JP2003076020A5 - - Google Patents
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- Publication number
- JP2003076020A5 JP2003076020A5 JP2001271992A JP2001271992A JP2003076020A5 JP 2003076020 A5 JP2003076020 A5 JP 2003076020A5 JP 2001271992 A JP2001271992 A JP 2001271992A JP 2001271992 A JP2001271992 A JP 2001271992A JP 2003076020 A5 JP2003076020 A5 JP 2003076020A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- chemically amplified
- amplified resist
- resist composition
- hydrogen atom
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 description 9
- 125000003118 aryl group Chemical group 0.000 description 8
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 6
- 125000003710 aryl alkyl group Chemical group 0.000 description 5
- 239000011347 resin Substances 0.000 description 5
- 229920005989 resin Polymers 0.000 description 5
- 125000001424 substituent group Chemical group 0.000 description 5
- 125000004432 carbon atom Chemical group C* 0.000 description 4
- 125000000217 alkyl group Chemical group 0.000 description 3
- 125000000753 cycloalkyl group Chemical group 0.000 description 3
- 239000002253 acid Substances 0.000 description 2
- 125000003342 alkenyl group Chemical group 0.000 description 2
- 125000004450 alkenylene group Chemical group 0.000 description 2
- 125000003545 alkoxy group Chemical group 0.000 description 2
- 125000002947 alkylene group Chemical group 0.000 description 2
- 125000000732 arylene group Chemical group 0.000 description 2
- 125000004093 cyano group Chemical group *C#N 0.000 description 2
- 125000002993 cycloalkylene group Chemical group 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
- 125000005647 linker group Chemical group 0.000 description 2
- 125000000547 substituted alkyl group Chemical group 0.000 description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
- XLLXMBCBJGATSP-UHFFFAOYSA-N 2-phenylethenol Chemical compound OC=CC1=CC=CC=C1 XLLXMBCBJGATSP-UHFFFAOYSA-N 0.000 description 1
- 150000007945 N-acyl ureas Chemical group 0.000 description 1
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 1
- 125000002252 acyl group Chemical group 0.000 description 1
- 125000003302 alkenyloxy group Chemical group 0.000 description 1
- 150000001408 amides Chemical group 0.000 description 1
- 125000004104 aryloxy group Chemical group 0.000 description 1
- 150000007514 bases Chemical class 0.000 description 1
- 150000001875 compounds Chemical class 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 239000003431 cross linking reagent Substances 0.000 description 1
- 125000006165 cyclic alkyl group Chemical group 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 150000002148 esters Chemical group 0.000 description 1
- 125000001033 ether group Chemical group 0.000 description 1
- 125000001188 haloalkyl group Chemical group 0.000 description 1
- 238000000034 method Methods 0.000 description 1
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 1
- JESXATFQYMPTNL-UHFFFAOYSA-N mono-hydroxyphenyl-ethylene Natural products OC1=CC=CC=C1C=C JESXATFQYMPTNL-UHFFFAOYSA-N 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 description 1
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 description 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001271992A JP4486768B2 (ja) | 2001-09-07 | 2001-09-07 | ネガ型電子線又はｘ線用化学増幅レジスト組成物 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001271992A JP4486768B2 (ja) | 2001-09-07 | 2001-09-07 | ネガ型電子線又はｘ線用化学増幅レジスト組成物 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003076020A JP2003076020A (ja) | 2003-03-14 |
| JP2003076020A5 true JP2003076020A5 (enExample) | 2006-01-19 |
| JP4486768B2 JP4486768B2 (ja) | 2010-06-23 |
Family
ID=19097425
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001271992A Expired - Lifetime JP4486768B2 (ja) | 2001-09-07 | 2001-09-07 | ネガ型電子線又はｘ線用化学増幅レジスト組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4486768B2 (enExample) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2007049593A1 (ja) * | 2005-10-25 | 2007-05-03 | Mitsubishi Rayon Co., Ltd. | レジスト用重合体、レジスト組成物、パターンが形成された基板の製造方法、重合性モノマー、および重合性モノマーの製造方法 |
| JP5148090B2 (ja) * | 2005-11-16 | 2013-02-20 | 信越化学工業株式会社 | レジスト材料及びこれを用いたパターン形成方法 |
| JP5358369B2 (ja) * | 2009-09-18 | 2013-12-04 | 富士フイルム株式会社 | レジストパターン形成方法及びそれに用いられる現像液 |
| JP5630181B2 (ja) * | 2010-03-05 | 2014-11-26 | 大日本印刷株式会社 | ネガ型レジスト組成物、当該レジスト組成物を用いたレリーフパターンの製造方法及びフォトマスクの製造方法 |
-
2001
- 2001-09-07 JP JP2001271992A patent/JP4486768B2/ja not_active Expired - Lifetime
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