JP2002043879A5 - - Google Patents

Download PDF

Info

Publication number
JP2002043879A5
JP2002043879A5 JP2001145259A JP2001145259A JP2002043879A5 JP 2002043879 A5 JP2002043879 A5 JP 2002043879A5 JP 2001145259 A JP2001145259 A JP 2001145259A JP 2001145259 A JP2001145259 A JP 2001145259A JP 2002043879 A5 JP2002043879 A5 JP 2002043879A5
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2001145259A
Other versions
JP5142001B2 (ja
JP2002043879A (ja
Filing date
Publication date
Priority claimed from US09/571,919 external-priority patent/US6420202B1/en
Application filed filed Critical
Publication of JP2002043879A publication Critical patent/JP2002043879A/ja
Publication of JP2002043879A5 publication Critical patent/JP2002043879A5/ja
Application granted granted Critical
Publication of JP5142001B2 publication Critical patent/JP5142001B2/ja
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

JP2001145259A 2000-05-16 2001-05-15 薄膜音響共振子の形成方法 Expired - Fee Related JP5142001B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/571919 2000-05-16
US09/571,919 US6420202B1 (en) 2000-05-16 2000-05-16 Method for shaping thin film resonators to shape acoustic modes therein

Publications (3)

Publication Number Publication Date
JP2002043879A JP2002043879A (ja) 2002-02-08
JP2002043879A5 true JP2002043879A5 (ja) 2008-11-13
JP5142001B2 JP5142001B2 (ja) 2013-02-13

Family

ID=24285591

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001145259A Expired - Fee Related JP5142001B2 (ja) 2000-05-16 2001-05-15 薄膜音響共振子の形成方法

Country Status (3)

Country Link
US (1) US6420202B1 (ja)
EP (1) EP1156584B1 (ja)
JP (1) JP5142001B2 (ja)

Families Citing this family (33)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002098576A1 (en) * 2001-06-01 2002-12-12 Litrex Corporation Industrial microdeposition system for polymer light emitting diode displays, printed circuit boards and the like
DE10135872A1 (de) * 2001-07-24 2003-02-27 Osram Opto Semiconductors Gmbh Verfahren zur Herstellung einer Linse
CN1245768C (zh) * 2001-09-07 2006-03-15 松下电器产业株式会社 薄膜压电体元件及其制造方法并致动器
JP3969224B2 (ja) 2002-01-08 2007-09-05 株式会社村田製作所 圧電共振子及びそれを用いた圧電フィルタ・デュプレクサ・通信装置
US20100107389A1 (en) * 2002-01-11 2010-05-06 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Method of fabricating an electrode for a bulk acoustic resonator
DE10200741A1 (de) * 2002-01-11 2003-07-24 Infineon Technologies Ag Verfahren zur Herstellung einer topologieoptimierten Elektrode für einen Resonator in Dünnfilmtechnologie
US20040173144A1 (en) * 2002-05-31 2004-09-09 Edwards Charles O. Formation of printed circuit board structures using piezo microdeposition
EP1437570B1 (en) * 2002-08-07 2014-03-05 Panasonic Corporation Angular-velocity sensor
WO2004025832A1 (en) 2002-09-12 2004-03-25 Philips Intellectual Property & Standards Gmbh Bulk acoustic wave resonator with means for suppression of pass-band ripple in bulk acoustic wave filters
JP2004304704A (ja) * 2003-04-01 2004-10-28 Matsushita Electric Ind Co Ltd 薄膜音響共振子、及び、薄膜音響共振子回路
JP4133580B2 (ja) * 2003-05-21 2008-08-13 独立行政法人科学技術振興機構 圧電材料の加工方法
JP4012156B2 (ja) * 2004-02-02 2007-11-21 独立行政法人科学技術振興機構 圧電素子の製造方法
JP4149416B2 (ja) * 2004-05-31 2008-09-10 富士通メディアデバイス株式会社 圧電薄膜共振子およびフィルタならびにそれらの製造方法
JP2006140370A (ja) * 2004-11-15 2006-06-01 Oki Electric Ind Co Ltd マイクロレンズの製造方法
US7541893B2 (en) * 2005-05-23 2009-06-02 Cts Corporation Ceramic RF filter and duplexer having improved third harmonic response
WO2006129532A1 (ja) 2005-06-02 2006-12-07 Murata Manufacturing Co., Ltd. 圧電共振子及び圧電薄膜フィルタ
US7889027B2 (en) * 2005-09-09 2011-02-15 Sony Corporation Film bulk acoustic resonator shaped as an ellipse with a part cut off
US7544612B1 (en) 2006-01-20 2009-06-09 Skyworks Solutions, Inc. Method and structure for reducing the effect of vertical steps in patterned layers in semiconductor structures
US7586389B2 (en) * 2006-06-19 2009-09-08 Maxim Integrated Products, Inc. Impedance transformation and filter using bulk acoustic wave technology
US7598827B2 (en) * 2006-06-19 2009-10-06 Maxim Integrated Products Harmonic termination of power amplifiers using BAW filter output matching circuits
JP2008078717A (ja) * 2006-09-19 2008-04-03 Nec Tokin Corp ノイズフィルタおよびスイッチング電源
US7385334B1 (en) 2006-11-20 2008-06-10 Sandia Corporation Contour mode resonators with acoustic reflectors
US8601655B2 (en) * 2007-08-14 2013-12-10 Avago Technologies General Ip (Singapore) Pte. Ltd. Process of making a bulk acoustic wave structure with an aluminum copper nitride piezoelectric layer
US8035277B2 (en) * 2007-08-14 2011-10-11 Avago Technologies Wireless Ip (Singapore) Pte.Ltd. Method for forming a multi-layer electrode underlying a piezoelectric layer and related structure
US7777596B2 (en) * 2007-12-18 2010-08-17 Robert Bosch Gmbh MEMS resonator structure and method
US7602102B1 (en) 2008-04-24 2009-10-13 Skyworks Solutions, Inc. Bulk acoustic wave resonator with controlled thickness region having controlled electromechanical coupling
US7795781B2 (en) * 2008-04-24 2010-09-14 Avago Technologies Wireless Ip (Singapore) Pte. Ltd. Bulk acoustic wave resonator with reduced energy loss
US7889025B1 (en) * 2008-06-10 2011-02-15 The United States Of America As Represented By The Secretary Of The Army Anti-reflective acoustic diffuser for SAW and BAW devices
JP5288920B2 (ja) * 2008-07-16 2013-09-11 日本電波工業株式会社 水晶振動用素子の製造方法
CN101477194B (zh) * 2009-02-17 2011-07-06 东南大学 一种转子碰摩声发射源定位方法
US9608589B2 (en) 2010-10-26 2017-03-28 Avago Technologies General Ip (Singapore) Pte. Ltd. Method of forming acoustic resonator using intervening seed layer
RU2704624C1 (ru) 2015-12-30 2019-10-30 3М Инновейтив Пропертиз Компани Резонаторные маркеры эллиптической формы с повышенными стабильностью частоты и коэффициентом усиления
WO2020082245A1 (zh) * 2018-10-23 2020-04-30 华为技术有限公司 单片集成baw谐振器制作方法

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52658B2 (ja) * 1971-12-30 1977-01-10
JPS58137317A (ja) * 1982-02-09 1983-08-15 Nec Corp 圧電薄膜複合振動子
US4556812A (en) * 1983-10-13 1985-12-03 The United States Of America As Represented By The United States Department Of Energy Acoustic resonator with Al electrodes on an AlN layer and using a GaAs substrate
US4719383A (en) * 1985-05-20 1988-01-12 The United States Of America As Represented By The United States Department Of Energy Piezoelectric shear wave resonator and method of making same
JP2644855B2 (ja) * 1988-10-24 1997-08-25 株式会社日立製作所 弾性波フィルタ、及びそれを用いたアンテナ分波器
US5074646A (en) 1989-04-28 1991-12-24 At&T Bell Laboratories Planar reflective optical devices
US4966447A (en) 1989-04-28 1990-10-30 At&T Bell Laboratories Integration of free-space planar optical components
US4966446A (en) 1989-04-28 1990-10-30 At&T Bell Laboratories Mask controlled coupling of inter-substrate optical components
US5011254A (en) 1989-11-30 1991-04-30 At&T Bell Laboratories Coupling of optical devices to optical fibers by means of microlenses
US5079130A (en) 1990-05-25 1992-01-07 At&T Bell Laboratories Partially or fully recessed microlens fabrication
US5075641A (en) * 1990-12-04 1991-12-24 Iowa State University Research Foundation, Inc. High frequency oscillator comprising cointegrated thin film resonator and active device
JP3362860B2 (ja) * 1991-01-09 2003-01-07 大日本印刷株式会社 表面弾性波素子の製造方法
JPH04322508A (ja) * 1991-04-22 1992-11-12 Matsushita Electric Ind Co Ltd 水晶振動子の製造方法
US5348617A (en) * 1991-12-23 1994-09-20 Iowa State University Research Foundation, Inc. Selective etching process
US5412506A (en) * 1992-03-09 1995-05-02 At&T Corp. Free-space optical interconnection arrangement
US5286338A (en) 1993-03-01 1994-02-15 At&T Bell Laboratories Methods for making microlens arrays
US5650075A (en) * 1995-05-30 1997-07-22 Motorola, Inc. Method for etching photolithographically produced quartz crystal blanks for singulation
US5696423A (en) * 1995-06-29 1997-12-09 Motorola, Inc. Temperature compenated resonator and method
US5918354A (en) * 1996-04-02 1999-07-06 Seiko Epson Corporation Method of making a piezoelectric element
JPH10107573A (ja) * 1996-09-30 1998-04-24 Kyocera Corp 弾性表面波装置
JP2000040931A (ja) * 1998-07-23 2000-02-08 Matsushita Electric Ind Co Ltd 圧電共振子、圧電共振子の製造方法および圧電共振子の周波数調整方法
JP4036544B2 (ja) * 1998-09-22 2008-01-23 Ｔｄｋ株式会社 電圧制御発振器

Similar Documents

Publication Publication Date Title
BE2022C531I2 (ja)
BE2022C502I2 (ja)
BE2022C547I2 (ja)
BE2017C057I2 (ja)
BE2015C046I2 (ja)
BE2014C052I2 (ja)
BE2011C034I2 (ja)
BE2007C047I2 (ja)
AU2002307149A8 (ja)
JP2002200936A5 (ja)
JP2002016244A5 (ja)
BRPI0209186B1 (ja)
JP2002043879A5 (ja)
BRPI0204884A2 (ja)
CH1379220H1 (ja)
BE2017C059I2 (ja)
JP2002140164A5 (ja)
JP2002158303A5 (ja)
BRPI0101486B8 (ja)
JP2002041312A5 (ja)
BRPI0210463A2 (ja)
JP2002050636A5 (ja)
AU2000280389A8 (ja)
JP2002189429A5 (ja)
JP2002026776A5 (ja)