JP1546512S - - Google Patents

Info

Publication number
JP1546512S
JP1546512S JPD2015-19682F JP2015019682F JP1546512S JP 1546512 S JP1546512 S JP 1546512S JP 2015019682 F JP2015019682 F JP 2015019682F JP 1546512 S JP1546512 S JP 1546512S
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
JPD2015-19682F
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JPD2015-19682F priority Critical patent/JP1546512S/ja
Priority to US29/555,822 priority patent/USD791090S1/en
Priority to TW105304215F priority patent/TWD181481S/zh
Application granted granted Critical
Publication of JP1546512S publication Critical patent/JP1546512S/ja
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

JPD2015-19682F 2015-09-04 2015-09-04 Active JP1546512S (ko)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JPD2015-19682F JP1546512S (ko) 2015-09-04 2015-09-04
US29/555,822 USD791090S1 (en) 2015-09-04 2016-02-25 Reaction tube
TW105304215F TWD181481S (zh) 2015-09-04 2016-03-02 反應管

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JPD2015-19682F JP1546512S (ko) 2015-09-04 2015-09-04

Publications (1)

Publication Number Publication Date
JP1546512S true JP1546512S (ko) 2016-03-22

Family

ID=55522530

Family Applications (1)

Application Number Title Priority Date Filing Date
JPD2015-19682F Active JP1546512S (ko) 2015-09-04 2015-09-04

Country Status (3)

Country Link
US (1) USD791090S1 (ko)
JP (1) JP1546512S (ko)
TW (1) TWD181481S (ko)

Families Citing this family (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP6462161B2 (ja) * 2016-02-09 2019-01-30 株式会社Ｋｏｋｕｓａｉ Ｅｌｅｃｔｒｉｃ 基板処理装置および半導体装置の製造方法
JP1605460S (ko) * 2017-08-09 2021-05-31
JP1605461S (ko) * 2017-08-10 2021-05-31
JP1605462S (ko) * 2017-08-10 2021-05-31
JP1605982S (ko) * 2017-12-27 2021-05-31
JP1644260S (ko) * 2019-03-20 2019-10-28
USD931241S1 (en) * 2019-08-28 2021-09-21 Applied Materials, Inc. Lower shield for a substrate processing chamber
USD931823S1 (en) * 2020-01-29 2021-09-28 Kokusai Electric Corporation Reaction tube
JP1713188S (ko) * 2021-09-15 2022-04-21
JP1731878S (ko) * 2022-03-01 2022-12-09
JP1731877S (ko) * 2022-03-01 2022-12-09
JP1731789S (ko) * 2022-03-01 2022-12-09
JP1731673S (ko) * 2022-05-30 2022-12-08
JP1731675S (ko) * 2022-05-30 2022-12-08
JP1731674S (ko) * 2022-05-30 2022-12-08

Family Cites Families (28)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
KR890008922A (ko) * 1987-11-21 1989-07-13 후세 노보루 열처리 장치
USD423463S (en) * 1997-01-31 2000-04-25 Tokyo Electron Limited Quartz process tube
USD417438S (en) * 1997-01-31 1999-12-07 Tokyo Electron Limited Quartz outer tube
USD424024S (en) * 1997-01-31 2000-05-02 Tokyo Electron Limited Quartz process tube
USD406113S (en) * 1997-01-31 1999-02-23 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405429S (en) * 1997-01-31 1999-02-09 Tokyo Electron Limited Processing tube for use in a semiconductor wafer heat processing apparatus
USD405062S (en) * 1997-08-20 1999-02-02 Tokyo Electron Ltd. Processing tube for use in a semiconductor wafer heat processing apparatus
USD405431S (en) * 1997-08-20 1999-02-09 Tokyo Electron Ltd. Tube for use in a semiconductor wafer heat processing apparatus
US5948300A (en) * 1997-09-12 1999-09-07 Kokusai Bti Corporation Process tube with in-situ gas preheating
JP2000243747A (ja) * 1999-02-18 2000-09-08 Kokusai Electric Co Ltd 基板処理装置
JP3985899B2 (ja) * 2002-03-28 2007-10-03 株式会社日立国際電気 基板処理装置
JP5157100B2 (ja) * 2006-08-04 2013-03-06 東京エレクトロン株式会社 成膜装置及び成膜方法
USD600659S1 (en) * 2006-09-12 2009-09-22 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD586768S1 (en) * 2006-10-12 2009-02-17 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
USD619630S1 (en) * 2007-05-08 2010-07-13 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP5096182B2 (ja) * 2008-01-31 2012-12-12 東京エレクトロン株式会社 熱処理炉
USD611013S1 (en) * 2008-03-28 2010-03-02 Tokyo Electron Limited Process tube for manufacturing semiconductor wafers
JP4930438B2 (ja) * 2008-04-03 2012-05-16 東京エレクトロン株式会社 反応管及び熱処理装置
USD618638S1 (en) * 2008-05-09 2010-06-29 Hitachi Kokusai Electric, Inc. Reaction tube
USD610559S1 (en) * 2008-05-30 2010-02-23 Hitachi Kokusai Electric, Inc. Reaction tube
USD725053S1 (en) * 2011-11-18 2015-03-24 Tokyo Electron Limited Outer tube for process tube for manufacturing semiconductor wafers
TWD167985S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD168774S (zh) * 2013-06-28 2015-07-01 日立國際電氣股份有限公司 反應管之部分
TWD167987S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
TWD167986S (zh) * 2013-06-28 2015-05-21 日立國際電氣股份有限公司 反應管之部分
USD739832S1 (en) * 2013-06-28 2015-09-29 Hitachi Kokusai Electric Inc. Reaction tube
JP1535455S (ko) * 2015-02-25 2015-10-19
JP1546345S (ko) * 2015-09-04 2016-03-22

Also Published As

Publication number Publication date
USD791090S1 (en) 2017-07-04
TWD181481S (zh) 2017-02-21

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