 | 2006-01-24 | Corning Incorporated | Method for making extreme ultraviolet lithography structures |
| US6829908B2 (en) | 2002-02-27 | 2004-12-14 | Corning Incorporated | Fabrication of inclusion free homogeneous glasses |
| US6832493B2 (en) | 2002-02-27 | 2004-12-21 | Corning Incorporated | High purity glass bodies formed by zero shrinkage casting |
| US7053017B2 (en) | 2002-03-05 | 2006-05-30 | Corning Incorporated | Reduced striae extreme ultraviolet elements |
| US7129010B2 (en) | 2002-08-02 | 2006-10-31 | Schott Ag | Substrates for in particular microlithography |
| DE10317662A1 (de) * | 2003-04-17 | 2004-11-18 | Carl Zeiss Smt Ag | Projektionsobjektiv, mikrolithographische Projektionsbelichtungsanlage und Verfahren zur Herstellung einer Halbleiterschaltung |
| AU2003229725A1 (en) | 2003-04-24 | 2004-11-19 | Carl Zeiss Smt Ag | Projection optical system |
| DE10319596A1 (de) * | 2003-05-02 | 2004-11-25 | Degussa Ag | Mehrkomponentenglas |
| JP4817844B2 (ja) | 2003-09-27 | 2011-11-16 | カール・ツァイス・エスエムティー・ゲーエムベーハー | ゼロ転移温度周辺の熱膨張係数に応じて温度の上昇に対する傾きの符号が異なる材料で構成されたミラーを備えたｅｕｖ投影レンズ |
| JP4492123B2 (ja) * | 2004-01-05 | 2010-06-30 | 旭硝子株式会社 | シリカガラス |
| DE102004024808B4 (de) | 2004-05-17 | 2006-11-09 | Heraeus Quarzglas Gmbh & Co. Kg | Quarzglasrohling für ein optisches Bauteil zur Übertragung extrem kurzwelliger ultravioletter Strahlung |
| US7450217B2 (en) * | 2005-01-12 | 2008-11-11 | Asml Netherlands B.V. | Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby |
| JP4506689B2 (ja) * | 2005-06-14 | 2010-07-21 | 旭硝子株式会社 | 予備研磨されたガラス基板表面を仕上げ加工する方法 |
| WO2007072890A1 (en) * | 2005-12-22 | 2007-06-28 | Asahi Glass Co., Ltd. | Glass substrate for mask blank and method of polishing for producing the same |
| JP2008100891A (ja) | 2006-10-20 | 2008-05-01 | Covalent Materials Corp | チタニア−シリカガラス |
| JP5332249B2 (ja) * | 2007-06-05 | 2013-11-06 | 旭硝子株式会社 | ガラス基板の研磨方法 |
| JP2009013048A (ja) * | 2007-06-06 | 2009-01-22 | Shin Etsu Chem Co Ltd | ナノインプリントモールド用チタニアドープ石英ガラス |
| JP5042714B2 (ja) | 2007-06-06 | 2012-10-03 | 信越化学工業株式会社 | ナノインプリントモールド用チタニアドープ石英ガラス |
| JP5314901B2 (ja) * | 2008-02-13 | 2013-10-16 | 国立大学法人東北大学 | シリカ・チタニアガラス及びその製造方法、線膨張係数測定方法 |
| JP5365247B2 (ja) * | 2008-02-25 | 2013-12-11 | 旭硝子株式会社 | ＴｉＯ２を含有するシリカガラスおよびそれを用いたリソグラフィ用光学部材 |
| DE102008002403A1 (de) * | 2008-06-12 | 2009-12-17 | Carl Zeiss Smt Ag | Verfahren zum Herstellen einer Mehrlagen-Beschichtung, optisches Element und optische Anordnung |
| JP2010135732A (ja) | 2008-08-01 | 2010-06-17 | Asahi Glass Co Ltd | Ｅｕｖマスクブランクス用基板 |
| US8713969B2 (en) * | 2009-08-31 | 2014-05-06 | Corning Incorporated | Tuning Tzc by the annealing of ultra low expansion glass |
| DE102009055119B4 (de) * | 2009-12-22 | 2017-07-13 | Carl Zeiss Smt Gmbh | Spiegelelement für die EUV-Lithographie und Herstellungsverfahren dafür |
| US8987155B2 (en) | 2012-08-30 | 2015-03-24 | Corning Incorporated | Niobium doped silica titania glass and method of preparation |
| TWI652541B (zh) * | 2012-12-28 | 2019-03-01 | 日商Ｈｏｙａ股份有限公司 | Method for manufacturing substrate for mask material, method for manufacturing substrate with multilayer reflective film, method for producing reflective mask material, and method for manufacturing semiconductor device |
| JP5992842B2 (ja) | 2013-01-24 | 2016-09-14 | 信越石英株式会社 | シリカチタニアガラスの製造方法及びシリカチタニアガラスの選別方法 |
| DE102013219808A1 (de) * | 2013-09-30 | 2015-04-02 | Heraeus Quarzglas Gmbh & Co. Kg | Spiegelblank für EUV Lithographie ohne Ausdehnung unter EUV-Bestrahlung |
| US9382151B2 (en) | 2014-01-31 | 2016-07-05 | Corning Incorporated | Low expansion silica-titania articles with a Tzc gradient by compositional variation |
| US20150239767A1 (en) | 2014-02-26 | 2015-08-27 | Corning Incorporated | HEAT TREATING SILICA-TITANIA GLASS TO INDUCE A Tzc GRADIENT |
| EP3224213B1 (en) | 2014-11-26 | 2022-03-23 | Corning Incorporated | Doped silica-titania glass having low expansivity and methods of making the same |
| WO2016154190A1 (en) | 2015-03-26 | 2016-09-29 | Corning Incorporated | Glass composite for use in extreme ultra-violet lithography |
| JP6069609B2 (ja) * | 2015-03-26 | 2017-02-01 | 株式会社リガク | 二重湾曲ｘ線集光素子およびその構成体、二重湾曲ｘ線分光素子およびその構成体の製造方法 |
| JP6597523B2 (ja) * | 2016-08-29 | 2019-10-30 | Ａｇｃ株式会社 | 多層膜付基板およびその製造方法 |
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|---|---|---|---|---|
| US2272342A (en) | 1934-08-27 | 1942-02-10 | Corning Glass Works | Method of making a transparent article of silica |
| BE438752A (enExample) | 1939-04-22 | |||
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| US3790654A (en) | 1971-11-09 | 1974-02-05 | Corning Glass Works | Extrusion method for forming thinwalled honeycomb structures |
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| FR2626082B1 (fr) | 1988-01-14 | 1991-10-18 | Commissariat Energie Atomique | Dispositif d'optique integree permettant de separer les composantes polarisees d'un champ electromagnetique guide et procede de realisation du dispositif |
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| US6199991B1 (en) | 1997-11-13 | 2001-03-13 | U.S. Philips Corporation | Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system |
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| US6548142B1 (en) | 1999-02-18 | 2003-04-15 | Corning Incorporated | Silica glass honeycomb structure from silica soot extrusion |
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| KR100647968B1 (ko) | 1999-07-22 | 2006-11-17 | 코닝 인코포레이티드 | 극 자외선 소프트 ｘ-선 투사 리소그라피 방법 및 마스크디바이스 |
| US6931097B1 (en) * | 1999-07-22 | 2005-08-16 | Corning Incorporated | Extreme ultraviolet soft x-ray projection lithographic method system and lithographic elements |
| EP1106582A3 (en) | 1999-12-10 | 2001-10-24 | Corning Incorporated | Silica soot and process for producing it |
| US6176588B1 (en) | 1999-12-14 | 2001-01-23 | Corning Incorporated | Low cost light weight mirror blank |
| US6368942B1 (en) | 2000-03-31 | 2002-04-09 | Euv Llc | Method for fabricating an ultra-low expansion mask blank having a crystalline silicon layer |
| EP1330679A4 (en) * | 2000-10-03 | 2006-09-06 | Corning Inc | PHOTOLITHOGRAPHIC PROCESSES AND SYSTEMS |
-
2000
- 2000-07-10 US US10/048,138 patent/US6931097B1/en not_active Ceased
- 2000-07-10 EP EP00948609A patent/EP1214718A4/en not_active Ceased
- 2000-07-10 JP JP2001512586A patent/JP3766802B2/ja not_active Expired - Lifetime
- 2000-07-10 AU AU62083/00A patent/AU6208300A/en not_active Abandoned
- 2000-07-10 KR KR1020027000877A patent/KR100648355B1/ko not_active Expired - Lifetime
- 2000-07-10 WO PCT/US2000/018798 patent/WO2001008163A1/en not_active Ceased
- 2000-07-10 US US11/880,425 patent/USRE41220E1/en not_active Expired - Lifetime
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