JP2003204020A - 半導体装置 - Google Patents
半導体装置Info
- Publication number
- JP2003204020A JP2003204020A JP2002000174A JP2002000174A JP2003204020A JP 2003204020 A JP2003204020 A JP 2003204020A JP 2002000174 A JP2002000174 A JP 2002000174A JP 2002000174 A JP2002000174 A JP 2002000174A JP 2003204020 A JP2003204020 A JP 2003204020A
- Authority
- JP
- Japan
- Prior art keywords
- solder
- semiconductor device
- thickness
- back surface
- pattern
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000004065 semiconductor Substances 0.000 title claims abstract description 83
- 229910000679 solder Inorganic materials 0.000 claims abstract description 121
- 239000000758 substrate Substances 0.000 claims abstract description 41
- 239000010949 copper Substances 0.000 claims abstract description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 claims abstract description 14
- 229910052802 copper Inorganic materials 0.000 claims abstract description 14
- PMHQVHHXPFUNSP-UHFFFAOYSA-M copper(1+);methylsulfanylmethane;bromide Chemical compound Br[Cu].CSC PMHQVHHXPFUNSP-UHFFFAOYSA-M 0.000 claims abstract description 4
- 229910052751 metal Inorganic materials 0.000 claims description 5
- 239000002184 metal Substances 0.000 claims description 5
- 239000000853 adhesive Substances 0.000 claims description 4
- 230000001070 adhesive effect Effects 0.000 claims description 4
- 238000009413 insulation Methods 0.000 abstract 2
- PIGFYZPCRLYGLF-UHFFFAOYSA-N Aluminum nitride Chemical compound [Al]#N PIGFYZPCRLYGLF-UHFFFAOYSA-N 0.000 description 5
- 229910052581 Si3N4 Inorganic materials 0.000 description 4
- 238000000034 method Methods 0.000 description 4
- 230000002093 peripheral effect Effects 0.000 description 4
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 description 4
- 239000000463 material Substances 0.000 description 3
- 230000035939 shock Effects 0.000 description 3
- 238000005452 bending Methods 0.000 description 2
- 238000005219 brazing Methods 0.000 description 2
- 229910010293 ceramic material Inorganic materials 0.000 description 2
- 238000005336 cracking Methods 0.000 description 2
- 238000010438 heat treatment Methods 0.000 description 2
- 230000001771 impaired effect Effects 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 239000007769 metal material Substances 0.000 description 2
- 238000003916 acid precipitation Methods 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 230000017525 heat dissipation Effects 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 230000035882 stress Effects 0.000 description 1
- 238000005382 thermal cycling Methods 0.000 description 1
- 230000008646 thermal stress Effects 0.000 description 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/26—Layer connectors, e.g. plate connectors, solder or adhesive layers; Manufacturing methods related thereto
- H01L2224/31—Structure, shape, material or disposition of the layer connectors after the connecting process
- H01L2224/32—Structure, shape, material or disposition of the layer connectors after the connecting process of an individual layer connector
- H01L2224/321—Disposition
- H01L2224/32151—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/32221—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/32225—Disposition the layer connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
Landscapes
- Cooling Or The Like Of Semiconductors Or Solid State Devices (AREA)
- Cooling Or The Like Of Electrical Apparatus (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002000174A JP2003204020A (ja) | 2002-01-04 | 2002-01-04 | 半導体装置 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2002000174A JP2003204020A (ja) | 2002-01-04 | 2002-01-04 | 半導体装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
JP2003204020A true JP2003204020A (ja) | 2003-07-18 |
JP2003204020A5 JP2003204020A5 (enrdf_load_stackoverflow) | 2005-04-28 |
Family
ID=27640646
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP2002000174A Pending JP2003204020A (ja) | 2002-01-04 | 2002-01-04 | 半導体装置 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JP2003204020A (enrdf_load_stackoverflow) |
Cited By (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006202884A (ja) * | 2005-01-19 | 2006-08-03 | Fuji Electric Device Technology Co Ltd | 半導体装置およびその製造方法 |
JP2006282417A (ja) * | 2005-03-31 | 2006-10-19 | Dowa Mining Co Ltd | 金属−セラミックス接合基板 |
JP2006286897A (ja) * | 2005-03-31 | 2006-10-19 | Dowa Mining Co Ltd | 金属−セラミックス接合基板 |
JP2006332084A (ja) * | 2005-05-23 | 2006-12-07 | Fuji Electric Device Technology Co Ltd | 半導体装置の製造方法、および半導体装置 |
WO2007032486A1 (ja) * | 2005-09-15 | 2007-03-22 | Mitsubishi Materials Corporation | 絶縁回路基板および冷却シンク部付き絶縁回路基板 |
JP2007081201A (ja) * | 2005-09-15 | 2007-03-29 | Mitsubishi Materials Corp | 絶縁回路基板および冷却シンク部付き絶縁回路基板 |
JP2007081202A (ja) * | 2005-09-15 | 2007-03-29 | Mitsubishi Materials Corp | 絶縁回路基板および冷却シンク部付き絶縁回路基板 |
WO2007105361A1 (ja) * | 2006-03-08 | 2007-09-20 | Kabushiki Kaisha Toshiba | 電子部品モジュール |
JP2008124416A (ja) * | 2006-03-31 | 2008-05-29 | Hitachi Metals Ltd | セラミックス回路基板およびこれを用いた半導体モジュール |
JP2010283168A (ja) * | 2009-06-04 | 2010-12-16 | Honda Motor Co Ltd | 半導体装置 |
EP2265099A1 (en) * | 2009-06-04 | 2010-12-22 | Honda Motor Co., Ltd. | Semiconductor device and method of manufacturing the same |
JP2011199315A (ja) * | 2011-06-17 | 2011-10-06 | Dowa Holdings Co Ltd | 金属−セラミックス接合基板 |
JP2014030053A (ja) * | 2013-10-11 | 2014-02-13 | Honda Motor Co Ltd | 半導体装置における絶縁基板及び金属板の板厚設定方法 |
WO2014148478A1 (ja) * | 2013-03-18 | 2014-09-25 | 株式会社フジクラ | 積層構造体および半導体装置 |
KR20230166143A (ko) * | 2021-04-28 | 2023-12-06 | 센주긴조쿠고교 가부시키가이샤 | 적층 접합 재료, 반도체 패키지 및 파워 모듈 |
-
2002
- 2002-01-04 JP JP2002000174A patent/JP2003204020A/ja active Pending
Cited By (22)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2006202884A (ja) * | 2005-01-19 | 2006-08-03 | Fuji Electric Device Technology Co Ltd | 半導体装置およびその製造方法 |
JP2006282417A (ja) * | 2005-03-31 | 2006-10-19 | Dowa Mining Co Ltd | 金属−セラミックス接合基板 |
JP2006286897A (ja) * | 2005-03-31 | 2006-10-19 | Dowa Mining Co Ltd | 金属−セラミックス接合基板 |
JP2006332084A (ja) * | 2005-05-23 | 2006-12-07 | Fuji Electric Device Technology Co Ltd | 半導体装置の製造方法、および半導体装置 |
WO2007032486A1 (ja) * | 2005-09-15 | 2007-03-22 | Mitsubishi Materials Corporation | 絶縁回路基板および冷却シンク部付き絶縁回路基板 |
JP2007081201A (ja) * | 2005-09-15 | 2007-03-29 | Mitsubishi Materials Corp | 絶縁回路基板および冷却シンク部付き絶縁回路基板 |
JP2007081202A (ja) * | 2005-09-15 | 2007-03-29 | Mitsubishi Materials Corp | 絶縁回路基板および冷却シンク部付き絶縁回路基板 |
US8273993B2 (en) | 2006-03-08 | 2012-09-25 | Kabushiki Kaisha Toshiba | Electronic component module |
WO2007105361A1 (ja) * | 2006-03-08 | 2007-09-20 | Kabushiki Kaisha Toshiba | 電子部品モジュール |
JPWO2007105361A1 (ja) * | 2006-03-08 | 2009-07-30 | 株式会社東芝 | 電子部品モジュール |
US9214617B2 (en) | 2006-03-08 | 2015-12-15 | Kabushiki Kaisha Toshiba | Electronic component module |
JP2008124416A (ja) * | 2006-03-31 | 2008-05-29 | Hitachi Metals Ltd | セラミックス回路基板およびこれを用いた半導体モジュール |
JP2010283168A (ja) * | 2009-06-04 | 2010-12-16 | Honda Motor Co Ltd | 半導体装置 |
US8415801B2 (en) | 2009-06-04 | 2013-04-09 | Honda Motor Co., Ltd. | Semiconductor device having thermal endurance and method of manufacturing the same |
EP2265099A1 (en) * | 2009-06-04 | 2010-12-22 | Honda Motor Co., Ltd. | Semiconductor device and method of manufacturing the same |
JP2011199315A (ja) * | 2011-06-17 | 2011-10-06 | Dowa Holdings Co Ltd | 金属−セラミックス接合基板 |
WO2014148478A1 (ja) * | 2013-03-18 | 2014-09-25 | 株式会社フジクラ | 積層構造体および半導体装置 |
JP2014183128A (ja) * | 2013-03-18 | 2014-09-29 | Fujikura Ltd | 積層構造体および半導体装置 |
JP2014030053A (ja) * | 2013-10-11 | 2014-02-13 | Honda Motor Co Ltd | 半導体装置における絶縁基板及び金属板の板厚設定方法 |
KR20230166143A (ko) * | 2021-04-28 | 2023-12-06 | 센주긴조쿠고교 가부시키가이샤 | 적층 접합 재료, 반도체 패키지 및 파워 모듈 |
US12080671B2 (en) | 2021-04-28 | 2024-09-03 | Senju Metal Industry Co., Ltd. | Layered bonding material, semiconductor package, and power module |
KR102759830B1 (ko) * | 2021-04-28 | 2025-02-04 | 센주긴조쿠고교 가부시키가이샤 | 적층 접합 재료, 반도체 패키지 및 파워 모듈 |
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Legal Events
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