GB662217A - Improvements in or relating to the electrodeposition of copper - Google Patents

Improvements in or relating to the electrodeposition of copper

Info

Publication number
GB662217A
GB662217A GB24159/49A GB2415949A GB662217A GB 662217 A GB662217 A GB 662217A GB 24159/49 A GB24159/49 A GB 24159/49A GB 2415949 A GB2415949 A GB 2415949A GB 662217 A GB662217 A GB 662217A
Authority
GB
United Kingdom
Prior art keywords
copper
cadmium
electrolyte
current
zinc
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
GB24159/49A
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Westinghouse Electric International Co
Original Assignee
Westinghouse Electric International Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Westinghouse Electric International Co filed Critical Westinghouse Electric International Co
Publication of GB662217A publication Critical patent/GB662217A/en
Expired legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/615Microstructure of the layers, e.g. mixed structure
    • C25D5/617Crystalline layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/38Electroplating: Baths therefor from solutions of copper
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/18Electroplating using modulated, pulsed or reversing current
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611Smooth layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/623Porosity of the layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)

Abstract

662,217. Electrodeposition of copper. WESTINGHOUSE ELECTRIC INTERNATIONAL CO. Sept. 20, 1949 [Oct. 13, 1948], No. 24159/49. Drawings to Specification. Class 41] An aqueous acid copper sulphate electrolyte, for the electrodeposition of copper, contains between 0.5 and 0.005 ozs per U.S. gallon of a metal from the groups consisting of zinc and cadmium. The zinc or cadmium may be added to the electrolyte as salts, for example, cadmium sulphate or oxide, or zinc sulphate or oxide. Alternatively the metal may be added as an anode of zinc or cadmium or an alloy of the two, a deplating current being applied to cause the anode to dissolve in the electrolyte. A small amount of a wetting agent may be present in the electrolyte. In the electrodeposition, there may be used a periodically-reversed current somewhat as in the process described in Specification 630,165. For example, the member to be plated may be subjected in the electrolyte to a plating current as cathode for a period of between 40 seconds and 0.01 seconds, then to a deplating current as anode for a period between 20 seconds and 0.002 seconds, the magnitude and time of application of the deplating current being sufficient to apply between 10 and 75 per cent of the Coulombs of current applied during the preceding plating period, alternate plating and deplating continuing until a deposit of copper of desired thickness has been applied. The anode may be an alloy of copper containing at least 95 per cent by weight of copper and between 0.005 and 5 per cent by weight of at least one metal from the group consisting of cadmium and zinc. Specification 633,780 is referred to.
GB24159/49A 1948-10-13 1949-09-20 Improvements in or relating to the electrodeposition of copper Expired GB662217A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US662217XA 1948-10-13 1948-10-13

Publications (1)

Publication Number Publication Date
GB662217A true GB662217A (en) 1951-12-05

Family

ID=22068076

Family Applications (1)

Application Number Title Priority Date Filing Date
GB24159/49A Expired GB662217A (en) 1948-10-13 1949-09-20 Improvements in or relating to the electrodeposition of copper

Country Status (1)

Country Link
GB (1) GB662217A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE925029C (en) * 1952-10-21 1955-03-10 Westinghouse Electric Corp Process for the electrolytic deposition of copper on objects
WO1998026114A1 (en) * 1996-12-13 1998-06-18 Atotech Deutschland Gmbh Process for the electrolytic deposition of copper layers

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE925029C (en) * 1952-10-21 1955-03-10 Westinghouse Electric Corp Process for the electrolytic deposition of copper on objects
WO1998026114A1 (en) * 1996-12-13 1998-06-18 Atotech Deutschland Gmbh Process for the electrolytic deposition of copper layers
US6129830A (en) * 1996-12-13 2000-10-10 Atotech Deutschland Gmbh Process for the electrolytic deposition of copper layers

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