JP2000294715A - Semiconductor device and manufacture thereof - Google Patents

Semiconductor device and manufacture thereof

Info

Publication number
JP2000294715A
JP2000294715A JP10194999A JP10194999A JP2000294715A JP 2000294715 A JP2000294715 A JP 2000294715A JP 10194999 A JP10194999 A JP 10194999A JP 10194999 A JP10194999 A JP 10194999A JP 2000294715 A JP2000294715 A JP 2000294715A
Authority
JP
Japan
Prior art keywords
semiconductor device
lead
leads
sealing body
semiconductor
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP10194999A
Other languages
Japanese (ja)
Inventor
Yukihiro Sato
幸弘 佐藤
Katsuo Arai
克夫 新井
Tadatoshi Danno
忠敏 団野
Kazuo Shimizu
一男 清水
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Renesas Eastern Japan Semiconductor Inc
Original Assignee
Hitachi Ltd
Hitachi Tohbu Semiconductor Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd, Hitachi Tohbu Semiconductor Ltd filed Critical Hitachi Ltd
Priority to JP10194999A priority Critical patent/JP2000294715A/en
Publication of JP2000294715A publication Critical patent/JP2000294715A/en
Pending legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/4805Shape
    • H01L2224/4809Loop shape
    • H01L2224/48091Arched
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2224/00Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
    • H01L2224/01Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
    • H01L2224/42Wire connectors; Manufacturing methods related thereto
    • H01L2224/47Structure, shape, material or disposition of the wire connectors after the connecting process
    • H01L2224/48Structure, shape, material or disposition of the wire connectors after the connecting process of an individual wire connector
    • H01L2224/481Disposition
    • H01L2224/48151Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
    • H01L2224/48221Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
    • H01L2224/48245Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic
    • H01L2224/48247Connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being metallic connecting the wire to a bond pad of the item

Landscapes

  • Structures Or Materials For Encapsulating Or Coating Semiconductor Devices Or Solid State Devices (AREA)
  • Lead Frames For Integrated Circuits (AREA)

Abstract

PROBLEM TO BE SOLVED: To obtain a technique for manufacturing a semiconductor device of a bottom face terminal type without any lead disconnected by a die, and also to obtain a semiconductor device of a bottom face terminal type which can improve its bonding strength upon mounting. SOLUTION: In the semiconductor device having leads 3 as external terminals of the semiconductor device exposed to a bottom surface of leads 3, the leads 3 exposed to the bottom surface are formed to be thin in a direction perpendicular to the bottom surface at their outer ends. The method for manufacturing the semiconductor device includes steps of providing a series of sets of leads 3 to be formed as parts of a plurality of semiconductor devices, using a lead frame having the leads 3 external ends of which to a sealed body 5 are provided with recesses at cut-off positions, mounting a semiconductor chip 1 onto the lead frame, electrically connecting the chip 1 and the leads 3 of the lead frame, sealing the chip 1 with resin, and separating the sealed body 5 and the leads 3 at the recesses of the leads 3 to obtain separated individual semiconductor devices.

Description

【発明の詳細な説明】DETAILED DESCRIPTION OF THE INVENTION

【0001】[0001]

【発明の属する技術分野】本発明は、半導体装置及びそ
の製造方法に関し、特に、底面端子型の半導体装置に適
用して有効な技術に関するものである。
BACKGROUND OF THE INVENTION 1. Field of the Invention The present invention relates to a semiconductor device and a method of manufacturing the same, and more particularly, to a technology effective when applied to a bottom terminal type semiconductor device.

【0002】[0002]

【従来の技術】半導体装置として、製造が比較的容易で
低コストであることから、樹脂を用いた封止体によって
半導体チップを覆い、封止体から延在するリードを外部
端子とするSOP型或いはSOJ型等の半導体装置が広
く用いられている。SOP型半導体装置或いはSOJ型
半導体装置では、半導体装置の外部端子となるリードが
封止体側面から延在しているために、実装状態では、リ
ードと配線基板との接続領域が半導体装置の周囲に必要
となり、実装状態での占有面積は半導体装置自体の占有
面積よりも大きくなる。電子装置の小型化のために、半
導体装置自体の小型化とともに、前記接続領域の面積縮
小も課題となっている。また、こうした半導体装置の組
立てにはリードフレームが用いられており、半導体チッ
プをレジン又は銀ペーストによってタブに固定し、半導
体チップのパッド電極とリードとがボンディングワイヤ
によって接続されている。このボンディング後に、半導
体チップ、タブ、ボンディングワイヤが例えばエポキシ
樹脂からなる封止体によって封止され、ダムバー及びタ
イバーが切断されて各リードは機械的・電気的に分離さ
れ、分離されたリードを所定形状に成形して、半導体装
置が完成する。前記ダムバー及びタイバーの切断では、
微細なリードを正確に切断することが求められるため、
これらの切断には精度の高い金型が必要となる。リード
が微細化するに連れて、こうした金型にはより高い精度
が要求されることとなり、金型のコストの増加が問題と
なる。また、この切断によって生じたバリがアウターリ
ードの成形に影響を与える等の問題がある。加えて、リ
ードが微細化するに連れてリードの強度が低くなるため
に、リード成形後の保管或いは移送時にリードが容易に
変形し、このリードの変形によって実装不良が生じるこ
とがある。PGA型或いはBGA型等の底面に外部端子
を面状に配置した半導体装置では、これらの問題は解決
されるが、比較的ピン数の少ない半導体装置には、コス
トの点等から適用が難しい。このために、搭載する半導
体チップを封止体によって樹脂封止し、前記封止体底面
の外周部にてリードを露出させて半導体装置の外部端子
とする底面端子型の半導体装置が考えられた。底面端子
型の半導体装置としては、QFN(Quad Flat Nonlea
d)型或いはSON(Small Outline Nonlead)型等の半
導体装置が知られている。こうした底面端子型の半導体
装置については、例えば特開昭63‐296252号公
報或いは特開平9‐162327号公報に開示されてい
る。
2. Description of the Related Art Since a semiconductor device is relatively easy to manufacture and inexpensive, an SOP type semiconductor device is covered with a sealing body using a resin, and a lead extending from the sealing body is used as an external terminal. Alternatively, a semiconductor device such as an SOJ type is widely used. In an SOP type semiconductor device or an SOJ type semiconductor device, since a lead serving as an external terminal of the semiconductor device extends from a side surface of the sealing body, a connection region between the lead and the wiring board is formed around the semiconductor device in a mounted state. Therefore, the occupied area in the mounted state is larger than the occupied area of the semiconductor device itself. In order to reduce the size of the electronic device, there is a need to reduce the size of the connection region as well as the size of the semiconductor device itself. In addition, a lead frame is used for assembling such a semiconductor device. A semiconductor chip is fixed to a tab with a resin or silver paste, and a pad electrode and a lead of the semiconductor chip are connected by a bonding wire. After this bonding, the semiconductor chip, the tab, and the bonding wire are sealed with a sealing body made of, for example, an epoxy resin, the dam bar and the tie bar are cut, each lead is separated mechanically and electrically, and the separated lead is The semiconductor device is completed by molding into a shape. In the cutting of the dam bar and the tie bar,
Because it is required to cut fine leads accurately,
These cuts require a highly accurate mold. As the leads become finer, higher precision is required for such a mold, and an increase in the cost of the mold becomes a problem. Further, there is a problem that burrs generated by this cutting affect the formation of the outer lead. In addition, since the strength of the lead is reduced as the lead is miniaturized, the lead is easily deformed during storage or transfer after forming the lead, and the deformation of the lead may cause a mounting failure. These problems can be solved in a semiconductor device such as a PGA type or BGA type in which external terminals are arranged in a plane on the bottom surface, but it is difficult to apply to a semiconductor device having a relatively small number of pins from the viewpoint of cost and the like. For this purpose, a bottom terminal type semiconductor device has been considered in which a semiconductor chip to be mounted is resin-sealed with a sealing body, and leads are exposed at the outer peripheral portion of the bottom surface of the sealing body to serve as external terminals of the semiconductor device. . QFN (Quad Flat Nonleaf)
Semiconductor devices of the d) type or the SON (Small Outline Nonlead) type are known. Such a bottom terminal type semiconductor device is disclosed in, for example, JP-A-63-296252 or JP-A-9-162327.

【0003】[0003]

【発明が解決しようとする課題】しかしながら、これら
の公報に開示されている技術では、リード間に位置する
ダムバーの切断は不用となるが、リード端部の切断には
依然金型が必要である。このリード端部の切断では、金
型を用いた剪断によってリードが切断されるために、リ
ードと封止体との接合面に大きな力が加わり、この力に
よってリードが封止体から剥離することがある。また、
前記公報に開示されている底面端子型半導体装置では、
突起電極を用いた接続等と比較して、接続部分のハンダ
が薄くなるため、ガラスエポキシ樹脂等の実装基板と半
導体装置の封止樹脂との熱膨張係数の違いから熱応力が
生じた際に、実装基板とリードとの接合部分にクラック
が生じることがある。この問題を解決するために、例え
ば特開平8‐64745号公報に開示されているよう
に、リードの端部に突起部を設け、この突起部によって
形成された中空部にハンダが充填される構成とし、ハン
ダの厚さを確保したものが考えられている。しかし、特
開平8‐64745号公報に開示されている方法では、
切断によってリード端部に突起部を形成するために、依
然金型が必要であり、更に、均一な突起部を形成するた
めには、切断に高い精度が必要となる。また、前記突起
部が外端に位置するため、リードと基板配線とを接続す
るハンダがこの突起部によって遮られ、目視によってハ
ンダの状態を確認することが難しくなるという問題も生
じる。本発明の課題は、これらの問題を解決し、金型に
よる切断を行なわずに半導体装置を製造する技術を提供
することにある。本発明の他の課題は、実装時の接合強
度を向上させた底面端子型の半導体装置を提供すること
にある。本発明の前記ならびにその他の課題と新規な特
徴は、本明細書の記述及び添付図面から明らかになるで
あろう。
However, in the techniques disclosed in these publications, it is unnecessary to cut the dam bar located between the leads, but a die is still required to cut the ends of the leads. . In the cutting of the lead end, the lead is cut by shearing using a mold, so that a large force is applied to the joint surface between the lead and the sealing body, and the lead is separated from the sealing body by this force. There is. Also,
In the bottom terminal type semiconductor device disclosed in the above publication,
Since the solder at the connection portion is thinner than the connection using a protruding electrode, etc., when thermal stress occurs due to the difference in the coefficient of thermal expansion between the mounting board such as glass epoxy resin and the sealing resin of the semiconductor device. In some cases, cracks may occur at the joint between the mounting board and the lead. In order to solve this problem, for example, as disclosed in Japanese Patent Application Laid-Open No. 8-64745, a protrusion is provided at an end of a lead, and solder is filled in a hollow formed by the protrusion. It is considered that the thickness of the solder is secured. However, in the method disclosed in JP-A-8-64745,
A die is still required to form a projection at the end of the lead by cutting, and high precision is required for cutting to form a uniform projection. In addition, since the protrusion is located at the outer end, the solder connecting the lead and the board wiring is blocked by the protrusion, which causes a problem that it is difficult to visually confirm the state of the solder. An object of the present invention is to solve these problems and to provide a technique for manufacturing a semiconductor device without cutting with a mold. Another object of the present invention is to provide a bottom terminal type semiconductor device having improved bonding strength during mounting. The above and other objects and novel features of the present invention will become apparent from the description of the present specification and the accompanying drawings.

【0004】[0004]

【課題を解決するための手段】本願において開示される
発明のうち、代表的なものの概要を簡単に説明すれば下
記の通りである。半導体装置の外部端子となるリードが
封止体底面にて露出する半導体装置に関し、前記底面に
露出するリードを、その外端部にて前記底面に対して垂
直方向に薄く形成する。また、その製造方法に関し、複
数の半導体装置となるリードの組が連続して設けられ、
各リードの封止体外端部に位置する切断部に凹部が設け
られたリードフレームを用い、前記リードフレームに半
導体チップを搭載し、前記半導体チップとリードフレー
ムのリードとを電気的に接続する工程と、前記半導体チ
ップを樹脂封止する工程と、前記リードの凹部にて封止
体及びリードを分離して、夫々の半導体装置に分断する
工程とを有する。
SUMMARY OF THE INVENTION Among the inventions disclosed in the present application, typical ones are briefly described as follows. In a semiconductor device in which a lead serving as an external terminal of a semiconductor device is exposed at a bottom surface of a sealing body, a lead exposed at the bottom surface is formed thin at an outer end thereof in a direction perpendicular to the bottom surface. Further, with respect to the manufacturing method, a set of leads to be a plurality of semiconductor devices is provided continuously,
A step of mounting a semiconductor chip on the lead frame using a lead frame provided with a concave portion at a cut portion located at the outer end of the sealing body of each lead, and electrically connecting the semiconductor chip and the lead of the lead frame And a step of sealing the semiconductor chip with a resin, and a step of separating the sealing body and the lead at the concave portion of the lead and dividing the semiconductor chip into respective semiconductor devices.

【0005】[0005]

【発明の実施の形態】以下、本発明の実施の形態を説明
する。なお、実施の形態を説明するための全図におい
て、同一機能を有するものは同一符号を付け、その繰り
返しの説明は省略する。図1は本発明の一実施の形態で
あるQFN型半導体装置を示す底面図であり、図2は図
1中のa‐a線に沿った縦断面図である。本実施の形態
の半導体装置では、単結晶シリコン等の半導体基板に所
定の素子を形成して回路を構成した半導体チップ1を、
レジン又は銀ペーストによってタブ2に固定し、半導体
チップ1とリード3の内端とをボンディングワイヤ4に
よって接続してある。半導体チップ1、タブ2、リード
3の上面及び側面、ボンディングワイヤ4は、例えばエ
ポキシ樹脂にフィラを混入させた封止樹脂を用いた封止
体5によって封止する。リード3は、その下面を封止体
5の底面にて露出させ、リード3の外端面を封止体5の
側面にて露出させてある。リード3の底面露出部分は、
外端部にて、その露出面が傾斜しており、この傾斜によ
って、リード3の外端面は、封止体5の底面に対して垂
直方向に薄く形成されている。こうした底面端子型の半
導体装置では、半導体チップを封止する封止体の底面に
夫々複数のリードが設けられているために、半導体装置
を実装基板に実装する場合に、その周囲に接続領域を設
ける必要がないため半導体装置の実装状態での占有面積
が減少し、周囲のスペースを有効に利用することができ
るという利点がある。
Embodiments of the present invention will be described below. In all the drawings for describing the embodiments, components having the same functions are denoted by the same reference numerals, and repeated description thereof will be omitted. FIG. 1 is a bottom view showing a QFN type semiconductor device according to an embodiment of the present invention, and FIG. 2 is a longitudinal sectional view taken along line aa in FIG. In the semiconductor device of the present embodiment, a semiconductor chip 1 having a circuit formed by forming a predetermined element on a semiconductor substrate such as single crystal silicon
The semiconductor chip 1 is fixed to the tab 2 with a resin or silver paste, and the inner ends of the leads 3 are connected by bonding wires 4. The semiconductor chip 1, the tab 2, the upper and side surfaces of the leads 3, and the bonding wires 4 are sealed by a sealing body 5 using a sealing resin in which a filler is mixed into an epoxy resin, for example. The lower surface of the lead 3 is exposed at the bottom surface of the sealing body 5, and the outer end surface of the lead 3 is exposed at the side surface of the sealing body 5. The bottom exposed part of the lead 3
The exposed surface is inclined at the outer end, and the outer end surface of the lead 3 is formed thinner in the direction perpendicular to the bottom surface of the sealing body 5 due to the inclination. In such a bottom terminal type semiconductor device, a plurality of leads are provided on the bottom surface of a sealing body for sealing a semiconductor chip. Therefore, when the semiconductor device is mounted on a mounting board, a connection region is formed around the semiconductor device. Since there is no need to provide, there is an advantage that the occupied area of the semiconductor device in the mounted state is reduced, and the surrounding space can be used effectively.

【0006】図3は、図1及び図2に示す半導体装置を
配線基板に実装した電子装置の要部を示す縦断面図であ
る。配線基板は、ガラスエポキシ或いはムライトセラミ
ック等の絶縁性材料を板状に成形した基体6の表面及び
内部に複数層の配線層が形成されており、最上層に形成
された配線層7が部分的に接続端子7aとなる。この接
続端子7aと、半導体装置の外部端子であるリード3と
を接合剤であるハンダ8によって接続する。リード3
は、その外端部にて、露出面が傾斜しているため、この
外端部ではハンダ8が厚く形成される。このため、この
厚く形成された外端部のハンダ8によって実装状態での
接続強度を向上させることができる。また、リード3の
外端部が薄くなっているため、ハンダ8の状態が、容易
に目視によってハンダ8の付着状態を観察することがで
きる。
FIG. 3 is a longitudinal sectional view showing a main part of an electronic device in which the semiconductor device shown in FIGS. 1 and 2 is mounted on a wiring board. The wiring board has a plurality of wiring layers formed on the surface and inside of a substrate 6 formed of an insulating material such as glass epoxy or mullite ceramic in a plate shape, and the wiring layer 7 formed on the uppermost layer is partially formed. Becomes the connection terminal 7a. The connection terminal 7a and the lead 3 as an external terminal of the semiconductor device are connected by a solder 8 as a bonding agent. Lead 3
Since the exposed surface is inclined at its outer end, the solder 8 is formed thicker at this outer end. For this reason, the connection strength in the mounted state can be improved by the thick solder 8 at the outer end. Further, since the outer end portion of the lead 3 is thin, the state of the solder 8 can be easily visually observed to see the state of adhesion of the solder 8.

【0007】次に、本実施の形態の半導体装置の製造方
法について、図4乃至図9を用いて説明する。本実施の
形態の半導体装置は、個々の半導体装置に用いられるタ
ブ及びリードの組が連続して複数組形成されたリードフ
レームを用いており、リードフレームとしては、図4に
示すように、例えばFe‐Ni系合金或いはCu系合金
等からなり、半導体チップ1が搭載されるタブ2の全周
囲にわたって複数の信号用のリード3が配置されてい
る。各リード3は、タイバー9により一体となってお
り、リード3の間に設けられたタブ吊りリード10によ
ってタブ2を支持している。封止体5端部に位置する各
リード3の切断部3aにはV字状の溝が設けてある。こ
の溝は、エッチング或いはプレスによって形成する。そ
して、このリードフレームのタブ2に夫々半導体チップ
1をレジン又は銀ペーストによって固定し、半導体チッ
プ1のパッド電極とリード3とをボンディングワイヤ4
によって接続し、半導体チップ1をリードフレームに実
装する。この状態を図5に示す。
Next, a method of manufacturing the semiconductor device according to the present embodiment will be described with reference to FIGS. The semiconductor device according to the present embodiment uses a lead frame in which a plurality of sets of tabs and leads used for individual semiconductor devices are formed continuously. As shown in FIG. A plurality of signal leads 3 are arranged around the entire periphery of the tab 2 on which the semiconductor chip 1 is mounted, which is made of an Fe-Ni-based alloy or a Cu-based alloy. Each lead 3 is integrated by a tie bar 9, and supports the tab 2 by a tab suspension lead 10 provided between the leads 3. A cut portion 3a of each lead 3 located at the end of the sealing body 5 is provided with a V-shaped groove. This groove is formed by etching or pressing. Then, the semiconductor chip 1 is fixed to the tab 2 of the lead frame with resin or silver paste, respectively, and the pad electrodes of the semiconductor chip 1 and the leads 3 are bonded to the bonding wires 4.
And the semiconductor chip 1 is mounted on a lead frame. This state is shown in FIG.

【0008】次に、半導体チップ1を実装したリードフ
レームを、ラミネートシート11等の上に設置し、金型
12を下げて金型12のキャビデイ内に半導体チップ
1、タブ2、リード3、ボンディングワイヤ4を収容し
て、封止樹脂を注入して封止体5を形成する。リード3
の下面はシート11によって覆われているため、封止樹
脂が付着せずに封止体5の底面に露出することとなる。
金型12とリード3の上面とは密着させず、わずかな隙
間を設け、この隙間及びリード3間が隣接するキャビテ
ィへの樹脂流路となる。このため、従来のゲートのみを
樹脂流路とする樹脂注入と比較して注入抵抗を低減する
ことが可能である。この樹脂注入によって、リード3の
底面を露出させる状態で、半導体チップ1、タブ2、ボ
ンディングワイヤ4が例えばエポキシ樹脂からなる封止
体5によって封止され、タイバー9はダミーキャビティ
13によって覆われ、封止体5とダミーキャビティ13
との間には、金型12とリード3との前記隙間によって
樹脂の薄いブレーク部14が形成される。そして、この
ブレーク部14にはリード3の切断部3aと対応させて
溝を設ける。この樹脂封止前の縦断面を図6に示し、樹
脂封止後の縦断面を図7に示し、平面を図8に示す。
Next, the lead frame on which the semiconductor chip 1 is mounted is placed on a laminate sheet 11 or the like, the mold 12 is lowered, and the semiconductor chip 1, tab 2, lead 3, bonding The sealing body 5 is formed by housing the wire 4 and injecting a sealing resin. Lead 3
Is covered with the sheet 11 and is exposed to the bottom surface of the sealing body 5 without attaching the sealing resin.
The mold 12 and the upper surface of the lead 3 are not brought into close contact with each other, and a slight gap is provided. The gap and the space between the leads 3 serve as a resin flow path to an adjacent cavity. Therefore, it is possible to reduce the injection resistance as compared with the conventional resin injection using only the gate as the resin flow path. With this resin injection, the semiconductor chip 1, the tab 2, and the bonding wire 4 are sealed with a sealing body 5 made of, for example, epoxy resin while the bottom surface of the lead 3 is exposed, and the tie bar 9 is covered with the dummy cavity 13. Sealing body 5 and dummy cavity 13
A thin break portion 14 made of resin is formed between the mold 12 and the lead 3 by the gap between the mold 12 and the lead 3. The break portion 14 is provided with a groove corresponding to the cut portion 3a of the lead 3. FIG. 6 shows a vertical cross section before resin sealing, FIG. 7 shows a vertical cross section after resin sealing, and FIG. 8 shows a plan view.

【0009】次に、例えばローラで機械的な曲げ応力を
切断部に与えることによって、図9に示すように、封止
樹脂のブレーク部14とともにリード3が切断部3aに
て切断され、各リード3は機械的・電気的に分離されて
夫々の半導体装置が完成する。封止樹脂を切断する際
に、ブレーク部14に設けた溝に応力が集中するため
に、分断が容易となる。リード3の切断部3aでは、前
記封止樹脂のブレーク部14を支点として曲げ応力を受
け、容易に切断される。このリード3の切断では横方向
に力が加わるため、リード3と封止体5との剥離も生じ
にくくなる。なお、この分断については、ウェハから半
導体チップを切り分けるダイシングの技術を応用するこ
とが可能である。本実施の形態では、封止体5とダミー
キャビテイ13とを同一の厚さとしてある。このため前
記分断の際にリード3の切断部3aに両側から均等に力
が加えられ、良好な切断が行なわれる。加えて、ダミー
キャビテイ13を設けなかった場合には、分断の不良が
生じた場合には、隣接する半導体装置が何れも不良品と
なるが、ダミーキャビテイ13を設けた場合には、不良
の生じた半導体装置と隣接するダミーキャビテイが損傷
し、他の半導体装置に影響を与えることがない。なお、
切断部3aに設ける溝としては、V字状の他に、図10
の(a)に示すような円弧状、或いは同図の(b)に示
すような矩形状のものでも、それらの形状を組み合わせ
たものでもよい。本実施の形態の製造方法では、従来の
樹脂封止型半導体装置の工程を流用することによって、
比較的ピン数の少ない半導体装置を低コストで製造する
ことが可能となる。
Next, as shown in FIG. 9, the lead 3 is cut along with the break portion 14 of the sealing resin at the cut portion 3a by applying a mechanical bending stress to the cut portion using, for example, a roller. 3 is separated mechanically and electrically to complete each semiconductor device. When cutting the sealing resin, the stress is concentrated on the groove provided in the break portion 14, so that the cutting becomes easy. The cutting portion 3a of the lead 3 receives bending stress with the break portion 14 of the sealing resin as a fulcrum and is easily cut. Since a force is applied in the lateral direction when the lead 3 is cut, separation between the lead 3 and the sealing body 5 hardly occurs. It is to be noted that a dicing technique for separating a semiconductor chip from a wafer can be applied to this division. In the present embodiment, the sealing body 5 and the dummy cavities 13 have the same thickness. For this reason, force is evenly applied to the cut portion 3a of the lead 3 from both sides at the time of the above-mentioned division, and a good cut is performed. In addition, in the case where the dummy cavity 13 is not provided, in the case where a division failure occurs, all of the adjacent semiconductor devices become defective, but in the case where the dummy cavity 13 is provided, the occurrence of the defect occurs. The dummy cavity adjacent to the damaged semiconductor device is not damaged and does not affect other semiconductor devices. In addition,
As the grooves provided in the cutting portion 3a, in addition to the V shape, FIG.
(A), a rectangular shape as shown in (b) of the figure, or a combination of these shapes. In the manufacturing method of the present embodiment, by diverting the steps of the conventional resin-encapsulated semiconductor device,
A semiconductor device having a relatively small number of pins can be manufactured at low cost.

【0010】以上、本発明者によってなされた発明を、
前記実施の形態に基づき具体的に説明したが、本発明
は、前記実施の形態に限定されるものではなく、その要
旨を逸脱しない範囲において種々変更可能であることは
勿論である。例えば、以上の説明では、主として本発明
者によってなされた発明をその背景となった利用分野で
あるQFN型半導体装置に適用した場合について説明し
たが、それに限定されるものではなく、本発明は、他の
形式の底面端子型半導体装置にも広く適用が可能であ
る。
As described above, the invention made by the present inventor
Although a specific description has been given based on the above-described embodiment, the present invention is not limited to the above-described embodiment, and it is needless to say that various modifications can be made without departing from the gist of the invention. For example, in the above description, the case where the invention made by the present inventor is mainly applied to the QFN type semiconductor device, which is the application field as the background, has been described. However, the present invention is not limited to this. It can be widely applied to other types of bottom terminal type semiconductor devices.

【0011】[0011]

【発明の効果】本願において開示される発明のうち代表
的なものによって得られる効果を簡単に説明すれば、下
記の通りである。 (1)本発明によれば、底面に露出するリードを、その
外端部にて前記底面に対して垂直方向に薄く形成するこ
とによって、実装時の接合強度を向上させることができ
るという効果がある。 (2)本発明によれば、横方向に力を加えてリードの切
断を行なうことにより、金型による切断を行なわずに半
導体装置を製造することができるという効果がある。 (3)本発明によれば、上記効果(1)により、実装状
態での底面端子型半導体装置の接続強度が向上するとい
う効果がある。 (4)本発明によれば、上記効果(2)により、リード
の剥離が防止され半導体装置の歩留が向上するという効
果がある。
The effects obtained by typical ones of the inventions disclosed in the present application will be briefly described as follows. (1) According to the present invention, the lead exposed on the bottom surface is formed thin at the outer end thereof in the direction perpendicular to the bottom surface, so that the bonding strength at the time of mounting can be improved. is there. (2) According to the present invention, there is an effect that a semiconductor device can be manufactured without cutting by a die by cutting a lead by applying a force in the lateral direction. (3) According to the present invention, the effect (1) has an effect of improving the connection strength of the bottom terminal type semiconductor device in the mounted state. (4) According to the present invention, according to the effect (2), there is an effect that separation of the lead is prevented and the yield of the semiconductor device is improved.

【図面の簡単な説明】[Brief description of the drawings]

【図1】本発明の一実施の形態である半導体装置を示す
底面図である。
FIG. 1 is a bottom view showing a semiconductor device according to an embodiment of the present invention.

【図2】図1中のa‐a線に沿った縦断面図である。FIG. 2 is a longitudinal sectional view taken along the line aa in FIG.

【図3】図1,図2に示す半導体装置の実装状態を示す
縦断面図である。
FIG. 3 is a longitudinal sectional view showing a mounting state of the semiconductor device shown in FIGS. 1 and 2;

【図4】本実施の形態に用いられるリードフレームを示
す平面図である。
FIG. 4 is a plan view showing a lead frame used in the present embodiment.

【図5】本発明の一実施の形態である半導体装置を製造
工程毎に示す平面図である。
FIG. 5 is a plan view showing a semiconductor device according to an embodiment of the present invention for each manufacturing process.

【図6】本発明の一実施の形態である半導体装置を製造
工程毎に示す平面図である。
FIG. 6 is a plan view showing a semiconductor device according to an embodiment of the present invention for each manufacturing process.

【図7】本発明の一実施の形態である半導体装置を製造
工程毎に示す縦断面図である。
FIG. 7 is a longitudinal sectional view illustrating a semiconductor device according to an embodiment of the present invention for each manufacturing process.

【図8】本発明の一実施の形態である半導体装置を製造
工程毎に示す縦断面図である。
FIG. 8 is a longitudinal sectional view showing a semiconductor device according to an embodiment of the present invention for each manufacturing process.

【図9】本発明の一実施の形態である半導体装置を製造
工程毎に示す平面図である。
FIG. 9 is a plan view showing a semiconductor device according to an embodiment of the present invention for each manufacturing process.

【図10】本発明の一実施の形態である半導体装置の変
形例を示す縦断面図である。
FIG. 10 is a longitudinal sectional view showing a modification of the semiconductor device according to one embodiment of the present invention;

【符号の説明】[Explanation of symbols]

1…半導体チップ、2…タブ、3…リード、3a…切断
部、4…ボンディングワイヤ、5…封止体、6…基体、
7…配線層、8…ハンダ、9…タイバー、10…タブ吊
りリード、11…シート、12…金型、13…ダミーキ
ャビティ、14…ブレーク部。
DESCRIPTION OF SYMBOLS 1 ... Semiconductor chip, 2 ... Tab, 3 ... Lead, 3a ... Cut part, 4 ... Bonding wire, 5 ... Sealing body, 6 ... Base,
7: wiring layer, 8: solder, 9: tie bar, 10: tab suspension lead, 11: sheet, 12: mold, 13: dummy cavity, 14: break part.

───────────────────────────────────────────────────── フロントページの続き (72)発明者 新井 克夫 東京都小平市上水本町五丁目20番1号 株 式会社日立製作所半導体グループ内 (72)発明者 団野 忠敏 東京都小平市上水本町五丁目20番1号 株 式会社日立製作所半導体グループ内 (72)発明者 清水 一男 東京都小平市上水本町五丁目20番1号 株 式会社日立製作所半導体グループ内 Fターム(参考) 4M109 AA01 BA01 CA21 FA02 5F067 AB03 AB04 BC07  ──────────────────────────────────────────────────続 き Continuing on the front page (72) Katsuo Arai, Inventor 5--20-1, Kamizuhoncho, Kodaira-shi, Tokyo Within the Semiconductor Group, Hitachi, Ltd. (72) Tadatoshi Tanno, Gojokamihoncho, Kodaira-shi, Tokyo No. 20-1, Hitachi Ltd. Semiconductor Group (72) Inventor Kazuo Shimizu 5-20-1, Kamimizu Honmachi, Kodaira-shi, Tokyo F-Terminology, Hitachi Semiconductor Group 4M109 AA01 BA01 CA21 FA02 5F067 AB03 AB04 BC07

Claims (8)

【特許請求の範囲】[Claims] 【請求項1】 半導体装置の外部端子となるリードが封
止体底面にて露出する半導体装置において、 前記底面に露出するリードが、その外端部にて前記底面
に対して垂直方向に薄く形成されていることを特徴とす
る半導体装置。
1. A semiconductor device in which a lead serving as an external terminal of a semiconductor device is exposed at a bottom surface of a sealing body, wherein the lead exposed at the bottom surface is formed thin at an outer end thereof in a direction perpendicular to the bottom surface. A semiconductor device characterized by being performed.
【請求項2】 前記リードの外端部にて、その露出面が
傾斜することによって、前記底面に対して垂直方向に薄
く形成されていることを特徴とする請求項1に記載の半
導体装置。
2. The semiconductor device according to claim 1, wherein an exposed surface of the lead is inclined at an outer end portion so as to be thin in a direction perpendicular to the bottom surface.
【請求項3】 前記封止体が、その外端部にて垂直方向
に薄く形成されていることを特徴とする請求項1又は請
求項2に記載の半導体装置。
3. The semiconductor device according to claim 1, wherein the sealing body is formed vertically thin at an outer end thereof.
【請求項4】 半導体装置の外部端子となるリードが封
止体底面にて露出する半導体装置の製造方法において、 複数の半導体装置となるリードの組が連続して設けら
れ、各リードの封止体外端部に位置する切断部に凹部が
設けられたリードフレームを用い、 前記リードフレームに半導体チップを搭載し、前記半導
体チップとリードフレームのリードとを電気的に接続す
る工程と、 前記半導体チップを樹脂封止する工程と、 前記リードの凹部にて封止体及びリードを分離して、夫
々の半導体装置に分断する工程とを有することを特徴と
する半導体装置の製造方法。
4. A method of manufacturing a semiconductor device in which leads serving as external terminals of a semiconductor device are exposed at a bottom surface of a sealing body, wherein a plurality of sets of leads serving as semiconductor devices are provided continuously, and each lead is sealed. A step of mounting a semiconductor chip on the lead frame using a lead frame provided with a concave portion at a cutting portion located at the outer end of the body, and electrically connecting the semiconductor chip and a lead of the lead frame; And a step of separating the sealing body and the lead at the concave portion of the lead and dividing the semiconductor body into respective semiconductor devices.
【請求項5】 各半導体装置のリードがタイバーによっ
て一体化されており、 隣接する半導体装置の切断部間
に形成されるダミーキャビティによって前記タイバーが
覆われることを特徴とする請求項4に記載の半導体装置
の製造方法。
5. The semiconductor device according to claim 4, wherein the leads of each semiconductor device are integrated by a tie bar, and the tie bar is covered by a dummy cavity formed between cut portions of adjacent semiconductor devices. A method for manufacturing a semiconductor device.
【請求項6】 前記封止体及びリードの分離が曲げ応力
によって行なわれることを特徴とする請求項4又は請求
項5に記載の半導体装置の製造方法。
6. The method for manufacturing a semiconductor device according to claim 4, wherein the sealing body and the lead are separated by bending stress.
【請求項7】 前記リードの凹部がV字状に設けられて
いることを特徴とする請求項4乃至請求項6の何れか一
項に記載の半導体装置の製造方法。
7. The method of manufacturing a semiconductor device according to claim 4, wherein the recess of the lead is provided in a V-shape.
【請求項8】 前記切断部の封止体に凹部を設けて封止
体が形成されることを特徴とする請求項4乃至請求項7
の何れか一項に記載の半導体装置の製造方法。
8. The sealing body according to claim 4, wherein the sealing body is formed by providing a concave portion in the sealing body of the cut portion.
13. The method for manufacturing a semiconductor device according to claim 1.
JP10194999A 1999-04-09 1999-04-09 Semiconductor device and manufacture thereof Pending JP2000294715A (en)

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Application Number Priority Date Filing Date Title
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Publication Number Publication Date
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ID=14314157

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Application Number Title Priority Date Filing Date
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Country Link
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