JP2003012400A5 - - Google Patents
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- Publication number
- JP2003012400A5 JP2003012400A5 JP2001195954A JP2001195954A JP2003012400A5 JP 2003012400 A5 JP2003012400 A5 JP 2003012400A5 JP 2001195954 A JP2001195954 A JP 2001195954A JP 2001195954 A JP2001195954 A JP 2001195954A JP 2003012400 A5 JP2003012400 A5 JP 2003012400A5
- Authority
- JP
- Japan
- Prior art keywords
- group iii
- reaction vessel
- substance containing
- nitride crystal
- metal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
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- 239000013078 crystal Substances 0.000 description 14
- 150000004767 nitrides Chemical class 0.000 description 13
- 239000000126 substance Substances 0.000 description 13
- 229910052751 metal Inorganic materials 0.000 description 11
- 239000002184 metal Substances 0.000 description 11
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 8
- 239000002994 raw material Substances 0.000 description 6
- 239000007788 liquid Substances 0.000 description 4
- 229910052757 nitrogen Inorganic materials 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 3
- 150000001340 alkali metals Chemical class 0.000 description 3
- 238000004519 manufacturing process Methods 0.000 description 3
- 239000000463 material Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000004065 semiconductor Substances 0.000 description 3
- 238000002109 crystal growth method Methods 0.000 description 2
- QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 2
- GYHNNYVSQQEPJS-UHFFFAOYSA-N Gallium Chemical compound [Ga] GYHNNYVSQQEPJS-UHFFFAOYSA-N 0.000 description 1
- 229910052733 gallium Inorganic materials 0.000 description 1
Priority Applications (4)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001195954A JP4640899B2 (ja) | 2001-06-28 | 2001-06-28 | Iii族窒化物結晶成長装置 |
| US10/134,895 US7001457B2 (en) | 2001-05-01 | 2002-04-30 | Crystal growth method, crystal growth apparatus, group-III nitride crystal and group-III nitride semiconductor device |
| US11/302,128 US7531038B2 (en) | 2001-05-01 | 2005-12-14 | Crystal growth method |
| US12/353,608 US8623138B2 (en) | 2001-05-01 | 2009-01-14 | Crystal growth apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001195954A JP4640899B2 (ja) | 2001-06-28 | 2001-06-28 | Iii族窒化物結晶成長装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2003012400A JP2003012400A (ja) | 2003-01-15 |
| JP2003012400A5 true JP2003012400A5 (enExample) | 2006-10-19 |
| JP4640899B2 JP4640899B2 (ja) | 2011-03-02 |
Family
ID=19033845
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001195954A Expired - Fee Related JP4640899B2 (ja) | 2001-05-01 | 2001-06-28 | Iii族窒化物結晶成長装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP4640899B2 (enExample) |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7261775B2 (en) | 2003-01-29 | 2007-08-28 | Ricoh Company, Ltd. | Methods of growing a group III nitride crystal |
| JP4049723B2 (ja) | 2003-09-04 | 2008-02-20 | 沖電気工業株式会社 | 窒化物半導体素子の製造方法及び窒化物半導体素子の製造装置 |
| JP4522836B2 (ja) * | 2004-12-08 | 2010-08-11 | 株式会社リコー | Iii族窒化物結晶製造方法及びiii族窒化物結晶成長装置 |
| JP4603498B2 (ja) | 2005-03-14 | 2010-12-22 | 株式会社リコー | Iii族窒化物結晶の製造方法及び製造装置 |
| TW200706710A (en) | 2005-05-12 | 2007-02-16 | Ricoh Co Ltd | Process for producing group iii element nitride crystal, apparatus for producing group iii element nitride crystal, and group iii element nitride crystal |
| JP4856934B2 (ja) | 2005-11-21 | 2012-01-18 | 株式会社リコー | GaN結晶 |
| US20070215034A1 (en) | 2006-03-14 | 2007-09-20 | Hirokazu Iwata | Crystal preparing device, crystal preparing method, and crystal |
| JP2010254495A (ja) * | 2009-04-22 | 2010-11-11 | Ihi Corp | 基板製造装置 |
| KR102673843B1 (ko) * | 2021-08-30 | 2024-06-11 | 에임즈마이크론 주식회사 | 수위 조절식 갈륨 메탈 보트를 구비한 질화갈륨 단결정 레이어 제조 장치 |
| KR102489127B1 (ko) * | 2021-11-10 | 2023-01-13 | 신정훈 | 질화갈륨 단결정 성장을 위한 하이드라이드 기상 증착 장비 |
| WO2024111688A1 (ko) * | 2022-11-22 | 2024-05-30 | 신정훈 | 질화갈륨 단결정 성장을 위한 하이드라이드 기상 증착 장비 |
| KR102774123B1 (ko) | 2023-06-02 | 2025-03-04 | 주식회사 비투지홀딩스 | 질화갈륨 단결정 성장을 위한 하이드라이드 기상 증착 장비의 갈륨 공급 장치 및 이를 포함하는 하이드라이드 기상 증착 장비 |
| KR102805527B1 (ko) | 2023-06-28 | 2025-05-12 | 주식회사 비투지홀딩스 | 질화갈륨 단결정 성장을 위한 하이드라이드 기상 증착 장비의 부산물 처리 장치 및 이를 포함하는 하이드라이드 기상 증착 장비 |
| KR20250016978A (ko) | 2023-07-26 | 2025-02-04 | 주식회사 비투지 | Ⅲ족 원소 질화물의 성장을 위한 hvpe 장치 |
Family Cites Families (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH062518B2 (ja) * | 1984-04-26 | 1994-01-12 | 株式会社島津製作所 | 流体クロマトグラフ用定量送液装置 |
| JP3929657B2 (ja) * | 1999-09-29 | 2007-06-13 | 株式会社リコー | 結晶成長方法およびiii族窒化物結晶の製造方法 |
| JP2001009016A (ja) * | 1999-06-30 | 2001-01-16 | Toshiba Lighting & Technology Corp | 光触媒清浄ユニットおよび空気清浄機ならびに発光ダイオード |
-
2001
- 2001-06-28 JP JP2001195954A patent/JP4640899B2/ja not_active Expired - Fee Related
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