JP2001351858A - アイリスダイヤフラム - Google Patents

アイリスダイヤフラム

Info

Publication number
JP2001351858A
JP2001351858A JP2001104974A JP2001104974A JP2001351858A JP 2001351858 A JP2001351858 A JP 2001351858A JP 2001104974 A JP2001104974 A JP 2001104974A JP 2001104974 A JP2001104974 A JP 2001104974A JP 2001351858 A JP2001351858 A JP 2001351858A
Authority
JP
Japan
Prior art keywords
diaphragm
grooved ring
iris diaphragm
curved portion
return
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP2001104974A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001351858A5 (https=
Inventor
Thomas Bischoff
トーマス・ビショッフ
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss AG
Original Assignee
Carl Zeiss AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss AG filed Critical Carl Zeiss AG
Publication of JP2001351858A publication Critical patent/JP2001351858A/ja
Publication of JP2001351858A5 publication Critical patent/JP2001351858A5/ja
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diaphragms For Cameras (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shutters For Cameras (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
JP2001104974A 2000-04-05 2001-04-03 アイリスダイヤフラム Withdrawn JP2001351858A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10016925A DE10016925A1 (de) 2000-04-05 2000-04-05 Irisblende
DE10016925.2 2000-04-05

Publications (2)

Publication Number Publication Date
JP2001351858A true JP2001351858A (ja) 2001-12-21
JP2001351858A5 JP2001351858A5 (https=) 2008-04-10

Family

ID=7637673

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2001104974A Withdrawn JP2001351858A (ja) 2000-04-05 2001-04-03 アイリスダイヤフラム

Country Status (6)

Country Link
US (1) US6466380B2 (https=)
EP (1) EP1150158B1 (https=)
JP (1) JP2001351858A (https=)
KR (1) KR20010095223A (https=)
DE (2) DE10016925A1 (https=)
TW (1) TW475075B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10219514A1 (de) 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
DE10328972A1 (de) * 2002-06-28 2004-01-22 Carl Zeiss Verfahren und Vorrichtung zum Ausrichten von optischen Elementen
AU2003250898A1 (en) * 2002-08-08 2004-03-11 Carl Zeiss Smt Ag Device for receiving an optical module in an imaging unit
DE10246828A1 (de) * 2002-10-08 2004-04-22 Carl Zeiss Smt Ag Objektiv, insbesondere Projektionsobjektiv in der Mikrolithographie
DE10344178B4 (de) * 2003-09-24 2006-08-10 Carl Zeiss Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
US7085080B2 (en) * 2003-12-06 2006-08-01 Carl Zeiss Smt Ag Low-deformation support device of an optical element
DE10359576A1 (de) * 2003-12-18 2005-07-28 Carl Zeiss Smt Ag Verfahren zur Herstellung einer optischen Einheit
DE102008000967B4 (de) 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
EP2762940B1 (en) * 2011-09-30 2020-09-23 FUJIFILM Corporation Lens device, and imaging device fitted with said lens device
DE102012111731B4 (de) 2012-12-03 2017-10-12 Carl Zeiss Industrielle Messtechnik Gmbh Irisblende und optische Vorrichtung
CN105388610B (zh) * 2015-09-18 2018-02-09 江苏南大五维电子科技有限公司 一种连续可调光强的光衰减装置
CN109143724B (zh) * 2018-11-08 2023-12-22 山东理工大学 一种可调光圈装置
CN113885269B (zh) * 2021-10-29 2023-03-31 河南皓泽电子股份有限公司 镜头光圈调节装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2949076A (en) * 1955-06-16 1960-08-16 Compur Werk Friedrich Deckel Iris diaphragm
DE2726144A1 (de) * 1977-06-10 1978-12-14 Zeiss Carl Fa Automatische springblende fuer objektive zu photographischen kameras
JPS5642219A (en) * 1979-09-17 1981-04-20 Canon Inc Electromagnetic drive diaphragm device
US4695145A (en) * 1985-02-07 1987-09-22 Canon Kabushiki Kaisha Motor built-in lens mounting
US5072249A (en) * 1988-11-28 1991-12-10 Canon Kabushiki Kaisha Diaphragm device
JPH03228039A (ja) * 1989-11-16 1991-10-09 Fuji Photo Film Co Ltd 絞りの電磁駆動装置
JP3733177B2 (ja) * 1996-07-02 2006-01-11 キヤノン株式会社 回転駆動装置及び該回転駆動装置を備えた光学機器

Also Published As

Publication number Publication date
KR20010095223A (ko) 2001-11-03
DE10016925A1 (de) 2001-10-11
EP1150158A1 (de) 2001-10-31
US6466380B2 (en) 2002-10-15
US20010028998A1 (en) 2001-10-11
EP1150158B1 (de) 2003-01-22
TW475075B (en) 2002-02-01
DE50100088D1 (de) 2003-02-27

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