JP2001505955A5 - - Google Patents
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- Publication number
- JP2001505955A5 JP2001505955A5 JP1998526181A JP52618198A JP2001505955A5 JP 2001505955 A5 JP2001505955 A5 JP 2001505955A5 JP 1998526181 A JP1998526181 A JP 1998526181A JP 52618198 A JP52618198 A JP 52618198A JP 2001505955 A5 JP2001505955 A5 JP 2001505955A5
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Description
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19653681A DE19653681C2 (de) | 1996-12-13 | 1996-12-13 | Verfahren zur elektrolytischen Abscheidung von Kupferschichten mit gleichmäßiger Schichtdicke und guten optischen und metallphysikalischen Eigenschaften und Anwendung des Verfahrens |
DE19653681.2 | 1996-12-13 | ||
PCT/EP1997/006786 WO1998026114A1 (de) | 1996-12-13 | 1997-12-04 | Verfahren zur elektrolytischen abscheidung von kupferschichten |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2001505955A JP2001505955A (ja) | 2001-05-08 |
JP2001505955A5 true JP2001505955A5 (ja) | 2005-05-12 |
JP4221064B2 JP4221064B2 (ja) | 2009-02-12 |
Family
ID=7815786
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP52618198A Expired - Lifetime JP4221064B2 (ja) | 1996-12-13 | 1997-12-04 | 銅層の電解析出方法 |
Country Status (8)
Country | Link |
---|---|
US (1) | US6129830A (ja) |
EP (1) | EP0944749B1 (ja) |
JP (1) | JP4221064B2 (ja) |
KR (1) | KR100546989B1 (ja) |
AT (1) | ATE204035T1 (ja) |
CA (1) | CA2275214C (ja) |
DE (2) | DE19653681C2 (ja) |
WO (1) | WO1998026114A1 (ja) |
Families Citing this family (32)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19915146C1 (de) * | 1999-01-21 | 2000-07-06 | Atotech Deutschland Gmbh | Verfahren zum galvanischen Bilden von Leiterstrukturen aus hochreinem Kupfer bei der Herstellung von integrierten Schaltungen |
JP4394234B2 (ja) * | 2000-01-20 | 2010-01-06 | 日鉱金属株式会社 | 銅電気めっき液及び銅電気めっき方法 |
US6503375B1 (en) * | 2000-02-11 | 2003-01-07 | Applied Materials, Inc | Electroplating apparatus using a perforated phosphorus doped consumable anode |
JP2001267726A (ja) * | 2000-03-22 | 2001-09-28 | Toyota Autom Loom Works Ltd | 配線基板の電解メッキ方法及び配線基板の電解メッキ装置 |
US6491806B1 (en) * | 2000-04-27 | 2002-12-10 | Intel Corporation | Electroplating bath composition |
US6776893B1 (en) * | 2000-11-20 | 2004-08-17 | Enthone Inc. | Electroplating chemistry for the CU filling of submicron features of VLSI/ULSI interconnect |
JP4806498B2 (ja) * | 2001-08-01 | 2011-11-02 | 凸版印刷株式会社 | プリント配線基板の製造装置および製造方法 |
EP1310582A1 (en) * | 2001-11-07 | 2003-05-14 | Shipley Company LLC | Process for electrolytic copper plating |
US7316772B2 (en) * | 2002-03-05 | 2008-01-08 | Enthone Inc. | Defect reduction in electrodeposited copper for semiconductor applications |
US8002962B2 (en) | 2002-03-05 | 2011-08-23 | Enthone Inc. | Copper electrodeposition in microelectronics |
DE10259362A1 (de) * | 2002-12-18 | 2004-07-08 | Siemens Ag | Verfahren zum Abscheiden einer Legierung auf ein Substrat |
KR20040073974A (ko) * | 2003-02-14 | 2004-08-21 | 롬 앤드 하스 일렉트로닉 머트어리얼즈, 엘.엘.씨. | 전기도금 조성물 |
DE602005022650D1 (de) * | 2004-04-26 | 2010-09-16 | Rohm & Haas Elect Mat | Verbessertes Plattierungsverfahren |
TW200632147A (ja) * | 2004-11-12 | 2006-09-16 | ||
EP1717351A1 (de) * | 2005-04-27 | 2006-11-02 | Enthone Inc. | Galvanikbad |
US20070158199A1 (en) * | 2005-12-30 | 2007-07-12 | Haight Scott M | Method to modulate the surface roughness of a plated deposit and create fine-grained flat bumps |
US20070178697A1 (en) * | 2006-02-02 | 2007-08-02 | Enthone Inc. | Copper electrodeposition in microelectronics |
US8784634B2 (en) | 2006-03-30 | 2014-07-22 | Atotech Deutschland Gmbh | Electrolytic method for filling holes and cavities with metals |
US7887693B2 (en) * | 2007-06-22 | 2011-02-15 | Maria Nikolova | Acid copper electroplating bath composition |
US7905994B2 (en) | 2007-10-03 | 2011-03-15 | Moses Lake Industries, Inc. | Substrate holder and electroplating system |
JP2009167506A (ja) * | 2008-01-21 | 2009-07-30 | Ebara Udylite Kk | 酸性電解銅めっき液およびこれを用いる微細配線回路の作製方法 |
DE102008031003B4 (de) | 2008-06-30 | 2010-04-15 | Siemens Aktiengesellschaft | Verfahren zum Erzeugen einer CNT enthaltenen Schicht aus einer ionischen Flüssigkeit |
US20100206737A1 (en) * | 2009-02-17 | 2010-08-19 | Preisser Robert F | Process for electrodeposition of copper chip to chip, chip to wafer and wafer to wafer interconnects in through-silicon vias (tsv) |
US8262894B2 (en) | 2009-04-30 | 2012-09-11 | Moses Lake Industries, Inc. | High speed copper plating bath |
EP2392694A1 (en) * | 2010-06-02 | 2011-12-07 | ATOTECH Deutschland GmbH | Method for etching of copper and copper alloys |
EP2518187A1 (en) | 2011-04-26 | 2012-10-31 | Atotech Deutschland GmbH | Aqueous acidic bath for electrolytic deposition of copper |
PL2620529T3 (pl) * | 2012-01-25 | 2014-09-30 | Atotech Deutschland Gmbh | Sposób wytwarzania matowych warstw miedzianych |
JP6216522B2 (ja) * | 2013-03-14 | 2017-10-18 | 大日本印刷株式会社 | インターポーザー基板の製造方法。 |
US10494732B2 (en) | 2016-05-19 | 2019-12-03 | Atotech Deutschland Gmbh | Method for monitoring the total amount of brighteners in an acidic copper/copper alloy plating bath and controlled process for plating |
JP6909582B2 (ja) * | 2017-01-18 | 2021-07-28 | 株式会社Jcu | 着色用めっき液および着色方法 |
KR20210062369A (ko) * | 2019-11-21 | 2021-05-31 | 에스케이넥실리스 주식회사 | 찢김 또는 주름 불량을 방지할 수 있는 전해동박, 그것을 포함하는 전극, 그것을 포함하는 이차전지, 및 그것의 제조방법 |
TW202342827A (zh) * | 2022-03-31 | 2023-11-01 | 日商奧野製藥工業股份有限公司 | Pr脈衝電解用銅鍍敷液、及利用pr脈衝電解法之銅鍍敷方法 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB662217A (en) * | 1948-10-13 | 1951-12-05 | Westinghouse Electric Int Co | Improvements in or relating to the electrodeposition of copper |
DD215589B5 (de) * | 1983-05-11 | 1994-06-01 | Heinz Dr Rer Nat Liebscher | Verfahren zur elektrolytischen Metallabscheidung bei erzwungener Konvektion |
DD261613A1 (de) * | 1987-06-05 | 1988-11-02 | Leipzig Galvanotechnik | Verfahren zur elektrolytischen kupferabscheidung aus sauren elektrolyten mit dimensionsstabiler anode |
GB8801827D0 (en) * | 1988-01-27 | 1988-02-24 | Jct Controls Ltd | Improvements in electrochemical processes |
CN1045770A (zh) * | 1989-03-18 | 1990-10-03 | 王英 | 用膜法蒸馏技术分离浓缩醋酸铵与氢氧化铵的系统 |
GB8913561D0 (en) * | 1989-06-13 | 1989-08-02 | Learonal Uk Plc | Method of stabilising an organic additive in an electroplating solution |
DE4344387C2 (de) * | 1993-12-24 | 1996-09-05 | Atotech Deutschland Gmbh | Verfahren zur elektrolytischen Abscheidung von Kupfer und Anordnung zur Durchführung des Verfahrens |
JP2866300B2 (ja) * | 1994-03-07 | 1999-03-08 | 生物系特定産業技術研究推進機構 | 運搬作業車 |
JPH0967693A (ja) * | 1995-08-29 | 1997-03-11 | Nikko Gould Foil Kk | 電解銅箔の製造方法 |
-
1996
- 1996-12-13 DE DE19653681A patent/DE19653681C2/de not_active Expired - Fee Related
-
1997
- 1997-12-04 US US09/319,423 patent/US6129830A/en not_active Expired - Lifetime
- 1997-12-04 DE DE59704260T patent/DE59704260D1/de not_active Expired - Lifetime
- 1997-12-04 EP EP97952879A patent/EP0944749B1/de not_active Expired - Lifetime
- 1997-12-04 JP JP52618198A patent/JP4221064B2/ja not_active Expired - Lifetime
- 1997-12-04 CA CA002275214A patent/CA2275214C/en not_active Expired - Fee Related
- 1997-12-04 WO PCT/EP1997/006786 patent/WO1998026114A1/de not_active Application Discontinuation
- 1997-12-04 AT AT97952879T patent/ATE204035T1/de active
- 1997-12-04 KR KR1019997004258A patent/KR100546989B1/ko not_active IP Right Cessation