JP2002363123A5 - - Google Patents
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- JP2002363123A5 JP2002363123A5 JP2002094756A JP2002094756A JP2002363123A5 JP 2002363123 A5 JP2002363123 A5 JP 2002363123A5 JP 2002094756 A JP2002094756 A JP 2002094756A JP 2002094756 A JP2002094756 A JP 2002094756A JP 2002363123 A5 JP2002363123 A5 JP 2002363123A5
- Authority
- JP
- Japan
- Prior art keywords
- group
- formula
- ring
- photoactive compound
- compound according
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- 150000001875 compounds Chemical class 0.000 claims 27
- 125000005647 linker group Chemical group 0.000 claims 10
- 125000002947 alkylene group Chemical group 0.000 claims 9
- 125000004419 alkynylene group Chemical group 0.000 claims 9
- 239000011342 resin composition Substances 0.000 claims 9
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 8
- 125000005708 carbonyloxy group Chemical group [*:2]OC([*:1])=O 0.000 claims 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims 8
- 125000005843 halogen group Chemical group 0.000 claims 8
- 125000005740 oxycarbonyl group Chemical group [*:1]OC([*:2])=O 0.000 claims 8
- 125000006239 protecting group Chemical group 0.000 claims 8
- 229910052710 silicon Inorganic materials 0.000 claims 8
- 239000010703 silicon Substances 0.000 claims 8
- 125000004450 alkenylene group Chemical group 0.000 claims 7
- 125000002993 cycloalkylene group Chemical group 0.000 claims 7
- 230000002209 hydrophobic effect Effects 0.000 claims 7
- 125000005702 oxyalkylene group Chemical group 0.000 claims 7
- 125000005103 alkyl silyl group Chemical group 0.000 claims 6
- 125000005529 alkyleneoxy group Chemical group 0.000 claims 6
- 239000011347 resin Substances 0.000 claims 6
- 229920005989 resin Polymers 0.000 claims 6
- 125000000217 alkyl group Chemical group 0.000 claims 5
- 125000002029 aromatic hydrocarbon group Chemical group 0.000 claims 5
- 125000000732 arylene group Chemical group 0.000 claims 5
- 239000002585 base Substances 0.000 claims 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 claims 5
- 125000001183 hydrocarbyl group Chemical group 0.000 claims 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 claims 5
- 125000000472 sulfonyl group Chemical group *S(*)(=O)=O 0.000 claims 5
- 125000002723 alicyclic group Chemical group 0.000 claims 4
- 125000003545 alkoxy group Chemical group 0.000 claims 4
- 125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 claims 4
- 239000003795 chemical substances by application Substances 0.000 claims 4
- VPWNQTHUCYMVMZ-UHFFFAOYSA-N 4,4'-sulfonyldiphenol Chemical class C1=CC(O)=CC=C1S(=O)(=O)C1=CC=C(O)C=C1 VPWNQTHUCYMVMZ-UHFFFAOYSA-N 0.000 claims 3
- 229930185605 Bisphenol Natural products 0.000 claims 3
- 125000004183 alkoxy alkyl group Chemical group 0.000 claims 3
- 125000004453 alkoxycarbonyl group Chemical group 0.000 claims 3
- 125000003368 amide group Chemical group 0.000 claims 3
- 125000003118 aryl group Chemical group 0.000 claims 3
- 125000000623 heterocyclic group Chemical group 0.000 claims 3
- 125000000101 thioether group Chemical group 0.000 claims 3
- XSQUKJJJFZCRTK-UHFFFAOYSA-N urea group Chemical group NC(=O)N XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 claims 3
- JOYRKODLDBILNP-UHFFFAOYSA-N urethane group Chemical group NC(=O)OCC JOYRKODLDBILNP-UHFFFAOYSA-N 0.000 claims 3
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims 2
- 239000002253 acid Substances 0.000 claims 2
- 125000003342 alkenyl group Chemical group 0.000 claims 2
- 125000000304 alkynyl group Chemical group 0.000 claims 2
- 150000004945 aromatic hydrocarbons Chemical group 0.000 claims 2
- 125000003710 aryl alkyl group Chemical group 0.000 claims 2
- 125000003917 carbamoyl group Chemical group [H]N([H])C(*)=O 0.000 claims 2
- 125000001033 ether group Chemical group 0.000 claims 2
- 125000005027 hydroxyaryl group Chemical group 0.000 claims 2
- 239000003504 photosensitizing agent Substances 0.000 claims 2
- 239000000758 substrate Substances 0.000 claims 2
- 125000004454 (C1-C6) alkoxycarbonyl group Chemical group 0.000 claims 1
- 125000004169 (C1-C6) alkyl group Chemical group 0.000 claims 1
- 125000004916 (C1-C6) alkylcarbonyl group Chemical group 0.000 claims 1
- PTBCCLLVPOLXES-UHFFFAOYSA-N 2-[9-(2-hydroxyphenyl)fluoren-9-yl]phenol Chemical class OC1=CC=CC=C1C1(C=2C(=CC=CC=2)O)C2=CC=CC=C2C2=CC=CC=C21 PTBCCLLVPOLXES-UHFFFAOYSA-N 0.000 claims 1
- -1 N-substituted carbamoyl group Chemical group 0.000 claims 1
- 125000002252 acyl group Chemical group 0.000 claims 1
- 150000001335 aliphatic alkanes Chemical class 0.000 claims 1
- 125000001931 aliphatic group Chemical group 0.000 claims 1
- 239000003513 alkali Substances 0.000 claims 1
- 125000005115 alkyl carbamoyl group Chemical group 0.000 claims 1
- 150000001408 amides Chemical class 0.000 claims 1
- 125000005116 aryl carbamoyl group Chemical group 0.000 claims 1
- 150000001602 bicycloalkyls Chemical group 0.000 claims 1
- 229920001577 copolymer Polymers 0.000 claims 1
- 125000004122 cyclic group Chemical group 0.000 claims 1
- 150000001924 cycloalkanes Chemical class 0.000 claims 1
- 230000008030 elimination Effects 0.000 claims 1
- 238000003379 elimination reaction Methods 0.000 claims 1
- 125000004185 ester group Chemical group 0.000 claims 1
- 125000003983 fluorenyl group Chemical group C1(=CC=CC=2C3=CC=CC=C3CC12)* 0.000 claims 1
- 238000010438 heat treatment Methods 0.000 claims 1
- 125000001165 hydrophobic group Chemical group 0.000 claims 1
- 125000000686 lactone group Chemical group 0.000 claims 1
- 238000000034 method Methods 0.000 claims 1
- 239000000178 monomer Substances 0.000 claims 1
- 125000001820 oxy group Chemical group [*:1]O[*:2] 0.000 claims 1
- 125000004430 oxygen atom Chemical group O* 0.000 claims 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims 1
- REQCZEXYDRLIBE-UHFFFAOYSA-N procainamide Chemical compound CCN(CC)CCNC(=O)C1=CC=C(N)C=C1 REQCZEXYDRLIBE-UHFFFAOYSA-N 0.000 claims 1
- 125000001424 substituent group Chemical group 0.000 claims 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2002094756A JP2002363123A (ja) | 2001-03-29 | 2002-03-29 | 光活性化合物および感光性樹脂組成物 |
Applications Claiming Priority (5)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001-97019 | 2001-03-29 | ||
| JP2001097019 | 2001-03-29 | ||
| JP2001-97020 | 2001-03-29 | ||
| JP2001097020 | 2001-03-29 | ||
| JP2002094756A JP2002363123A (ja) | 2001-03-29 | 2002-03-29 | 光活性化合物および感光性樹脂組成物 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002363123A JP2002363123A (ja) | 2002-12-18 |
| JP2002363123A5 true JP2002363123A5 (enExample) | 2005-09-15 |
Family
ID=27346404
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2002094756A Pending JP2002363123A (ja) | 2001-03-29 | 2002-03-29 | 光活性化合物および感光性樹脂組成物 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002363123A (enExample) |
Families Citing this family (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4484479B2 (ja) * | 2002-09-27 | 2010-06-16 | 大阪瓦斯株式会社 | フルオレン誘導体及び光活性化合物 |
| US20070059632A1 (en) * | 2003-09-18 | 2007-03-15 | Dai Oguro | Method of manufacturing a semiconductor device |
| JP4614056B2 (ja) * | 2003-09-18 | 2011-01-19 | 三菱瓦斯化学株式会社 | レジスト用化合物および感放射線性組成物 |
| JP2005139087A (ja) * | 2003-11-05 | 2005-06-02 | Asahi Organic Chem Ind Co Ltd | フェノール誘導体の製造方法 |
| JP4685418B2 (ja) * | 2004-11-25 | 2011-05-18 | 大阪瓦斯株式会社 | フルオレン誘導体および感光性樹脂組成物 |
| TWI400568B (zh) | 2004-12-24 | 2013-07-01 | Mitsubishi Gas Chemical Co | 感放射線性組成物、非晶質膜及形成光阻圖案的方法 |
| KR100660016B1 (ko) | 2005-02-18 | 2006-12-20 | 삼성전자주식회사 | 감광성 수지, 이를 포함하는 포토레지스트 조성물 및 이를이용한 포토레지스트 패턴 형성 방법 |
| JP2007079552A (ja) | 2005-08-17 | 2007-03-29 | Jsr Corp | 感放射線性樹脂組成物 |
| US8722306B2 (en) | 2007-06-05 | 2014-05-13 | Jsr Corporation | Radiation-sensitive resin composition |
| JP5175579B2 (ja) * | 2008-02-25 | 2013-04-03 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
| AU2010270797B2 (en) | 2009-07-08 | 2015-03-19 | Dermira (Canada), Inc. | TOFA analogs useful in treating dermatological disorders or conditions |
| JP5624742B2 (ja) * | 2009-10-02 | 2014-11-12 | 東京応化工業株式会社 | レジスト組成物、レジストパターン形成方法 |
| WO2011093280A1 (ja) | 2010-01-29 | 2011-08-04 | Jsr株式会社 | 感放射線性樹脂組成物 |
| WO2012033145A1 (ja) | 2010-09-09 | 2012-03-15 | Jsr株式会社 | 感放射線性樹脂組成物 |
| JP5729392B2 (ja) | 2010-12-02 | 2015-06-03 | Jsr株式会社 | 感放射線性樹脂組成物及び感放射線性酸発生剤 |
| KR101839640B1 (ko) | 2011-01-11 | 2018-03-16 | 제이에스알 가부시끼가이샤 | 감방사선성 수지 조성물 및 감방사선성 산 발생제 |
| JP5593357B2 (ja) * | 2012-09-18 | 2014-09-24 | 富士フイルム株式会社 | ポジ型レジスト組成物及びそれを用いたパターン形成方法 |
-
2002
- 2002-03-29 JP JP2002094756A patent/JP2002363123A/ja active Pending
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