JP2001518873A - 金属酸化物と有機金属酸化物組成物の製造方法 - Google Patents
金属酸化物と有機金属酸化物組成物の製造方法Info
- Publication number
- JP2001518873A JP2001518873A JP54312398A JP54312398A JP2001518873A JP 2001518873 A JP2001518873 A JP 2001518873A JP 54312398 A JP54312398 A JP 54312398A JP 54312398 A JP54312398 A JP 54312398A JP 2001518873 A JP2001518873 A JP 2001518873A
- Authority
- JP
- Japan
- Prior art keywords
- organometallic
- oxide
- metal oxide
- desiccant
- rate
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 229910044991 metal oxide Inorganic materials 0.000 title claims abstract description 179
- 150000004706 metal oxides Chemical class 0.000 title claims abstract description 176
- 125000002524 organometallic group Chemical group 0.000 title claims abstract description 166
- 239000000203 mixture Substances 0.000 title claims abstract description 90
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 23
- 238000000034 method Methods 0.000 claims abstract description 159
- 239000002274 desiccant Substances 0.000 claims abstract description 98
- 239000002243 precursor Substances 0.000 claims abstract description 63
- 229910001507 metal halide Inorganic materials 0.000 claims abstract description 15
- 150000005309 metal halides Chemical class 0.000 claims abstract description 14
- DKGAVHZHDRPRBM-UHFFFAOYSA-N Tert-Butanol Chemical group CC(C)(C)O DKGAVHZHDRPRBM-UHFFFAOYSA-N 0.000 claims description 82
- 239000007787 solid Substances 0.000 claims description 71
- 238000001035 drying Methods 0.000 claims description 49
- 239000003795 chemical substances by application Substances 0.000 claims description 42
- 239000007788 liquid Substances 0.000 claims description 42
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 claims description 30
- 238000006460 hydrolysis reaction Methods 0.000 claims description 22
- 230000008018 melting Effects 0.000 claims description 17
- 238000002844 melting Methods 0.000 claims description 17
- 239000000843 powder Substances 0.000 claims description 11
- 230000003301 hydrolyzing effect Effects 0.000 claims description 9
- -1 flakes Substances 0.000 claims description 8
- 238000007711 solidification Methods 0.000 claims description 7
- 230000008023 solidification Effects 0.000 claims description 7
- FDNAPBUWERUEDA-UHFFFAOYSA-N silicon tetrachloride Chemical compound Cl[Si](Cl)(Cl)Cl FDNAPBUWERUEDA-UHFFFAOYSA-N 0.000 claims description 6
- 239000008187 granular material Substances 0.000 claims description 5
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims description 4
- 235000012239 silicon dioxide Nutrition 0.000 claims description 4
- 238000005345 coagulation Methods 0.000 claims description 2
- 230000015271 coagulation Effects 0.000 claims description 2
- 239000000835 fiber Substances 0.000 claims description 2
- 239000012702 metal oxide precursor Substances 0.000 abstract description 2
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 112
- 239000000243 solution Substances 0.000 description 111
- 238000006243 chemical reaction Methods 0.000 description 57
- 230000008569 process Effects 0.000 description 52
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 42
- 239000000047 product Substances 0.000 description 42
- 239000005055 methyl trichlorosilane Substances 0.000 description 39
- JLUFWMXJHAVVNN-UHFFFAOYSA-N methyltrichlorosilane Chemical compound C[Si](Cl)(Cl)Cl JLUFWMXJHAVVNN-UHFFFAOYSA-N 0.000 description 39
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 30
- 238000001291 vacuum drying Methods 0.000 description 30
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 27
- 229910000077 silane Inorganic materials 0.000 description 27
- 239000000499 gel Substances 0.000 description 26
- 229910052751 metal Inorganic materials 0.000 description 26
- 239000002184 metal Substances 0.000 description 25
- 239000011521 glass Substances 0.000 description 24
- 239000003517 fume Substances 0.000 description 22
- 230000008014 freezing Effects 0.000 description 17
- 238000007710 freezing Methods 0.000 description 17
- 230000005291 magnetic effect Effects 0.000 description 15
- 230000010512 thermal transition Effects 0.000 description 15
- 230000008901 benefit Effects 0.000 description 14
- 229910001873 dinitrogen Inorganic materials 0.000 description 14
- 229910001510 metal chloride Inorganic materials 0.000 description 14
- 229910052757 nitrogen Inorganic materials 0.000 description 14
- 230000007062 hydrolysis Effects 0.000 description 13
- 230000005587 bubbling Effects 0.000 description 12
- 239000002253 acid Substances 0.000 description 11
- 230000000704 physical effect Effects 0.000 description 11
- VXEGSRKPIUDPQT-UHFFFAOYSA-N 4-[4-(4-methoxyphenyl)piperazin-1-yl]aniline Chemical compound C1=CC(OC)=CC=C1N1CCN(C=2C=CC(N)=CC=2)CC1 VXEGSRKPIUDPQT-UHFFFAOYSA-N 0.000 description 10
- 239000007791 liquid phase Substances 0.000 description 10
- 239000005049 silicon tetrachloride Substances 0.000 description 10
- 230000007704 transition Effects 0.000 description 10
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 9
- 239000000126 substance Substances 0.000 description 8
- 239000007789 gas Substances 0.000 description 7
- 238000003756 stirring Methods 0.000 description 7
- 238000009834 vaporization Methods 0.000 description 7
- 230000008016 vaporization Effects 0.000 description 7
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 6
- LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 6
- 239000006185 dispersion Substances 0.000 description 6
- 229910052737 gold Inorganic materials 0.000 description 6
- 239000010931 gold Substances 0.000 description 6
- 229910052736 halogen Inorganic materials 0.000 description 6
- 238000012546 transfer Methods 0.000 description 6
- VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 5
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 5
- 150000004703 alkoxides Chemical class 0.000 description 5
- 239000000908 ammonium hydroxide Substances 0.000 description 5
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 5
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 5
- 239000000463 material Substances 0.000 description 5
- 229910052710 silicon Inorganic materials 0.000 description 5
- 239000010703 silicon Substances 0.000 description 5
- QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 4
- 150000002367 halogens Chemical class 0.000 description 4
- FFUAGWLWBBFQJT-UHFFFAOYSA-N hexamethyldisilazane Chemical compound C[Si](C)(C)N[Si](C)(C)C FFUAGWLWBBFQJT-UHFFFAOYSA-N 0.000 description 4
- 238000012544 monitoring process Methods 0.000 description 4
- 230000003647 oxidation Effects 0.000 description 4
- 238000007254 oxidation reaction Methods 0.000 description 4
- 239000002245 particle Substances 0.000 description 4
- 239000002244 precipitate Substances 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- 238000000926 separation method Methods 0.000 description 4
- 229910052717 sulfur Inorganic materials 0.000 description 4
- 238000009423 ventilation Methods 0.000 description 4
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- 239000004115 Sodium Silicate Substances 0.000 description 3
- 230000002378 acidificating effect Effects 0.000 description 3
- 150000001298 alcohols Chemical class 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 125000003636 chemical group Chemical group 0.000 description 3
- 238000010586 diagram Methods 0.000 description 3
- 150000002009 diols Chemical class 0.000 description 3
- 238000005886 esterification reaction Methods 0.000 description 3
- 238000002360 preparation method Methods 0.000 description 3
- BDERNNFJNOPAEC-UHFFFAOYSA-N propan-1-ol Chemical compound CCCO BDERNNFJNOPAEC-UHFFFAOYSA-N 0.000 description 3
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 description 3
- 229910052911 sodium silicate Inorganic materials 0.000 description 3
- 238000000194 supercritical-fluid extraction Methods 0.000 description 3
- 239000002562 thickening agent Substances 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 description 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 2
- 150000007513 acids Chemical class 0.000 description 2
- 239000003463 adsorbent Substances 0.000 description 2
- 239000004964 aerogel Substances 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 229910021529 ammonia Inorganic materials 0.000 description 2
- 125000003118 aryl group Chemical group 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- BTANRVKWQNVYAZ-UHFFFAOYSA-N butan-2-ol Chemical compound CCC(C)O BTANRVKWQNVYAZ-UHFFFAOYSA-N 0.000 description 2
- KBPLFHHGFOOTCA-UHFFFAOYSA-N caprylic alcohol Natural products CCCCCCCCO KBPLFHHGFOOTCA-UHFFFAOYSA-N 0.000 description 2
- 150000001721 carbon Chemical group 0.000 description 2
- YCIMNLLNPGFGHC-UHFFFAOYSA-N catechol Chemical compound OC1=CC=CC=C1O YCIMNLLNPGFGHC-UHFFFAOYSA-N 0.000 description 2
- 239000003153 chemical reaction reagent Substances 0.000 description 2
- 150000001875 compounds Chemical class 0.000 description 2
- MWKFXSUHUHTGQN-UHFFFAOYSA-N decan-1-ol Chemical compound CCCCCCCCCCO MWKFXSUHUHTGQN-UHFFFAOYSA-N 0.000 description 2
- 239000003989 dielectric material Substances 0.000 description 2
- 230000032050 esterification Effects 0.000 description 2
- 125000005843 halogen group Chemical group 0.000 description 2
- 230000002209 hydrophobic effect Effects 0.000 description 2
- 239000004615 ingredient Substances 0.000 description 2
- ZXEKIIBDNHEJCQ-UHFFFAOYSA-N isobutanol Chemical compound CC(C)CO ZXEKIIBDNHEJCQ-UHFFFAOYSA-N 0.000 description 2
- 238000003760 magnetic stirring Methods 0.000 description 2
- 239000012528 membrane Substances 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000002808 molecular sieve Substances 0.000 description 2
- QWVGKYWNOKOFNN-UHFFFAOYSA-N o-cresol Chemical compound CC1=CC=CC=C1O QWVGKYWNOKOFNN-UHFFFAOYSA-N 0.000 description 2
- GLDOVTGHNKAZLK-UHFFFAOYSA-N octadecan-1-ol Chemical compound CCCCCCCCCCCCCCCCCCO GLDOVTGHNKAZLK-UHFFFAOYSA-N 0.000 description 2
- IWDCLRJOBJJRNH-UHFFFAOYSA-N p-cresol Chemical compound CC1=CC=C(O)C=C1 IWDCLRJOBJJRNH-UHFFFAOYSA-N 0.000 description 2
- 150000003138 primary alcohols Chemical class 0.000 description 2
- YPFDHNVEDLHUCE-UHFFFAOYSA-N propane-1,3-diol Chemical compound OCCCO YPFDHNVEDLHUCE-UHFFFAOYSA-N 0.000 description 2
- 230000002787 reinforcement Effects 0.000 description 2
- GHMLBKRAJCXXBS-UHFFFAOYSA-N resorcinol Chemical compound OC1=CC=CC(O)=C1 GHMLBKRAJCXXBS-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000002002 slurry Substances 0.000 description 2
- URGAHOPLAPQHLN-UHFFFAOYSA-N sodium aluminosilicate Chemical compound [Na+].[Al+3].[O-][Si]([O-])=O.[O-][Si]([O-])=O URGAHOPLAPQHLN-UHFFFAOYSA-N 0.000 description 2
- 239000007790 solid phase Substances 0.000 description 2
- 239000012265 solid product Substances 0.000 description 2
- 239000005051 trimethylchlorosilane Substances 0.000 description 2
- 239000011240 wet gel Substances 0.000 description 2
- YPFNIPKMNMDDDB-UHFFFAOYSA-K 2-[2-[bis(carboxylatomethyl)amino]ethyl-(2-hydroxyethyl)amino]acetate;iron(3+) Chemical compound [Fe+3].OCCN(CC([O-])=O)CCN(CC([O-])=O)CC([O-])=O YPFNIPKMNMDDDB-UHFFFAOYSA-K 0.000 description 1
- 125000003903 2-propenyl group Chemical group [H]C([*])([H])C([H])=C([H])[H] 0.000 description 1
- UZFMOKQJFYMBGY-UHFFFAOYSA-N 4-hydroxy-TEMPO Chemical compound CC1(C)CC(O)CC(C)(C)N1[O] UZFMOKQJFYMBGY-UHFFFAOYSA-N 0.000 description 1
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 1
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
- 206010037660 Pyrexia Diseases 0.000 description 1
- 229910020175 SiOH Inorganic materials 0.000 description 1
- NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical group OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 1
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
- 239000000654 additive Substances 0.000 description 1
- 238000005054 agglomeration Methods 0.000 description 1
- 230000002776 aggregation Effects 0.000 description 1
- 150000003973 alkyl amines Chemical group 0.000 description 1
- 125000000217 alkyl group Chemical group 0.000 description 1
- 239000003708 ampul Substances 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- 125000004429 atom Chemical group 0.000 description 1
- 230000004888 barrier function Effects 0.000 description 1
- 238000010923 batch production Methods 0.000 description 1
- 238000009835 boiling Methods 0.000 description 1
- 229910052796 boron Inorganic materials 0.000 description 1
- 239000001273 butane Substances 0.000 description 1
- 239000000969 carrier Substances 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000008859 change Effects 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 230000003750 conditioning effect Effects 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 238000010924 continuous production Methods 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052802 copper Inorganic materials 0.000 description 1
- 239000010949 copper Substances 0.000 description 1
- HPXRVTGHNJAIIH-UHFFFAOYSA-N cyclohexanol Chemical compound OC1CCCCC1 HPXRVTGHNJAIIH-UHFFFAOYSA-N 0.000 description 1
- 238000000354 decomposition reaction Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 239000008367 deionised water Substances 0.000 description 1
- 229910021641 deionized water Inorganic materials 0.000 description 1
- 238000001739 density measurement Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- HQPMKSGTIOYHJT-UHFFFAOYSA-N ethane-1,2-diol;propane-1,2-diol Chemical compound OCCO.CC(O)CO HQPMKSGTIOYHJT-UHFFFAOYSA-N 0.000 description 1
- 238000001704 evaporation Methods 0.000 description 1
- 230000008020 evaporation Effects 0.000 description 1
- 239000000945 filler Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 239000012467 final product Substances 0.000 description 1
- 239000012530 fluid Substances 0.000 description 1
- 125000000524 functional group Chemical group 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hcl hcl Chemical compound Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- 239000008240 homogeneous mixture Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 239000000017 hydrogel Substances 0.000 description 1
- FUKUFMFMCZIRNT-UHFFFAOYSA-N hydron;methanol;chloride Chemical compound Cl.OC FUKUFMFMCZIRNT-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
- 125000004356 hydroxy functional group Chemical group O* 0.000 description 1
- 238000009413 insulation Methods 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 238000004898 kneading Methods 0.000 description 1
- 238000011031 large-scale manufacturing process Methods 0.000 description 1
- RLSSMJSEOOYNOY-UHFFFAOYSA-N m-cresol Chemical compound CC1=CC=CC(O)=C1 RLSSMJSEOOYNOY-UHFFFAOYSA-N 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- WPBNNNQJVZRUHP-UHFFFAOYSA-L manganese(2+);methyl n-[[2-(methoxycarbonylcarbamothioylamino)phenyl]carbamothioyl]carbamate;n-[2-(sulfidocarbothioylamino)ethyl]carbamodithioate Chemical compound [Mn+2].[S-]C(=S)NCCNC([S-])=S.COC(=O)NC(=S)NC1=CC=CC=C1NC(=S)NC(=O)OC WPBNNNQJVZRUHP-UHFFFAOYSA-L 0.000 description 1
- 239000006224 matting agent Substances 0.000 description 1
- 239000011259 mixed solution Substances 0.000 description 1
- 238000002156 mixing Methods 0.000 description 1
- 229910052750 molybdenum Inorganic materials 0.000 description 1
- 239000011733 molybdenum Substances 0.000 description 1
- TVMXDCGIABBOFY-UHFFFAOYSA-N n-Octanol Natural products CCCCCCCC TVMXDCGIABBOFY-UHFFFAOYSA-N 0.000 description 1
- IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 229910052758 niobium Inorganic materials 0.000 description 1
- 239000010955 niobium Substances 0.000 description 1
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 239000005416 organic matter Substances 0.000 description 1
- 238000000643 oven drying Methods 0.000 description 1
- 239000012071 phase Substances 0.000 description 1
- WVDDGKGOMKODPV-ZQBYOMGUSA-N phenyl(114C)methanol Chemical compound O[14CH2]C1=CC=CC=C1 WVDDGKGOMKODPV-ZQBYOMGUSA-N 0.000 description 1
- 229920005862 polyol Polymers 0.000 description 1
- 150000003077 polyols Chemical class 0.000 description 1
- 239000011148 porous material Substances 0.000 description 1
- 238000012545 processing Methods 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000000376 reactant Substances 0.000 description 1
- 239000012744 reinforcing agent Substances 0.000 description 1
- 230000004044 response Effects 0.000 description 1
- 238000000518 rheometry Methods 0.000 description 1
- 150000003839 salts Chemical class 0.000 description 1
- 229920006395 saturated elastomer Polymers 0.000 description 1
- 150000003333 secondary alcohols Chemical class 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 125000005372 silanol group Chemical group 0.000 description 1
- 238000002336 sorption--desorption measurement Methods 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 125000000547 substituted alkyl group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000011593 sulfur Substances 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
- 150000003509 tertiary alcohols Chemical class 0.000 description 1
- 238000010998 test method Methods 0.000 description 1
- 238000012360 testing method Methods 0.000 description 1
- 150000003573 thiols Chemical class 0.000 description 1
- 229910052718 tin Inorganic materials 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052720 vanadium Inorganic materials 0.000 description 1
- GPPXJZIENCGNKB-UHFFFAOYSA-N vanadium Chemical compound [V]#[V] GPPXJZIENCGNKB-UHFFFAOYSA-N 0.000 description 1
- 229910052727 yttrium Inorganic materials 0.000 description 1
- VWQVUPCCIRVNHF-UHFFFAOYSA-N yttrium atom Chemical compound [Y] VWQVUPCCIRVNHF-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
- 239000011701 zinc Substances 0.000 description 1
- 229910052726 zirconium Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B13/00—Oxygen; Ozone; Oxides or hydroxides in general
- C01B13/14—Methods for preparing oxides or hydroxides in general
- C01B13/32—Methods for preparing oxides or hydroxides in general by oxidation or hydrolysis of elements or compounds in the liquid or solid state or in non-aqueous solution, e.g. sol-gel process
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
- C01B33/163—Preparation of silica xerogels by hydrolysis of organosilicon compounds, e.g. ethyl orthosilicate
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/18—Preparation of finely divided silica neither in sol nor in gel form; After-treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01G—COMPOUNDS CONTAINING METALS NOT COVERED BY SUBCLASSES C01D OR C01F
- C01G1/00—Methods of preparing compounds of metals not covered by subclasses C01B, C01C, C01D, or C01F, in general
- C01G1/02—Oxides
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/10—Solid density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/11—Powder tap density
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/12—Surface area
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01P—INDEXING SCHEME RELATING TO STRUCTURAL AND PHYSICAL ASPECTS OF SOLID INORGANIC COMPOUNDS
- C01P2006/00—Physical properties of inorganic compounds
- C01P2006/20—Powder free flowing behaviour
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Oxygen, Ozone, And Oxides In General (AREA)
- Solid-Sorbent Or Filter-Aiding Compositions (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/831,564 | 1997-04-09 | ||
| US08/831,564 US6071486A (en) | 1997-04-09 | 1997-04-09 | Process for producing metal oxide and organo-metal oxide compositions |
| PCT/US1998/007109 WO1998045210A1 (en) | 1997-04-09 | 1998-04-09 | Process for producing metal oxide and organo-metal oxide compositions |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2001518873A true JP2001518873A (ja) | 2001-10-16 |
| JP2001518873A5 JP2001518873A5 (https=) | 2005-11-24 |
Family
ID=25259349
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP54312398A Ceased JP2001518873A (ja) | 1997-04-09 | 1998-04-09 | 金属酸化物と有機金属酸化物組成物の製造方法 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US6071486A (https=) |
| EP (1) | EP0973691B1 (https=) |
| JP (1) | JP2001518873A (https=) |
| KR (1) | KR100529979B1 (https=) |
| CN (1) | CN1204048C (https=) |
| AU (1) | AU6894898A (https=) |
| BR (1) | BR9808518A (https=) |
| CA (1) | CA2286149A1 (https=) |
| DE (1) | DE69810094T2 (https=) |
| WO (1) | WO1998045210A1 (https=) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP1047734B1 (en) * | 1998-01-15 | 2004-10-27 | Cabot Corporation | Method of preparing treated silica |
| DE69902223T2 (de) * | 1998-01-15 | 2003-01-23 | Cabot Corp., Boston | Polyfunktionelle organosilan behandlung von kieselsäure |
| DE69915590T2 (de) * | 1998-01-15 | 2004-08-05 | Cabot Corp., Boston | Verfahren zur herstellung von organisch modifizierter kieselgel |
| US6174926B1 (en) | 1999-01-13 | 2001-01-16 | Cabot Corporation | Method of preparing organically modified silica |
| US6444609B1 (en) * | 2000-08-15 | 2002-09-03 | Aer Energy Resources, Inc. | Manganese-based oxygen reduction catalyst, metal-air electrode including said catalyst and methods for making the same |
| USH2121H1 (en) * | 2000-10-13 | 2005-08-02 | The United States Of America As Represented By The Secretary Of The Navy | High surface area, nanoscale, mesoporous manganese oxides with controlled solid-pore architectures and method for production thereof |
| US20030228972A1 (en) * | 2002-06-05 | 2003-12-11 | Birss Viola | Oxygen reduction catalyst |
| US7157073B2 (en) | 2003-05-02 | 2007-01-02 | Reading Alloys, Inc. | Production of high-purity niobium monoxide and capacitor production therefrom |
| EP2455340A1 (en) | 2003-05-19 | 2012-05-23 | Cabot Corporation | Valve metal sub-oxide powders and capacitors and sintered anode bodies made therefrom |
| WO2005064715A1 (en) | 2003-12-31 | 2005-07-14 | Lg Chem, Ltd. | Electrode active material powder with size dependent composition and method to prepare the same |
| US7482382B2 (en) * | 2004-05-19 | 2009-01-27 | The Texas A&M University System | Process for preparing nano-sized metal oxide particles |
| US20060194910A1 (en) * | 2004-05-19 | 2006-08-31 | Nobuo Miyatake | Stabilization of polymers with zinc oxide nanoparticles |
| US20070004840A1 (en) * | 2004-05-19 | 2007-01-04 | Texas A&M University | Zinc oxide polymer nanocomposites and methods of producing zinc oxide polymer nanocomposites |
| US8344054B2 (en) * | 2007-07-24 | 2013-01-01 | The Texas A & M University System | Polymer nanocomposites including dispersed nanoparticles and inorganic nanoplatelets |
| DE102008046444A1 (de) | 2008-09-09 | 2010-03-11 | Evonik Röhm Gmbh | Fassadenplatte, System und Verfahren zur Energiegewinnung |
| WO2011020671A1 (de) | 2009-08-20 | 2011-02-24 | Evonik Röhm Gmbh | Dämmplatte aus kunststoff, system und verfahren zur wärmedämmung |
| CN101698583B (zh) * | 2009-11-13 | 2012-08-22 | 航天特种材料及工艺技术研究所 | 一种多组元气凝胶复合材料及其制备方法 |
| US10822807B2 (en) | 2019-02-18 | 2020-11-03 | Royal Building Products (Usa) Inc. | Assembly for improved insulation |
| CN121866302A (zh) | 2023-09-29 | 2026-04-14 | 陶氏环球技术有限责任公司 | 用于隔热涂料以提供耐隔热层下腐蚀性的有机硅–丙烯酸类粘结剂 |
| WO2025071812A1 (en) | 2023-09-29 | 2025-04-03 | Dow Global Technologies Llc | Silicone - acrylic binder for liquid applied thermal insulation coating compositions to resist corrosion under insulation |
Family Cites Families (42)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2269059A (en) * | 1938-05-14 | 1942-01-06 | Corning Glass Works | Method of preparing finely comminuted oxides |
| US2765242A (en) * | 1952-02-29 | 1956-10-02 | Du Pont | Process of making reinforced silica gel and esterified silica gel |
| US2739075A (en) * | 1952-03-06 | 1956-03-20 | Du Pont | Product and process |
| US2832794A (en) * | 1952-11-05 | 1958-04-29 | Allied Chem & Dye Corp | Hydrolysis of organosilanes |
| US2901460A (en) * | 1956-02-07 | 1959-08-25 | Gen Electric | Halosilane hydrolysis with tetrahydrofuran and water |
| FR1568817A (https=) * | 1967-11-30 | 1969-05-30 | ||
| US3652214A (en) * | 1968-08-06 | 1972-03-28 | Nat Petro Chemicals Co Inc | Preparation of silica gels |
| DE2313073C2 (de) * | 1973-03-16 | 1984-11-29 | Istvan Prof. Dr. 6600 Saarbruecken Halasz | Verfahren zur chemischen Modifizierung von Oberflächen anorganischer Festkörper und deren Verwendung |
| DE2414478C3 (de) * | 1974-03-26 | 1978-07-13 | Deutsche Gold- Und Silber-Scheideanstalt Vormals Roessler, 6000 Frankfurt | Aerogelartige strukturierte Kieselsäure und Verfahren zu ihrer Herstellung |
| JPS6144711A (ja) * | 1984-08-03 | 1986-03-04 | Agency Of Ind Science & Technol | 微粒状シリカの製法 |
| DE3429671A1 (de) * | 1984-08-11 | 1986-02-20 | Basf Ag, 6700 Ludwigshafen | Verfahren zur herstellung von aerogelen |
| JPS6168314A (ja) * | 1984-09-07 | 1986-04-08 | Agency Of Ind Science & Technol | 多孔性シリカ、アルミナ、チタニアおよびジルコニアの製造方法 |
| US4561872A (en) * | 1984-10-22 | 1985-12-31 | Corning Glass Works | Method for making glass or ceramic article |
| FR2585973A1 (fr) * | 1985-08-06 | 1987-02-13 | Centre Nat Rech Scient | Gel monolithique et poudre d'oxydes d'elements de transition, procede de fabrication du gel et procede de preparation de couches minces de ces oxydes |
| JPS6252119A (ja) * | 1985-08-29 | 1987-03-06 | Tokuyama Soda Co Ltd | シリカ粒子の製造方法 |
| US4810415A (en) * | 1985-09-24 | 1989-03-07 | Dresser Industries, Inc. | Process for manufacturing ultra pure silica and resulting encapsulated products |
| DE3616133A1 (de) * | 1985-09-25 | 1987-11-19 | Merck Patent Gmbh | Kugelfoermige sio(pfeil abwaerts)2(pfeil abwaerts)-partikel |
| JPS62171914A (ja) * | 1986-01-25 | 1987-07-28 | Agency Of Ind Science & Technol | 微小球シリカの製造方法 |
| JPS6374911A (ja) * | 1986-09-19 | 1988-04-05 | Shin Etsu Chem Co Ltd | 微細球状シリカの製造法 |
| DE58900956D1 (de) * | 1988-11-22 | 1992-04-16 | Degussa | Verfahren zur herstellung von kieselsaeuren. |
| US5158758A (en) * | 1989-04-24 | 1992-10-27 | International Minerals & Chemical Corp. | Production of silica having high specific surface area |
| US5017540A (en) * | 1989-09-15 | 1991-05-21 | Sandoval Junior E | Silicon hydride surface intermediates for chemical separations apparatus |
| US4983369A (en) * | 1989-11-22 | 1991-01-08 | Allied-Signal Inc. | Process for forming highly uniform silica spheres |
| IT1240673B (it) * | 1990-04-24 | 1993-12-17 | Tenav | Microsfere di aerogels di ossidi inorganici a stretta distribuzione dei diametri dei pori e metodo per la loro preparazione |
| DE69128073T2 (de) * | 1990-08-23 | 1998-02-26 | Univ California As Represented | Verfahren zur herstellung von metalloxidaerogelen mit dichte weniger als 0,02 g/cm3 |
| US5409683A (en) * | 1990-08-23 | 1995-04-25 | Regents Of The University Of California | Method for producing metal oxide aerogels |
| US5106604A (en) * | 1991-03-12 | 1992-04-21 | Pradyot Agaskar | Use of metal salts in the synthesis of oligomeric hydrogensilsesquioxanes via hydrolysis/condensation reactions |
| US5206189A (en) * | 1991-10-25 | 1993-04-27 | Instituto Guido Donegani S.P.A. | Sol-gel method for the preparation of monolithic multicomponent oxide glasses |
| EP0585456B1 (en) * | 1992-02-18 | 1997-05-07 | Matsushita Electric Works Ltd | Process for producing hydrophobic aerogel |
| US5565142A (en) * | 1992-04-01 | 1996-10-15 | Deshpande; Ravindra | Preparation of high porosity xerogels by chemical surface modification. |
| KR100229829B1 (ko) * | 1992-05-20 | 1999-11-15 | 미리암디. 메코너헤이 | 무기질 겔의 제조방법 |
| US5395805A (en) * | 1993-03-25 | 1995-03-07 | Regents Of The University Of California | Method for making monolithic metal oxide aerogels |
| US5420168A (en) * | 1993-04-01 | 1995-05-30 | The Regents Of The University Of California | Method of low pressure and/or evaporative drying of aerogel |
| US5376449A (en) * | 1993-07-09 | 1994-12-27 | Martin Marietta Energy Systems, Inc. | Silica powders for powder evacuated thermal insulating panel and method |
| WO1995017347A1 (en) * | 1993-12-23 | 1995-06-29 | Ppg Industries, Inc. | Silica aerogel produced under subcritical conditions |
| US5470802A (en) * | 1994-05-20 | 1995-11-28 | Texas Instruments Incorporated | Method of making a semiconductor device using a low dielectric constant material |
| DE4422912A1 (de) * | 1994-06-30 | 1996-01-11 | Hoechst Ag | Xerogele, Verfahren zu ihrer Herstellung, sowie ihre Verwendung |
| US5473826A (en) * | 1994-08-19 | 1995-12-12 | Yazaki Corporation | Process for drying sol-gel derived porous bodies at elevated subcritical temperatures and pressures |
| DE4437424A1 (de) * | 1994-10-20 | 1996-04-25 | Hoechst Ag | Aerogelhaltige Zusammensetzung, Verfahren zu ihrer Herstellung sowie ihre Verwendung |
| US5807494A (en) * | 1994-12-15 | 1998-09-15 | Boes; Ralph Ulrich | Gel compositions comprising silica and functionalized carbon products |
| US5876686A (en) * | 1995-06-28 | 1999-03-02 | E. I. Du Pont De Nemours And Company | Process for making inorganic oxide gels in fluorocarbon solvents |
| AU1421597A (en) * | 1995-12-20 | 1997-07-14 | E.I. Du Pont De Nemours And Company | Rapid process for making silica gel and silicate polymer and low density gels made thereby |
-
1997
- 1997-04-09 US US08/831,564 patent/US6071486A/en not_active Expired - Fee Related
-
1998
- 1998-04-09 EP EP98914643A patent/EP0973691B1/en not_active Expired - Lifetime
- 1998-04-09 CN CNB988055031A patent/CN1204048C/zh not_active Expired - Fee Related
- 1998-04-09 CA CA002286149A patent/CA2286149A1/en not_active Abandoned
- 1998-04-09 BR BR9808518-2A patent/BR9808518A/pt active Search and Examination
- 1998-04-09 KR KR10-1999-7009294A patent/KR100529979B1/ko not_active Expired - Fee Related
- 1998-04-09 AU AU68948/98A patent/AU6894898A/en not_active Abandoned
- 1998-04-09 WO PCT/US1998/007109 patent/WO1998045210A1/en not_active Ceased
- 1998-04-09 JP JP54312398A patent/JP2001518873A/ja not_active Ceased
- 1998-04-09 DE DE69810094T patent/DE69810094T2/de not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| EP0973691B1 (en) | 2002-12-11 |
| KR100529979B1 (ko) | 2005-11-22 |
| US6071486A (en) | 2000-06-06 |
| CN1258262A (zh) | 2000-06-28 |
| DE69810094T2 (de) | 2003-09-25 |
| CN1204048C (zh) | 2005-06-01 |
| BR9808518A (pt) | 2000-10-31 |
| WO1998045210A1 (en) | 1998-10-15 |
| KR20010006214A (ko) | 2001-01-26 |
| DE69810094D1 (de) | 2003-01-23 |
| EP0973691A1 (en) | 2000-01-26 |
| AU6894898A (en) | 1998-10-30 |
| CA2286149A1 (en) | 1998-10-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2001518873A (ja) | 金属酸化物と有機金属酸化物組成物の製造方法 | |
| JP6960044B2 (ja) | 疎水性のシリカエアロゲル顆粒の製造方法 | |
| US10618815B2 (en) | Process for producing organically modified aerogels | |
| EP1047735B1 (en) | Method of preparing hydrophobic silica | |
| EP1741672B1 (en) | Process for producing hydrophobic silica powder | |
| JP2659155B2 (ja) | 疎水性エアロゲルの製造方法 | |
| CN115485239A (zh) | 具有增大的碱性稳定性的二氧化硅气凝胶 | |
| JPH0465006B2 (https=) | ||
| EP0849220A1 (en) | Process for producing aerogel | |
| WO1998045210A9 (en) | Process for producing metal oxide and organo-metal oxide compositions | |
| WO2009038393A2 (en) | Method for preparing surface-modified transparent bead type aerogel and aerogel prepared therefrom | |
| JP2001518835A (ja) | 低密度ゲル構造体の製造方法 | |
| JP2001019422A (ja) | 高気孔容積を有する親水性シリカゲルの製造法 | |
| JP2018518438A (ja) | 有機修飾エアロゲルの製造方法 | |
| JP2001507661A (ja) | 有機的に改良されたエアロゲルを製造するための方法およびそれらの使用 | |
| JP5267758B2 (ja) | 疎水性シリカ粉末の製造法 | |
| JPH05178863A (ja) | アルコール中弗化水素溶液とシリコンとを接触させるアルコキシシランの製造法 | |
| Park et al. | Effect of substituted alkyl groups on textural properties of ORMOSILs | |
| JP4128363B2 (ja) | 多孔質ゲルの製造方法 | |
| KR102704396B1 (ko) | 구형 실리카 제조방법 및 그로부터 제조된 구형 실리카 | |
| JP3971168B2 (ja) | 疎水性で軽量な多孔質シリカゲルの製造方法 | |
| KR20250066177A (ko) | 비표면적이 향상된 구형 알루미늄실리케이트 | |
| TW202335964A (zh) | 球狀表面處理二氧化矽氣凝膠及其製備方法 | |
| Al-Bawab | Formation of silica iron oxide glasses |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A521 | Request for written amendment filed |
Free format text: JAPANESE INTERMEDIATE CODE: A523 Effective date: 20050405 |
|
| A621 | Written request for application examination |
Free format text: JAPANESE INTERMEDIATE CODE: A621 Effective date: 20050405 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20080507 |
|
| A313 | Final decision of rejection without a dissenting response from the applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A313 Effective date: 20080930 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20081118 |