JP2003318180A5 - - Google Patents

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Publication number
JP2003318180A5
JP2003318180A5 JP2003100127A JP2003100127A JP2003318180A5 JP 2003318180 A5 JP2003318180 A5 JP 2003318180A5 JP 2003100127 A JP2003100127 A JP 2003100127A JP 2003100127 A JP2003100127 A JP 2003100127A JP 2003318180 A5 JP2003318180 A5 JP 2003318180A5
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JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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JP2003100127A
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JP2003318180A (ja
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Publication date
Priority claimed from US10/133,772 external-priority patent/US6759180B2/en
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Publication of JP2003318180A publication Critical patent/JP2003318180A/ja
Publication of JP2003318180A5 publication Critical patent/JP2003318180A5/ja
Pending legal-status Critical Current

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JP2003100127A 2002-04-23 2003-04-03 サブリソグラフィサイズの線および空間パターンを形成する方法 Pending JP2003318180A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/133,772 2002-04-23
US10/133,772 US6759180B2 (en) 2002-04-23 2002-04-23 Method of fabricating sub-lithographic sized line and space patterns for nano-imprinting lithography

Publications (2)

Publication Number Publication Date
JP2003318180A JP2003318180A (ja) 2003-11-07
JP2003318180A5 true JP2003318180A5 (ja) 2006-04-20

Family

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Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003100127A Pending JP2003318180A (ja) 2002-04-23 2003-04-03 サブリソグラフィサイズの線および空間パターンを形成する方法

Country Status (4)

Country Link
US (1) US6759180B2 (ja)
EP (1) EP1357433A3 (ja)
JP (1) JP2003318180A (ja)
CN (1) CN1453638A (ja)

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