JP2002299282A5 - - Google Patents
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- Publication number
- JP2002299282A5 JP2002299282A5 JP2001095309A JP2001095309A JP2002299282A5 JP 2002299282 A5 JP2002299282 A5 JP 2002299282A5 JP 2001095309 A JP2001095309 A JP 2001095309A JP 2001095309 A JP2001095309 A JP 2001095309A JP 2002299282 A5 JP2002299282 A5 JP 2002299282A5
- Authority
- JP
- Japan
- Prior art keywords
- film
- forming
- metal
- silicide film
- silicon
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 229910021332 silicide Inorganic materials 0.000 claims 16
- FVBUAEGBCNSCDD-UHFFFAOYSA-N silicide(4-) Chemical compound [Si-4] FVBUAEGBCNSCDD-UHFFFAOYSA-N 0.000 claims 16
- 239000002184 metal Substances 0.000 claims 15
- 239000004065 semiconductor Substances 0.000 claims 13
- 238000004519 manufacturing process Methods 0.000 claims 7
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims 6
- 238000000034 method Methods 0.000 claims 6
- 229910052710 silicon Inorganic materials 0.000 claims 6
- 239000010703 silicon Substances 0.000 claims 6
- 150000003377 silicon compounds Chemical class 0.000 claims 6
- 238000010438 heat treatment Methods 0.000 claims 5
- 229910021417 amorphous silicon Inorganic materials 0.000 claims 2
- 230000015572 biosynthetic process Effects 0.000 claims 2
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001095309A JP2002299282A (ja) | 2001-03-29 | 2001-03-29 | 半導体装置の製造方法 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2001095309A JP2002299282A (ja) | 2001-03-29 | 2001-03-29 | 半導体装置の製造方法 |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2006197771A Division JP3971442B2 (ja) | 2006-07-20 | 2006-07-20 | 半導体装置の製造方法 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2002299282A JP2002299282A (ja) | 2002-10-11 |
| JP2002299282A5 true JP2002299282A5 (enExample) | 2005-08-11 |
Family
ID=18949378
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001095309A Withdrawn JP2002299282A (ja) | 2001-03-29 | 2001-03-29 | 半導体装置の製造方法 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP2002299282A (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4501379B2 (ja) * | 2003-09-02 | 2010-07-14 | Ｊｓｒ株式会社 | ルテニウム−シリコン混合膜を形成する方法 |
| JP4521327B2 (ja) * | 2005-07-19 | 2010-08-11 | 株式会社東芝 | 半導体装置の製造方法 |
| JPWO2007026677A1 (ja) * | 2005-09-01 | 2009-03-05 | 日本電気株式会社 | 半導体装置の製造方法 |
| JP5157450B2 (ja) * | 2005-11-28 | 2013-03-06 | 日本電気株式会社 | 半導体装置およびその製造方法 |
| JP5547877B2 (ja) * | 2008-05-23 | 2014-07-16 | ルネサスエレクトロニクス株式会社 | 半導体装置およびその製造方法 |
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2001
- 2001-03-29 JP JP2001095309A patent/JP2002299282A/ja not_active Withdrawn