GB662217A - Improvements in or relating to the electrodeposition of copper - Google Patents
Improvements in or relating to the electrodeposition of copperInfo
- Publication number
- GB662217A GB662217A GB24159/49A GB2415949A GB662217A GB 662217 A GB662217 A GB 662217A GB 24159/49 A GB24159/49 A GB 24159/49A GB 2415949 A GB2415949 A GB 2415949A GB 662217 A GB662217 A GB 662217A
- Authority
- GB
- United Kingdom
- Prior art keywords
- copper
- cadmium
- electrolyte
- current
- zinc
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/615—Microstructure of the layers, e.g. mixed structure
- C25D5/617—Crystalline layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D3/00—Electroplating: Baths therefor
- C25D3/02—Electroplating: Baths therefor from solutions
- C25D3/38—Electroplating: Baths therefor from solutions of copper
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/18—Electroplating using modulated, pulsed or reversing current
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/605—Surface topography of the layers, e.g. rough, dendritic or nodular layers
- C25D5/611—Smooth layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/60—Electroplating characterised by the structure or texture of the layers
- C25D5/623—Porosity of the layers
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
- C25D5/627—Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Crystallography & Structural Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
Abstract
662,217. Electrodeposition of copper. WESTINGHOUSE ELECTRIC INTERNATIONAL CO. Sept. 20, 1949 [Oct. 13, 1948], No. 24159/49. Drawings to Specification. Class 41] An aqueous acid copper sulphate electrolyte, for the electrodeposition of copper, contains between 0.5 and 0.005 ozs per U.S. gallon of a metal from the groups consisting of zinc and cadmium. The zinc or cadmium may be added to the electrolyte as salts, for example, cadmium sulphate or oxide, or zinc sulphate or oxide. Alternatively the metal may be added as an anode of zinc or cadmium or an alloy of the two, a deplating current being applied to cause the anode to dissolve in the electrolyte. A small amount of a wetting agent may be present in the electrolyte. In the electrodeposition, there may be used a periodically-reversed current somewhat as in the process described in Specification 630,165. For example, the member to be plated may be subjected in the electrolyte to a plating current as cathode for a period of between 40 seconds and 0.01 seconds, then to a deplating current as anode for a period between 20 seconds and 0.002 seconds, the magnitude and time of application of the deplating current being sufficient to apply between 10 and 75 per cent of the Coulombs of current applied during the preceding plating period, alternate plating and deplating continuing until a deposit of copper of desired thickness has been applied. The anode may be an alloy of copper containing at least 95 per cent by weight of copper and between 0.005 and 5 per cent by weight of at least one metal from the group consisting of cadmium and zinc. Specification 633,780 is referred to.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US662217XA | 1948-10-13 | 1948-10-13 |
Publications (1)
Publication Number | Publication Date |
---|---|
GB662217A true GB662217A (en) | 1951-12-05 |
Family
ID=22068076
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
GB24159/49A Expired GB662217A (en) | 1948-10-13 | 1949-09-20 | Improvements in or relating to the electrodeposition of copper |
Country Status (1)
Country | Link |
---|---|
GB (1) | GB662217A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE925029C (en) * | 1952-10-21 | 1955-03-10 | Westinghouse Electric Corp | Process for the electrolytic deposition of copper on objects |
WO1998026114A1 (en) * | 1996-12-13 | 1998-06-18 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of copper layers |
-
1949
- 1949-09-20 GB GB24159/49A patent/GB662217A/en not_active Expired
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE925029C (en) * | 1952-10-21 | 1955-03-10 | Westinghouse Electric Corp | Process for the electrolytic deposition of copper on objects |
WO1998026114A1 (en) * | 1996-12-13 | 1998-06-18 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of copper layers |
US6129830A (en) * | 1996-12-13 | 2000-10-10 | Atotech Deutschland Gmbh | Process for the electrolytic deposition of copper layers |
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