JP2001296326A - 欠陥検査方法及び装置 - Google Patents

欠陥検査方法及び装置

Info

Publication number
JP2001296326A
JP2001296326A JP2000116180A JP2000116180A JP2001296326A JP 2001296326 A JP2001296326 A JP 2001296326A JP 2000116180 A JP2000116180 A JP 2000116180A JP 2000116180 A JP2000116180 A JP 2000116180A JP 2001296326 A JP2001296326 A JP 2001296326A
Authority
JP
Japan
Prior art keywords
detection electrode
conductive pattern
pattern
defect inspection
potential
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2000116180A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001296326A5 (enExample
Inventor
Shigeru Yamamoto
山本　　茂
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
ODP KK
Original Assignee
ODP KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by ODP KK filed Critical ODP KK
Priority to JP2000116180A priority Critical patent/JP2001296326A/ja
Publication of JP2001296326A publication Critical patent/JP2001296326A/ja
Publication of JP2001296326A5 publication Critical patent/JP2001296326A5/ja
Pending legal-status Critical Current

Links

Landscapes

  • Testing Of Short-Circuits, Discontinuities, Leakage, Or Incorrect Line Connections (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
JP2000116180A 2000-04-18 2000-04-18 欠陥検査方法及び装置 Pending JP2001296326A (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2000116180A JP2001296326A (ja) 2000-04-18 2000-04-18 欠陥検査方法及び装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2000116180A JP2001296326A (ja) 2000-04-18 2000-04-18 欠陥検査方法及び装置

Publications (2)

Publication Number Publication Date
JP2001296326A true JP2001296326A (ja) 2001-10-26
JP2001296326A5 JP2001296326A5 (enExample) 2007-06-07

Family

ID=18627674

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000116180A Pending JP2001296326A (ja) 2000-04-18 2000-04-18 欠陥検査方法及び装置

Country Status (1)

Country Link
JP (1) JP2001296326A (enExample)

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002101398A1 (fr) * 2001-05-24 2002-12-19 Oht Inc. Appareil d'inspection de schema de circuit, procede d'inspection de schema de circuit et support d'enregistrement
WO2004057350A1 (ja) * 2002-11-30 2004-07-08 Oht Inc. 回路パターン検査装置及びパターン検査方法
JP2005030850A (ja) * 2003-07-10 2005-02-03 Chi Mei Electronics Corp 電気的接続部の非接触検査方法及び非接触検査装置
JP2006337073A (ja) * 2005-05-31 2006-12-14 Advantest Corp 試験装置、及びデバイス製造方法
JP2007298277A (ja) * 2006-04-27 2007-11-15 Nidec-Read Corp 基板検査装置及び基板検査方法
CN103487960A (zh) * 2013-10-21 2014-01-01 京东方科技集团股份有限公司 光栅基板短路检测方法
JP2015043369A (ja) * 2013-08-26 2015-03-05 大日本印刷株式会社 膜検査方法、インプリント方法、パターン構造体の製造方法、インプリント用のモールド、インプリント用の転写基板、および、インプリント装置
KR102132860B1 (ko) * 2020-03-17 2020-07-10 주식회사 나노시스 기판 검사 시스템

Cited By (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2002101398A1 (fr) * 2001-05-24 2002-12-19 Oht Inc. Appareil d'inspection de schema de circuit, procede d'inspection de schema de circuit et support d'enregistrement
US6995566B2 (en) 2001-05-24 2006-02-07 Oht, Inc. Circuit pattern inspection apparatus, circuit pattern inspection method, and recording medium
WO2004057350A1 (ja) * 2002-11-30 2004-07-08 Oht Inc. 回路パターン検査装置及びパターン検査方法
US7088107B2 (en) 2002-11-30 2006-08-08 Oht Inc. Circuit pattern inspection instrument and pattern inspection method
JP2005030850A (ja) * 2003-07-10 2005-02-03 Chi Mei Electronics Corp 電気的接続部の非接触検査方法及び非接触検査装置
JP2006337073A (ja) * 2005-05-31 2006-12-14 Advantest Corp 試験装置、及びデバイス製造方法
JP2007298277A (ja) * 2006-04-27 2007-11-15 Nidec-Read Corp 基板検査装置及び基板検査方法
JP2015043369A (ja) * 2013-08-26 2015-03-05 大日本印刷株式会社 膜検査方法、インプリント方法、パターン構造体の製造方法、インプリント用のモールド、インプリント用の転写基板、および、インプリント装置
CN103487960A (zh) * 2013-10-21 2014-01-01 京东方科技集团股份有限公司 光栅基板短路检测方法
WO2015058528A1 (zh) * 2013-10-21 2015-04-30 京东方科技集团股份有限公司 光栅基板短路检测方法
KR102132860B1 (ko) * 2020-03-17 2020-07-10 주식회사 나노시스 기판 검사 시스템

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