JP2002532828A - プラズマ発生のための中空の陰極のアレー - Google Patents

プラズマ発生のための中空の陰極のアレー

Info

Publication number
JP2002532828A
JP2002532828A JP2000587353A JP2000587353A JP2002532828A JP 2002532828 A JP2002532828 A JP 2002532828A JP 2000587353 A JP2000587353 A JP 2000587353A JP 2000587353 A JP2000587353 A JP 2000587353A JP 2002532828 A JP2002532828 A JP 2002532828A
Authority
JP
Japan
Prior art keywords
plasma
cathode assembly
cells
assembly
cell
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000587353A
Other languages
English (en)
Japanese (ja)
Inventor
チエン，ジー−ホング・エリク
リン，テイオ−ジーン
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EI Du Pont de Nemours and Co
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JP2002532828A publication Critical patent/JP2002532828A/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
JP2000587353A 1998-12-07 1999-12-06 プラズマ発生のための中空の陰極のアレー Pending JP2002532828A (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11111698P 1998-12-07 1998-12-07
US60/111,116 1998-12-07
PCT/US1999/028841 WO2000034979A1 (en) 1998-12-07 1999-12-06 Hollow cathode array for plasma generation

Publications (1)

Publication Number Publication Date
JP2002532828A true JP2002532828A (ja) 2002-10-02

Family

ID=22336697

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000587353A Pending JP2002532828A (ja) 1998-12-07 1999-12-06 プラズマ発生のための中空の陰極のアレー

Country Status (8)

Country Link
EP (1) EP1141996A1 (zh)
JP (1) JP2002532828A (zh)
KR (1) KR20010101137A (zh)
CN (1) CN1331836A (zh)
AU (1) AU1842200A (zh)
CA (1) CA2348653A1 (zh)
TW (1) TW470995B (zh)
WO (1) WO2000034979A1 (zh)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012038682A (ja) * 2010-08-11 2012-02-23 Tokyo Electron Ltd プラズマ処理装置及びプラズマ制御方法

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10120405B4 (de) * 2001-04-25 2008-08-21 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas
KR20040022639A (ko) * 2002-09-09 2004-03-16 주식회사 네오바이오텍 탄소계 물질 박막 형성방법
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
SE529058C2 (sv) 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning, användning av en plasmakirurgisk anordning och förfarande för att bilda ett plasma
SE529056C2 (sv) 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning
SE529053C2 (sv) 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning
JP4984285B2 (ja) * 2007-01-23 2012-07-25 独立行政法人産業技術総合研究所 高密度プラズマ処理装置
US8742282B2 (en) * 2007-04-16 2014-06-03 General Electric Company Ablative plasma gun
US8735766B2 (en) 2007-08-06 2014-05-27 Plasma Surgical Investments Limited Cathode assembly and method for pulsed plasma generation
WO2009018838A1 (en) * 2007-08-06 2009-02-12 Plasma Surgical Investments Limited Cathode assembly and method for pulsed plasma generation
US8613742B2 (en) 2010-01-29 2013-12-24 Plasma Surgical Investments Limited Methods of sealing vessels using plasma
US9089319B2 (en) 2010-07-22 2015-07-28 Plasma Surgical Investments Limited Volumetrically oscillating plasma flows
DE102012201956A1 (de) * 2012-02-09 2013-08-14 Krones Ag Hohlkathoden-Gaslanze für die Innenbeschichtung von Behältern
KR101506305B1 (ko) * 2012-12-17 2015-03-26 한국생산기술연구원 중공관 단위체로 구성된 음극을 포함하는 질화처리용 플라즈마 장치 및 그를 이용한 플라즈마 질화처리 방법
CN103730320B (zh) * 2013-12-23 2016-09-28 苏州市奥普斯等离子体科技有限公司 一种微空心阴极等离子体处理装置
WO2016048323A1 (en) * 2014-09-25 2016-03-31 Apple Inc. Durable 3d geometry conformal anti-reflection coating
WO2022047227A2 (en) 2020-08-28 2022-03-03 Plasma Surgical Investments Limited Systems, methods, and devices for generating predominantly radially expanded plasma flow

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637853A (en) * 1985-07-29 1987-01-20 International Business Machines Corporation Hollow cathode enhanced plasma for high rate reactive ion etching and deposition
JPS644481A (en) * 1987-06-24 1989-01-09 Minoru Sugawara Parallel-plate discharge electrode
JPH0266941A (ja) * 1988-08-31 1990-03-07 Nec Corp エッチング装置
SE503260C2 (sv) * 1992-06-15 1996-04-29 Akerlund & Rausing Ab Förfarande för framställning av en barriärfilm medelst plasmabehandling
EP0634778A1 (en) * 1993-07-12 1995-01-18 The Boc Group, Inc. Hollow cathode array
DE19755902C1 (de) * 1997-12-08 1999-05-12 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Vergüten von Oberflächen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2012038682A (ja) * 2010-08-11 2012-02-23 Tokyo Electron Ltd プラズマ処理装置及びプラズマ制御方法
US8829387B2 (en) 2010-08-11 2014-09-09 Tokyo Electron Limited Plasma processing apparatus having hollow electrode on periphery and plasma control method

Also Published As

Publication number Publication date
WO2000034979A1 (en) 2000-06-15
CA2348653A1 (en) 2000-06-15
EP1141996A1 (en) 2001-10-10
KR20010101137A (ko) 2001-11-14
CN1331836A (zh) 2002-01-16
AU1842200A (en) 2000-06-26
TW470995B (en) 2002-01-01

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