JP2001024308A5 - - Google Patents
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- Publication number
- JP2001024308A5 JP2001024308A5 JP1999194922A JP19492299A JP2001024308A5 JP 2001024308 A5 JP2001024308 A5 JP 2001024308A5 JP 1999194922 A JP1999194922 A JP 1999194922A JP 19492299 A JP19492299 A JP 19492299A JP 2001024308 A5 JP2001024308 A5 JP 2001024308A5
- Authority
- JP
- Japan
- Prior art keywords
- plated
- plating
- plating solution
- substrate
- pores
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000007747 plating Methods 0.000 claims description 29
- 239000000758 substrate Substances 0.000 claims description 9
- 239000011148 porous material Substances 0.000 claims description 8
- 230000002209 hydrophobic effect Effects 0.000 claims 1
- 239000007788 liquid Substances 0.000 claims 1
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19492299A JP3877911B2 (ja) | 1999-07-08 | 1999-07-08 | めっき装置 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP19492299A JP3877911B2 (ja) | 1999-07-08 | 1999-07-08 | めっき装置 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2001024308A JP2001024308A (ja) | 2001-01-26 |
| JP2001024308A5 true JP2001024308A5 (enExample) | 2004-12-02 |
| JP3877911B2 JP3877911B2 (ja) | 2007-02-07 |
Family
ID=16332586
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP19492299A Expired - Fee Related JP3877911B2 (ja) | 1999-07-08 | 1999-07-08 | めっき装置 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JP3877911B2 (enExample) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6585876B2 (en) * | 1999-04-08 | 2003-07-01 | Applied Materials Inc. | Flow diffuser to be used in electro-chemical plating system and method |
| JP4694008B2 (ja) * | 2001-02-15 | 2011-06-01 | イビデン株式会社 | 電解めっき装置、電気めっき装置用めっき液保持部材、銅配線半導体の製造方法 |
| TWI229367B (en) | 2002-12-26 | 2005-03-11 | Canon Kk | Chemical treatment apparatus and chemical treatment method |
| JP2005248277A (ja) * | 2004-03-05 | 2005-09-15 | Ebara Corp | メッキ装置の電極構造 |
| US7563348B2 (en) | 2004-06-28 | 2009-07-21 | Lam Research Corporation | Electroplating head and method for operating the same |
-
1999
- 1999-07-08 JP JP19492299A patent/JP3877911B2/ja not_active Expired - Fee Related
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