JP2003048984A5 - - Google Patents

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Publication number
JP2003048984A5
JP2003048984A5 JP2002095177A JP2002095177A JP2003048984A5 JP 2003048984 A5 JP2003048984 A5 JP 2003048984A5 JP 2002095177 A JP2002095177 A JP 2002095177A JP 2002095177 A JP2002095177 A JP 2002095177A JP 2003048984 A5 JP2003048984 A5 JP 2003048984A5
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JP
Japan
Prior art keywords
hydroxyphenyl
alkyl
formula
monomer
silsesquioxane
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2002095177A
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English (en)
Japanese (ja)
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JP2003048984A (ja
JP4557487B2 (ja
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Publication date
Priority claimed from US09/821,527 external-priority patent/US6731857B2/en
Application filed filed Critical
Publication of JP2003048984A publication Critical patent/JP2003048984A/ja
Publication of JP2003048984A5 publication Critical patent/JP2003048984A5/ja
Application granted granted Critical
Publication of JP4557487B2 publication Critical patent/JP4557487B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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JP2002095177A 2001-03-29 2002-03-29 ウェーブガイドおよび組成物 Expired - Lifetime JP4557487B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/821,527 US6731857B2 (en) 2001-03-29 2001-03-29 Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
US09/821527 2001-03-29

Publications (3)

Publication Number Publication Date
JP2003048984A JP2003048984A (ja) 2003-02-21
JP2003048984A5 true JP2003048984A5 (https=) 2005-09-15
JP4557487B2 JP4557487B2 (ja) 2010-10-06

Family

ID=25233613

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2002095177A Expired - Lifetime JP4557487B2 (ja) 2001-03-29 2002-03-29 ウェーブガイドおよび組成物

Country Status (7)

Country Link
US (1) US6731857B2 (https=)
EP (1) EP1251155B1 (https=)
JP (1) JP4557487B2 (https=)
KR (1) KR100831937B1 (https=)
CN (1) CN1277886C (https=)
DE (1) DE60208628T2 (https=)
TW (1) TW593603B (https=)

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US6731857B2 (en) * 2001-03-29 2004-05-04 Shipley Company, L.L.C. Photodefinable composition, method of manufacturing an optical waveguide with the photodefinable composition, and optical waveguide formed therefrom
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US7373060B2 (en) * 2005-02-28 2008-05-13 Chisso Corporation Optical waveguide using polymer composed of silsesquioxane derivative
JP4762630B2 (ja) * 2005-08-03 2011-08-31 東京応化工業株式会社 レジスト組成物およびレジストパターン形成方法
US20070202435A1 (en) * 2005-12-29 2007-08-30 Rohm And Haas Electronic Materials Llc Methods of forming optical waveguides
JP5586820B2 (ja) * 2006-07-21 2014-09-10 東京応化工業株式会社 高屈折率材料
EP1950587B1 (en) * 2006-12-31 2017-11-08 Rohm and Haas Electronic Materials LLC Methods of forming printed circuit boards having embedded optical waveguides
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