JP2003243301A5 - - Google Patents
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- Publication number
- JP2003243301A5 JP2003243301A5 JP2003002557A JP2003002557A JP2003243301A5 JP 2003243301 A5 JP2003243301 A5 JP 2003243301A5 JP 2003002557 A JP2003002557 A JP 2003002557A JP 2003002557 A JP2003002557 A JP 2003002557A JP 2003243301 A5 JP2003243301 A5 JP 2003243301A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US10/040,375 | 2002-01-09 | ||
| US10/040,375 US7004715B2 (en) | 2002-01-09 | 2002-01-09 | Apparatus for transferring and loading a reticle with a robotic reticle end-effector |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2003243301A JP2003243301A (ja) | 2003-08-29 |
| JP2003243301A5 true JP2003243301A5 (enExample) | 2006-02-02 |
Family
ID=21910641
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2003002557A Pending JP2003243301A (ja) | 2002-01-09 | 2003-01-08 | ロボットのレチクル末端エフェクターを用いてレチクルを移動およびロードするための方法および装置 |
Country Status (7)
| Country | Link |
|---|---|
| US (2) | US7004715B2 (enExample) |
| EP (1) | EP1327913A3 (enExample) |
| JP (1) | JP2003243301A (enExample) |
| KR (1) | KR100891181B1 (enExample) |
| CN (1) | CN1295121C (enExample) |
| SG (1) | SG102066A1 (enExample) |
| TW (1) | TWI283799B (enExample) |
Families Citing this family (13)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7004715B2 (en) * | 2002-01-09 | 2006-02-28 | Asml Holding N.V. | Apparatus for transferring and loading a reticle with a robotic reticle end-effector |
| US6862817B1 (en) * | 2003-11-12 | 2005-03-08 | Asml Holding N.V. | Method and apparatus for kinematic registration of a reticle |
| KR101474572B1 (ko) * | 2006-06-19 | 2014-12-18 | 엔테그리스, 아이엔씨. | 레티클 스토리지 정화시스템 |
| NL1036673A1 (nl) * | 2008-04-09 | 2009-10-12 | Asml Holding Nv | Robot Position Calibration Tool (RPCT). |
| NL1036785A1 (nl) * | 2008-04-18 | 2009-10-20 | Asml Netherlands Bv | Rapid exchange device for lithography reticles. |
| US8145349B2 (en) | 2008-05-14 | 2012-03-27 | Formfactor, Inc. | Pre-aligner search |
| US8336188B2 (en) * | 2008-07-17 | 2012-12-25 | Formfactor, Inc. | Thin wafer chuck |
| JP5667620B2 (ja) * | 2009-04-06 | 2015-02-12 | エーエスエムエル ホールディング エヌ．ブイ． | パターニングデバイスをロードする方法、高速交換デバイス、及び、半導体デバイスを製造するためのシステム |
| CN102320472B (zh) * | 2011-06-03 | 2013-07-10 | 深圳市华星光电技术有限公司 | 基板传送系统及传送方法 |
| KR102270563B1 (ko) * | 2015-03-16 | 2021-06-30 | 주식회사 탑 엔지니어링 | 기판 이송 시스템 |
| WO2023205176A1 (en) * | 2022-04-18 | 2023-10-26 | Dextrous Robotics, Inc. | System and/or method for grasping objects |
| US12176228B2 (en) | 2022-04-20 | 2024-12-24 | Taiwan Semiconductor Manufacturing Co., Ltd. | High density semiconductor storage system |
| CN116088283B (zh) * | 2023-04-12 | 2023-06-30 | 深圳市龙图光罩股份有限公司 | 掩模版预校准方法、系统、电子设备以及可读存储介质 |
Family Cites Families (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4984953A (en) | 1987-02-20 | 1991-01-15 | Canon Kabushiki Kaisha | Plate-like article conveying system |
| DE69123279T2 (de) | 1990-04-06 | 1997-04-24 | Canon K.K., Tokio/Tokyo | Transportvorrichtung für Substrate und Verfahren zur Kontrolle |
| US5130747A (en) | 1990-09-28 | 1992-07-14 | Kabushiki Kaisha Toshiba | Carrier apparatus |
| EP0634787B1 (en) * | 1993-07-15 | 1997-05-02 | Applied Materials, Inc. | Subsrate tray and ceramic blade for semiconductor processing apparatus |
| US5980187A (en) | 1997-04-16 | 1999-11-09 | Kla-Tencor Corporation | Mechanism for transporting semiconductor-process masks |
| JPH1174182A (ja) * | 1997-08-28 | 1999-03-16 | Nikon Corp | マスク搬送装置及びマスクステージ |
| US6183026B1 (en) * | 1999-04-07 | 2001-02-06 | Gasonics International Corporation | End effector |
| EP1052546B1 (en) * | 1999-04-21 | 2004-09-15 | ASML Netherlands B.V. | Substrate handler for use in lithographic projection apparatus |
| EP1052547A3 (en) * | 1999-04-21 | 2002-07-31 | Asm Lithography B.V. | Mask-handling apparatus for lithographic projection apparatus |
| US6499777B1 (en) * | 1999-05-11 | 2002-12-31 | Matrix Integrated Systems, Inc. | End-effector with integrated cooling mechanism |
| JP3513437B2 (ja) * | 1999-09-01 | 2004-03-31 | キヤノン株式会社 | 基板管理方法及び半導体露光装置 |
| JP4689064B2 (ja) | 2000-03-30 | 2011-05-25 | キヤノン株式会社 | 露光装置およびデバイス製造方法 |
| JP4560182B2 (ja) | 2000-07-06 | 2010-10-13 | キヤノン株式会社 | 減圧処理装置、半導体製造装置およびデバイス製造方法 |
| JP2002050667A (ja) | 2000-08-04 | 2002-02-15 | Canon Inc | 基板搬送装置、半導体製造装置および半導体デバイス製造方法 |
| US6619903B2 (en) | 2001-08-10 | 2003-09-16 | Glenn M. Friedman | System and method for reticle protection and transport |
| US7004715B2 (en) * | 2002-01-09 | 2006-02-28 | Asml Holding N.V. | Apparatus for transferring and loading a reticle with a robotic reticle end-effector |
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2002
- 2002-01-09 US US10/040,375 patent/US7004715B2/en not_active Expired - Fee Related
- 2002-12-09 EP EP02027411A patent/EP1327913A3/en not_active Withdrawn
- 2002-12-18 TW TW091136538A patent/TWI283799B/zh not_active IP Right Cessation
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2003
- 2003-01-08 KR KR1020030000923A patent/KR100891181B1/ko not_active Expired - Fee Related
- 2003-01-08 JP JP2003002557A patent/JP2003243301A/ja active Pending
- 2003-01-09 CN CNB031010598A patent/CN1295121C/zh not_active Expired - Fee Related
- 2003-01-09 SG SG200300053A patent/SG102066A1/en unknown
-
2006
- 2006-01-24 US US11/337,439 patent/US7278817B2/en not_active Expired - Fee Related