KR20010101137A - 플라즈마 생성을 위한 중공 음극 어레이 - Google Patents

플라즈마 생성을 위한 중공 음극 어레이 Download PDF

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Publication number
KR20010101137A
KR20010101137A KR1020017007066A KR20017007066A KR20010101137A KR 20010101137 A KR20010101137 A KR 20010101137A KR 1020017007066 A KR1020017007066 A KR 1020017007066A KR 20017007066 A KR20017007066 A KR 20017007066A KR 20010101137 A KR20010101137 A KR 20010101137A
Authority
KR
South Korea
Prior art keywords
negative electrode
electrode assembly
plasma
cells
array
Prior art date
Application number
KR1020017007066A
Other languages
English (en)
Korean (ko)
Inventor
에릭 첸지-홍
린띠아우-진
Original Assignee
메리 이. 보울러
이 아이 듀폰 디 네모아 앤드 캄파니
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 메리 이. 보울러, 이 아이 듀폰 디 네모아 앤드 캄파니 filed Critical 메리 이. 보울러
Publication of KR20010101137A publication Critical patent/KR20010101137A/ko

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00—Gas-filled discharge tubes with solid cathode
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32532—Electrodes
    • H01J37/32596—Hollow cathodes

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
KR1020017007066A 1998-12-07 1999-12-06 플라즈마 생성을 위한 중공 음극 어레이 KR20010101137A (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US11111698P 1998-12-07 1998-12-07
US60/111,116 1998-12-07
PCT/US1999/028841 WO2000034979A1 (en) 1998-12-07 1999-12-06 Hollow cathode array for plasma generation

Publications (1)

Publication Number Publication Date
KR20010101137A true KR20010101137A (ko) 2001-11-14

Family

ID=22336697

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020017007066A KR20010101137A (ko) 1998-12-07 1999-12-06 플라즈마 생성을 위한 중공 음극 어레이

Country Status (8)

Country Link
EP (1) EP1141996A1 (zh)
JP (1) JP2002532828A (zh)
KR (1) KR20010101137A (zh)
CN (1) CN1331836A (zh)
AU (1) AU1842200A (zh)
CA (1) CA2348653A1 (zh)
TW (1) TW470995B (zh)
WO (1) WO2000034979A1 (zh)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101415415B1 (ko) * 2007-04-16 2014-07-04 제너럴 일렉트릭 캄파니 융삭 플라즈마 건
KR101506305B1 (ko) * 2012-12-17 2015-03-26 한국생산기술연구원 중공관 단위체로 구성된 음극을 포함하는 질화처리용 플라즈마 장치 및 그를 이용한 플라즈마 질화처리 방법

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10120405B4 (de) * 2001-04-25 2008-08-21 Je Plasmaconsult Gmbh Vorrichtung zur Erzeugung eines Niedertemperatur-Plasmas
KR20040022639A (ko) * 2002-09-09 2004-03-16 주식회사 네오바이오텍 탄소계 물질 박막 형성방법
DE10256663B3 (de) * 2002-12-04 2005-10-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Gasentladungslampe für EUV-Strahlung
SE529056C2 (sv) 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning
SE529058C2 (sv) 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning, användning av en plasmakirurgisk anordning och förfarande för att bilda ett plasma
SE529053C2 (sv) 2005-07-08 2007-04-17 Plasma Surgical Invest Ltd Plasmaalstrande anordning, plasmakirurgisk anordning och användning av en plasmakirurgisk anordning
JP4984285B2 (ja) * 2007-01-23 2012-07-25 独立行政法人産業技術総合研究所 高密度プラズマ処理装置
ES2458515T3 (es) * 2007-08-06 2014-05-05 Plasma Surgical Investments Limited Conjunto de cátodo y método de generación de plasma pulsado
US8735766B2 (en) 2007-08-06 2014-05-27 Plasma Surgical Investments Limited Cathode assembly and method for pulsed plasma generation
US8613742B2 (en) 2010-01-29 2013-12-24 Plasma Surgical Investments Limited Methods of sealing vessels using plasma
US9089319B2 (en) 2010-07-22 2015-07-28 Plasma Surgical Investments Limited Volumetrically oscillating plasma flows
JP5702968B2 (ja) * 2010-08-11 2015-04-15 東京エレクトロン株式会社 プラズマ処理装置及びプラズマ制御方法
DE102012201956A1 (de) * 2012-02-09 2013-08-14 Krones Ag Hohlkathoden-Gaslanze für die Innenbeschichtung von Behältern
CN103730320B (zh) * 2013-12-23 2016-09-28 苏州市奥普斯等离子体科技有限公司 一种微空心阴极等离子体处理装置
US20160093477A1 (en) 2014-09-25 2016-03-31 Apple Inc. Durable 3d geometry conformal anti-reflection coating
WO2022047227A2 (en) 2020-08-28 2022-03-03 Plasma Surgical Investments Limited Systems, methods, and devices for generating predominantly radially expanded plasma flow

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4637853A (en) * 1985-07-29 1987-01-20 International Business Machines Corporation Hollow cathode enhanced plasma for high rate reactive ion etching and deposition
JPS644481A (en) * 1987-06-24 1989-01-09 Minoru Sugawara Parallel-plate discharge electrode
JPH0266941A (ja) * 1988-08-31 1990-03-07 Nec Corp エッチング装置
SE503260C2 (sv) * 1992-06-15 1996-04-29 Akerlund & Rausing Ab Förfarande för framställning av en barriärfilm medelst plasmabehandling
EP0634778A1 (en) * 1993-07-12 1995-01-18 The Boc Group, Inc. Hollow cathode array
DE19755902C1 (de) * 1997-12-08 1999-05-12 Fraunhofer Ges Forschung Verfahren und Vorrichtung zum Vergüten von Oberflächen

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR101415415B1 (ko) * 2007-04-16 2014-07-04 제너럴 일렉트릭 캄파니 융삭 플라즈마 건
KR101506305B1 (ko) * 2012-12-17 2015-03-26 한국생산기술연구원 중공관 단위체로 구성된 음극을 포함하는 질화처리용 플라즈마 장치 및 그를 이용한 플라즈마 질화처리 방법

Also Published As

Publication number Publication date
CN1331836A (zh) 2002-01-16
CA2348653A1 (en) 2000-06-15
EP1141996A1 (en) 2001-10-10
TW470995B (en) 2002-01-01
JP2002532828A (ja) 2002-10-02
AU1842200A (en) 2000-06-26
WO2000034979A1 (en) 2000-06-15

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