JP2001177101A5 - - Google Patents

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Publication number
JP2001177101A5
JP2001177101A5 JP1999360882A JP36088299A JP2001177101A5 JP 2001177101 A5 JP2001177101 A5 JP 2001177101A5 JP 1999360882 A JP1999360882 A JP 1999360882A JP 36088299 A JP36088299 A JP 36088299A JP 2001177101 A5 JP2001177101 A5 JP 2001177101A5
Authority
JP
Japan
Prior art keywords
film
semiconductor
silicon oxynitride
semiconductor device
concentration
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
JP1999360882A
Other languages
English (en)
Japanese (ja)
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JP2001177101A (ja
Filing date
Publication date
Application filed filed Critical
Priority to JP36088299A priority Critical patent/JP2001177101A/ja
Priority claimed from JP36088299A external-priority patent/JP2001177101A/ja
Priority to TW089126800A priority patent/TW522439B/zh
Priority to US09/739,269 priority patent/US6632708B2/en
Publication of JP2001177101A publication Critical patent/JP2001177101A/ja
Priority to US10/367,819 priority patent/US6730992B2/en
Publication of JP2001177101A5 publication Critical patent/JP2001177101A5/ja
Withdrawn legal-status Critical Current

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JP36088299A 1999-12-20 1999-12-20 半導体装置およびその作製方法 Withdrawn JP2001177101A (ja)

Priority Applications (4)

Application Number Priority Date Filing Date Title
JP36088299A JP2001177101A (ja) 1999-12-20 1999-12-20 半導体装置およびその作製方法
TW089126800A TW522439B (en) 1999-12-20 2000-12-13 Semiconductor device and method of manufacturing the same
US09/739,269 US6632708B2 (en) 1999-12-20 2000-12-19 Semiconductor device and method of manufacturing the same
US10/367,819 US6730992B2 (en) 1999-12-20 2003-02-19 Semiconductor device and method of manufacturing the same

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP36088299A JP2001177101A (ja) 1999-12-20 1999-12-20 半導体装置およびその作製方法

Publications (2)

Publication Number Publication Date
JP2001177101A JP2001177101A (ja) 2001-06-29
JP2001177101A5 true JP2001177101A5 (enExample) 2004-11-18

Family

ID=18471316

Family Applications (1)

Application Number Title Priority Date Filing Date
JP36088299A Withdrawn JP2001177101A (ja) 1999-12-20 1999-12-20 半導体装置およびその作製方法

Country Status (3)

Country Link
US (2) US6632708B2 (enExample)
JP (1) JP2001177101A (enExample)
TW (1) TW522439B (enExample)

Families Citing this family (40)

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US6380558B1 (en) * 1998-12-29 2002-04-30 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method of fabricating the same
US6858898B1 (en) 1999-03-23 2005-02-22 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing the same
US6461899B1 (en) 1999-04-30 2002-10-08 Semiconductor Energy Laboratory, Co., Ltd. Oxynitride laminate “blocking layer” for thin film semiconductor devices
JP4493779B2 (ja) * 2000-01-31 2010-06-30 株式会社半導体エネルギー研究所 半導体装置およびその作製方法
JP5046452B2 (ja) * 2000-10-26 2012-10-10 株式会社半導体エネルギー研究所 半導体装置の作製方法
US6372561B1 (en) * 2001-06-01 2002-04-16 Advanced Micro Devices, Inc. Fabrication of fully depleted field effect transistor formed in SOI technology with a single implantation step
US8415208B2 (en) 2001-07-16 2013-04-09 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and peeling off method and method of manufacturing semiconductor device
JP5057619B2 (ja) 2001-08-01 2012-10-24 株式会社半導体エネルギー研究所 半導体装置の作製方法
TW554398B (en) * 2001-08-10 2003-09-21 Semiconductor Energy Lab Method of peeling off and method of manufacturing semiconductor device
US7351300B2 (en) 2001-08-22 2008-04-01 Semiconductor Energy Laboratory Co., Ltd. Peeling method and method of manufacturing semiconductor device
KR100944886B1 (ko) 2001-10-30 2010-03-03 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치의 제조 방법
TWI264121B (en) * 2001-11-30 2006-10-11 Semiconductor Energy Lab A display device, a method of manufacturing a semiconductor device, and a method of manufacturing a display device
US20040145381A1 (en) * 2001-12-28 2004-07-29 Jun Su Test fixture for die-level testing of planar lightwave circuits
US6953735B2 (en) 2001-12-28 2005-10-11 Semiconductor Energy Laboratory Co., Ltd. Method for fabricating a semiconductor device by transferring a layer to a support with curvature
TWI272556B (en) 2002-05-13 2007-02-01 Semiconductor Energy Lab Display device
JP3637332B2 (ja) * 2002-05-29 2005-04-13 株式会社東芝 半導体装置及びその製造方法
WO2004040648A1 (ja) * 2002-10-30 2004-05-13 Semiconductor Energy Laboratory Co., Ltd. 半導体装置および半導体装置の作製方法
TWI330269B (en) * 2002-12-27 2010-09-11 Semiconductor Energy Lab Separating method
JP4373085B2 (ja) 2002-12-27 2009-11-25 株式会社半導体エネルギー研究所 半導体装置の作製方法、剥離方法及び転写方法
JP2004247077A (ja) * 2003-02-12 2004-09-02 Semiconductor Energy Lab Co Ltd 発光装置及びその作製方法
TWI220072B (en) 2003-02-19 2004-08-01 Toppoly Optoelectronics Corp TFT structure with LDD region and manufacturing process of the same
KR100546394B1 (ko) * 2003-11-14 2006-01-26 삼성전자주식회사 비휘발성 메모리 소자 및 그 제조 방법
TWI254990B (en) * 2003-11-14 2006-05-11 Samsung Electronics Co Ltd Method of manufacturing a thin dielectric layer using a heat treatment and a semiconductor device formed using the method
JP3946724B2 (ja) * 2004-01-29 2007-07-18 シャープ株式会社 半導体装置の製造方法
US20060113586A1 (en) * 2004-11-29 2006-06-01 Macronix International Co., Ltd. Charge trapping dielectric structure for non-volatile memory
KR100707176B1 (ko) * 2005-01-13 2007-04-13 삼성전자주식회사 단결정 실리콘으로 구성된 박막 트랜지스터의 채널 영역형성 방법
EP1691383A1 (en) * 2005-02-14 2006-08-16 TDK Corporation Capacitor, method of making the same, filter using the same, and dielectric thin film used for the same
JP5005953B2 (ja) * 2006-05-18 2012-08-22 株式会社ジャパンディスプレイセントラル 薄膜トランジスタ
WO2008032543A1 (fr) * 2006-08-25 2008-03-20 Ube Industries, Ltd. Résonateur piézoélectrique à couche mince et son procédé de fabrication
JP4997961B2 (ja) * 2006-12-26 2012-08-15 宇部興産株式会社 集積化分波器
JP5827578B2 (ja) 2011-02-14 2015-12-02 株式会社半導体エネルギー研究所 光学素子の作製方法
JP5766467B2 (ja) * 2011-03-02 2015-08-19 株式会社東芝 薄膜トランジスタ及びその製造方法、表示装置
KR20130017312A (ko) * 2011-08-10 2013-02-20 삼성디스플레이 주식회사 표시 장치
KR20200019269A (ko) * 2012-06-29 2020-02-21 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
KR102309244B1 (ko) 2013-02-20 2021-10-05 가부시키가이샤 한도오따이 에네루기 켄큐쇼 반도체 장치
US9219120B2 (en) * 2013-10-15 2015-12-22 Taiwan Semiconductor Manufacturing Company, Ltd. Semiconductor film with adhesion layer and method for forming the same
WO2015087192A1 (en) 2013-12-12 2015-06-18 Semiconductor Energy Laboratory Co., Ltd. Peeling method and peeling apparatus
KR102223678B1 (ko) * 2014-07-25 2021-03-08 삼성디스플레이 주식회사 표시장치용 백플레인 및 그 제조 방법
CN114424325B (zh) * 2019-08-07 2025-12-05 应用材料公司 用于3d nand的修改的堆叠
CN115745417B (zh) * 2022-11-08 2024-07-19 福建华佳彩有限公司 一种使用在铟镓锌氧化物上的氮氧化硅成膜方法

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US5041888A (en) * 1989-09-18 1991-08-20 General Electric Company Insulator structure for amorphous silicon thin-film transistors
US5470768A (en) * 1992-08-07 1995-11-28 Fujitsu Limited Method for fabricating a thin-film transistor
TW264575B (enExample) 1993-10-29 1995-12-01 Handotai Energy Kenkyusho Kk
US5923962A (en) 1993-10-29 1999-07-13 Semiconductor Energy Laboratory Co., Ltd. Method for manufacturing a semiconductor device
JP3431033B2 (ja) 1993-10-29 2003-07-28 株式会社半導体エネルギー研究所 半導体作製方法
JP3464287B2 (ja) 1994-09-05 2003-11-05 株式会社半導体エネルギー研究所 半導体装置の作製方法
JP3645377B2 (ja) 1996-10-24 2005-05-11 株式会社半導体エネルギー研究所 集積回路の作製方法
JP3597331B2 (ja) 1996-10-24 2004-12-08 株式会社半導体エネルギー研究所 半導体装置の作製方法
US6087229A (en) * 1998-03-09 2000-07-11 Lsi Logic Corporation Composite semiconductor gate dielectrics
JP2000012864A (ja) * 1998-06-22 2000-01-14 Semiconductor Energy Lab Co Ltd 半導体装置の作製方法
US6461899B1 (en) * 1999-04-30 2002-10-08 Semiconductor Energy Laboratory, Co., Ltd. Oxynitride laminate “blocking layer” for thin film semiconductor devices
JP4493779B2 (ja) 2000-01-31 2010-06-30 株式会社半導体エネルギー研究所 半導体装置およびその作製方法
EP1266054B1 (en) * 2000-03-07 2006-12-20 Asm International N.V. Graded thin films
TW521226B (en) * 2000-03-27 2003-02-21 Semiconductor Energy Lab Electro-optical device

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