JP2003243301A5 - - Google Patents

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Publication number
JP2003243301A5
JP2003243301A5 JP2003002557A JP2003002557A JP2003243301A5 JP 2003243301 A5 JP2003243301 A5 JP 2003243301A5 JP 2003002557 A JP2003002557 A JP 2003002557A JP 2003002557 A JP2003002557 A JP 2003002557A JP 2003243301 A5 JP2003243301 A5 JP 2003243301A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2003002557A
Other versions
JP2003243301A (ja
Filing date
Publication date
Priority claimed from US10/040,375 external-priority patent/US7004715B2/en
Application filed filed Critical
Publication of JP2003243301A publication Critical patent/JP2003243301A/ja
Publication of JP2003243301A5 publication Critical patent/JP2003243301A5/ja
Pending legal-status Critical Current

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JP2003002557A 2002-01-09 2003-01-08 ロボットのレチクル末端エフェクターを用いてレチクルを移動およびロードするための方法および装置 Pending JP2003243301A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10/040,375 2002-01-09
US10/040,375 US7004715B2 (en) 2002-01-09 2002-01-09 Apparatus for transferring and loading a reticle with a robotic reticle end-effector

Publications (2)

Publication Number Publication Date
JP2003243301A JP2003243301A (ja) 2003-08-29
JP2003243301A5 true JP2003243301A5 (ja) 2006-02-02

Family

ID=21910641

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2003002557A Pending JP2003243301A (ja) 2002-01-09 2003-01-08 ロボットのレチクル末端エフェクターを用いてレチクルを移動およびロードするための方法および装置

Country Status (7)

Country Link
US (2) US7004715B2 (ja)
EP (1) EP1327913A3 (ja)
JP (1) JP2003243301A (ja)
KR (1) KR100891181B1 (ja)
CN (1) CN1295121C (ja)
SG (1) SG102066A1 (ja)
TW (1) TWI283799B (ja)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7004715B2 (en) * 2002-01-09 2006-02-28 Asml Holding N.V. Apparatus for transferring and loading a reticle with a robotic reticle end-effector
US6862817B1 (en) * 2003-11-12 2005-03-08 Asml Holding N.V. Method and apparatus for kinematic registration of a reticle
EP2453310B1 (en) * 2006-06-19 2015-12-09 Entegris, Inc. System for purging reticle storage
NL1036673A1 (nl) * 2008-04-09 2009-10-12 Asml Holding Nv Robot Position Calibration Tool (RPCT).
NL1036785A1 (nl) * 2008-04-18 2009-10-20 Asml Netherlands Bv Rapid exchange device for lithography reticles.
US8145349B2 (en) * 2008-05-14 2012-03-27 Formfactor, Inc. Pre-aligner search
US8336188B2 (en) * 2008-07-17 2012-12-25 Formfactor, Inc. Thin wafer chuck
CN102365590B (zh) * 2009-04-06 2014-07-16 Asml控股股份有限公司 用于掩模板的快速交换装置中的共享的顺应性和掩模板平台
CN102320472B (zh) * 2011-06-03 2013-07-10 深圳市华星光电技术有限公司 基板传送系统及传送方法
KR102270563B1 (ko) * 2015-03-16 2021-06-30 주식회사 탑 엔지니어링 기판 이송 시스템
WO2023205176A1 (en) * 2022-04-18 2023-10-26 Dextrous Robotics, Inc. System and/or method for grasping objects
CN116088283B (zh) * 2023-04-12 2023-06-30 深圳市龙图光罩股份有限公司 掩模版预校准方法、系统、电子设备以及可读存储介质

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4984953A (en) 1987-02-20 1991-01-15 Canon Kabushiki Kaisha Plate-like article conveying system
EP0452041B1 (en) 1990-04-06 1996-11-27 Canon Kabushiki Kaisha Substrate conveying device and method of controlling the same
US5130747A (en) 1990-09-28 1992-07-14 Kabushiki Kaisha Toshiba Carrier apparatus
DE69402918T2 (de) * 1993-07-15 1997-08-14 Applied Materials Inc Substratfangvorrichtung und Keramikblatt für Halbleiterbearbeitungseinrichtung
US5980187A (en) 1997-04-16 1999-11-09 Kla-Tencor Corporation Mechanism for transporting semiconductor-process masks
JPH1174182A (ja) * 1997-08-28 1999-03-16 Nikon Corp マスク搬送装置及びマスクステージ
US6183026B1 (en) * 1999-04-07 2001-02-06 Gasonics International Corporation End effector
EP1052547A3 (en) * 1999-04-21 2002-07-31 Asm Lithography B.V. Mask-handling apparatus for lithographic projection apparatus
EP1052546B1 (en) * 1999-04-21 2004-09-15 ASML Netherlands B.V. Substrate handler for use in lithographic projection apparatus
US6499777B1 (en) * 1999-05-11 2002-12-31 Matrix Integrated Systems, Inc. End-effector with integrated cooling mechanism
JP3513437B2 (ja) * 1999-09-01 2004-03-31 キヤノン株式会社 基板管理方法及び半導体露光装置
JP4689064B2 (ja) * 2000-03-30 2011-05-25 キヤノン株式会社 露光装置およびデバイス製造方法
JP4560182B2 (ja) * 2000-07-06 2010-10-13 キヤノン株式会社 減圧処理装置、半導体製造装置およびデバイス製造方法
JP2002050667A (ja) 2000-08-04 2002-02-15 Canon Inc 基板搬送装置、半導体製造装置および半導体デバイス製造方法
US6619903B2 (en) 2001-08-10 2003-09-16 Glenn M. Friedman System and method for reticle protection and transport
US7004715B2 (en) 2002-01-09 2006-02-28 Asml Holding N.V. Apparatus for transferring and loading a reticle with a robotic reticle end-effector

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