JP2001170471A - Ｎ，ｎ，ｎ′−トリアルキル尿素を用いた表面張力の低減化 - Google Patents

Ｎ，ｎ，ｎ′−トリアルキル尿素を用いた表面張力の低減化

Info

Publication number
JP2001170471A
JP2001170471A JP2000316318A JP2000316318A JP2001170471A JP 2001170471 A JP2001170471 A JP 2001170471A JP 2000316318 A JP2000316318 A JP 2000316318A JP 2000316318 A JP2000316318 A JP 2000316318A JP 2001170471 A JP2001170471 A JP 2001170471A
Authority
JP
Japan
Prior art keywords
weight
water
aqueous
composition
urea
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
JP2000316318A
Other languages
English (en)
Japanese (ja)
Other versions
JP2001170471A5 (cg-RX-API-DMAC7.html
Inventor
John Anthony Marsella
ジョン・アントニー・マーセーラ
Kevin Rodney Lassila
ケヴィン・ロドニー・ラーシーラ
Robert Lee Fowlkes
ロバート・リー・ファウルクス
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Publication of JP2001170471A publication Critical patent/JP2001170471A/ja
Publication of JP2001170471A5 publication Critical patent/JP2001170471A5/ja
Abandoned legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
    • C07C275/04—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms
    • C07C275/06—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/02—Emulsion paints including aerosols
    • C09D5/024—Emulsion paints including aerosols characterised by the additives
    • C09D5/027—Dispersing agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
    • C09K23/16—Amines or polyamines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/32—Amides; Substituted amides
    • C11D3/323—Amides; Substituted amides urea or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/906—Cleaning of wafer as interim step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Detergent Compositions (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
JP2000316318A 1999-10-18 2000-10-17 Ｎ，ｎ，ｎ′−トリアルキル尿素を用いた表面張力の低減化 Abandoned JP2001170471A (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/420214 1999-10-18
US09/420,214 US6281170B1 (en) 1999-10-18 1999-10-18 Surface tension reduction with N,N,N'-trialkkyl ureas

Publications (2)

Publication Number Publication Date
JP2001170471A true JP2001170471A (ja) 2001-06-26
JP2001170471A5 JP2001170471A5 (cg-RX-API-DMAC7.html) 2005-04-14

Family

ID=23665544

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2000316318A Abandoned JP2001170471A (ja) 1999-10-18 2000-10-17 Ｎ，ｎ，ｎ′−トリアルキル尿素を用いた表面張力の低減化

Country Status (6)

Country Link
US (1) US6281170B1 (cg-RX-API-DMAC7.html)
EP (1) EP1094095B1 (cg-RX-API-DMAC7.html)
JP (1) JP2001170471A (cg-RX-API-DMAC7.html)
KR (1) KR100378770B1 (cg-RX-API-DMAC7.html)
CN (1) CN1293221A (cg-RX-API-DMAC7.html)
DE (1) DE60012448T2 (cg-RX-API-DMAC7.html)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11263923A (ja) * 1997-11-17 1999-09-28 Air Prod And Chem Inc Ｎ，ｎ−ジアルキル尿素による表面張力の低下
JP2005146283A (ja) * 2003-11-12 2005-06-09 Samsung Electronics Co Ltd インク組成物
JP2007517987A (ja) * 2004-01-14 2007-07-05 ハイ シァー コーポレイション クロム酸塩を含まない耐腐食性コーティング

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6470691B1 (en) * 2000-06-13 2002-10-29 Atofina Chemicals, Inc. Fluid transport
US6437009B1 (en) * 2001-03-29 2002-08-20 Air Products And Chemicals, Inc. Low foam n-alkyltartarimide and n-alkylmalimide wetting agents
US6413914B1 (en) * 2001-03-29 2002-07-02 Air Products And Chemicals, Inc. Low foam N,N′-dialkylmalamide wetting agents
US6399543B1 (en) * 2001-03-29 2002-06-04 Air Products And Chemicals, Inc. Low foam N,N′-dialkyltartaramide wetting agents
US20030229164A1 (en) * 2002-06-10 2003-12-11 Meier Ingrid Kristine Low foam N-alkyltartarimide and N-alkylmalimide wetting agents
JP4508706B2 (ja) * 2004-04-09 2010-07-21 キヤノン株式会社 インクジェット記録方法
US7258878B2 (en) * 2004-12-20 2007-08-21 Kimberly-Clark Worldwide, Inc. Anti-microbial composition and methods of use thereof
US20060254459A1 (en) * 2005-05-16 2006-11-16 Konica Minolta Holdings, Inc. Ink-jet ink
KR100750125B1 (ko) * 2005-08-18 2007-08-21 삼성전자주식회사 잉크젯 잉크 조성물, 잉크 카트리지 및 잉크젯 기록장치
US10259973B2 (en) 2009-03-13 2019-04-16 Hi-Shear Corporation Anti-corrosion and low friction metal pigmented coating
US10563153B2 (en) 2010-05-20 2020-02-18 Ecolab Usa Inc. Rheology modified low foaming liquid antimicrobial compositions and methods of use thereof
US9138393B2 (en) 2013-02-08 2015-09-22 The Procter & Gamble Company Cosmetic compositions containing substituted azole and methods for improving the appearance of aging skin
US9144538B2 (en) 2013-02-08 2015-09-29 The Procter & Gamble Company Cosmetic compositions containing substituted azole and methods for alleviating the signs of photoaged skin

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2374187A (en) 1945-04-24 Detergent composition
US2335862A (en) 1942-03-25 1943-12-07 Walter C Klingel Insecticide spray composition and method of making the same
NL74817C (cg-RX-API-DMAC7.html) 1951-05-02
DK132665A (cg-RX-API-DMAC7.html) 1969-12-31
US3814705A (en) 1972-06-06 1974-06-04 Colgate Palmolive Co Low-foaming detergent compositions
US3965015A (en) 1972-08-01 1976-06-22 Colgate-Palmolive Company Bleach-resistant fabric softener
US4272413A (en) 1979-11-26 1981-06-09 Colgate-Palmolive Company Dialkylurea textile softening and antistatic agents
JPS6232453A (ja) 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用現像液
US5098478A (en) 1990-12-07 1992-03-24 Sun Chemical Corporation Water-based ink compositions
US5543268A (en) 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
US5562762A (en) 1995-05-17 1996-10-08 Lexmark International, Inc. Jet ink with amine surfactant
DE19602350B4 (de) 1996-01-24 2004-11-11 Institut Für Polymerforschung Dresden E.V. Wässriges Beschichtungsmittel für Verstärkungsfasern für den Einsatz in Epoxidharzmatrices und deren Verwendung
US5985968A (en) 1997-11-17 1999-11-16 Air Products And Chemicals, Inc. Surface tension reduction with N,N-dialkyl ureas
DE19853216B4 (de) 1997-11-25 2007-08-02 Mitsubishi Paper Mills Limited Verfahren zur Herstellung einer lithographischen Druckplatte und in demselben zu verwendende Behandlungslösung
US5922522A (en) 1998-04-29 1999-07-13 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US5972431A (en) 1998-07-29 1999-10-26 Air Products And Chemicals, Inc. Cyclic urea surfactants

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH11263923A (ja) * 1997-11-17 1999-09-28 Air Prod And Chem Inc Ｎ，ｎ−ジアルキル尿素による表面張力の低下
JP2005146283A (ja) * 2003-11-12 2005-06-09 Samsung Electronics Co Ltd インク組成物
JP2007517987A (ja) * 2004-01-14 2007-07-05 ハイ シァー コーポレイション クロム酸塩を含まない耐腐食性コーティング

Also Published As

Publication number Publication date
EP1094095A1 (en) 2001-04-25
EP1094095B1 (en) 2004-07-28
US6281170B1 (en) 2001-08-28
CN1293221A (zh) 2001-05-02
KR20010067337A (ko) 2001-07-12
KR100378770B1 (ko) 2003-04-07
DE60012448T2 (de) 2005-01-13
DE60012448D1 (de) 2004-09-02

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Legal Events

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A521 Request for written amendment filed

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Effective date: 20040604

A621 Written request for application examination

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A762 Written abandonment of application

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Effective date: 20050126