IT963413B - Procedimento di fotoincisione particolarmente per la fabbrica zione di circuiti integrati - Google Patents

Procedimento di fotoincisione particolarmente per la fabbrica zione di circuiti integrati

Info

Publication number
IT963413B
IT963413B IT2747972A IT2747972A IT963413B IT 963413 B IT963413 B IT 963413B IT 2747972 A IT2747972 A IT 2747972A IT 2747972 A IT2747972 A IT 2747972A IT 963413 B IT963413 B IT 963413B
Authority
IT
Italy
Prior art keywords
photoengraving
manufacture
integrated circuits
procedure particularly
procedure
Prior art date
Application number
IT2747972A
Other languages
English (en)
Italian (it)
Original Assignee
Ibm
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ibm filed Critical Ibm
Application granted granted Critical
Publication of IT963413B publication Critical patent/IT963413B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • ing And Chemical Polishing (AREA)
IT2747972A 1971-09-01 1972-07-27 Procedimento di fotoincisione particolarmente per la fabbrica zione di circuiti integrati IT963413B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE19712143737 DE2143737A1 (de) 1971-09-01 1971-09-01 Photoaetzverfahren

Publications (1)

Publication Number Publication Date
IT963413B true IT963413B (it) 1974-01-10

Family

ID=5818349

Family Applications (1)

Application Number Title Priority Date Filing Date
IT2747972A IT963413B (it) 1971-09-01 1972-07-27 Procedimento di fotoincisione particolarmente per la fabbrica zione di circuiti integrati

Country Status (4)

Country Link
JP (1) JPS5133445B2 (enrdf_load_stackoverflow)
DE (1) DE2143737A1 (enrdf_load_stackoverflow)
FR (1) FR2151130A1 (enrdf_load_stackoverflow)
IT (1) IT963413B (enrdf_load_stackoverflow)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS501805A (enrdf_load_stackoverflow) * 1973-05-14 1975-01-09
JPS5168772A (en) * 1974-12-11 1976-06-14 Matsushita Electronics Corp Handotaisochino seizohoho
JPS5348676A (en) * 1976-10-15 1978-05-02 Handotai Kenkyu Shinkokai Method of forming pattern
US4099062A (en) * 1976-12-27 1978-07-04 International Business Machines Corporation Electron beam lithography process
DE2734580C2 (de) * 1977-08-01 1979-02-15 Hoechst Ag, 6000 Frankfurt Verfahren zum Herstellen eines Originals eines Informationsträgers
JPS5429976A (en) * 1977-08-10 1979-03-06 Nec Home Electronics Ltd Manufacture of semiconductor device
JPS5676531A (en) * 1979-11-28 1981-06-24 Fujitsu Ltd Manufacture of semiconductor device
DE3013819A1 (de) * 1980-04-10 1981-10-15 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung gedruckter leiterplatten
JPS594017A (ja) * 1982-06-30 1984-01-10 Toshiba Corp 電子ビ−ム露光方法
US4456371A (en) * 1982-06-30 1984-06-26 International Business Machines Corporation Optical projection printing threshold leveling arrangement
JPS59232418A (ja) * 1983-06-15 1984-12-27 Sumitomo Electric Ind Ltd 微細パタ−ン形成法
EP0448735B1 (en) * 1990-03-23 1997-08-06 Ushio Denki Kabushiki Kaisha Method of exposing a peripheral part of wafer

Also Published As

Publication number Publication date
JPS4833908A (enrdf_load_stackoverflow) 1973-05-15
FR2151130A1 (en) 1973-04-13
DE2143737A1 (de) 1973-03-08
JPS5133445B2 (enrdf_load_stackoverflow) 1976-09-20
FR2151130B1 (enrdf_load_stackoverflow) 1974-08-19

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