JP2000030654A5 - - Google Patents

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Publication number
JP2000030654A5
JP2000030654A5 JP1999169351A JP16935199A JP2000030654A5 JP 2000030654 A5 JP2000030654 A5 JP 2000030654A5 JP 1999169351 A JP1999169351 A JP 1999169351A JP 16935199 A JP16935199 A JP 16935199A JP 2000030654 A5 JP2000030654 A5 JP 2000030654A5
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JP
Japan
Prior art keywords
detectors
sample
particle beam
objective lens
optical axis
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JP1999169351A
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English (en)
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JP4482179B2 (ja
JP2000030654A (ja
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Priority claimed from DE19828476A external-priority patent/DE19828476A1/de
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Publication of JP2000030654A publication Critical patent/JP2000030654A/ja
Publication of JP2000030654A5 publication Critical patent/JP2000030654A5/ja
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Publication of JP4482179B2 publication Critical patent/JP4482179B2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Description

【請求項1】 ビーム発生器(1,2,3)と;
試料(10)上に粒子ビームをフォーカシングする焦面を有する対物レンズ(5,5a,6)と;
上記試料上に飛来する粒子ビームのエネルギを約5Keボルト以上の1次エネルギから約200eボルト以上の最低1次エネルギまでに変化させる静電装置と;
上記ビーム発生器(1,2,3)と対物レンズ(5,5a,6)の焦面との間に配設された、試料(10)から反射散乱されたまたは放射された粒子(19,20)を検知する2つの検知器(11,12,13,15,16)と;から構成された光軸を有する粒子ビーム装置において、
上記2つの検知器は、光軸の方向へ相互にずらして配設されており、この2つの検知器間の間隔は、試料側の検知器(11,12)と対物レンズの焦面との間隔の50%と75%の範囲にあることを特徴とする粒子ビーム装置。
JP16935199A 1998-06-26 1999-06-16 粒子ビーム装置 Expired - Lifetime JP4482179B2 (ja)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19828476A DE19828476A1 (de) 1998-06-26 1998-06-26 Teilchenstrahlgerät
DE19828476.4 1998-06-26

Publications (3)

Publication Number Publication Date
JP2000030654A JP2000030654A (ja) 2000-01-28
JP2000030654A5 true JP2000030654A5 (ja) 2006-07-06
JP4482179B2 JP4482179B2 (ja) 2010-06-16

Family

ID=7872080

Family Applications (1)

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JP16935199A Expired - Lifetime JP4482179B2 (ja) 1998-06-26 1999-06-16 粒子ビーム装置

Country Status (4)

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US (1) US6498345B1 (ja)
EP (1) EP0969495B1 (ja)
JP (1) JP4482179B2 (ja)
DE (1) DE19828476A1 (ja)

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