JP2000044386A5 - - Google Patents
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- Publication number
- JP2000044386A5 JP2000044386A5 JP1999022628A JP2262899A JP2000044386A5 JP 2000044386 A5 JP2000044386 A5 JP 2000044386A5 JP 1999022628 A JP1999022628 A JP 1999022628A JP 2262899 A JP2262899 A JP 2262899A JP 2000044386 A5 JP2000044386 A5 JP 2000044386A5
- Authority
- JP
- Japan
- Prior art keywords
- quartz glass
- less
- powder
- crucible
- single crystal
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 231
- 239000000843 powder Substances 0.000 description 78
- 239000013078 crystal Substances 0.000 description 73
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 66
- 229910052710 silicon Inorganic materials 0.000 description 66
- 239000010703 silicon Substances 0.000 description 66
- 239000010410 layer Substances 0.000 description 65
- 238000000034 method Methods 0.000 description 39
- 239000007789 gas Substances 0.000 description 36
- 239000000758 substrate Substances 0.000 description 29
- 238000010438 heat treatment Methods 0.000 description 28
- 238000002844 melting Methods 0.000 description 26
- 230000008018 melting Effects 0.000 description 26
- 235000012239 silicon dioxide Nutrition 0.000 description 26
- 239000010453 quartz Substances 0.000 description 24
- 238000004519 manufacturing process Methods 0.000 description 15
- 238000010891 electric arc Methods 0.000 description 12
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 12
- 239000002245 particle Substances 0.000 description 12
- 230000007547 defect Effects 0.000 description 8
- 230000002093 peripheral effect Effects 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 7
- 238000001000 micrograph Methods 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 239000006260 foam Substances 0.000 description 6
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 5
- 230000015572 biosynthetic process Effects 0.000 description 5
- 238000004868 gas analysis Methods 0.000 description 5
- 239000011521 glass Substances 0.000 description 5
- 238000004458 analytical method Methods 0.000 description 4
- 238000002425 crystallisation Methods 0.000 description 4
- 230000008025 crystallization Effects 0.000 description 4
- 229910002804 graphite Inorganic materials 0.000 description 4
- 239000010439 graphite Substances 0.000 description 4
- 229910052739 hydrogen Inorganic materials 0.000 description 4
- 239000001257 hydrogen Substances 0.000 description 4
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 4
- 229920005591 polysilicon Polymers 0.000 description 4
- 239000002994 raw material Substances 0.000 description 4
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 2
- 239000003575 carbonaceous material Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 229910052906 cristobalite Inorganic materials 0.000 description 1
- 238000005516 engineering process Methods 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 238000004880 explosion Methods 0.000 description 1
- 239000010419 fine particle Substances 0.000 description 1
- 150000002431 hydrogen Chemical class 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 238000012856 packing Methods 0.000 description 1
- 239000013049 sediment Substances 0.000 description 1
- 238000003980 solgel method Methods 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000008961 swelling Effects 0.000 description 1
Priority Applications (6)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP02262899A JP4398527B2 (ja) | 1998-05-25 | 1999-01-29 | シリコン単結晶引き上げ用石英ガラスるつぼ |
| TW088107805A TW509664B (en) | 1998-05-25 | 1999-05-13 | Silica glass crucible for pulling up silicon single crystal and production of the crucible |
| KR1019990018459A KR100550440B1 (ko) | 1998-05-25 | 1999-05-21 | 실리콘단결정 인상용 석영 유리 도가니 및 그의 제조방법 |
| EP99921237A EP1020546A4 (en) | 1998-05-25 | 1999-05-24 | QUARTZ-GLASS-POT FOR DRAWING SILICON MONOCRYSTALS AND METHOD FOR THE PRODUCTION THEREOF |
| PCT/JP1999/002703 WO1999061685A1 (en) | 1998-05-25 | 1999-05-24 | Quartz glass crucible for pulling silicon monocrystal and method of manufacturing the same |
| US09/987,463 US6797061B2 (en) | 1998-05-25 | 2001-11-14 | Quartz glass crucible for pulling up silicon single crystal and production method therefor |
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15988098 | 1998-05-25 | ||
| JP10-159880 | 1998-05-25 | ||
| JP02262899A JP4398527B2 (ja) | 1998-05-25 | 1999-01-29 | シリコン単結晶引き上げ用石英ガラスるつぼ |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2007041694A Division JP4482567B2 (ja) | 1998-05-25 | 2007-02-22 | シリコン単結晶引き上げ用石英ガラスるつぼの製造方法 |
Publications (3)
| Publication Number | Publication Date |
|---|---|
| JP2000044386A JP2000044386A (ja) | 2000-02-15 |
| JP2000044386A5 true JP2000044386A5 (enExample) | 2007-04-12 |
| JP4398527B2 JP4398527B2 (ja) | 2010-01-13 |
Family
ID=26359887
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP02262899A Expired - Fee Related JP4398527B2 (ja) | 1998-05-25 | 1999-01-29 | シリコン単結晶引き上げ用石英ガラスるつぼ |
Country Status (6)
| Country | Link |
|---|---|
| US (1) | US6797061B2 (enExample) |
| EP (1) | EP1020546A4 (enExample) |
| JP (1) | JP4398527B2 (enExample) |
| KR (1) | KR100550440B1 (enExample) |
| TW (1) | TW509664B (enExample) |
| WO (1) | WO1999061685A1 (enExample) |
Families Citing this family (20)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4549008B2 (ja) | 2002-05-17 | 2010-09-22 | 信越石英株式会社 | 水素ドープシリカ粉及びそれを用いたシリコン単結晶引上げ用石英ガラスルツボ |
| JP4086283B2 (ja) * | 2002-07-31 | 2008-05-14 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボおよびその製造方法 |
| US7427327B2 (en) * | 2005-09-08 | 2008-09-23 | Heraeus Shin-Etsu America, Inc. | Silica glass crucible with barium-doped inner wall |
| US7383696B2 (en) * | 2005-09-08 | 2008-06-10 | Heraeus Shin-Etsu America, Inc. | Silica glass crucible with bubble-free and reduced bubble growth wall |
| US20070084400A1 (en) * | 2005-10-19 | 2007-04-19 | General Electric Company | Quartz glass crucible and method for treating surface of quartz glass crucible |
| JP5046753B2 (ja) * | 2006-06-26 | 2012-10-10 | 信越化学工業株式会社 | 光ファイバ母材の製造方法及びその装置 |
| TWI408259B (zh) * | 2006-09-28 | 2013-09-11 | Shinetsu Quartz Prod | 具有鋇摻雜內壁的矽玻璃坩堝 |
| US7993556B2 (en) | 2007-08-08 | 2011-08-09 | Heraeus Shin-Etsu America, Inc. | Method for making a silica glass crucible |
| JP4702898B2 (ja) * | 2007-09-18 | 2011-06-15 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボの製造方法 |
| JP5273512B2 (ja) * | 2007-10-25 | 2013-08-28 | 株式会社Sumco | 石英ガラスルツボとその製造方法および用途 |
| JP4671999B2 (ja) * | 2007-11-30 | 2011-04-20 | ジャパンスーパークォーツ株式会社 | 石英ガラスルツボの試験方法 |
| JP4995069B2 (ja) * | 2007-12-28 | 2012-08-08 | ジャパンスーパークォーツ株式会社 | 内面結晶化ルツボおよび該ルツボを用いた引上げ方法 |
| EP2264226A4 (en) * | 2008-03-31 | 2011-07-27 | Japan Super Quartz Corp | QUARTZ GLASS LEVER AND MANUFACTURING METHOD THEREFOR |
| DE102008026890B3 (de) * | 2008-06-05 | 2009-06-04 | Heraeus Quarzglas Gmbh & Co. Kg | Verfahren und Vorrichtung zur Herstellung eines Tiegels aus Quarzglas |
| JP5523018B2 (ja) * | 2008-08-30 | 2014-06-18 | 株式会社Sumco | 石英ルツボの製造装置 |
| JP5142912B2 (ja) * | 2008-09-22 | 2013-02-13 | ジャパンスーパークォーツ株式会社 | アーク放電方法、アーク放電装置、石英ガラスルツボ製造装置 |
| JP5467418B2 (ja) * | 2010-12-01 | 2014-04-09 | 株式会社Sumco | 造粒シリカ粉の製造方法、シリカガラスルツボの製造方法 |
| JP5500688B2 (ja) * | 2010-12-03 | 2014-05-21 | 株式会社Sumco | シリカガラスルツボの製造方法 |
| US20140041575A1 (en) * | 2012-03-23 | 2014-02-13 | Shin-Etsu Quartz Products Co., Ltd. | Silica container for pulling single crystal silicon and method for producing the same |
| JP7163863B2 (ja) * | 2019-05-08 | 2022-11-01 | 株式会社Sumco | 石英ルツボ製造用モールド及びこれを用いた石英ルツボ製造装置 |
Family Cites Families (17)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE236084C (enExample) | ||||
| JPH0243720B2 (ja) * | 1982-09-10 | 1990-10-01 | Toshiba Ceramics Co | Handotaishoryosekieigarasuseiroshinkan |
| DD236084A1 (de) * | 1985-04-04 | 1986-05-28 | Technisches Glas Veb K | Verfahren zur herstellung von gelaeuterten rotationssymmetrischen kieselglashohlkoerpern |
| US5389582A (en) * | 1985-11-06 | 1995-02-14 | Loxley; Ted A. | Cristobalite reinforcement of quartz glass |
| US4632686A (en) * | 1986-02-24 | 1986-12-30 | Gte Products Corporation | Method of manufacturing quartz glass crucibles with low bubble content |
| US4935046A (en) * | 1987-12-03 | 1990-06-19 | Shin-Etsu Handotai Company, Limited | Manufacture of a quartz glass vessel for the growth of single crystal semiconductor |
| JPH01148718A (ja) * | 1987-12-03 | 1989-06-12 | Shin Etsu Handotai Co Ltd | 石英るつぼの製造方法 |
| JP2933404B2 (ja) * | 1990-06-25 | 1999-08-16 | 信越石英 株式会社 | シリコン単結晶引き上げ用石英ガラスルツボとその製造方法 |
| JP2747856B2 (ja) * | 1991-10-31 | 1998-05-06 | 信越石英株式会社 | シリコン単結晶引上げ用石英ガラスルツボ及びその製造方法 |
| US5306473A (en) * | 1992-01-31 | 1994-04-26 | Toshiba Ceramics Co., Ltd. | Quartz glass crucible for pulling a single crystal |
| JP2736863B2 (ja) * | 1994-05-31 | 1998-04-02 | 信越石英株式会社 | 石英ガラスルツボの製造方法 |
| JP2830990B2 (ja) * | 1995-05-31 | 1998-12-02 | 信越石英株式会社 | 石英製二重ルツボの製造方法 |
| JPH0920586A (ja) * | 1995-06-30 | 1997-01-21 | Toshiba Ceramics Co Ltd | シリコン単結晶引上げ用石英ガラスルツボの製造方法 |
| JP3533416B2 (ja) * | 1996-02-06 | 2004-05-31 | 三菱住友シリコン株式会社 | 単結晶引上装置 |
| JP4285788B2 (ja) * | 1996-03-14 | 2009-06-24 | 信越石英株式会社 | 単結晶引き上げ用大口径石英るつぼの製造方法 |
| JP3764776B2 (ja) * | 1996-03-18 | 2006-04-12 | 信越石英株式会社 | 単結晶引き上げ用石英ガラスるつぼ及びその製造方法 |
| JP3798849B2 (ja) * | 1996-07-09 | 2006-07-19 | 信越石英株式会社 | 石英ルツボの製造装置及び方法 |
-
1999
- 1999-01-29 JP JP02262899A patent/JP4398527B2/ja not_active Expired - Fee Related
- 1999-05-13 TW TW088107805A patent/TW509664B/zh not_active IP Right Cessation
- 1999-05-21 KR KR1019990018459A patent/KR100550440B1/ko not_active Expired - Lifetime
- 1999-05-24 EP EP99921237A patent/EP1020546A4/en not_active Withdrawn
- 1999-05-24 WO PCT/JP1999/002703 patent/WO1999061685A1/ja not_active Ceased
-
2001
- 2001-11-14 US US09/987,463 patent/US6797061B2/en not_active Expired - Lifetime
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