JP2003186195A5 - - Google Patents
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- Publication number
- JP2003186195A5 JP2003186195A5 JP2001383291A JP2001383291A JP2003186195A5 JP 2003186195 A5 JP2003186195 A5 JP 2003186195A5 JP 2001383291 A JP2001383291 A JP 2001383291A JP 2001383291 A JP2001383291 A JP 2001383291A JP 2003186195 A5 JP2003186195 A5 JP 2003186195A5
- Authority
- JP
- Japan
- Prior art keywords
- resist film
- excited
- compound
- component
- acid generated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000002253 acid Substances 0.000 claims 3
- 150000001875 compounds Chemical class 0.000 claims 2
- 239000000203 mixture Substances 0.000 claims 2
- 229920002120 photoresistant polymer Polymers 0.000 claims 2
- 125000003158 alcohol group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 239000007864 aqueous solution Substances 0.000 claims 1
- 238000004132 cross linking Methods 0.000 claims 1
- 239000003431 cross linking reagent Substances 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 230000005855 radiation Effects 0.000 claims 1
- 239000011347 resin Substances 0.000 claims 1
- 229920005989 resin Polymers 0.000 claims 1
- 239000002904 solvent Substances 0.000 claims 1
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001383291A JP3841398B2 (ja) | 2001-12-17 | 2001-12-17 | ネガ型レジスト組成物 |
| US10/319,493 US20030165772A1 (en) | 2001-12-17 | 2002-12-16 | Negative resist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001383291A JP3841398B2 (ja) | 2001-12-17 | 2001-12-17 | ネガ型レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003186195A JP2003186195A (ja) | 2003-07-03 |
| JP2003186195A5 true JP2003186195A5 (enExample) | 2005-04-07 |
| JP3841398B2 JP3841398B2 (ja) | 2006-11-01 |
Family
ID=27593385
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001383291A Expired - Fee Related JP3841398B2 (ja) | 2001-12-17 | 2001-12-17 | ネガ型レジスト組成物 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US20030165772A1 (enExample) |
| JP (1) | JP3841398B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7083892B2 (en) * | 2002-06-28 | 2006-08-01 | Fuji Photo Film Co., Ltd. | Resist composition |
| JP4396849B2 (ja) * | 2005-01-21 | 2010-01-13 | 信越化学工業株式会社 | ネガ型レジスト材料及びパターン形成方法 |
| JP5850863B2 (ja) | 2010-02-24 | 2016-02-03 | ビーエーエスエフ ソシエタス・ヨーロピアＢａｓｆ Ｓｅ | 潜在性酸及びそれらの使用 |
| WO2011139073A2 (ko) | 2010-05-04 | 2011-11-10 | 주식회사 엘지화학 | 네가티브 포토레지스트 조성물 및 소자의 패터닝 방법 |
| US20140194383A1 (en) | 2011-04-07 | 2014-07-10 | Cornell University | Monomers capable of dimerizing in an aqueous solution, and methods of using same |
| US9469941B2 (en) | 2011-07-01 | 2016-10-18 | Empire Technology Development Llc | Paraben derivatives for preserving cellulosic materials |
| JP2013175546A (ja) * | 2012-02-24 | 2013-09-05 | Dexerials Corp | アンダーフィル材、及びそれを用いた半導体装置の製造方法 |
| JP6313604B2 (ja) * | 2014-02-05 | 2018-04-18 | 富士フイルム株式会社 | 感活性光線性又は感放射線性樹脂組成物、感活性光線性又は感放射線性膜、感活性光線性又は感放射線性膜を備えたマスクブランクス、パターン形成方法、及び電子デバイスの製造方法 |
| US10345700B2 (en) * | 2014-09-08 | 2019-07-09 | International Business Machines Corporation | Negative-tone resist compositions and multifunctional polymers therein |
| EP3253735B1 (en) | 2015-02-02 | 2021-03-31 | Basf Se | Latent acids and their use |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH05287222A (ja) * | 1992-04-10 | 1993-11-02 | Kansai Paint Co Ltd | ポジ型感光性電着塗料組成物及びそれを用いる回路板の製造方法 |
-
2001
- 2001-12-17 JP JP2001383291A patent/JP3841398B2/ja not_active Expired - Fee Related
-
2002
- 2002-12-16 US US10/319,493 patent/US20030165772A1/en not_active Abandoned
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