|
IL141803A0
(en)
|
1998-09-23 |
2002-03-10 |
Du Pont |
Photoresists, polymers and processes for microlithography
|
|
US6849377B2
(en)
|
1998-09-23 |
2005-02-01 |
E. I. Du Pont De Nemours And Company |
Photoresists, polymers and processes for microlithography
|
|
AU4811800A
(en)
|
1999-05-04 |
2000-11-17 |
E.I. Du Pont De Nemours And Company |
Polyfluorinated epoxides and associated polymers and processes
|
|
US6468712B1
(en)
|
2000-02-25 |
2002-10-22 |
Massachusetts Institute Of Technology |
Resist materials for 157-nm lithography
|
|
JP4923376B2
(ja)
*
|
2000-04-04 |
2012-04-25 |
ダイキン工業株式会社 |
酸反応性基を有する新規なフッ素ポリマーおよびそれを用いた化学増幅型フォトレジスト組成物
|
|
SG100729A1
(en)
*
|
2000-06-16 |
2003-12-26 |
Jsr Corp |
Radiation-sensitive resin composition
|
|
WO2001098834A1
(en)
|
2000-06-21 |
2001-12-27 |
Asahi Glass Company, Limited |
Resist composition
|
|
JP4190167B2
(ja)
|
2000-09-26 |
2008-12-03 |
富士フイルム株式会社 |
ポジ型レジスト組成物
|
|
AU2001296737A1
(en)
|
2000-10-12 |
2002-04-22 |
North Carolina State University |
Co2-processes photoresists, polymers, and photoactive compounds for microlithography
|
|
KR20040004429A
(ko)
*
|
2000-11-09 |
2004-01-13 |
이 아이 듀폰 디 네모아 앤드 캄파니 |
미세리쏘그래피용 포토레지스트 조성물의 광산 발생제
|
|
CN1498360A
(zh)
*
|
2000-11-29 |
2004-05-19 |
纳幕尔杜邦公司 |
聚合物掺混物及其在用于微细光刻的光刻胶组合物中的应用
|
|
KR20040012689A
(ko)
*
|
2000-11-29 |
2004-02-11 |
이 아이 듀폰 디 네모아 앤드 캄파니 |
포토레지스트 조성물을 함유하는 다층 엘레멘트 및 이들의미세석판인쇄에서의 용도
|
|
US6469220B2
(en)
*
|
2000-12-25 |
2002-10-22 |
Shin-Etsu Chemical Co., Ltd. |
Tertiary alcohol compounds having an alicyclic structure
|
|
EP1365290B1
(en)
|
2001-02-09 |
2007-11-21 |
Asahi Glass Company Ltd. |
Resist composition
|
|
US6794109B2
(en)
|
2001-02-23 |
2004-09-21 |
Massachusetts Institute Of Technology |
Low abosorbing resists for 157 nm lithography
|
|
WO2002066526A1
(en)
*
|
2001-02-23 |
2002-08-29 |
Daikin Industries, Ltd. |
Ethylenic fluoromonomer containing hydroxyl or fluoroalkylcarbonyl group and fluoropolymer obtained by polymerizing the same
|
|
US6787286B2
(en)
|
2001-03-08 |
2004-09-07 |
Shipley Company, L.L.C. |
Solvents and photoresist compositions for short wavelength imaging
|
|
TWI226973B
(en)
|
2001-03-19 |
2005-01-21 |
Fuji Photo Film Co Ltd |
Positive resist composition
|
|
EP1377879A2
(en)
*
|
2001-03-22 |
2004-01-07 |
Shipley Company LLC |
Photoresist compositions comprising solvents for short wavelength imaging
|
|
JP2005508512A
(ja)
*
|
2001-03-22 |
2005-03-31 |
ローム・アンド・ハース・エレクトロニック・マテリアルズ，エル．エル．シー． |
フォトレジスト組成物
|
|
US6858379B2
(en)
|
2001-03-22 |
2005-02-22 |
Shipley Company, L.L.C. |
Photoresist compositions for short wavelength imaging
|
|
KR100583297B1
(ko)
|
2001-04-27 |
2006-05-24 |
미쓰이 가가쿠 가부시키가이샤 |
불소 함유 시클로올레핀 중합체, 이들의 시클로올레핀단량체, 이 중합체의 제조방법 및 이 중합체의 용도
|
|
US6936398B2
(en)
*
|
2001-05-09 |
2005-08-30 |
Massachusetts Institute Of Technology |
Resist with reduced line edge roughness
|
|
US6686429B2
(en)
|
2001-05-11 |
2004-02-03 |
Clariant Finance (Bvi) Limited |
Polymer suitable for photoresist compositions
|
|
US6737215B2
(en)
|
2001-05-11 |
2004-05-18 |
Clariant Finance (Bvi) Ltd |
Photoresist composition for deep ultraviolet lithography
|
|
US6958123B2
(en)
|
2001-06-15 |
2005-10-25 |
Reflectivity, Inc |
Method for removing a sacrificial material with a compressed fluid
|
|
DE10131144B4
(de)
*
|
2001-06-28 |
2006-01-19 |
Infineon Technologies Ag |
Verstärkung von Resiststrukturen aus fluorierten Resistpolymeren durch strukturelles Aufwachsen der Strukturen mittels gezieltem chemischem Anbinden von fluorierten Oligomeren
|
|
KR20040030799A
(ko)
*
|
2001-07-12 |
2004-04-09 |
가부시끼가이샤 한도따이 센단 테크놀로지스 |
미세 패턴 형성 방법
|
|
KR100493015B1
(ko)
*
|
2001-08-25 |
2005-06-07 |
삼성전자주식회사 |
감광성 폴리머 및 이를 포함하는 포토레지스트 조성물
|
|
JP4856826B2
(ja)
*
|
2001-08-30 |
2012-01-18 |
株式会社ダイセル |
ビニルエーテル化合物の製造法
|
|
JPWO2003036390A1
(ja)
*
|
2001-10-03 |
2005-02-17 |
株式会社半導体先端テクノロジーズ |
微細パターン形成方法
|
|
KR20050039699A
(ko)
*
|
2001-10-26 |
2005-04-29 |
이 아이 듀폰 디 네모아 앤드 캄파니 |
에스테르기를 갖는 플루오르화 중합체 및마이크로리소그래피용 포토레지스트
|
|
US6723488B2
(en)
|
2001-11-07 |
2004-04-20 |
Clariant Finance (Bvi) Ltd |
Photoresist composition for deep UV radiation containing an additive
|
|
JP2003186198A
(ja)
*
|
2001-12-19 |
2003-07-03 |
Sony Corp |
レジスト材料及び露光方法
|
|
JP2003186197A
(ja)
*
|
2001-12-19 |
2003-07-03 |
Sony Corp |
レジスト材料及び露光方法
|
|
US6800416B2
(en)
*
|
2002-01-09 |
2004-10-05 |
Clariant Finance (Bvi) Ltd. |
Negative deep ultraviolet photoresist
|
|
JP3841400B2
(ja)
|
2002-02-26 |
2006-11-01 |
富士写真フイルム株式会社 |
ポジ型レジスト組成物
|
|
TW200403522A
(en)
*
|
2002-03-01 |
2004-03-01 |
Shipley Co Llc |
Photoresist compositions
|
|
TW200401164A
(en)
|
2002-03-01 |
2004-01-16 |
Shipley Co Llc |
Photoresist compositions
|
|
CN1639640A
(zh)
*
|
2002-03-01 |
2005-07-13 |
E·I·内穆尔杜邦公司 |
用于显微平版印刷的氟化共聚物
|
|
JP4010160B2
(ja)
|
2002-03-04 |
2007-11-21 |
旭硝子株式会社 |
レジスト組成物
|
|
US7211365B2
(en)
*
|
2002-03-04 |
2007-05-01 |
Shipley Company, L.L.C. |
Negative photoresists for short wavelength imaging
|
|
GB0207134D0
(en)
|
2002-03-27 |
2002-05-08 |
Cambridge Display Tech Ltd |
Method of preparation of organic optoelectronic and electronic devices and devices thereby obtained
|
|
TWI307819B
(en)
|
2002-05-28 |
2009-03-21 |
Arch Spec Chem Inc |
Acetal protected polymers and photoresist compositions thereof
|
|
KR100955454B1
(ko)
*
|
2002-05-31 |
2010-04-29 |
후지필름 가부시키가이샤 |
포지티브 레지스트 조성물
|
|
US6806026B2
(en)
|
2002-05-31 |
2004-10-19 |
International Business Machines Corporation |
Photoresist composition
|
|
US20030235775A1
(en)
|
2002-06-13 |
2003-12-25 |
Munirathna Padmanaban |
Photoresist composition for deep ultraviolet lithography comprising a mixture of photoactive compounds
|
|
AU2003254112A1
(en)
*
|
2002-07-26 |
2004-02-16 |
E. I. Du Pont De Nemours And Company |
Fluorinated polymers, photoresists and processes for microlithography
|
|
AU2003259728A1
(en)
*
|
2002-08-09 |
2004-02-25 |
E. I. Du Pont De Nemours And Company |
Fluorinated monomers, fluorinated polymers having polycyclic groups with fused 4-membered heterocyclic rings, useful as photoresists, and processes for microlithography
|
|
AU2003259951A1
(en)
|
2002-08-19 |
2004-03-03 |
E.I. Du Pont De Nemours And Company |
Fluorinated polymers useful as photoresists, and processes for microlithography
|
|
US7022457B2
(en)
*
|
2002-10-03 |
2006-04-04 |
E. I. Du Pont De Nemours And Company |
Photoresists with hydroxylated, photoacid-cleavable groups
|
|
WO2004041760A2
(en)
*
|
2002-11-05 |
2004-05-21 |
Honeywell International Inc. |
Fluorinated polymers
|
|
CN1711291A
(zh)
|
2002-11-07 |
2005-12-21 |
旭硝子株式会社 |
含氟聚合物
|
|
US7264913B2
(en)
|
2002-11-21 |
2007-09-04 |
Az Electronic Materials Usa Corp. |
Antireflective compositions for photoresists
|
|
JP2006335774A
(ja)
*
|
2003-01-15 |
2006-12-14 |
Daikin Ind Ltd |
レジスト用含フッ素重合体の製造方法
|
|
EP1597627A4
(en)
*
|
2003-02-20 |
2008-01-09 |
Promerus Llc |
RESOLUTION SPEED MODULATORS FOR PHOTORESISTAL COMPOSITIONS
|
|
US6919160B2
(en)
|
2003-02-20 |
2005-07-19 |
Air Products And Chemicals, Inc. |
Acrylic compounds for sub-200 nm photoresist compositions and methods for making and using same
|
|
US20040166434A1
(en)
|
2003-02-21 |
2004-08-26 |
Dammel Ralph R. |
Photoresist composition for deep ultraviolet lithography
|
|
US7029832B2
(en)
|
2003-03-11 |
2006-04-18 |
Samsung Electronics Co., Ltd. |
Immersion lithography methods using carbon dioxide
|
|
JP4166598B2
(ja)
|
2003-03-12 |
2008-10-15 |
富士フイルム株式会社 |
ポジ型レジスト組成物
|
|
WO2004088428A1
(ja)
*
|
2003-03-28 |
2004-10-14 |
Tokyo Ohka Kogyo Co. Ltd. |
ホトレジスト組成物及びそれを用いたレジストパターン形成方法
|
|
JP2005099646A
(ja)
*
|
2003-03-28 |
2005-04-14 |
Tokyo Ohka Kogyo Co Ltd |
液浸露光プロセス用レジスト組成物および該レジスト組成物を用いたレジストパターン形成方法
|
|
US7150957B2
(en)
*
|
2003-04-25 |
2006-12-19 |
International Business Machines Corporation |
Fluorinated vinyl ethers, copolymers thereof, and use in lithographic photoresist compositions
|
|
JP4386710B2
(ja)
|
2003-04-28 |
2009-12-16 |
東京応化工業株式会社 |
ホトレジスト組成物、該ホトレジスト組成物用低分子化合物および高分子化合物
|
|
US7138550B2
(en)
|
2003-08-04 |
2006-11-21 |
Air Products And Chemicals, Inc. |
Bridged carbocyclic compounds and methods of making and using same
|
|
JP2005055697A
(ja)
*
|
2003-08-05 |
2005-03-03 |
Fuji Photo Film Co Ltd |
ポジ型レジスト組成物及びそれを用いたパターン形成方法
|
|
JP4383810B2
(ja)
*
|
2003-09-10 |
2009-12-16 |
信越化学工業株式会社 |
含フッ素重合性環状オレフィン化合物
|
|
US7408013B2
(en)
|
2003-09-23 |
2008-08-05 |
Commonwealth Scientific And Industrial Research Organization |
Low-polydispersity photoimageable polymers and photoresists and processes for microlithography
|
|
US7473512B2
(en)
|
2004-03-09 |
2009-01-06 |
Az Electronic Materials Usa Corp. |
Process of imaging a deep ultraviolet photoresist with a top coating and materials thereof
|
|
US7081511B2
(en)
|
2004-04-05 |
2006-07-25 |
Az Electronic Materials Usa Corp. |
Process for making polyesters
|
|
WO2005118656A2
(en)
|
2004-05-20 |
2005-12-15 |
E.I. Dupont De Nemours And Company |
Photoresists comprising polymers derived from fluoroalcohol-substituted polycyclic monomers
|
|
JP4551701B2
(ja)
*
|
2004-06-14 |
2010-09-29 |
富士フイルム株式会社 |
液浸露光用保護膜形成組成物及びそれを用いたパターン形成方法
|
|
US7691556B2
(en)
|
2004-09-15 |
2010-04-06 |
Az Electronic Materials Usa Corp. |
Antireflective compositions for photoresists
|
|
US7595141B2
(en)
|
2004-10-26 |
2009-09-29 |
Az Electronic Materials Usa Corp. |
Composition for coating over a photoresist pattern
|
|
KR100893515B1
(ko)
*
|
2004-11-15 |
2009-04-16 |
도오꾜오까고오교 가부시끼가이샤 |
레지스트 패턴의 형성 방법
|
|
US7358035B2
(en)
*
|
2005-06-23 |
2008-04-15 |
International Business Machines Corporation |
Topcoat compositions and methods of use thereof
|
|
US7553905B2
(en)
|
2005-10-31 |
2009-06-30 |
Az Electronic Materials Usa Corp. |
Anti-reflective coatings
|
|
JP2007131704A
(ja)
|
2005-11-09 |
2007-05-31 |
Fujifilm Corp |
環状オレフィン系重合体、およびそれを用いた光学材料、偏光板および液晶表示装置
|
|
US20070191560A1
(en)
*
|
2006-02-13 |
2007-08-16 |
Kipp Brian E |
Norbornenylmethyl fluoroalkyl ethers
|
|
JP5430821B2
(ja)
|
2006-09-19 |
2014-03-05 |
東京応化工業株式会社 |
レジストパターン形成方法
|
|
US7923200B2
(en)
|
2007-04-09 |
2011-04-12 |
Az Electronic Materials Usa Corp. |
Composition for coating over a photoresist pattern comprising a lactam
|
|
JP4280301B2
(ja)
|
2007-05-31 |
2009-06-17 |
パナソニック株式会社 |
有機ｅｌ素子、およびその製造方法
|
|
US7745077B2
(en)
|
2008-06-18 |
2010-06-29 |
Az Electronic Materials Usa Corp. |
Composition for coating over a photoresist pattern
|
|
WO2010140301A1
(ja)
|
2009-06-04 |
2010-12-09 |
パナソニック株式会社 |
有機ｅｌディスプレイパネルおよびその製造方法
|
|
JP4951151B2
(ja)
|
2009-06-29 |
2012-06-13 |
パナソニック株式会社 |
有機ｅｌディスプレイパネル
|
|
JP4990425B1
(ja)
|
2010-12-20 |
2012-08-01 |
パナソニック株式会社 |
有機ｅｌディスプレイパネル及びその製造方法
|
|
US9746776B2
(en)
*
|
2014-11-25 |
2017-08-29 |
E I Du Pont De Nemours And Company |
Low surface energy photoresist composition and process
|
|
CN111155349A
(zh)
*
|
2020-01-09 |
2020-05-15 |
浙江理工大学 |
一种负性光刻胶用纤维素基成膜树脂的制备方法
|
|
CN121079290A
(zh)
|
2023-04-27 |
2025-12-05 |
默克专利股份有限公司 |
光活性化合物
|