JP2003130132A - 除振機構 - Google Patents

除振機構

Info

Publication number
JP2003130132A
JP2003130132A JP2001323386A JP2001323386A JP2003130132A JP 2003130132 A JP2003130132 A JP 2003130132A JP 2001323386 A JP2001323386 A JP 2001323386A JP 2001323386 A JP2001323386 A JP 2001323386A JP 2003130132 A JP2003130132 A JP 2003130132A
Authority
JP
Japan
Prior art keywords
coil spring
vibration
spring
guide
vibration isolation
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2001323386A
Other languages
English (en)
Japanese (ja)
Other versions
JP2003130132A5 (enExample
Inventor
Satoshi Watakari
佐登志 渡苅
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NEC Ameniplantex Ltd
Original Assignee
NEC Ameniplantex Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by NEC Ameniplantex Ltd filed Critical NEC Ameniplantex Ltd
Priority to JP2001323386A priority Critical patent/JP2003130132A/ja
Publication of JP2003130132A publication Critical patent/JP2003130132A/ja
Publication of JP2003130132A5 publication Critical patent/JP2003130132A5/ja
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/709—Vibration, e.g. vibration detection, compensation, suppression or isolation

Landscapes

  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Vibration Prevention Devices (AREA)
JP2001323386A 2001-10-22 2001-10-22 除振機構 Pending JP2003130132A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2001323386A JP2003130132A (ja) 2001-10-22 2001-10-22 除振機構

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2001323386A JP2003130132A (ja) 2001-10-22 2001-10-22 除振機構

Publications (2)

Publication Number Publication Date
JP2003130132A true JP2003130132A (ja) 2003-05-08
JP2003130132A5 JP2003130132A5 (enExample) 2005-07-14

Family

ID=19140280

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001323386A Pending JP2003130132A (ja) 2001-10-22 2001-10-22 除振機構

Country Status (1)

Country Link
JP (1) JP2003130132A (enExample)

Cited By (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2009031656A1 (ja) * 2007-09-07 2009-03-12 Nikon Corporation 吊り下げ装置及び露光装置
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US8905369B2 (en) 2011-09-09 2014-12-09 Mapper Lithography Ip B.V. Vibration isolation module and substrate processing system
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
CN106229440A (zh) * 2016-09-28 2016-12-14 东莞市联洲知识产权运营管理有限公司 一种新能源汽车用锂电池缓冲架装置
CN106374070A (zh) * 2016-09-28 2017-02-01 东莞市联洲知识产权运营管理有限公司 一种新能源汽车用锂电池自动调节缓冲通风装置
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
CN112025769A (zh) * 2020-09-02 2020-12-04 成都明杰科技有限公司 适用于精密测量机器人的减震台

Cited By (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9678437B2 (en) 2003-04-09 2017-06-13 Nikon Corporation Illumination optical apparatus having distribution changing member to change light amount and polarization member to set polarization in circumference direction
US9885959B2 (en) 2003-04-09 2018-02-06 Nikon Corporation Illumination optical apparatus having deflecting member, lens, polarization member to set polarization in circumference direction, and optical integrator
US9423698B2 (en) 2003-10-28 2016-08-23 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US9760014B2 (en) 2003-10-28 2017-09-12 Nikon Corporation Illumination optical apparatus and projection exposure apparatus
US10281632B2 (en) 2003-11-20 2019-05-07 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical member with optical rotatory power to rotate linear polarization direction
US9885872B2 (en) 2003-11-20 2018-02-06 Nikon Corporation Illumination optical apparatus, exposure apparatus, and exposure method with optical integrator and polarization member that changes polarization state of light
US10241417B2 (en) 2004-02-06 2019-03-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10007194B2 (en) 2004-02-06 2018-06-26 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US10234770B2 (en) 2004-02-06 2019-03-19 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US20130271945A1 (en) 2004-02-06 2013-10-17 Nikon Corporation Polarization-modulating element, illumination optical apparatus, exposure apparatus, and exposure method
US9891539B2 (en) 2005-05-12 2018-02-13 Nikon Corporation Projection optical system, exposure apparatus, and exposure method
WO2009031656A1 (ja) * 2007-09-07 2009-03-12 Nikon Corporation 吊り下げ装置及び露光装置
US10101666B2 (en) 2007-10-12 2018-10-16 Nikon Corporation Illumination optical apparatus, exposure apparatus, and device manufacturing method
US9857599B2 (en) 2007-10-24 2018-01-02 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9341954B2 (en) 2007-10-24 2016-05-17 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9678332B2 (en) 2007-11-06 2017-06-13 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
US8905369B2 (en) 2011-09-09 2014-12-09 Mapper Lithography Ip B.V. Vibration isolation module and substrate processing system
CN106374070A (zh) * 2016-09-28 2017-02-01 东莞市联洲知识产权运营管理有限公司 一种新能源汽车用锂电池自动调节缓冲通风装置
CN106229440A (zh) * 2016-09-28 2016-12-14 东莞市联洲知识产权运营管理有限公司 一种新能源汽车用锂电池缓冲架装置
CN112025769A (zh) * 2020-09-02 2020-12-04 成都明杰科技有限公司 适用于精密测量机器人的减震台

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