JP2003161803A5 - - Google Patents
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- Publication number
- JP2003161803A5 JP2003161803A5 JP2001359618A JP2001359618A JP2003161803A5 JP 2003161803 A5 JP2003161803 A5 JP 2003161803A5 JP 2001359618 A JP2001359618 A JP 2001359618A JP 2001359618 A JP2001359618 A JP 2001359618A JP 2003161803 A5 JP2003161803 A5 JP 2003161803A5
- Authority
- JP
- Japan
- Prior art keywords
- manufacturing
- light
- thin film
- processed
- optical element
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000004519 manufacturing process Methods 0.000 claims 9
- 230000003287 optical effect Effects 0.000 claims 6
- 239000000758 substrate Substances 0.000 claims 5
- 239000010409 thin film Substances 0.000 claims 5
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 claims 3
- 230000001678 irradiating effect Effects 0.000 claims 2
- 238000000034 method Methods 0.000 claims 2
- WUKWITHWXAAZEY-UHFFFAOYSA-L calcium difluoride Chemical group [F-].[F-].[Ca+2] WUKWITHWXAAZEY-UHFFFAOYSA-L 0.000 claims 1
- 229910001634 calcium fluoride Inorganic materials 0.000 claims 1
- 239000002131 composite material Substances 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 238000005286 illumination Methods 0.000 claims 1
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 claims 1
- 229910052753 mercury Inorganic materials 0.000 claims 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359618A JP4006226B2 (ja) | 2001-11-26 | 2001-11-26 | 光学素子の製造方法、光学素子、露光装置及びデバイス製造方法及びデバイス |
| EP02258027A EP1316849A3 (en) | 2001-11-26 | 2002-11-21 | Method of removing color centers from film coated fluoride optical elements |
| US10/303,295 US20030108665A1 (en) | 2001-11-26 | 2002-11-25 | Optical element fabrication method, optical element, exposure apparatus, device fabrication method |
| US11/212,574 US7455880B2 (en) | 2001-11-26 | 2005-08-29 | Optical element fabrication method, optical element, exposure apparatus, device fabrication method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001359618A JP4006226B2 (ja) | 2001-11-26 | 2001-11-26 | 光学素子の製造方法、光学素子、露光装置及びデバイス製造方法及びデバイス |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003161803A JP2003161803A (ja) | 2003-06-06 |
| JP2003161803A5 true JP2003161803A5 (OSRAM) | 2005-07-07 |
| JP4006226B2 JP4006226B2 (ja) | 2007-11-14 |
Family
ID=19170589
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001359618A Expired - Fee Related JP4006226B2 (ja) | 2001-11-26 | 2001-11-26 | 光学素子の製造方法、光学素子、露光装置及びデバイス製造方法及びデバイス |
Country Status (3)
| Country | Link |
|---|---|
| US (2) | US20030108665A1 (OSRAM) |
| EP (1) | EP1316849A3 (OSRAM) |
| JP (1) | JP4006226B2 (OSRAM) |
Families Citing this family (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US20050018296A1 (en) * | 2003-07-24 | 2005-01-27 | Asml Holding Nv | Diffractive optical element and method of making same |
| US8149381B2 (en) | 2003-08-26 | 2012-04-03 | Nikon Corporation | Optical element and exposure apparatus |
| JP4474652B2 (ja) | 2003-08-26 | 2010-06-09 | 株式会社ニコン | 光学素子及び露光装置 |
| US6954256B2 (en) | 2003-08-29 | 2005-10-11 | Asml Netherlands B.V. | Gradient immersion lithography |
| EP2261740B1 (en) | 2003-08-29 | 2014-07-09 | ASML Netherlands BV | Lithographic apparatus |
| US7460206B2 (en) | 2003-12-19 | 2008-12-02 | Carl Zeiss Smt Ag | Projection objective for immersion lithography |
| CN100467117C (zh) * | 2005-09-05 | 2009-03-11 | 鸿富锦精密工业（深圳）有限公司 | 纳米粉体制备装置及制备方法 |
| JP5459896B2 (ja) * | 2007-03-05 | 2014-04-02 | 株式会社半導体エネルギー研究所 | 配線及び記憶素子の作製方法 |
| US8399069B2 (en) * | 2009-07-30 | 2013-03-19 | Canon Kabushiki Kaisha | Method of producing magnesium fluoride coating, antireflection coating, and optical element |
| DE102009037077B3 (de) | 2009-08-13 | 2011-02-17 | Carl Zeiss Smt Ag | Katadioptrisches Projektionsobjektiv |
| TWI512374B (zh) * | 2013-11-05 | 2015-12-11 | Au Optronics Corp | 光配向設備與光配向方法 |
| DE102021203505A1 (de) * | 2021-04-09 | 2022-10-13 | Carl Zeiss Smt Gmbh | Verfahren und Vorrichtung zum Abscheiden mindestens einer Schicht, optisches Element und optische Anordnung |
Family Cites Families (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4608272A (en) * | 1980-10-20 | 1986-08-26 | Northrop Corporation | Method of reducing optical coating absorptance |
| JPS60204640A (ja) * | 1984-03-28 | 1985-10-16 | Nuclear Fuel Ind Ltd | 放射線照射による着色ガラス製品の脱色再生方法 |
| US4641033A (en) * | 1984-12-19 | 1987-02-03 | Fusion Systems Corporation | Apparatus and method preventing radiation induced degradation of optical elements |
| JPH02166447A (ja) * | 1988-12-20 | 1990-06-27 | Fujitsu Ltd | 露光用マスクおよびその製造方法 |
| US5472748A (en) * | 1990-10-15 | 1995-12-05 | The United States Of America As Represented By The United States Department Of Energy | Permanent laser conditioning of thin film optical materials |
| US5796458A (en) * | 1992-09-01 | 1998-08-18 | Fujitsu Limited | Element division liquid crystal display device and its manufacturing method |
| US5512399A (en) * | 1993-09-21 | 1996-04-30 | Fuji Electric Co., Ltd. | Organic photo sensitive member for electrophotography |
| JPH07294705A (ja) | 1994-04-25 | 1995-11-10 | Canon Inc | 紫外線照射後処理方法 |
| JPH0817815A (ja) * | 1994-06-30 | 1996-01-19 | Toshiba Corp | 半導体デバイスの製造方法、半導体基板の処理方法、分析方法及び製造方法 |
| US5581499A (en) * | 1995-06-06 | 1996-12-03 | Hamamdjian; Gilbert | Micro information storage system |
| FR2742926B1 (fr) * | 1995-12-22 | 1998-02-06 | Alsthom Cge Alcatel | Procede et dispositif de preparation de faces de laser |
| US6261696B1 (en) * | 1996-03-22 | 2001-07-17 | Canon Kabushika Kaisha | Optical element with substrate containing fluorite as main ingredient, and method and apparatus for producing the optical element |
| JPH09324262A (ja) | 1996-06-06 | 1997-12-16 | Nikon Corp | フッ化物薄膜の製造方法及びフッ化物薄膜 |
| JP3345590B2 (ja) * | 1998-07-16 | 2002-11-18 | 株式会社アドバンテスト | 基板処理方法及び装置 |
| JP2000150343A (ja) | 1998-11-10 | 2000-05-30 | Nikon Corp | エキシマレーザ光学装置およびエキシマレーザ光学装置の透過率の回復方法 |
| EP1088795A4 (en) * | 1999-03-25 | 2004-03-31 | Asahi Glass Co Ltd | SYNTHETIC SILICA GLASS FOR OPTICAL ELEMENT, METHOD FOR MANUFACTURING AND USING THE SAME |
| EP1134303B1 (en) * | 2000-03-13 | 2010-06-09 | Canon Kabushiki Kaisha | Thin film production process |
| JP2001290001A (ja) | 2000-04-04 | 2001-10-19 | Canon Inc | レーザー照射による光学薄膜の製造方法 |
| US20020005990A1 (en) * | 2000-07-11 | 2002-01-17 | Nikon Corporation | Optical element formed with optical thin film and exposure apparatus |
| JP3619157B2 (ja) * | 2001-02-13 | 2005-02-09 | キヤノン株式会社 | 光学素子、該光学素子を有する露光装置、洗浄装置及び光学素子の洗浄方法 |
-
2001
- 2001-11-26 JP JP2001359618A patent/JP4006226B2/ja not_active Expired - Fee Related
-
2002
- 2002-11-21 EP EP02258027A patent/EP1316849A3/en not_active Ceased
- 2002-11-25 US US10/303,295 patent/US20030108665A1/en not_active Abandoned
-
2005
- 2005-08-29 US US11/212,574 patent/US7455880B2/en not_active Expired - Fee Related
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