JP2002043879A5 - - Google Patents
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- JP2002043879A5 JP2002043879A5 JP2001145259A JP2001145259A JP2002043879A5 JP 2002043879 A5 JP2002043879 A5 JP 2002043879A5 JP 2001145259 A JP2001145259 A JP 2001145259A JP 2001145259 A JP2001145259 A JP 2001145259A JP 2002043879 A5 JP2002043879 A5 JP 2002043879A5
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Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US09/571919 | 2000-05-16 | ||
| US09/571,919 US6420202B1 (en) | 2000-05-16 | 2000-05-16 | Method for shaping thin film resonators to shape acoustic modes therein |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2002043879A JP2002043879A (ja) | 2002-02-08 |
| JP2002043879A5 true JP2002043879A5 (enExample) | 2008-11-13 |
| JP5142001B2 JP5142001B2 (ja) | 2013-02-13 |
Family
ID=24285591
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2001145259A Expired - Fee Related JP5142001B2 (ja) | 2000-05-16 | 2001-05-15 | 薄膜音響共振子の形成方法 |
Country Status (3)
| Country | Link |
|---|---|
| US (1) | US6420202B1 (enExample) |
| EP (1) | EP1156584B1 (enExample) |
| JP (1) | JP5142001B2 (enExample) |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN1280025C (zh) * | 2001-06-01 | 2006-10-18 | 利特斯公司 | 微沉积系统以及在衬底上沉积精确量的流体材料的方法 |
| DE10135872A1 (de) * | 2001-07-24 | 2003-02-27 | Osram Opto Semiconductors Gmbh | Verfahren zur Herstellung einer Linse |
| US20030048041A1 (en) * | 2001-09-07 | 2003-03-13 | Hiroyuki Kita | Piezoelectric thin-film element and a manufacturing method thereof |
| JP3969224B2 (ja) * | 2002-01-08 | 2007-09-05 | 株式会社村田製作所 | 圧電共振子及びそれを用いた圧電フィルタ・デュプレクサ・通信装置 |
| US20100107389A1 (en) * | 2002-01-11 | 2010-05-06 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Method of fabricating an electrode for a bulk acoustic resonator |
| DE10200741A1 (de) * | 2002-01-11 | 2003-07-24 | Infineon Technologies Ag | Verfahren zur Herstellung einer topologieoptimierten Elektrode für einen Resonator in Dünnfilmtechnologie |
| US20040173144A1 (en) * | 2002-05-31 | 2004-09-09 | Edwards Charles O. | Formation of printed circuit board structures using piezo microdeposition |
| JP3829861B2 (ja) | 2002-08-07 | 2006-10-04 | 松下電器産業株式会社 | 角速度センサ |
| EP1540819A1 (en) * | 2002-09-12 | 2005-06-15 | Philips Intellectual Property & Standards GmbH | Bulk acoustic waver resonator with means for suppression of pass-band ripple in bulk acoustic wave filters |
| JP2004304704A (ja) * | 2003-04-01 | 2004-10-28 | Matsushita Electric Ind Co Ltd | 薄膜音響共振子、及び、薄膜音響共振子回路 |
| JP4133580B2 (ja) * | 2003-05-21 | 2008-08-13 | 独立行政法人科学技術振興機構 | 圧電材料の加工方法 |
| JP4012156B2 (ja) * | 2004-02-02 | 2007-11-21 | 独立行政法人科学技術振興機構 | 圧電素子の製造方法 |
| JP4149416B2 (ja) * | 2004-05-31 | 2008-09-10 | 富士通メディアデバイス株式会社 | 圧電薄膜共振子およびフィルタならびにそれらの製造方法 |
| JP2006140370A (ja) * | 2004-11-15 | 2006-06-01 | Oki Electric Ind Co Ltd | マイクロレンズの製造方法 |
| US7541893B2 (en) * | 2005-05-23 | 2009-06-02 | Cts Corporation | Ceramic RF filter and duplexer having improved third harmonic response |
| EP1887688A4 (en) * | 2005-06-02 | 2009-08-05 | Murata Manufacturing Co | PIEZOELECTRIC RESONATOR AND PIEZOELECTRIC THIN-FILTER FILTER |
| US7889027B2 (en) * | 2005-09-09 | 2011-02-15 | Sony Corporation | Film bulk acoustic resonator shaped as an ellipse with a part cut off |
| US7544612B1 (en) | 2006-01-20 | 2009-06-09 | Skyworks Solutions, Inc. | Method and structure for reducing the effect of vertical steps in patterned layers in semiconductor structures |
| US7598827B2 (en) | 2006-06-19 | 2009-10-06 | Maxim Integrated Products | Harmonic termination of power amplifiers using BAW filter output matching circuits |
| US7586389B2 (en) * | 2006-06-19 | 2009-09-08 | Maxim Integrated Products, Inc. | Impedance transformation and filter using bulk acoustic wave technology |
| JP2008078717A (ja) * | 2006-09-19 | 2008-04-03 | Nec Tokin Corp | ノイズフィルタおよびスイッチング電源 |
| US7385334B1 (en) | 2006-11-20 | 2008-06-10 | Sandia Corporation | Contour mode resonators with acoustic reflectors |
| DE112008002181B4 (de) * | 2007-08-14 | 2023-08-03 | Avago Technologies International Sales Pte. Limited | Bulkakustikwellenstruktur mit einer piezoelektrischen Aluminiumkupfernitrid-Schicht und darauf bezogenes Verfahren |
| WO2009023100A2 (en) * | 2007-08-14 | 2009-02-19 | Skyworks Solutions, Inc. | Method for forming a multi-layer electrode underlying a piezoelectric layer and related structure |
| US7777596B2 (en) * | 2007-12-18 | 2010-08-17 | Robert Bosch Gmbh | MEMS resonator structure and method |
| US7602102B1 (en) | 2008-04-24 | 2009-10-13 | Skyworks Solutions, Inc. | Bulk acoustic wave resonator with controlled thickness region having controlled electromechanical coupling |
| US7795781B2 (en) * | 2008-04-24 | 2010-09-14 | Avago Technologies Wireless Ip (Singapore) Pte. Ltd. | Bulk acoustic wave resonator with reduced energy loss |
| US7889025B1 (en) * | 2008-06-10 | 2011-02-15 | The United States Of America As Represented By The Secretary Of The Army | Anti-reflective acoustic diffuser for SAW and BAW devices |
| JP5288920B2 (ja) * | 2008-07-16 | 2013-09-11 | 日本電波工業株式会社 | 水晶振動用素子の製造方法 |
| CN101477194B (zh) * | 2009-02-17 | 2011-07-06 | 东南大学 | 一种转子碰摩声发射源定位方法 |
| US9608589B2 (en) | 2010-10-26 | 2017-03-28 | Avago Technologies General Ip (Singapore) Pte. Ltd. | Method of forming acoustic resonator using intervening seed layer |
| US10763823B2 (en) | 2015-12-30 | 2020-09-01 | 3M Innovative Properties Company | Elliptically-shaped resonator markers with enhanced frequency stability and gain |
| EP3863176B1 (en) * | 2018-10-23 | 2022-12-07 | Huawei Technologies Co., Ltd. | Method for preparing monolithic integrated baw resonator |
Family Cites Families (22)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52658B2 (enExample) * | 1971-12-30 | 1977-01-10 | ||
| JPS58137317A (ja) * | 1982-02-09 | 1983-08-15 | Nec Corp | 圧電薄膜複合振動子 |
| US4556812A (en) * | 1983-10-13 | 1985-12-03 | The United States Of America As Represented By The United States Department Of Energy | Acoustic resonator with Al electrodes on an AlN layer and using a GaAs substrate |
| US4719383A (en) * | 1985-05-20 | 1988-01-12 | The United States Of America As Represented By The United States Department Of Energy | Piezoelectric shear wave resonator and method of making same |
| JP2644855B2 (ja) * | 1988-10-24 | 1997-08-25 | 株式会社日立製作所 | 弾性波フィルタ、及びそれを用いたアンテナ分波器 |
| US4966446A (en) | 1989-04-28 | 1990-10-30 | At&T Bell Laboratories | Mask controlled coupling of inter-substrate optical components |
| US4966447A (en) | 1989-04-28 | 1990-10-30 | At&T Bell Laboratories | Integration of free-space planar optical components |
| US5074646A (en) | 1989-04-28 | 1991-12-24 | At&T Bell Laboratories | Planar reflective optical devices |
| US5011254A (en) | 1989-11-30 | 1991-04-30 | At&T Bell Laboratories | Coupling of optical devices to optical fibers by means of microlenses |
| US5079130A (en) | 1990-05-25 | 1992-01-07 | At&T Bell Laboratories | Partially or fully recessed microlens fabrication |
| US5075641A (en) * | 1990-12-04 | 1991-12-24 | Iowa State University Research Foundation, Inc. | High frequency oscillator comprising cointegrated thin film resonator and active device |
| JP3362860B2 (ja) * | 1991-01-09 | 2003-01-07 | 大日本印刷株式会社 | 表面弾性波素子の製造方法 |
| JPH04322508A (ja) * | 1991-04-22 | 1992-11-12 | Matsushita Electric Ind Co Ltd | 水晶振動子の製造方法 |
| US5348617A (en) * | 1991-12-23 | 1994-09-20 | Iowa State University Research Foundation, Inc. | Selective etching process |
| US5412506A (en) | 1992-03-09 | 1995-05-02 | At&T Corp. | Free-space optical interconnection arrangement |
| US5286338A (en) | 1993-03-01 | 1994-02-15 | At&T Bell Laboratories | Methods for making microlens arrays |
| US5650075A (en) * | 1995-05-30 | 1997-07-22 | Motorola, Inc. | Method for etching photolithographically produced quartz crystal blanks for singulation |
| US5696423A (en) * | 1995-06-29 | 1997-12-09 | Motorola, Inc. | Temperature compenated resonator and method |
| US5918354A (en) * | 1996-04-02 | 1999-07-06 | Seiko Epson Corporation | Method of making a piezoelectric element |
| JPH10107573A (ja) * | 1996-09-30 | 1998-04-24 | Kyocera Corp | 弾性表面波装置 |
| JP2000040931A (ja) * | 1998-07-23 | 2000-02-08 | Matsushita Electric Ind Co Ltd | 圧電共振子、圧電共振子の製造方法および圧電共振子の周波数調整方法 |
| JP4036544B2 (ja) * | 1998-09-22 | 2008-01-23 | Ｔｄｋ株式会社 | 電圧制御発振器 |
-
2000
- 2000-05-16 US US09/571,919 patent/US6420202B1/en not_active Expired - Lifetime
-
2001
- 2001-05-08 EP EP01304145A patent/EP1156584B1/en not_active Expired - Lifetime
- 2001-05-15 JP JP2001145259A patent/JP5142001B2/ja not_active Expired - Fee Related