JP2000501370A - 製造過程において生成塩の沈殿が生じる、有機変性したエーロゲルの製造法 - Google Patents
製造過程において生成塩の沈殿が生じる、有機変性したエーロゲルの製造法Info
- Publication number
- JP2000501370A JP2000501370A JP9517842A JP51784297A JP2000501370A JP 2000501370 A JP2000501370 A JP 2000501370A JP 9517842 A JP9517842 A JP 9517842A JP 51784297 A JP51784297 A JP 51784297A JP 2000501370 A JP2000501370 A JP 2000501370A
- Authority
- JP
- Japan
- Prior art keywords
- gel
- water glass
- sol
- acid
- organically modified
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Ceased
Links
- 150000003839 salts Chemical class 0.000 title claims abstract description 22
- 238000004519 manufacturing process Methods 0.000 title claims abstract description 20
- 239000004964 aerogel Substances 0.000 title claims abstract description 17
- NTHWMYGWWRZVTN-UHFFFAOYSA-N sodium silicate Chemical compound [Na+].[Na+].[O-][Si]([O-])=O NTHWMYGWWRZVTN-UHFFFAOYSA-N 0.000 claims abstract description 30
- 235000019353 potassium silicate Nutrition 0.000 claims abstract description 29
- RMAQACBXLXPBSY-UHFFFAOYSA-N silicic acid Chemical compound O[Si](O)(O)O RMAQACBXLXPBSY-UHFFFAOYSA-N 0.000 claims abstract description 21
- 238000001035 drying Methods 0.000 claims abstract description 20
- 239000002253 acid Substances 0.000 claims abstract description 13
- 239000007864 aqueous solution Substances 0.000 claims abstract description 11
- 235000012239 silicon dioxide Nutrition 0.000 claims abstract description 11
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims abstract description 10
- 150000001768 cations Chemical class 0.000 claims abstract description 9
- 239000003960 organic solvent Substances 0.000 claims abstract description 9
- 229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 8
- BPQQTUXANYXVAA-UHFFFAOYSA-N Orthosilicate Chemical compound [O-][Si]([O-])([O-])[O-] BPQQTUXANYXVAA-UHFFFAOYSA-N 0.000 claims abstract description 7
- 238000005406 washing Methods 0.000 claims abstract description 7
- 150000007522 mineralic acids Chemical class 0.000 claims abstract description 6
- 150000007524 organic acids Chemical class 0.000 claims abstract description 6
- 238000000034 method Methods 0.000 claims description 36
- 239000000243 solution Substances 0.000 claims description 24
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 claims description 18
- 239000003795 chemical substances by application Substances 0.000 claims description 15
- 239000002904 solvent Substances 0.000 claims description 13
- 239000011734 sodium Substances 0.000 claims description 10
- -1 NH 4 OH Chemical compound 0.000 claims description 9
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 claims description 8
- 239000000835 fiber Substances 0.000 claims description 8
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 claims description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 5
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 claims description 4
- 229910052782 aluminium Inorganic materials 0.000 claims description 4
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 claims description 4
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims description 3
- 150000001338 aliphatic hydrocarbons Chemical class 0.000 claims description 3
- 239000000010 aprotic solvent Substances 0.000 claims description 3
- 150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
- 239000008119 colloidal silica Substances 0.000 claims description 3
- 150000002148 esters Chemical class 0.000 claims description 3
- 150000002576 ketones Chemical class 0.000 claims description 3
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 3
- 238000002360 preparation method Methods 0.000 claims description 3
- 239000003586 protic polar solvent Substances 0.000 claims description 3
- 238000006884 silylation reaction Methods 0.000 claims description 3
- 229910052708 sodium Inorganic materials 0.000 claims description 3
- RLQWHDODQVOVKU-UHFFFAOYSA-N tetrapotassium;silicate Chemical compound [K+].[K+].[K+].[K+].[O-][Si]([O-])([O-])[O-] RLQWHDODQVOVKU-UHFFFAOYSA-N 0.000 claims description 3
- 150000003609 titanium compounds Chemical class 0.000 claims description 3
- 229910052726 zirconium Inorganic materials 0.000 claims description 3
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 claims description 2
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 claims description 2
- 125000000217 alkyl group Chemical group 0.000 claims description 2
- 125000000113 cyclohexyl group Chemical group [H]C1([H])C([H])([H])C([H])([H])C([H])(*)C([H])([H])C1([H])[H] 0.000 claims description 2
- 229910000077 silane Inorganic materials 0.000 claims description 2
- 238000006068 polycondensation reaction Methods 0.000 abstract description 2
- 230000001376 precipitating effect Effects 0.000 abstract 1
- 239000000499 gel Substances 0.000 description 55
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 13
- CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 11
- IJOOHPMOJXWVHK-UHFFFAOYSA-N chlorotrimethylsilane Chemical compound C[Si](C)(C)Cl IJOOHPMOJXWVHK-UHFFFAOYSA-N 0.000 description 6
- 239000000203 mixture Substances 0.000 description 5
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 238000001556 precipitation Methods 0.000 description 4
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
- 230000032683 aging Effects 0.000 description 3
- 239000000017 hydrogel Substances 0.000 description 3
- 239000007788 liquid Substances 0.000 description 3
- 229910001414 potassium ion Inorganic materials 0.000 description 3
- 229910001415 sodium ion Inorganic materials 0.000 description 3
- 239000005051 trimethylchlorosilane Substances 0.000 description 3
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- UQSXHKLRYXJYBZ-UHFFFAOYSA-N Iron oxide Chemical compound [Fe]=O UQSXHKLRYXJYBZ-UHFFFAOYSA-N 0.000 description 2
- PMZURENOXWZQFD-UHFFFAOYSA-L Sodium Sulfate Chemical compound [Na+].[Na+].[O-]S([O-])(=O)=O PMZURENOXWZQFD-UHFFFAOYSA-L 0.000 description 2
- BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 2
- WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 description 2
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
- 238000005903 acid hydrolysis reaction Methods 0.000 description 2
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- YGZSVWMBUCGDCV-UHFFFAOYSA-N chloro(methyl)silane Chemical compound C[SiH2]Cl YGZSVWMBUCGDCV-UHFFFAOYSA-N 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 239000002270 dispersing agent Substances 0.000 description 2
- 229920000728 polyester Polymers 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 239000012266 salt solution Substances 0.000 description 2
- 238000000926 separation method Methods 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000007858 starting material Substances 0.000 description 2
- 238000000967 suction filtration Methods 0.000 description 2
- NWUYHJFMYQTDRP-UHFFFAOYSA-N 1,2-bis(ethenyl)benzene;1-ethenyl-2-ethylbenzene;styrene Chemical compound C=CC1=CC=CC=C1.CCC1=CC=CC=C1C=C.C=CC1=CC=CC=C1C=C NWUYHJFMYQTDRP-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- YSVZGWAJIHWNQK-UHFFFAOYSA-N [3-(hydroxymethyl)-2-bicyclo[2.2.1]heptanyl]methanol Chemical group C1CC2C(CO)C(CO)C1C2 YSVZGWAJIHWNQK-UHFFFAOYSA-N 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 238000007605 air drying Methods 0.000 description 1
- 230000001476 alcoholic effect Effects 0.000 description 1
- 239000012736 aqueous medium Substances 0.000 description 1
- 229920006231 aramid fiber Polymers 0.000 description 1
- 239000006229 carbon black Substances 0.000 description 1
- 239000003054 catalyst Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 239000011248 coating agent Substances 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000009833 condensation Methods 0.000 description 1
- 230000005494 condensation Effects 0.000 description 1
- 238000011437 continuous method Methods 0.000 description 1
- 239000000495 cryogel Substances 0.000 description 1
- 239000013078 crystal Substances 0.000 description 1
- 238000002425 crystallisation Methods 0.000 description 1
- 230000008025 crystallization Effects 0.000 description 1
- 125000000753 cycloalkyl group Chemical group 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 239000003792 electrolyte Substances 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 238000001125 extrusion Methods 0.000 description 1
- 239000002657 fibrous material Substances 0.000 description 1
- 238000001914 filtration Methods 0.000 description 1
- 238000007710 freezing Methods 0.000 description 1
- 230000008014 freezing Effects 0.000 description 1
- 238000001879 gelation Methods 0.000 description 1
- 239000003365 glass fiber Substances 0.000 description 1
- 238000000227 grinding Methods 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 230000007062 hydrolysis Effects 0.000 description 1
- 238000006460 hydrolysis reaction Methods 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000003456 ion exchange resin Substances 0.000 description 1
- 229920003303 ion-exchange polymer Polymers 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000002557 mineral fiber Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 1
- 238000010899 nucleation Methods 0.000 description 1
- 229920001778 nylon Polymers 0.000 description 1
- 239000003605 opacifier Substances 0.000 description 1
- 235000006408 oxalic acid Nutrition 0.000 description 1
- 150000002913 oxalic acids Chemical class 0.000 description 1
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 239000013557 residual solvent Substances 0.000 description 1
- 150000004756 silanes Chemical class 0.000 description 1
- 239000000377 silicon dioxide Substances 0.000 description 1
- 229910052938 sodium sulfate Inorganic materials 0.000 description 1
- 235000011152 sodium sulphate Nutrition 0.000 description 1
- 238000009718 spray deposition Methods 0.000 description 1
- 238000003756 stirring Methods 0.000 description 1
- YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 description 1
- 239000004408 titanium dioxide Substances 0.000 description 1
- 235000013311 vegetables Nutrition 0.000 description 1
- 239000011240 wet gel Substances 0.000 description 1
- 229910001928 zirconium oxide Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/157—After-treatment of gels
- C01B33/158—Purification; Drying; Dehydrating
- C01B33/1585—Dehydration into aerogels
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
- C01B33/141—Preparation of hydrosols or aqueous dispersions
- C01B33/142—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates
- C01B33/143—Preparation of hydrosols or aqueous dispersions by acidic treatment of silicates of aqueous solutions of silicates
-
- C—CHEMISTRY; METALLURGY
- C01—INORGANIC CHEMISTRY
- C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
- C01B33/00—Silicon; Compounds thereof
- C01B33/113—Silicon oxides; Hydrates thereof
- C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
- C01B33/16—Preparation of silica xerogels
-
- C—CHEMISTRY; METALLURGY
- C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
- C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
- C04B14/00—Use of inorganic materials as fillers, e.g. pigments, for mortars, concrete or artificial stone; Treatment of inorganic materials specially adapted to enhance their filling properties in mortars, concrete or artificial stone
- C04B14/02—Granular materials, e.g. microballoons
- C04B14/04—Silica-rich materials; Silicates
- C04B14/06—Quartz; Sand
- C04B14/064—Silica aerogel
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Dispersion Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Engineering & Computer Science (AREA)
- Ceramic Engineering (AREA)
- Civil Engineering (AREA)
- Materials Engineering (AREA)
- Structural Engineering (AREA)
- Silicon Compounds (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE19541715A DE19541715A1 (de) | 1995-11-09 | 1995-11-09 | Verfahren zur Herstellung von organisch modifizierten Aerogelen, bei dem die gebildeten Salze ausgefällt werden |
| DE19541715.1 | 1995-11-09 | ||
| PCT/EP1996/004822 WO1997017288A1 (de) | 1995-11-09 | 1996-11-05 | Verfahren zur herstellung von organisch modifizierten aerogelen, bei dem die gebildeten salze ausgefällt werden |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JP2000501370A true JP2000501370A (ja) | 2000-02-08 |
Family
ID=7776975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP9517842A Ceased JP2000501370A (ja) | 1995-11-09 | 1996-11-05 | 製造過程において生成塩の沈殿が生じる、有機変性したエーロゲルの製造法 |
Country Status (12)
| Country | Link |
|---|---|
| US (1) | US6210751B1 (de) |
| EP (1) | EP0859740B1 (de) |
| JP (1) | JP2000501370A (de) |
| KR (1) | KR100501758B1 (de) |
| CN (1) | CN1087271C (de) |
| AT (1) | ATE184862T1 (de) |
| CA (1) | CA2237096A1 (de) |
| DE (2) | DE19541715A1 (de) |
| ES (1) | ES2139392T3 (de) |
| MX (1) | MX9803701A (de) |
| NO (1) | NO982069D0 (de) |
| WO (1) | WO1997017288A1 (de) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001504756A (ja) * | 1996-11-26 | 2001-04-10 | カボット コーポレイション | 有機修飾エアロゲル、事前の溶媒交換ならびに事後の乾燥を行わない水系ゲルの表面修飾によるその製造法、およびその使用 |
| JP2016522146A (ja) * | 2013-05-07 | 2016-07-28 | 弘大科技（北京）有限公司Ｈｏｎｇ Ｄａ Ｔｅｃｈｎｏｌｏｇｙ （Ｂｅｉ Ｊｉｎｇ） Ｃｏ．Ｌｔｄ． | 減圧乾燥によるエアロゲルの製造方法及び装置 |
Families Citing this family (33)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE19718740A1 (de) | 1997-05-02 | 1998-11-05 | Hoechst Ag | Verfahren zur Granulierung von Aerogelen |
| DE19718741A1 (de) | 1997-05-02 | 1998-11-05 | Hoechst Ag | Verfahren zur Kompaktierung von Aerogelen |
| DE19752456A1 (de) | 1997-11-26 | 1999-05-27 | Hoechst Ag | Verfahren zur Herstellung von organisch modifizierten Aerogelen auf Basis von Siliciumtetrachlorid |
| DE19756633A1 (de) | 1997-12-19 | 1999-06-24 | Hoechst Ag | Verfahren zur unterkritischen Trocknung von Lyogelen zu Aerogelen |
| DE19801004A1 (de) | 1998-01-14 | 1999-07-15 | Cabot Corp | Verfahren zur Herstellung von im wesentlichen kugelförmigen Lyogelen in wasserunlöslichen Silylierungsmitteln |
| ITLE20050008A1 (it) * | 2005-05-24 | 2006-11-25 | Megatex S P A | Filati di origine naturale e sintetica con caratteristiche di barriera al trasporto di calore ottenuti attraverso la deposizione di aerogel. |
| US7618608B1 (en) | 2005-12-13 | 2009-11-17 | Keller Companies, Inc. | Aerogel and method of manufacturing same |
| US7750056B1 (en) | 2006-10-03 | 2010-07-06 | Sami Daoud | Low-density, high r-value translucent nanocrystallites |
| WO2008044873A1 (en) * | 2006-10-10 | 2008-04-17 | Korea Institute Of Industrial Technology | Method for preparing permanently hydrophobic aerogel and permanently hydrophobic aerogel prepared by using the method |
| KR100824291B1 (ko) * | 2007-02-13 | 2008-04-22 | 주식회사 넵 | 표면개질된 나노크기입자의 실리카 제조 방법 |
| KR100848856B1 (ko) * | 2007-03-27 | 2008-07-29 | 주식회사 넵 | 영구적 소수성을 갖는 에어로겔의 제조 방법 및 이로부터제조된 영구적 소수성을 갖는 에어로겔 |
| KR100868989B1 (ko) * | 2007-05-23 | 2008-11-17 | 엠파워(주) | 초소수성 실리카 에어로겔 분말의 제조방법 |
| KR100924782B1 (ko) | 2007-09-19 | 2009-11-03 | 주식회사 넵 | 영구적인 소수성을 갖는 고투광성 입상형 에어로겔제조방법 및 이로부터 제조된 입상형 에어로겔 |
| KR20090032707A (ko) * | 2007-09-28 | 2009-04-01 | 엠파워(주) | 초소수성 실리카계 분말의 제조방법 |
| CN101468907B (zh) * | 2007-12-27 | 2012-03-07 | 上海暄洋化工材料科技有限公司 | 一种SiO2纳米复合绝热保温膏及其制备工艺 |
| CN102198943B (zh) * | 2011-04-21 | 2013-03-13 | 江苏大学 | 一种低成本常压干燥制备不同接触角硅基气凝胶的方法 |
| CN102642841B (zh) * | 2012-04-25 | 2016-07-27 | 陕西得波材料科技有限公司 | 一种常压制备低密度高性能SiO2气凝胶的方法 |
| MX361776B (es) * | 2013-11-19 | 2018-12-17 | Hecker Electronica Potencia Y Procesos S A | Proceso de superposicion de corriente alterna sobre la corriente continua en procesos electroliticos. |
| KR101687952B1 (ko) * | 2013-12-31 | 2016-12-20 | 연세대학교 산학협력단 | 실리카 에어로겔의 제조방법과 상기 방법을 이용하여 제조된 실리카 에어로겔 |
| WO2015192731A1 (zh) * | 2014-06-18 | 2015-12-23 | 金承黎 | 一种硅基一元或多元氧化物气凝胶材料及其制备方法 |
| CN104030301B (zh) * | 2014-06-18 | 2016-03-23 | 金承黎 | 一种二氧化硅气凝胶材料及其制备方法 |
| ITUB20150924A1 (it) | 2015-05-29 | 2016-11-29 | N A M Nano Analysis & Mat S R L | Processo sol-gel per la produzione di aerogeli di silice |
| CN104944887A (zh) * | 2015-07-01 | 2015-09-30 | 卓达新材料科技集团有限公司 | 刚性二氧化硅气凝胶绝热板的制备方法 |
| KR101938369B1 (ko) | 2015-12-09 | 2019-01-14 | 주식회사 엘지화학 | 산화금속-실리카 복합 에어로겔의 제조방법 및 이로부터 제조된 산화금속-실리카 복합 에어로겔 |
| WO2017099488A1 (ko) * | 2015-12-09 | 2017-06-15 | 주식회사 엘지화학 | 산화금속-실리카 복합 에어로겔의 제조방법 및 이로부터 제조된 산화금속-실리카 복합 에어로겔 |
| KR102002050B1 (ko) | 2015-12-15 | 2019-10-21 | 주식회사 엘지화학 | 산화금속-실리카 복합 에어로겔의 제조방법 및 이로부터 제조된 산화금속-실리카 복합 에어로겔 |
| CN105582866B (zh) * | 2016-03-08 | 2022-12-09 | 浙江圣润纳米科技有限公司 | 一种射频辐射快速制备气凝胶的方法及生产线 |
| CN106185959B (zh) | 2016-09-14 | 2018-04-06 | 纳诺科技有限公司 | 一种以微乳液为前体快速制备气凝胶的方法 |
| KR102192354B1 (ko) | 2017-09-08 | 2020-12-17 | 주식회사 엘지화학 | 산화금속-실리카 복합 에어로겔의 제조방법 및 이로부터 제조된 산화금속-실리카 복합 에어로겔 |
| JP6870108B2 (ja) | 2017-09-08 | 2021-05-12 | エルジー・ケム・リミテッド | 酸化金属−シリカ複合エアロゲルの製造方法及びそれにより製造された酸化金属−シリカ複合エアロゲル |
| US11332378B2 (en) | 2018-11-27 | 2022-05-17 | Lg Chem, Ltd. | Method for producing silica aerogel |
| KR102693340B1 (ko) * | 2020-10-15 | 2024-08-09 | 주식회사 엘지화학 | 에어로겔 블랭킷의 제조방법 및 이로부터 제조된 에어로겔 블랭킷 |
| CN115304066A (zh) * | 2022-08-22 | 2022-11-08 | 湖北硅金凝节能减排科技有限公司 | 一种耐高温气凝胶粉体的制备方法 |
Family Cites Families (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US2285477A (en) * | 1942-06-09 | Method of producing sols | ||
| US2927083A (en) * | 1955-04-11 | 1960-03-01 | Monsanto Chemicals | Process for the preparation of silica gel and silica aerogels |
| DE3346180C2 (de) | 1983-12-21 | 1996-05-15 | Micropore International Ltd | Starrer Wärmedämmkörper |
| DE4342548A1 (de) | 1993-12-14 | 1995-06-22 | Hoechst Ag | Xerogele, Verfahren zu ihrer Herstellung, sowie ihre Verwendung |
| US5795556A (en) * | 1993-12-14 | 1998-08-18 | Hoechst Ag | Xerogels and process for their preparation |
| DE4430669A1 (de) * | 1994-08-29 | 1996-03-07 | Hoechst Ag | Verfahren zur Herstellung von faserverstärkten Xerogelen, sowie ihre Verwendung |
-
1995
- 1995-11-09 DE DE19541715A patent/DE19541715A1/de not_active Withdrawn
-
1996
- 1996-11-05 ES ES96938991T patent/ES2139392T3/es not_active Expired - Lifetime
- 1996-11-05 US US09/068,371 patent/US6210751B1/en not_active Expired - Lifetime
- 1996-11-05 JP JP9517842A patent/JP2000501370A/ja not_active Ceased
- 1996-11-05 KR KR10-1998-0703379A patent/KR100501758B1/ko not_active IP Right Cessation
- 1996-11-05 EP EP96938991A patent/EP0859740B1/de not_active Expired - Lifetime
- 1996-11-05 CN CN96198951A patent/CN1087271C/zh not_active Expired - Fee Related
- 1996-11-05 AT AT96938991T patent/ATE184862T1/de not_active IP Right Cessation
- 1996-11-05 WO PCT/EP1996/004822 patent/WO1997017288A1/de not_active Application Discontinuation
- 1996-11-05 DE DE59603187T patent/DE59603187D1/de not_active Expired - Lifetime
- 1996-11-05 CA CA002237096A patent/CA2237096A1/en not_active Abandoned
-
1998
- 1998-05-06 NO NO982069A patent/NO982069D0/no not_active Application Discontinuation
- 1998-05-08 MX MX9803701A patent/MX9803701A/es unknown
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2001504756A (ja) * | 1996-11-26 | 2001-04-10 | カボット コーポレイション | 有機修飾エアロゲル、事前の溶媒交換ならびに事後の乾燥を行わない水系ゲルの表面修飾によるその製造法、およびその使用 |
| JP2016522146A (ja) * | 2013-05-07 | 2016-07-28 | 弘大科技（北京）有限公司Ｈｏｎｇ Ｄａ Ｔｅｃｈｎｏｌｏｇｙ （Ｂｅｉ Ｊｉｎｇ） Ｃｏ．Ｌｔｄ． | 減圧乾燥によるエアロゲルの製造方法及び装置 |
Also Published As
| Publication number | Publication date |
|---|---|
| KR19990067369A (ko) | 1999-08-16 |
| NO982069L (no) | 1998-05-06 |
| ATE184862T1 (de) | 1999-10-15 |
| CN1087271C (zh) | 2002-07-10 |
| EP0859740B1 (de) | 1999-09-22 |
| DE19541715A1 (de) | 1997-05-15 |
| EP0859740A1 (de) | 1998-08-26 |
| NO982069D0 (no) | 1998-05-06 |
| ES2139392T3 (es) | 2000-02-01 |
| MX9803701A (es) | 1998-11-30 |
| US6210751B1 (en) | 2001-04-03 |
| KR100501758B1 (ko) | 2005-10-07 |
| WO1997017288A1 (de) | 1997-05-15 |
| DE59603187D1 (de) | 1999-10-28 |
| CN1204300A (zh) | 1999-01-06 |
| CA2237096A1 (en) | 1997-05-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JP2000501370A (ja) | 製造過程において生成塩の沈殿が生じる、有機変性したエーロゲルの製造法 | |
| JP3854645B2 (ja) | キセロゲル、その製法および用途 | |
| JP3808115B2 (ja) | キセロゲル、及びそれらの調製方法と利用 | |
| US6140377A (en) | Process for preparing organically modified aerogels using alcohols | |
| JP4041161B2 (ja) | 変性エーロゲルの製造方法及びその使用 | |
| US6129949A (en) | Process for preparing organically modified aerogels using alcohols, wherein the resultant salts are precipitated | |
| US5795556A (en) | Xerogels and process for their preparation | |
| US7470725B2 (en) | Organically modified aerogels, processes for their preparation by surface modification of the aqueous gel, without prior solvent exchange, and subsequent drying, and their use | |
| JP3951307B2 (ja) | エーロゲルの製造方法 | |
| JP2001504757A (ja) | 有機的に修飾された持続的に疎水性のエロゲルの製造方法 | |
| US6156386A (en) | Method for the preparation of organically modified aerogels | |
| KR100571989B1 (ko) | 실리콘 테트라클로라이드를 기초로 하고 유기적으로 변형된 에어로겔의 제조 방법 | |
| JP2001019422A (ja) | 高気孔容積を有する親水性シリカゲルの製造法 | |
| JP4331894B2 (ja) | 水不溶性シリル化剤中で実質的に球状のリオゲルを製造する方法 | |
| MXPA99004858A (es) | Proceso para la elaboracion de aerogeles organicos modificados permanentemente hidrofobicos | |
| MXPA97005686A (en) | Procedure for the preparation of modified aerogels, and its |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| A711 | Notification of change in applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A711 Effective date: 20060727 |
|
| A72 | Notification of change in name of applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A721 Effective date: 20060727 |
|
| A131 | Notification of reasons for refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A131 Effective date: 20070130 |
|
| A313 | Final decision of rejection without a dissenting response from the applicant |
Free format text: JAPANESE INTERMEDIATE CODE: A313 Effective date: 20070620 |
|
| A02 | Decision of refusal |
Free format text: JAPANESE INTERMEDIATE CODE: A02 Effective date: 20070731 |