CN1293221A - 用n,n,n'－三烷基脲降低表面张力 - Google Patents

用n,n,n'－三烷基脲降低表面张力 Download PDF

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Publication number
CN1293221A
CN1293221A CN00131443A CN00131443A CN1293221A CN 1293221 A CN1293221 A CN 1293221A CN 00131443 A CN00131443 A CN 00131443A CN 00131443 A CN00131443 A CN 00131443A CN 1293221 A CN1293221 A CN 1293221A
Authority
CN
China
Prior art keywords
composition
urea
water
surface tension
trialkyl
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
CN00131443A
Other languages
English (en)
Chinese (zh)
Inventor
J·A·马瑟尔拉
K·R·拉斯拉
R·L·福尔克斯
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Products and Chemicals Inc
Original Assignee
Air Products and Chemicals Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Products and Chemicals Inc filed Critical Air Products and Chemicals Inc
Publication of CN1293221A publication Critical patent/CN1293221A/zh
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
    • C07C275/00—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups
    • C07C275/04—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms
    • C07C275/06—Derivatives of urea, i.e. compounds containing any of the groups, the nitrogen atoms not being part of nitro or nitroso groups having nitrogen atoms of urea groups bound to acyclic carbon atoms of an acyclic and saturated carbon skeleton
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/02—Printing inks
    • C09D11/03—Printing inks characterised by features other than the chemical nature of the binder
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D11/00—Inks
    • C09D11/30—Inkjet printing inks
    • C09D11/38—Inkjet printing inks characterised by non-macromolecular additives other than solvents, pigments or dyes
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
    • C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
    • C09D5/02—Emulsion paints including aerosols
    • C09D5/024—Emulsion paints including aerosols characterised by the additives
    • C09D5/027—Dispersing agents
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09J—ADHESIVES; NON-MECHANICAL ASPECTS OF ADHESIVE PROCESSES IN GENERAL; ADHESIVE PROCESSES NOT PROVIDED FOR ELSEWHERE; USE OF MATERIALS AS ADHESIVES
    • C09J11/00—Features of adhesives not provided for in group C09J9/00, e.g. additives
    • C09J11/02—Non-macromolecular additives
    • C09J11/06—Non-macromolecular additives organic
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K23/00—Use of substances as emulsifying, wetting, dispersing, or foam-producing agents
    • C09K23/16—Amines or polyamines
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D3/00—Other compounding ingredients of detergent compositions covered in group C11D1/00
    • C11D3/16—Organic compounds
    • C11D3/26—Organic compounds containing nitrogen
    • C11D3/32—Amides; Substituted amides
    • C11D3/323—Amides; Substituted amides urea or derivatives thereof
    • C—CHEMISTRY; METALLURGY
    • C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
    • C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
    • C11D2111/00—Cleaning compositions characterised by the objects to be cleaned; Cleaning compositions characterised by non-standard cleaning or washing processes
    • C11D2111/10—Objects to be cleaned
    • C11D2111/14—Hard surfaces
    • C11D2111/22—Electronic devices, e.g. PCBs or semiconductors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S438/00—Semiconductor device manufacturing: process
    • Y10S438/906—Cleaning of wafer as interim step

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Wood Science & Technology (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Oil, Petroleum & Natural Gas (AREA)
  • General Chemical & Material Sciences (AREA)
  • Dispersion Chemistry (AREA)
  • Emulsifying, Dispersing, Foam-Producing Or Wetting Agents (AREA)
  • Inks, Pencil-Leads, Or Crayons (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Paints Or Removers (AREA)
  • Detergent Compositions (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
CN00131443A 1999-10-18 2000-10-18 用n,n,n'－三烷基脲降低表面张力 Pending CN1293221A (zh)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US09/420,214 1999-10-18
US09/420,214 US6281170B1 (en) 1999-10-18 1999-10-18 Surface tension reduction with N,N,N'-trialkkyl ureas

Publications (1)

Publication Number Publication Date
CN1293221A true CN1293221A (zh) 2001-05-02

Family

ID=23665544

Family Applications (1)

Application Number Title Priority Date Filing Date
CN00131443A Pending CN1293221A (zh) 1999-10-18 2000-10-18 用n,n,n'－三烷基脲降低表面张力

Country Status (6)

Country Link
US (1) US6281170B1 (cg-RX-API-DMAC7.html)
EP (1) EP1094095B1 (cg-RX-API-DMAC7.html)
JP (1) JP2001170471A (cg-RX-API-DMAC7.html)
KR (1) KR100378770B1 (cg-RX-API-DMAC7.html)
CN (1) CN1293221A (cg-RX-API-DMAC7.html)
DE (1) DE60012448T2 (cg-RX-API-DMAC7.html)

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5985968A (en) * 1997-11-17 1999-11-16 Air Products And Chemicals, Inc. Surface tension reduction with N,N-dialkyl ureas
US6470691B1 (en) * 2000-06-13 2002-10-29 Atofina Chemicals, Inc. Fluid transport
US6437009B1 (en) * 2001-03-29 2002-08-20 Air Products And Chemicals, Inc. Low foam n-alkyltartarimide and n-alkylmalimide wetting agents
US6413914B1 (en) * 2001-03-29 2002-07-02 Air Products And Chemicals, Inc. Low foam N,N′-dialkylmalamide wetting agents
US6399543B1 (en) * 2001-03-29 2002-06-04 Air Products And Chemicals, Inc. Low foam N,N′-dialkyltartaramide wetting agents
US20030229164A1 (en) * 2002-06-10 2003-12-11 Meier Ingrid Kristine Low foam N-alkyltartarimide and N-alkylmalimide wetting agents
KR100538238B1 (ko) * 2003-11-12 2005-12-21 삼성전자주식회사 잉크 조성물
US7192639B2 (en) * 2004-01-14 2007-03-20 Hi-Shear Corporation Chromate free corrosion resistant coating
JP4508706B2 (ja) * 2004-04-09 2010-07-21 キヤノン株式会社 インクジェット記録方法
US7258878B2 (en) * 2004-12-20 2007-08-21 Kimberly-Clark Worldwide, Inc. Anti-microbial composition and methods of use thereof
US20060254459A1 (en) * 2005-05-16 2006-11-16 Konica Minolta Holdings, Inc. Ink-jet ink
KR100750125B1 (ko) * 2005-08-18 2007-08-21 삼성전자주식회사 잉크젯 잉크 조성물, 잉크 카트리지 및 잉크젯 기록장치
US10259973B2 (en) 2009-03-13 2019-04-16 Hi-Shear Corporation Anti-corrosion and low friction metal pigmented coating
US10563153B2 (en) 2010-05-20 2020-02-18 Ecolab Usa Inc. Rheology modified low foaming liquid antimicrobial compositions and methods of use thereof
US9138393B2 (en) 2013-02-08 2015-09-22 The Procter & Gamble Company Cosmetic compositions containing substituted azole and methods for improving the appearance of aging skin
US9144538B2 (en) 2013-02-08 2015-09-29 The Procter & Gamble Company Cosmetic compositions containing substituted azole and methods for alleviating the signs of photoaged skin

Family Cites Families (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2374187A (en) 1945-04-24 Detergent composition
US2335862A (en) 1942-03-25 1943-12-07 Walter C Klingel Insecticide spray composition and method of making the same
NL74817C (cg-RX-API-DMAC7.html) 1951-05-02
DK132665A (cg-RX-API-DMAC7.html) 1969-12-31
US3814705A (en) 1972-06-06 1974-06-04 Colgate Palmolive Co Low-foaming detergent compositions
US3965015A (en) 1972-08-01 1976-06-22 Colgate-Palmolive Company Bleach-resistant fabric softener
US4272413A (en) 1979-11-26 1981-06-09 Colgate-Palmolive Company Dialkylurea textile softening and antistatic agents
JPS6232453A (ja) 1985-08-06 1987-02-12 Tokyo Ohka Kogyo Co Ltd ポジ型ホトレジスト用現像液
US5098478A (en) 1990-12-07 1992-03-24 Sun Chemical Corporation Water-based ink compositions
US5543268A (en) 1992-05-14 1996-08-06 Tokyo Ohka Kogyo Co., Ltd. Developer solution for actinic ray-sensitive resist
US5562762A (en) 1995-05-17 1996-10-08 Lexmark International, Inc. Jet ink with amine surfactant
DE19602350B4 (de) 1996-01-24 2004-11-11 Institut Für Polymerforschung Dresden E.V. Wässriges Beschichtungsmittel für Verstärkungsfasern für den Einsatz in Epoxidharzmatrices und deren Verwendung
US5985968A (en) 1997-11-17 1999-11-16 Air Products And Chemicals, Inc. Surface tension reduction with N,N-dialkyl ureas
DE19853216B4 (de) 1997-11-25 2007-08-02 Mitsubishi Paper Mills Limited Verfahren zur Herstellung einer lithographischen Druckplatte und in demselben zu verwendende Behandlungslösung
US5922522A (en) 1998-04-29 1999-07-13 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US5972431A (en) 1998-07-29 1999-10-26 Air Products And Chemicals, Inc. Cyclic urea surfactants

Also Published As

Publication number Publication date
EP1094095A1 (en) 2001-04-25
JP2001170471A (ja) 2001-06-26
EP1094095B1 (en) 2004-07-28
US6281170B1 (en) 2001-08-28
KR20010067337A (ko) 2001-07-12
KR100378770B1 (ko) 2003-04-07
DE60012448T2 (de) 2005-01-13
DE60012448D1 (de) 2004-09-02

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C20 Patent right or utility model deemed to be abandoned or is abandoned