KR20010095223A - 아이리스 다이어프램 - Google Patents

아이리스 다이어프램 Download PDF

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Publication number
KR20010095223A
KR20010095223A KR1020010017290A KR20010017290A KR20010095223A KR 20010095223 A KR20010095223 A KR 20010095223A KR 1020010017290 A KR1020010017290 A KR 1020010017290A KR 20010017290 A KR20010017290 A KR 20010017290A KR 20010095223 A KR20010095223 A KR 20010095223A
Authority
KR
South Korea
Prior art keywords
diaphragm
groove ring
iris diaphragm
curved portion
track
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
KR1020010017290A
Other languages
English (en)
Korean (ko)
Inventor
비숍토마스
Original Assignee
케이.그나찌그, 뮬러 리브만
칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by 케이.그나찌그, 뮬러 리브만, 칼-짜이스-스티프퉁 트레이딩 에즈 칼 짜이스 filed Critical 케이.그나찌그, 뮬러 리브만
Publication of KR20010095223A publication Critical patent/KR20010095223A/ko
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/02—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the intensity of light
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/005—Diaphragms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/7025—Size or form of projection system aperture, e.g. aperture stops, diaphragms or pupil obscuration; Control thereof

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Diaphragms For Cameras (AREA)
  • Mechanical Light Control Or Optical Switches (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Shutters For Cameras (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Lens Barrels (AREA)
KR1020010017290A 2000-04-05 2001-04-02 아이리스 다이어프램 Withdrawn KR20010095223A (ko)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE10016925A DE10016925A1 (de) 2000-04-05 2000-04-05 Irisblende
DE10016925.2 2000-04-05

Publications (1)

Publication Number Publication Date
KR20010095223A true KR20010095223A (ko) 2001-11-03

Family

ID=7637673

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020010017290A Withdrawn KR20010095223A (ko) 2000-04-05 2001-04-02 아이리스 다이어프램

Country Status (6)

Country Link
US (1) US6466380B2 (https=)
EP (1) EP1150158B1 (https=)
JP (1) JP2001351858A (https=)
KR (1) KR20010095223A (https=)
DE (2) DE10016925A1 (https=)
TW (1) TW475075B (https=)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10219514A1 (de) 2002-04-30 2003-11-13 Zeiss Carl Smt Ag Beleuchtungssystem, insbesondere für die EUV-Lithographie
DE10328972A1 (de) * 2002-06-28 2004-01-22 Carl Zeiss Verfahren und Vorrichtung zum Ausrichten von optischen Elementen
AU2003250898A1 (en) * 2002-08-08 2004-03-11 Carl Zeiss Smt Ag Device for receiving an optical module in an imaging unit
DE10246828A1 (de) * 2002-10-08 2004-04-22 Carl Zeiss Smt Ag Objektiv, insbesondere Projektionsobjektiv in der Mikrolithographie
DE10344178B4 (de) * 2003-09-24 2006-08-10 Carl Zeiss Smt Ag Halte- und Positioniervorrichtung für ein optisches Element
US7085080B2 (en) * 2003-12-06 2006-08-01 Carl Zeiss Smt Ag Low-deformation support device of an optical element
DE10359576A1 (de) * 2003-12-18 2005-07-28 Carl Zeiss Smt Ag Verfahren zur Herstellung einer optischen Einheit
DE102008000967B4 (de) 2008-04-03 2015-04-09 Carl Zeiss Smt Gmbh Projektionsbelichtungsanlage für die EUV-Mikrolithographie
EP2762940B1 (en) * 2011-09-30 2020-09-23 FUJIFILM Corporation Lens device, and imaging device fitted with said lens device
DE102012111731B4 (de) 2012-12-03 2017-10-12 Carl Zeiss Industrielle Messtechnik Gmbh Irisblende und optische Vorrichtung
CN105388610B (zh) * 2015-09-18 2018-02-09 江苏南大五维电子科技有限公司 一种连续可调光强的光衰减装置
CN109143724B (zh) * 2018-11-08 2023-12-22 山东理工大学 一种可调光圈装置
CN113885269B (zh) * 2021-10-29 2023-03-31 河南皓泽电子股份有限公司 镜头光圈调节装置

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2949076A (en) * 1955-06-16 1960-08-16 Compur Werk Friedrich Deckel Iris diaphragm
DE2726144A1 (de) * 1977-06-10 1978-12-14 Zeiss Carl Fa Automatische springblende fuer objektive zu photographischen kameras
JPS5642219A (en) * 1979-09-17 1981-04-20 Canon Inc Electromagnetic drive diaphragm device
US4695145A (en) * 1985-02-07 1987-09-22 Canon Kabushiki Kaisha Motor built-in lens mounting
US5072249A (en) * 1988-11-28 1991-12-10 Canon Kabushiki Kaisha Diaphragm device
JPH03228039A (ja) * 1989-11-16 1991-10-09 Fuji Photo Film Co Ltd 絞りの電磁駆動装置
JP3733177B2 (ja) * 1996-07-02 2006-01-11 キヤノン株式会社 回転駆動装置及び該回転駆動装置を備えた光学機器

Also Published As

Publication number Publication date
JP2001351858A (ja) 2001-12-21
DE10016925A1 (de) 2001-10-11
EP1150158A1 (de) 2001-10-31
US6466380B2 (en) 2002-10-15
US20010028998A1 (en) 2001-10-11
EP1150158B1 (de) 2003-01-22
TW475075B (en) 2002-02-01
DE50100088D1 (de) 2003-02-27

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Legal Events

Date Code Title Description
PA0109 Patent application

St.27 status event code: A-0-1-A10-A12-nap-PA0109

PG1501 Laying open of application

St.27 status event code: A-1-1-Q10-Q12-nap-PG1501

N231 Notification of change of applicant
PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

PC1203 Withdrawal of no request for examination

St.27 status event code: N-1-6-B10-B12-nap-PC1203

WITN Application deemed withdrawn, e.g. because no request for examination was filed or no examination fee was paid
R18-X000 Changes to party contact information recorded

St.27 status event code: A-3-3-R10-R18-oth-X000

PN2301 Change of applicant

St.27 status event code: A-3-3-R10-R13-asn-PN2301

St.27 status event code: A-3-3-R10-R11-asn-PN2301

P22-X000 Classification modified

St.27 status event code: A-2-2-P10-P22-nap-X000