JP2002511905A5 - - Google Patents

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JP2002511905A5
JP2002511905A5 JP1999505915A JP50591599A JP2002511905A5 JP 2002511905 A5 JP2002511905 A5 JP 2002511905A5 JP 1999505915 A JP1999505915 A JP 1999505915A JP 50591599 A JP50591599 A JP 50591599A JP 2002511905 A5 JP2002511905 A5 JP 2002511905A5
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Japan
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JP1999505915A
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JP2002511905A (ja
JP4153048B2 (ja
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JP50591599A 1997-06-30 1998-06-30 プラズマ処理装置のガス噴射システム Expired - Lifetime JP4153048B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US08/885,353 1997-06-30
US08/885,353 US6013155A (en) 1996-06-28 1997-06-30 Gas injection system for plasma processing
PCT/US1998/013777 WO1999000532A1 (en) 1997-06-30 1998-06-30 Gas injection system for plasma processing apparatus

Publications (3)

Publication Number Publication Date
JP2002511905A JP2002511905A (ja) 2002-04-16
JP2002511905A5 true JP2002511905A5 (enExample) 2005-12-22
JP4153048B2 JP4153048B2 (ja) 2008-09-17

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JP50591599A Expired - Lifetime JP4153048B2 (ja) 1997-06-30 1998-06-30 プラズマ処理装置のガス噴射システム

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US (1) US6013155A (enExample)
EP (1) EP1017876B1 (enExample)
JP (1) JP4153048B2 (enExample)
AT (1) ATE291104T1 (enExample)
DE (1) DE69829390T2 (enExample)
TW (1) TW514672B (enExample)
WO (1) WO1999000532A1 (enExample)

Families Citing this family (171)

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